Patents Examined by Rachel Johnson
  • Patent number: 5541251
    Abstract: Aqueous selfcrosslinkable resin composition comprising an aqueous dispersion of at least one polyurethane polymer having anionic salt groups as sole chain-pendant functional group and at least one vinyl polymer having chain-pendant acetoacetoxyalkyl ester groups. A selfcrosslinking reaction between the polyurethane polymer and the vinyl polymer will take place during and/or after film formation, resulting in the formation of a polymeric film having properties not found to be those of the non-functional polymer components.
    Type: Grant
    Filed: January 12, 1995
    Date of Patent: July 30, 1996
    Assignee: U C B S.A.
    Inventors: Dirk Bontinck, Michel Tielemans, Jean-Marie Loutz, Andr e Vandersmissen, Luc De Koninck
  • Patent number: 5541280
    Abstract: A linear segmented polyurethaneurea having a degree of branching (Nb) of 3 or less and obtained by chain-extending a prepolymer with an organic diamine in an organic solvent comprising dimethylformamide or dimethylacetamide, wherein the prepolymer has an isocyanate group at the both ends thereof and comprises a stoichiometrically excessive amount of a diisocyanate component selected from 4,4'-diphenylmethane diisocyanate, 2,4-toluene diisocyanate and 1,4-phenylene diisocyanate and a diol component having a number average molecular weight of 500 to 6000.
    Type: Grant
    Filed: February 23, 1994
    Date of Patent: July 30, 1996
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Hiroyuki Hanahata, Seiji Goto
  • Patent number: 5541338
    Abstract: In an active hydrogen-containing B-side composition for reaction with a polyisocyanate-containing A-side composition to make a polyurethane, polyurethane/urea or polyurea elastomer by reaction injected molding, the improvement which comprises a crosslinking polyol composition which is the reaction product of a C.sub.12 -C.sub.36 fatty acid with a polyalkylene polyamine to yield an intermediate imidazoline-containing polyamine reaction product having at least one C.sub.11 -C.sub.35 alkyl substituent and further reacting the intermediate reaction product with a C.sub.2 -C.sub.21 reactive epoxide.
    Type: Grant
    Filed: March 22, 1995
    Date of Patent: July 30, 1996
    Assignee: Air Products and Chemicals, Inc.
    Inventors: John E. Dewhurst, James S. Emerick, Brian E. Farrell
  • Patent number: 5541281
    Abstract: The present invention is directed to a polyisocyanate mixturei) having an NCO content of 5 to 35% by weight and prepared from an organic diisocyanate,ii) containing less than 5% by weight of isocyanurate groups (calculated as N.sub.3, C.sub.3, O.sub.3, MW 126),iii) containing allophanate groups in an amount such that there are more equivalents of allophanate groups than urethane groups andiv) containing fluorine (calculated as F, AW 19) in an amount of 0.001 to 50% by weight, based on solids.,wherein fluorine is incorporated with compounds containing two or more carbon atoms, one or more hydroxyl groups and one or more fluorine atoms. The present invention is also directed to a process for the production of this polyisocyanate mixture and to its use, optionally in blocked form, as an isocyanate component in one- or two-component coating compositions.
    Type: Grant
    Filed: December 20, 1994
    Date of Patent: July 30, 1996
    Assignee: Bayer Corporation
    Inventors: Philip E. Yeske, Edward P. Squiller, William E. Slack
  • Patent number: 5525681
    Abstract: Polyurea polymers prepared from formulations including a polyisocyanate, a polyamine and a polyepoxide can have good heat stability and good physical properties in the substantial absence of uretidine diones and isocyanurates. The polymers can be prepared in one step of admixing and heating at greater than 150.degree. C. or in a two step process by first admixing the components at less than 130.degree. C. and then postcuring the product at greater than 150.degree. C. The polyurea polymer, after postcuring, can have substantially no residual epoxy or oxazolidinone groups. These polymers were particularly useful for applications which require the exposure of the polyurea polymers to both intermittent high temperatures and high humidity. The polyurea polymers of the present invention can withstand higher temperatures than conventional polyurea polymers without blistering.
