Patents Examined by Rachel Johnson
-
Patent number: 5541251Abstract: Aqueous selfcrosslinkable resin composition comprising an aqueous dispersion of at least one polyurethane polymer having anionic salt groups as sole chain-pendant functional group and at least one vinyl polymer having chain-pendant acetoacetoxyalkyl ester groups. A selfcrosslinking reaction between the polyurethane polymer and the vinyl polymer will take place during and/or after film formation, resulting in the formation of a polymeric film having properties not found to be those of the non-functional polymer components.Type: GrantFiled: January 12, 1995Date of Patent: July 30, 1996Assignee: U C B S.A.Inventors: Dirk Bontinck, Michel Tielemans, Jean-Marie Loutz, Andr e Vandersmissen, Luc De Koninck
-
Patent number: 5541280Abstract: A linear segmented polyurethaneurea having a degree of branching (Nb) of 3 or less and obtained by chain-extending a prepolymer with an organic diamine in an organic solvent comprising dimethylformamide or dimethylacetamide, wherein the prepolymer has an isocyanate group at the both ends thereof and comprises a stoichiometrically excessive amount of a diisocyanate component selected from 4,4'-diphenylmethane diisocyanate, 2,4-toluene diisocyanate and 1,4-phenylene diisocyanate and a diol component having a number average molecular weight of 500 to 6000.Type: GrantFiled: February 23, 1994Date of Patent: July 30, 1996Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Hiroyuki Hanahata, Seiji Goto
-
Patent number: 5541338Abstract: In an active hydrogen-containing B-side composition for reaction with a polyisocyanate-containing A-side composition to make a polyurethane, polyurethane/urea or polyurea elastomer by reaction injected molding, the improvement which comprises a crosslinking polyol composition which is the reaction product of a C.sub.12 -C.sub.36 fatty acid with a polyalkylene polyamine to yield an intermediate imidazoline-containing polyamine reaction product having at least one C.sub.11 -C.sub.35 alkyl substituent and further reacting the intermediate reaction product with a C.sub.2 -C.sub.21 reactive epoxide.Type: GrantFiled: March 22, 1995Date of Patent: July 30, 1996Assignee: Air Products and Chemicals, Inc.Inventors: John E. Dewhurst, James S. Emerick, Brian E. Farrell
-
Patent number: 5541281Abstract: The present invention is directed to a polyisocyanate mixturei) having an NCO content of 5 to 35% by weight and prepared from an organic diisocyanate,ii) containing less than 5% by weight of isocyanurate groups (calculated as N.sub.3, C.sub.3, O.sub.3, MW 126),iii) containing allophanate groups in an amount such that there are more equivalents of allophanate groups than urethane groups andiv) containing fluorine (calculated as F, AW 19) in an amount of 0.001 to 50% by weight, based on solids.,wherein fluorine is incorporated with compounds containing two or more carbon atoms, one or more hydroxyl groups and one or more fluorine atoms. The present invention is also directed to a process for the production of this polyisocyanate mixture and to its use, optionally in blocked form, as an isocyanate component in one- or two-component coating compositions.Type: GrantFiled: December 20, 1994Date of Patent: July 30, 1996Assignee: Bayer CorporationInventors: Philip E. Yeske, Edward P. Squiller, William E. Slack
-
Patent number: 5525681Abstract: Polyurea polymers prepared from formulations including a polyisocyanate, a polyamine and a polyepoxide can have good heat stability and good physical properties in the substantial absence of uretidine diones and isocyanurates. The polymers can be prepared in one step of admixing and heating at greater than 150.degree. C. or in a two step process by first admixing the components at less than 130.degree. C. and then postcuring the product at greater than 150.degree. C. The polyurea polymer, after postcuring, can have substantially no residual epoxy or oxazolidinone groups. These polymers were particularly useful for applications which require the exposure of the polyurea polymers to both intermittent high temperatures and high humidity. The polyurea polymers of the present invention can withstand higher temperatures than conventional polyurea polymers without blistering.Type: GrantFiled: April 13, 1995Date of Patent: June 11, 1996Assignee: The Dow Chemical CompanyInventors: Benny G. Barron, Shenghong Dai, James R. Porter
