Abstract: An apparatus and configuring scheme where a ferroelectric capacitive input circuit can be programmed to perform different logic functions by adjusting the switching threshold of the ferroelectric capacitive input circuit. Digital inputs are received by respective capacitors on first terminals of those capacitors. The second terminals of the capacitors are connected to a summing node. A pull-up and pull-down device are coupled to the summing node. The pull-up and pull-down devices are controlled separately. During a reset phase, the pull-up and pull-down devices are turned on in a sequence, and inputs to the capacitors are set to condition the voltage on node n1. As such, a threshold for the capacitive input circuit is set. After the reset phase, an evaluation phase follows. In the evaluation phase, the output of the capacitive input circuit is determined based on the inputs and the logic function configured during the reset phase.

Abstract: A method of fabricating an integrated circuit includes placing a first set of conductive feature patterns on a first level, placing a second set of conductive feature patterns on a second level, placing a first set of via patterns between the second set of conductive feature patterns and the first set of conductive feature patterns, placing a third set of conductive feature patterns on a third level different from the first level and the second level, placing a second set of via patterns between the third set of conductive feature patterns and the second set of conductive feature patterns, and manufacturing the integrated circuit based on at least one of the above patterns of the integrated circuit.

Abstract: A display panel and a display device are provided. The display panel includes a first display area and a second display area, wherein the display panel includes: a base substrate; a plurality of first repeating units arranged on the base substrate in an array and located in the first display area, each of the first repeating units including at least a first sub-pixel; a plurality of second repeating units arranged on the base substrate in an array and located in the second display area, each of the second repeating units including at least a second sub-pixel, wherein a color of light emitted by the first sub-pixel is the same as a color of light emitted by the second sub-pixel; a pixel defining layer disposed on the base substrate and located in both the first display area and the second display area, wherein the pixel defining layer includes a first opening located in the first display area and a second opening located in the second display area.

Abstract: A microelectromechanical systems (MEMS) device includes a MEMS die and an electrical circuit electrically connected to the MEMS die. The electrical circuit includes a first capacitor that produces a first output signal based on a signal received from the MEMS die, and a second capacitor that produces a second output signal based on a signal received from the MEMS die. The electrical circuit is configured to determine a nominal capacitance of the MEMS die based on a ratio of the first output signal to the second output signal and a ratio of the capacitances of the first and second capacitors.

Abstract: A semiconductor device includes a semiconductor substrate, a source/drain region, a source/drain contact and a conductive via and a first polymer layer. The source/drain region is in the semiconductor substrate. The source/drain contact is over the source/drain region. The conductive via is over the source/drain contact. From a top view, the conductive via has two opposite long sides and two opposite short sides connecting the long sides, and the short sides are shorter than the long sides and more curved than the long sides.

Abstract: Described herein are ferroelectric (FE) memory cells that include transistors having gate stacks separate from FE capacitors of these cells. An example memory cell may be implemented as an IC device that includes a support structure (e.g., a substrate) and a transistor provided over the support structure and including a gate stack. The IC device also includes a FE capacitor having a first capacitor electrode, a second capacitor electrode, and a capacitor insulator of a FE material between the first capacitor electrode and the second capacitor electrode, where the FE capacitor is separate from the gate stack (i.e., is not integrated within the gate stack and does not have any layers that are part of the gate stack). The IC device further includes an interconnect structure, configured to electrically couple the gate stack and the first capacitor electrode.

Abstract: A display includes a display substrate and a flexible circuit board. The display substrate includes a silicon substrate, a driving circuit of which at least part is embedded in the silicon substrate, and a first pad electrically connected with the driving circuit. The driving circuit includes a transistor with a semiconductor layer; the flexible circuit board includes a flexible substrate, a first wiring layer, and a first reinforcement plate. The first wiring layer includes a main wiring portion and a second pad electrically connected with the main wiring portion, and the second pad is electrically connected with the first pad by a conductive adhesive layer. The first reinforcement plate covers the main wiring portion and does not cover the second pad. The first reinforcement plate is located outside the display substrate and there is a non-zero distance between the first reinforcement plate and the display substrate.

Abstract: A single photon avalanche (SPAD) device configured to detect visible to infrared light includes a substrate and a trench coupled to the substrate. The trench has a lattice mismatch with the substrate and has a height equal to or greater than its width. The device further includes a substantially defect-free semiconductor region that includes photosensitive material. The semiconductor region includes a well coupled to the trench and doped a first type. The well is configured to detect a photon and generate a current. The semiconductor region also includes a region formed in the well and doped a second type opposite to the first type. The well is configured to cause an avalanche multiplication of the current. The trench and the well form a first electrode and the region forms a second electrode.

Abstract: An alternating stack of first material layers and second material layers can be formed over a semiconductor material layer. A patterning film is formed over the alternating stack, and openings are formed through the patterning film. Via openings are formed through the alternating stack at least to a top surface of the semiconductor material layer by performing a first anisotropic etch process that transfers a pattern of the openings in the patterning film. A cladding liner can be formed on a top surface of the patterning film and sidewalls of the openings in the pattering film. The via openings can be vertically extended through the semiconductor material layer at least to a bottom surface of the semiconductor material layer by performing a second anisotropic etch process employing the cladding liner as an etch mask.

Abstract: Disclosed are a display panel and a display device. The display panel includes a base substrate; a plurality of data signal lines on the base substrate, and a plurality of pixel units; and each pixel unit has a transparent area and a non-transparent area; the pixel unit includes a plurality of sub-pixels in the non-transparent area. All sub-pixels in the display panel are arranged in an array, each column of sub-pixels corresponds to a respective one of the data signal lines, and at least part of the data signal lines are arranged around the transparent areas.