    Type: Grant
    Filed: April 13, 1995
    Date of Patent: June 11, 1996
    Assignee: The Dow Chemical Company
    Inventors: Benny G. Barron, Shenghong Dai, James R. Porter
  • Patent number: 5523377
    Abstract: Blocked (cyclo)aliphatic polyisocyanates wherein 30 to 70 equivalent-% of the isocyanate groups are blocked with butanone oxime, 30 to 70 equivalent-% of the isocyanate groups are blocked with 1,2,4-triazole and 0 to 30 equivalent-% of the isocyanate groups are blocked with other blocking agents; a method for their preparation by blocking lacquer polyisocyanates with these blocking agents, optionally with the prior, simultaneous or subsequent modification of the polyisocyanates with hydrazine derivatives containing one or more isocyanate-reactive groups; and the use of the blocked polyisocyanates as cross-linking agents for organic polyhydroxy compounds in one-component polyurethane stoving compositions.
    Type: Grant
    Filed: November 8, 1994
    Date of Patent: June 4, 1996
    Assignee: Bayer Aktiengesellschaft
    Inventors: Eberhard Konig, Theodor Engbert, Thomas Klimmasch, Manfred Bock
  • Patent number: 5521253
    Abstract: This invention relates to polymer particles that are acid-free in the swellable polymer core and to hollow polymer particles derived therefrom, and to a process for the production of these particles. The acid-free core advantageously decreases the polymer particle's affinity to water. Applicants have discovered that non-carboxylated latexes having a variety of Tg's will swell at temperatures higher than the Tg of the polymer. These latex particles are useful as opacifying plastic pigments for various coatings and particularly as gloss-enhancing plastic pigments for paper and paperboard coatings. Preparation of the hollow polymer particle comprises the use of (meth)acrylate ester monomers, vinyl esters of carboxylic acids or a mixture thereof which are hydrolyzable and swellable at higher temperatures in alkaline environments. The particles may be encapsulated with a hard shell.
    Type: Grant
    Filed: January 19, 1995
    Date of Patent: May 28, 1996
    Assignee: The Dow Chemical Company
    Inventors: Do I. Lee, Michael R. Mulders, Dwayne J. Nicholson, Arthur N. Leadbetter
  • Patent number: 5514726
    Abstract: Polymeric foams with novel chemical compositions are prepared by the condensation of specially-synthesized precursors, which contain (in addition to carbon and hydrogen) one or more of the following elements: oxygen, fluorine, nitrogen (in structures with stable chemical bonds), silicon, boron, phosphorus (in high oxidation states), and certain metals (and/or their oxides and hydroxides). Upon mixing in the proper proportions and/or heating these precursors react rapidly to generate polymeric networks, consisting of heterocyclic crosslink centers, connected with heterochain segments; hydrogen is largely eliminated or replaced by fluorine. These structures possess inherent nonflammability and high thermoxidative stability. Foaming is effected by the gaseous by-products of the condensation reactions, as well as by the addition of foaming agents. The resulting foam products can be formulated to have a wide range of densities and flexibilities.
    Type: Grant
    Filed: September 15, 1992
    Date of Patent: May 7, 1996
    Inventors: Gus Nichols, C. D. Armeniades
  • Patent number: 5376502
    Abstract: Photoactive cationic organic polymers are provided which are electrically insulating and which are capable of photolysis to an electrically conductive form. The organic polymer includes a C-A linkage, wherein C is a chalcogenide-sulfide, selenide or telluride-in the polymer backbone chain and A is in aryl or alkyl group. The C-A linkage is capable of being cleaved in the presence of ultraviolet light to release A as a free radical and cause the polymer to become electrically conducting in the presence of the light while the remainder of the polymer remains electrically non-conducting. A thin film of such a polymer containing an electrically insulating region and a photolysed electrically conductive region may be used as a semiconductor. Methods for forming photoactive arylated or alkylated poly(phenylene chalcogenide) polymers involving the step of direct arylation or alkylation of a poly(phenylene chalcogenide) polymer are also provided. In addition, a method is provided for forming a semiconductor.