-
Patent number: 5523377Abstract: Blocked (cyclo)aliphatic polyisocyanates wherein 30 to 70 equivalent-% of the isocyanate groups are blocked with butanone oxime, 30 to 70 equivalent-% of the isocyanate groups are blocked with 1,2,4-triazole and 0 to 30 equivalent-% of the isocyanate groups are blocked with other blocking agents; a method for their preparation by blocking lacquer polyisocyanates with these blocking agents, optionally with the prior, simultaneous or subsequent modification of the polyisocyanates with hydrazine derivatives containing one or more isocyanate-reactive groups; and the use of the blocked polyisocyanates as cross-linking agents for organic polyhydroxy compounds in one-component polyurethane stoving compositions.Type: GrantFiled: November 8, 1994Date of Patent: June 4, 1996Assignee: Bayer AktiengesellschaftInventors: Eberhard Konig, Theodor Engbert, Thomas Klimmasch, Manfred Bock
-
Patent number: 5521253Abstract: This invention relates to polymer particles that are acid-free in the swellable polymer core and to hollow polymer particles derived therefrom, and to a process for the production of these particles. The acid-free core advantageously decreases the polymer particle's affinity to water. Applicants have discovered that non-carboxylated latexes having a variety of Tg's will swell at temperatures higher than the Tg of the polymer. These latex particles are useful as opacifying plastic pigments for various coatings and particularly as gloss-enhancing plastic pigments for paper and paperboard coatings. Preparation of the hollow polymer particle comprises the use of (meth)acrylate ester monomers, vinyl esters of carboxylic acids or a mixture thereof which are hydrolyzable and swellable at higher temperatures in alkaline environments. The particles may be encapsulated with a hard shell.Type: GrantFiled: January 19, 1995Date of Patent: May 28, 1996Assignee: The Dow Chemical CompanyInventors: Do I. Lee, Michael R. Mulders, Dwayne J. Nicholson, Arthur N. Leadbetter
-
Polymer foams with inherent nonflammability and thermal stability and methods of preparation thereof
Patent number: 5514726Abstract: Polymeric foams with novel chemical compositions are prepared by the condensation of specially-synthesized precursors, which contain (in addition to carbon and hydrogen) one or more of the following elements: oxygen, fluorine, nitrogen (in structures with stable chemical bonds), silicon, boron, phosphorus (in high oxidation states), and certain metals (and/or their oxides and hydroxides). Upon mixing in the proper proportions and/or heating these precursors react rapidly to generate polymeric networks, consisting of heterocyclic crosslink centers, connected with heterochain segments; hydrogen is largely eliminated or replaced by fluorine. These structures possess inherent nonflammability and high thermoxidative stability. Foaming is effected by the gaseous by-products of the condensation reactions, as well as by the addition of foaming agents. The resulting foam products can be formulated to have a wide range of densities and flexibilities.Type: GrantFiled: September 15, 1992Date of Patent: May 7, 1996Inventors: Gus Nichols, C. D. Armeniades -
Patent number: 5376502Abstract: Photoactive cationic organic polymers are provided which are electrically insulating and which are capable of photolysis to an electrically conductive form. The organic polymer includes a C-A linkage, wherein C is a chalcogenide-sulfide, selenide or telluride-in the polymer backbone chain and A is in aryl or alkyl group. The C-A linkage is capable of being cleaved in the presence of ultraviolet light to release A as a free radical and cause the polymer to become electrically conducting in the presence of the light while the remainder of the polymer remains electrically non-conducting. A thin film of such a polymer containing an electrically insulating region and a photolysed electrically conductive region may be used as a semiconductor. Methods for forming photoactive arylated or alkylated poly(phenylene chalcogenide) polymers involving the step of direct arylation or alkylation of a poly(phenylene chalcogenide) polymer are also provided. In addition, a method is provided for forming a semiconductor.Type: GrantFiled: May 12, 1992Date of Patent: December 27, 1994Assignee: Regents of the University of CaliforniaInventors: Bruce M. Novak, Edward H. Haagen, Anand Viswanathan