Abstract: A semiconductor device includes a first metal layer, a second metal layer, and an inter-metal dielectric layer disposed between the first metal layer and the second metal layer. The inter-metal dielectric layer includes: a first dielectric layer disposed on the first metal layer and in direct contact with the first metal layer, wherein the first dielectric layer has a stress value less than 0; a second dielectric layer disposed on the first dielectric layer, wherein the second dielectric layer has a stress value greater than 0; and a third dielectric layer disposed on the second dielectric layer, wherein the third dielectric layer has a stress value less than 0. A thickness of the third dielectric layer is greater than a thickness of the second dielectric layer, and the thickness of the second dielectric layer is greater than a thickness of the first dielectric layer.

Abstract: A display and a display panel are provided. An additional VDD wire is arranged in an irregular-shaped region. The VDD wire is connected to a pixel arranged in the irregular-shaped region through a plurality of connection wires, such that the display may have a narrow side edge, and at the same time, a difference between impedances of the irregular-shaped region and a regular-shaped display region may not be large, and a display region may not be split.

Abstract: A display region includes a plurality of pixel driving circuitry setting regions arranged sequentially in a first direction, and each pixel driving circuitry setting region extends in a second direction intersecting the first direction. Each display circuitry includes a plurality of subpixels in one-to-one correspondence with the pixel driving circuitry setting regions, each subpixel includes a subpixel driving circuitry and a light-emitting element coupled to each other, the subpixel driving circuitry is located in a corresponding pixel driving circuitry setting region, the light-emitting element is located at a side of the subpixel driving circuitry away from the substrate, a width of the light-emitting element is greater than a width of the corresponding pixel driving circuitry setting region in the first direction, and a length of the light-emitting element is smaller than a length of the corresponding pixel driving circuitry setting region in the second direction.

Abstract: Structures and methods are provided for integrating a resistance random access memory (ReRAM) in a back-end-on-the-line (BEOL) fat wire level. In one embodiment, a ReRAM device area contact structure is provided in the BEOL fat wire level that has at least a lower via portion that contacts a surface of a top electrode of a ReRAM device area ReRAM-containing stack. In other embodiments, a tall ReRAM device area bottom electrode is provided in the BEOL fat wire level and embedded in a dielectric material stack that includes a dielectric capping layer and an interlayer dielectric material layer.

Abstract: Stacked FET devices having wrap-around contacts to optimize contact resistance and techniques for formation thereof are provided. In one aspect, a stacked FET device includes: a bottom-level FET(s) on a substrate; lower contact vias present in an ILD disposed over the bottom-level FET(s); a top-level FET(s) present over the lower contact vias; and top-level FET source/drain contacts that wrap-around source/drain regions of the top-level FET(s), wherein the lower contact vias connect the top-level FET source/drain contacts to source/drain regions of the bottom-level FET(s). When not vertically aligned, a local interconnect can be used to connect a given one of the lower contact vias to a given one of the top-level FET source/drain contacts. A method of forming a stacked FET device is also provided.

Abstract: Embodiments herein describe techniques for a memory device including at least two memory cells. A first memory cell includes a first storage cell and a first transistor to control access to the first storage cell. A second memory cell includes a second storage cell and a second transistor to control access to the second storage cell. A shared contact electrode is shared between the first transistor and the second transistor, the shared contact electrode being coupled to a source area or a drain area of the first transistor, coupled to a source area or a drain area of the second transistor, and further being coupled to a bit line of the memory device. Other embodiments may be described and/or claimed.

Abstract: A semiconductor package includes a first semiconductor device and a second semiconductor device. The first semiconductor device includes a first semiconductor substrate, a first bonding structure and a memory cell. The second semiconductor device is stacked over the first semiconductor device. The second semiconductor device includes a second semiconductor substrate, a second bonding structure in a second dielectric layer and a peripheral circuit between the second semiconductor substrate and the second bonding structure. The first bonding structure and the second bonding structure are bonded and disposed between the memory cell and the peripheral circuit, and the memory cell and the peripheral circuit are electrically connected through the first bonding structure and the second bonding structure.

Abstract: A semiconductor device includes a first cell. The first cell is surrounded by a castle-shaped forbidden region. The first cell includes a first active region, a second active region, and at least one via. The first active region and the second active region extend along a first direction and are separated from each other along a second direction traverse to the first direction. The first active region partially overlaps an upper region of the castle-shaped forbidden region, and the second active region partially overlaps a lower region of the castle-shaped forbidden region. The at least one via is arranged outside the castle-shaped forbidden region.

Abstract: A phosphor substrate having at least one light emitting element mounted on one surface, includes an insulating substrate, at least one electrode pair disposed on one surface of the insulating substrate and bonded to the light emitting element, and a phosphor layer disposed on one surface of the insulating substrate, including a phosphor in which a light emission peak wavelength, in a case where light emitted by the element is used as excitation light, is in a visible light region, in which a bonded surface of the electrode pair facing an outer side in a thickness direction of the insulating substrate, the bonded surface being bonded to the light emitting element, is positioned further on the outer side in the thickness direction than a non-bonded surface other than the bonded surface, and at least a part of the phosphor layer is disposed around the bonded surface of the one surface.

Abstract: A device includes an electrical circuit having a first set of circuit elements. The device further includes a first set of conductive pillars over a first side of a substrate. The device further includes a first conductive rail electrically connected to each of the first set of conductive pillars, wherein each of the first set of conductive pillars is electrically connected to each of the first set of circuit elements by the first conductive rail. The device further includes a first plurality of power pillars extending through the substrate, wherein each of the first plurality of power pillars is electrically connected to the first conductive rail.