    Type: Grant
    Filed: May 12, 1992
    Date of Patent: December 27, 1994
    Assignee: Regents of the University of California
    Inventors: Bruce M. Novak, Edward H. Haagen, Anand Viswanathan
  • Patent number: 5354808
    Abstract: Ungelled, aqueous dispersions of silane-terminated partially crosslinked polyurethane polymers are described which are the reaction product of A) an isocyanate-containing prepolymer formed from: (i) a molar excess of organic polyisocyanate sufficient to promote substantially equal access to isocyanate groups; (ii) active hydrogen-containing material; (iii) sterically hindered amines; (iv) emulsifying monomer; B) chain-extending monomer; C) an organic compound having a pKb of at most about 7; and D) a silane coupling agent represented by the general formula ASi(OR.sup.2).sub.3 and present in an amount sufficient to partially crosslink the polyurethane resin but insufficient to gel the dispersion, provide advantages over previously known polyurethanes used as surface coatings. The hindered amine allows surface coatings incorporating the polyurethanes to be easily removed by aqueous compositions having pH between about 2 and 5. Methods of making the prepolymers, polymers, and dispersions are also presented.
    Type: Grant
    Filed: December 8, 1992
    Date of Patent: October 11, 1994
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Fidelis C. Onwumere, Kurt C. Frisch, Jr.
  • Patent number: 5352757
    Abstract: The present invention relates to new sulfur compounds which are polyol esters of mercaptocarboxylic acids. It also relates to the use of these sulfur esters for preparing polymers exhibiting a refractive index higher than 1.50. The manufacture of optical discs and of waveguides may be mentioned among the optical applications of these polymers.
    Type: Grant
    Filed: September 16, 1992
    Date of Patent: October 4, 1994
    Assignee: Rhone-Poulenc Chimie
    Inventors: Sylvie Lavault, Gerard Velleret
  • Patent number: 5349016
    Abstract: Disclosed are fibers comprising a graft copolymer consisting of a propylene polymer material backbone having graft polymerized thereto an ethylenically unsaturated monomer(s) or a blend of at least two of said graft copolymers.
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: September 20, 1994
    Assignee: Himont Incorporated
    Inventors: Anthony J. DeNicola, Jr., Rosemary C. Sams
  • Patent number: 5348838
    Abstract: A photosensitive composition comprises an alkali-soluble resin, a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or a compound which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid, and a compound which generates an acid upon exposure, which is represented by formula (1) given below: ##STR1## wherein R.sub.11 represents a monovalent organic group or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced.
    Type: Grant
    Filed: July 30, 1992
    Date of Patent: September 20, 1994
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Toru Ushirogouchi, Naoko Kihara, Osamu Sasaki, Tsukasa Tada, Takuya Naito, Satoshi Saito
  • Patent number: 5340901
    Abstract: A two component primerless modified urethane adhesive having good adhesion can be utilized to bond various substrates together such as sheet molded compounds. The prepolymer component of the modified urethane contains a reacted hydroxyl intermediate and has a significant excess of free isocyanate. The curative component contains a polyol curing agent, an amine sag resistant agent, a phosphorus-type adhesion promoter, and optionally molecular sieves. The equivalent ratio of free NCO groups in the prepolymer component to OH groups plus any amine groups in the curative component is generally from about 0.90 to about 1.25.
    Type: Grant
    Filed: April 29, 1993
    Date of Patent: August 23, 1994
    Assignee: GenCorp Inc.
    Inventor: Chia L. Wang
  • Patent number: 5338800
    Abstract: One of the objects of the present invention is to produce a shaped article of a cured resin having well-balanced heat resistance and toughness by using a plural liquid pack type heat-curable resinous composition of a low liquid viscosity and excellent handling property with good storage stability. As claimed in the present invention, individual components comprising a polyisocyanate compound (a), a radically polymerizable unsaturated monomer compound bearing no functional group reactive with isocyanate, for example, styrene or a (meth)acrylic acid derivative (b), a polyol compound bearing no radically polymerizable unsaturated bond such as a polyether polyol (c), a radical catalyst (e) and a ring-forming catalyst (d) are separated into 2 liquid packs or 3 liquid packs, and they are mixed on molding, fed into the mold, and reaction-cured in the mold to give a shaped article of a cured resin of excellent heat resistance, toughness and other properties.