-
Patent number: 5354808Abstract: Ungelled, aqueous dispersions of silane-terminated partially crosslinked polyurethane polymers are described which are the reaction product of A) an isocyanate-containing prepolymer formed from: (i) a molar excess of organic polyisocyanate sufficient to promote substantially equal access to isocyanate groups; (ii) active hydrogen-containing material; (iii) sterically hindered amines; (iv) emulsifying monomer; B) chain-extending monomer; C) an organic compound having a pKb of at most about 7; and D) a silane coupling agent represented by the general formula ASi(OR.sup.2).sub.3 and present in an amount sufficient to partially crosslink the polyurethane resin but insufficient to gel the dispersion, provide advantages over previously known polyurethanes used as surface coatings. The hindered amine allows surface coatings incorporating the polyurethanes to be easily removed by aqueous compositions having pH between about 2 and 5. Methods of making the prepolymers, polymers, and dispersions are also presented.Type: GrantFiled: December 8, 1992Date of Patent: October 11, 1994Assignee: Minnesota Mining and Manufacturing CompanyInventors: Fidelis C. Onwumere, Kurt C. Frisch, Jr.
-
Patent number: 5352757Abstract: The present invention relates to new sulfur compounds which are polyol esters of mercaptocarboxylic acids. It also relates to the use of these sulfur esters for preparing polymers exhibiting a refractive index higher than 1.50. The manufacture of optical discs and of waveguides may be mentioned among the optical applications of these polymers.Type: GrantFiled: September 16, 1992Date of Patent: October 4, 1994Assignee: Rhone-Poulenc ChimieInventors: Sylvie Lavault, Gerard Velleret
-
Patent number: 5349016Abstract: Disclosed are fibers comprising a graft copolymer consisting of a propylene polymer material backbone having graft polymerized thereto an ethylenically unsaturated monomer(s) or a blend of at least two of said graft copolymers.Type: GrantFiled: July 30, 1991Date of Patent: September 20, 1994Assignee: Himont IncorporatedInventors: Anthony J. DeNicola, Jr., Rosemary C. Sams
-
Patent number: 5348838Abstract: A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.Type: GrantFiled: July 30, 1992Date of Patent: September 20, 1994Assignee: Kabushiki Kaisha ToshibaInventors: Toru Ushirogouchi, Naoko Kihara, Osamu Sasaki, Tsukasa Tada, Takuya Naito, Satoshi Saito
-
Patent number: 5340901Abstract: A two component primerless modified urethane adhesive having good adhesion can be utilized to bond various substrates together such as sheet molded compounds. The prepolymer component of the modified urethane contains a reacted hydroxyl intermediate and has a significant excess of free isocyanate. The curative component contains a polyol curing agent, an amine sag resistant agent, a phosphorus-type adhesion promoter, and optionally molecular sieves. The equivalent ratio of free NCO groups in the prepolymer component to OH groups plus any amine groups in the curative component is generally from about 0.90 to about 1.25.Type: GrantFiled: April 29, 1993Date of Patent: August 23, 1994Assignee: GenCorp Inc.Inventor: Chia L. Wang
-
Patent number: 5338800Abstract: One of the objects of the present invention is to produce a shaped article of a cured resin having well-balanced heat resistance and toughness by using a plural liquid pack type heat-curable resinous composition of a low liquid viscosity and excellent handling property with good storage stability. As claimed in the present invention, individual components comprising a polyisocyanate compound (a), a radically polymerizable unsaturated monomer compound bearing no functional group reactive with isocyanate, for example, styrene or a (meth)acrylic acid derivative (b), a polyol compound bearing no radically polymerizable unsaturated bond such as a polyether polyol (c), a radical catalyst (e) and a ring-forming catalyst (d) are separated into 2 liquid packs or 3 liquid packs, and they are mixed on molding, fed into the mold, and reaction-cured in the mold to give a shaped article of a cured resin of excellent heat resistance, toughness and other properties.Type: GrantFiled: May 18, 1993Date of Patent: August 16, 1994Assignee: Teijin LimitedInventors: Hiroyuki Umetani, Takeyoshi Yamada
