Patents Examined by Paul M. Gurzo
  • Patent number: 7211791
    Abstract: Method and apparatus for chromatographic high field asymmetric waveform ion mobility spectrometry, including a gas chromatographic analyzer section intimately coupled with an ionization section, an ion filter section, and an ion detection section, in which the sample compounds are at least somewhat separated prior to ionization, and ion filtering proceeds in a planar chamber under influence of high field asymmetric periodic signals, with detection integrated into the flow path, for producing accurate, real-time, orthogonal data for identification of a broad range of chemical compounds.
    Type: Grant
    Filed: September 2, 2004
    Date of Patent: May 1, 2007
    Assignee: The Charles Stark Draper Laboratory, Inc.
    Inventors: Raanan A. Miller, Erkinjon G. Nazarov, Gary A. Eiceman, Evgeny Krylov, Boris Tadjikov
  • Patent number: 7102128
    Abstract: A mass spectrometer having a matrix-assisted laser desorption ionization (MALDI) source which operates at ambient pressure is disclosed.
    Type: Grant
    Filed: March 22, 2004
    Date of Patent: September 5, 2006
    Assignee: Agilent Technologies, Inc.
    Inventors: Jian Bai, Steven M. Fischer, J. Michael Flanagan
  • Patent number: 7095927
    Abstract: An optical distributor includes an optical-signal input port, a light receiving device, a light emitting device, a light splitter, and optical signal output ports. The light receiving device converts an optical light signal input to the optical-signal input port into an electric signal. The light emitting device converts the electric signal into an optical signal. The optical splitter 14 splits the converted optical signal into two optical signals. The optical-signal output ports output the split optical signals. The light receiving device includes a light receiving element, a pre-amplifier, and a limiting amplifier. The light emitting device includes a light-source drive element and a light emitting element.
    Type: Grant
    Filed: March 25, 2003
    Date of Patent: August 22, 2006
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Hidenori Yamada, Junji Okada, Osamu Ueno, Shinya Kyozuka, Yoshihide Sato, Masaru Kijima
  • Patent number: 7088896
    Abstract: An optical fiber includes a primary covering layer, a secondary covering layer transparent to a laser beam, an intermediate covering layer less than 100 nm thick between the primary covering layer and the secondary covering layer and including a coloring element whose coloring properties can be modified by using the laser beam to irradiate the intermediate covering layer to write data.
    Type: Grant
    Filed: March 13, 2003
    Date of Patent: August 8, 2006
    Assignee: Alcatel
    Inventors: Xavier Andrieu, Jean-François Libert, Anne Decaumont
  • Patent number: 7050687
    Abstract: A low slope dispersion shifted optical waveguide fiber having an effective area of less than about 60 ?m2 at a wavelength of about 1550 nm, a zero-dispersion wavelength of less than about 1430 nm, a dispersion of between about 4 ps/nm/km and about 10 ps/nm/km at a wavelength of about 1550 nm, a dispersion slope of less than 0.045 ps/nm2/km at a wavelength of about 1550 nm, and a cabled cutoff wavelength of less than about 1260 nm.
    Type: Grant
    Filed: February 12, 2003
    Date of Patent: May 23, 2006
    Assignee: Corning Incorporated
    Inventors: Scott R. Bickham, Phong Diep
  • Patent number: 7041988
    Abstract: An electron beam exposure apparatus for exposing wafer with an electron beam, includes: a first electromagnetic lens system for making the electron beam incident substantially perpendicularly on a first plane be incident on a second plane substantially perpendicularly; a second electromagnetic lens system for making the electron beam that was substantially perpendicularly incident on the second plane be incident on the wafer substantially perpendicularly; a rotation correction lens provided within the first electromagnetic lens system for correcting rotation of the electron beam caused by at least the first electromagnetic lens system; a deflection system for deflecting the electron beam to a position on the wafer; and a deflection-correction optical system provided within the second electromagnetic lens system for correcting deflection aberration caused by the deflection system.