    Type: Grant
    Filed: May 18, 1993
    Date of Patent: August 16, 1994
    Assignee: Teijin Limited
    Inventors: Hiroyuki Umetani, Takeyoshi Yamada
  • Patent number: 5332621
    Abstract: A composite article is prepared by intimately bonding a latex foam with a thermoplastic molded part containing polyphenylene ether, the latex consisting of the following components, relative to its total rubber content:I. 20-100% by weight of SBR latex with a minimum proportion of more than 15% by weight of styrene in the solid polymer, andII. 80-0% by weight of natural-rubber latex or other, synthetic latexes.The combination is vulcanized to form a product which exhibits cohesive rupture within the foam body, when the foam body is subjected to separation.
    Type: Grant
    Filed: March 12, 1993
    Date of Patent: July 26, 1994
    Assignee: Huels Aktiengesellschaft
    Inventors: Friedrich-Georg Schmidt, Herbert Knipp, Wilhelm Munninghoff
  • Patent number: 5332798
    Abstract: Fluorinated polyurethanes and polyurethane-ureas, of heat-processable, elastomeric type, constituted by rubber-like blocks and hard blocks, comprising segments derived from:(a) a macroglycol or polybutadiene-diol;(b) a perfluoropolyether-diol of formulaHO(CH.sub.2 CH.sub.2 O).sub.n --CH.sub.2 --Q--CH.sub.2 --(OCH.sub.2 CH.sub.2).sub.n OHwherein Q is a perfluoropolyether chain and "n" is comprised within the range of from 1 to 5;(c) an aromatic, aliphatic, or cycloaliphatic diisocyanate; and(d) an aliphatic, cycloaliphatic or aromatic diol or diamine, containing from 2 to 14 carbon atoms.They contain from 4 to 30% by weight of fluorine, from 10 to 60% by weight of hard components, with the molar ratio of rubber-like components (a): (b) comprised within the range of from 2 to 20. At least 80% of rubber-like segments deriving from (b) component are connected, at least at one of their sides, through a segment deriving from (c) component, with a rubber-like segment deriving from (a) component.
    Type: Grant
    Filed: December 22, 1992
    Date of Patent: July 26, 1994
    Assignee: Ausimont S.p.A.
    Inventors: Enrico Ferreri, Francesco Giavarini, Claudio Tonelli, Tania Trombetta, Ronald E. Zielinski
  • Patent number: 5330883
    Abstract: Changing (varying, irregular) resist thickness on semiconductor wafers having irregular top surface topography or having different island sizes, affects the percent reflectance (and absorption efficiency) of incident photolithographic light, and consequently the critical dimensions of underlying features being formed (e.g., polysilicon gates). A low solvent content resist solution that can be applied as an aerosol provides a more uniform thickness resist film, eliminating or diminishing photoresist thickness variations. A top antireflective coating (TAR) also aids in uniformizing reflectance, despite resist thickness variations. The two techniques can be used alone, or together. Hence, better control over underlying gate size can be effected, without differential biasing.
    Type: Grant
    Filed: June 29, 1992
    Date of Patent: July 19, 1994
    Assignee: LSI Logic Corporation
    Inventor: Mario Garza
  • Patent number: 5330879
    Abstract: A method for fabricating submicron lines over a semiconductor material by creating a narrow hard mask over the material using a narrow void-producing process. The narrow void is thus used as a mask to form lines that are narrower than those that can be produced by current lithography techniques. The method can also be used to create sharp emission tips for field effect display devices.
    Type: Grant
    Filed: July 16, 1992
    Date of Patent: July 19, 1994
    Assignee: Micron Technology, Inc.
    Inventor: Charles H. Dennison
  • Patent number: 5326829
    Abstract: Disclosed herein is a method of preparing an activated polyether polyol by reacting an aminoalcohol with a polyether terminated with a leaving group.
    Type: Grant
    Filed: October 7, 1992
    Date of Patent: July 5, 1994
    Assignee: Miles Inc.
    Inventors: William E. Slack, Rick L. Adkins