-
Patent number: 5332621Abstract: A composite article is prepared by intimately bonding a latex foam with a thermoplastic molded part containing polyphenylene ether, the latex consisting of the following components, relative to its total rubber content:I. 20-100% by weight of SBR latex with a minimum proportion of more than 15% by weight of styrene in the solid polymer, andII. 80-0% by weight of natural-rubber latex or other, synthetic latexes.The combination is vulcanized to form a product which exhibits cohesive rupture within the foam body, when the foam body is subjected to separation.Type: GrantFiled: March 12, 1993Date of Patent: July 26, 1994Assignee: Huels AktiengesellschaftInventors: Friedrich-Georg Schmidt, Herbert Knipp, Wilhelm Munninghoff
-
Patent number: 5332798Abstract: Fluorinated polyurethanes and polyurethane-ureas, of heat-processable, elastomeric type, constituted by rubber-like blocks and hard blocks, comprising segments derived from:(a) a macroglycol or polybutadiene-diol;(b) a perfluoropolyether-diol of formulaHO(CH.sub.2 CH.sub.2 O).sub.n --CH.sub.2 --Q--CH.sub.2 --(OCH.sub.2 CH.sub.2).sub.n OHwherein Q is a perfluoropolyether chain and "n" is comprised within the range of from 1 to 5;(c) an aromatic, aliphatic, or cycloaliphatic diisocyanate; and(d) an aliphatic, cycloaliphatic or aromatic diol or diamine, containing from 2 to 14 carbon atoms.They contain from 4 to 30% by weight of fluorine, from 10 to 60% by weight of hard components, with the molar ratio of rubber-like components (a): (b) comprised within the range of from 2 to 20. At least 80% of rubber-like segments deriving from (b) component are connected, at least at one of their sides, through a segment deriving from (c) component, with a rubber-like segment deriving from (a) component.Type: GrantFiled: December 22, 1992Date of Patent: July 26, 1994Assignee: Ausimont S.p.A.Inventors: Enrico Ferreri, Francesco Giavarini, Claudio Tonelli, Tania Trombetta, Ronald E. Zielinski
-
Patent number: 5330883Abstract: Changing (varying, irregular) resist thickness on semiconductor wafers having irregular top surface topography or having different island sizes, affects the percent reflectance (and absorption efficiency) of incident photolithographic light, and consequently the critical dimensions of underlying features being formed (e.g., polysilicon gates). A low solvent content resist solution that can be applied as an aerosol provides a more uniform thickness resist film, eliminating or diminishing photoresist thickness variations. A top antireflective coating (TAR) also aids in uniformizing reflectance, despite resist thickness variations. The two techniques can be used alone, or together. Hence, better control over underlying gate size can be effected, without differential biasing.Type: GrantFiled: June 29, 1992Date of Patent: July 19, 1994Assignee: LSI Logic CorporationInventor: Mario Garza
-
Patent number: 5330879Abstract: A method for fabricating submicron lines over a semiconductor material by creating a narrow hard mask over the material using a narrow void-producing process. The narrow void is thus used as a mask to form lines that are narrower than those that can be produced by current lithography techniques. The method can also be used to create sharp emission tips for field effect display devices.Type: GrantFiled: July 16, 1992Date of Patent: July 19, 1994Assignee: Micron Technology, Inc.Inventor: Charles H. Dennison
-
Patent number: 5326829Abstract: Disclosed herein is a method of preparing an activated polyether polyol by reacting an aminoalcohol with a polyether terminated with a leaving group.Type: GrantFiled: October 7, 1992Date of Patent: July 5, 1994Assignee: Miles Inc.Inventors: William E. Slack, Rick L. Adkins