    Type: Grant
    Filed: May 8, 2003
    Date of Patent: May 9, 2006
    Assignees: Advantest Corp., Canon Kabushiki Kaisha, Hitachi, Ltd
    Inventors: Shinichi Hamaguchi, Susumu Goto, Osamu Kamimura, Yasunari Sohda
  • Patent number: 7030396
    Abstract: Disclosed is a medical particle irradiation apparatus comprising a rotating gantry 1 including an irradiation unit 4 emitting particle beams; an annular frame 16 located within and supported by the rotating gantry 1 such that it can rotate relative to the rotating gantry 1; an annular frame 15 fixedly located opposite the annular frame 16; an anti-corotation mechanism 34 being in contact with both the annular frames 16 and 15 to prevent the annular frame 16 from rotating together with the rotating gantry 1 during rotation of the rotating gantry 1; and a flexible moving floor 17 interposed between the annular frames 15 and 16, the flexible moving floor 17 being engaged with the annular frames 15 and 16 in such a manner as to move freely such that its bottom is substantially level and that it moves as the rotating gantry rotates.
    Type: Grant
    Filed: December 1, 2003
    Date of Patent: April 18, 2006
    Assignees: Hitachi, Ltd., Hitachi Setsubi Engineering Co., Ltd.
    Inventors: Yutaka Muramatsu, Hidehito Asano, Wataru Sagawa, Hiroshi Akiyama, Tsutomu Yamashita
  • Patent number: 7030376
    Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.
    Type: Grant
    Filed: December 23, 2003
    Date of Patent: April 18, 2006
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tsuyoshi Inanobe, Sho Takami, Yoichi Ose, Katsuhiro Sasada
  • Patent number: 7026636
    Abstract: The present invention provides an increased degree of uniformity of radiation dose distribution for the interior of a diseased part. A particle beam therapy system includes a charged particle beam generation apparatus and an irradiation apparatus. An ion beam is generated by the charged particle beam generation apparatus. The irradiation apparatus exposes a diseased part to the generated ion beam. A scattering device, a range adjustment device, and a Bragg peak spreading device are installed upstream of a first scanning magnet and a second scanning magnet. The scattering device and the range adjustment device are combined together and moved along a beam axis, whereas the Bragg peak spreading device is moved independently along the beam axis. The scattering device moves to adjust the degree of ion beam scattering. The range adjustment device moves to adjust ion beam scatter changes caused by an absorber thickness adjustment.
    Type: Grant
    Filed: January 21, 2004
    Date of Patent: April 11, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Masaki Yanagisawa, Hiroshi Akiyama, Koji Matsuda, Hisataka Fujimaki
  • Patent number: 7024076
    Abstract: An optical packet header identifier having a simplified configuration and being superior in reliability, stability, and economical efficiency, an optical router incorporating the identifier therein, and a routing method using the optical router are provided. The optical packet header identifier includes an optical waveguide, optical focusing elements, and a photo receiver. Tilted gratings for diffracting an incident optical beam and emitting the beams as diffracted optical beams to the outside of the waveguide are formed within the optical waveguide. The tilted gratings are not formed uniformly in a longitudinal direction of a core of the optical waveguide, but are arranged at intervals. The length of a portion containing a set of gratings and the length of a portion containing no gratings can be defined in increments of length “L”. “L” equals to the spatial length which 1 bit in an optical signal occupies.
    Type: Grant
    Filed: March 21, 2005
    Date of Patent: April 4, 2006
    Assignee: Laserfront Technologies, Inc.
    Inventors: Yoshinori Ohta, Yukio Ogura
  • Patent number: 7019286
    Abstract: Time-of-flight mass spectrometer instruments for monitoring fast processes using an interleaved timing scheme and a position sensitive detector are described. The combination of both methods is also described.
    Type: Grant
    Filed: October 20, 2003
    Date of Patent: March 28, 2006
    Assignee: Ionwerks, Inc.
    Inventors: Katrin Fuhrer, Marc Gonin, Kent J. Gillig, Thomas Egan, Michael I. McCully, John A. Schultz
  • Patent number: 7020365
    Abstract: Resistive heaters formed in two mask counts on a surface of a grating of a thermo optic device thereby eliminating one mask count from prior art manufacturing methods. The resistive heater is comprised of a heater region and a conductive path region formed together in a first mask count from a relatively high resistance material. A conductor formed from a relatively low resistance material is formed directly on the conductive path region in a second mask count. Thermo optic devices formed by these two mask count methods are also described.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: March 28, 2006
    Assignee: Micron Technology, Inc.
