Patents by Inventor Akinobu Kobayashi

Akinobu Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120231220
    Abstract: There are provided a microstructural material allowing a concavo-convex pattern of a mold to be imprinted thereon by hardening a pattern formative layer through an unprecedented method, and a fabrication method thereof. A PTFE dispersion liquid is used in a pattern formative layer 2a forming an imprint section 2, thereby allowing such pattern formative layer 2a formed on a concavo-convex pattern of a mold 5 to be hardened when irradiated with an ionizing radiation. Accordingly, the fabrication method of a microstructural material 1 of the present invention employs an imprinting method allowing the pattern formative layer 2a to be hardened through an ionizing radiation R, which is completely different from a thermal imprinting and an optical imprinting. That is, the pattern formative layer 2a can be hardened, and the concavo-convex pattern of the mold 5 can thus be imprinted thereon, through an unprecedented method.
    Type: Application
    Filed: December 29, 2011
    Publication date: September 13, 2012
    Applicant: JAPAN ATOMIC ENERGY AGENCY
    Inventors: Akihiro Oshima, Seiichi Tagawa, Masakazu Washio, Tomoko Oyama, Tomohiro Takahashi, Satoshi Okubo, Akinobu Kobayashi, Naotsugu Nagasawa, Mitsumasa Taguchi