    Inventors: Gurtej Singh Sandhu, Guy T. Blalock
  • Patent number: 7009179
    Abstract: In a method for displaying an image: a polarization inversion pattern is produced in a ferroelectric member in accordance with image information so as to produce a surface charge pattern corresponding to the polarization inversion pattern; and an image contrast is produced in a contrast production member by the influence of the surface charge pattern, where the contrast production member is joined to the ferroelectric member. The polarization inversion pattern may be produced by heating the ferroelectric member so as to produce a heat distribution corresponding to the image information in the ferroelectric member. Further, the ferroelectric member may be heated by applying infrared light carrying the image information to the ferroelectric member.
    Type: Grant
    Filed: December 26, 2001
    Date of Patent: March 7, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yasukazu Nihei
  • Patent number: 7010204
    Abstract: An optical transmission fiber including a core having a first index of refraction, a cladding material located around the core and having a second index of refraction less than the first index of refraction, a first coating material located around a first portion of the cladding material and having a third index of refraction greater than the second index of refraction, and a second coating material located around a second portion of the cladding material and having a fourth index of refraction less than the second index of refraction.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: March 7, 2006
    Assignee: Lucent Technologies Inc.
    Inventors: Leslie A. Reith, Eva M. Vogel
  • Patent number: 7002164
    Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
    Type: Grant
    Filed: January 8, 2003
    Date of Patent: February 21, 2006
    Assignee: Intel Corporation
    Inventors: Michael Goldstein, Peter J. Silverman
  • Patent number: 7002170
    Abstract: The invention relates to an irradiation device for irradiating objects, comprising a housing having an outlet for the electromagnetic radiation directed at an object to be irradiated and at least one long radiation source for the electromagnetic radiation arranged in the housing. In order to enable bigger irradiation widths in an irradiation device, more particularly in a UV irradiation device, without deformation of the radiation source, at least one of the radiation sources in the irradiation device is rotationally arranged about its longitudinal axis.
    Type: Grant
    Filed: May 18, 2002
    Date of Patent: February 21, 2006
    Assignee: Arccure Technologies GbmH
    Inventor: Bert Schweitzer
  • Patent number: 6999666
    Abstract: The fiber is adapted to compensation of the chromatic dispersion and chromatic dispersion slope of an optical fiber with negative chromatic dispersion. It has, in a propagation mode other than the fundamental mode, a positive chromatic dispersion and a negative chromatic dispersion slope. The fiber can be used in compensation dispersion modules or as line fiber, in transmission systems using line fiber with negative chromatic dispersion.
    Type: Grant
    Filed: April 4, 2003
    Date of Patent: February 14, 2006
    Assignee: Draka Comteo B.V.
    Inventors: Cyril Ruilier, Sébastien Bigo, José Chesnoy, Pierre Sansonetti
  • Patent number: 6992281
    Abstract: An Inductively Coupled Plasma (“ICP”) mass spectrometer is disclosed comprising a mass filter and a reaction/collision cell. Analyte ions and background ions having the same nominal mass to charge ratio are transmitted by the mass filter. The analyte ions selectively react with gas in the reaction/collision cell to form product ions having different mass to charge ratios. By measuring the intensity of the product ions the intensity of the analyte ions can be determined. According to less preferred embodiments background ions may be neutralised or reacted in the reaction/collision cell.
    Type: Grant
    Filed: May 1, 2003
    Date of Patent: January 31, 2006
    Assignee: Micromass UK Limited
    Inventors: Fadi Abou-Shakra, Andrew Eaton, Andrew Entwistle, Heather Walker
  • Patent number: 6992300
    Abstract: A chamber suitable for use with a scanning electron microscope. The chamber comprises at least one aperture sealed with a membrane. The membrane is adapted to withstand a vacuum, and is transparent to electrons and the interior of the chamber is isolated from said vacuum. The chamber is useful for allowing wet samples including living cells to be viewed under an electron microscope.
    Type: Grant
    Filed: May 27, 2003
    Date of Patent: January 31, 2006
    Assignees: Yeda Research and Development Co., Ltd, El-Mul Technologies Ltd.
    Inventors: Elisha Moses, Ory Zik, Stephan Thiberge
  • Patent number: 6992290
    Abstract: An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: January 31, 2006
    Assignees: Ebara Corporation, Kabushiki Kaisha Toshiba
    Inventors: Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa, Tsutomu Karimata, Mamoru Nakasuji, Masahiro Hatakeyama, Takeshi Murakami, Yuichiro Yamazaki, Ichirota Nagahama, Takamitsu Nagai, Kazuyoshi Sugihara