Abstract: The present invention relates to an alkali-free glass substrate, having a strain point of 680° C. or higher, a Young's modulus of 78 GPa or greater, an UV transmittance at a wavelength of 300 nm of from 40% to 85% in terms of 0.5 mm thickness, an in-plane distribution of the UV transmittance at a wavelength of 300 nm in a G6-sized substrate of 1% or less in terms of 0.5 mm thickness, an average cooling rate around the glass transition point obtained according to a rate cooling method of 400° C./min or lower, and an in-plane distribution of the average cooling rate of 40° C./min or less.

Abstract: A chemically strengthened glass includes a first main surface, a second main surface opposite to the first main surface, and an end surface connecting the first main surface and the second main surface. A compressive stress layer is provided in the first main surface and the second main surface. An average sheet thickness t is from 0.06 to 0.25 mm. When a bending test method is performed, a crack originating in at least one main surface of the first main surface and the second main surface is not formed.

Abstract: The present invention relates to an alkali-free glass substrate, having a strain point of 680° C. or higher, a Young's modulus of 78 GPa or greater, an UV transmittance at a wavelength of 300 nm of from 40% to 85% in terms of 0.5 mm thickness, an in-plane distribution of the UV transmittance at a wavelength of 300 nm in a G6-sized substrate of 1% or less in terms of 0.5 mm thickness, an average cooling rate around the glass transition point obtained according to a rate cooling method of 400° C./min or lower, and an in-plane distribution of the average cooling rate of 40° C./min or less.

Abstract: A method of manufacturing a lithium ion conductive solid electrolyte includes (a) a step of preparing an object to be processed including a crystalline material, that includes alkali metal other than lithium and whose ionic conductivity at room temperature is greater than or equal to 1×10?13 S/cm; and (b) a step of performing an ion-exchange process on the object to be processed in molten salt including lithium ions.

Abstract: The present invention relates to an alkali-free glass substrate, having a strain point of 680° C. or higher, a Young's modulus of 78 GPa or greater, an UV transmittance at a wavelength of 300 nm of from 40% to 85% in terms of 0.5 mm thickness, an in-plane distribution of the UV transmittance at a wavelength of 300 nm in a G6-sized substrate of 1% or less in terms of 0.5 mm thickness, an average cooling rate around the glass transition point obtained according to a rate cooling method of 400° C./min or lower, and an in-plane distribution of the average cooling rate of 40° C./min or less.

Abstract: The present invention relates to an alkali-free glass having a strain point of 725° C. or higher, an average thermal expansion coefficient at from 50 to 300° C. of from 30×10?7 to 40×107/° C., a temperature T2 at which a glass viscosity is 102 dPa·s of 1,710° C. or lower, and a temperature T4 at which a glass viscosity is 104 dPa·s of 1,320° C. or lower, the alkali-free glass including, in terms of mol % on the basis of oxides, SiO2: 66 to 70, Al2O3: 12 to 15, B2O3: 0 to 1.5, MgO: more than 9.5 and 13 or less, CaO: 4 to 9, SrO: 0.5 to 4.5, BaO: 0 to 1, and ZrO2: 0 to 2, in which MgO+CaO+SrO+BaO is from 17 to 21, MgO/(MgO+CaO+SrO+BaO) is 0.4 or more, MgO/(MgO+CaO) is 0.4 or more, MgO/(MgO+SrO) is 0.6 or more, and the alkali-free glass does not substantially contain an alkali metal oxide.

Abstract: The present invention relates to an alkali-free glass having a strain point of from 680 to 735° C., an average thermal expansion coefficient at from 50 to 350° C. of from 30×10?7 to 43×10?7/° C., and a specific gravity of 2.60 or less, and containing, indicated by mol % on the basis of oxides, SiO2 65 to 69%, Al2O3 11.5 to 14%, B2O3 3 to 6.5%, MgO 1 to 5%, CaO 7.5 to 12%, SrO 0 to 1%, BaO 0.5 to 6%, and ZrO2 0 to 2%.

Abstract: A float glass for chemical strengthening, having a bottom surface to contact a molten metal during molding and a top surface facing the bottom surface. An absolute value of a difference between a normalized hydrogen concentration at a depth of 5 to 10 ?m that is a value obtained by dividing a hydrogen concentration at a depth of 5 to 10 ?m by a hydrogen concentration at a depth of 50 to 55 ?m in the top surface and the normalized hydrogen concentration at a depth of 5 to 10 ?m in the bottom surface is 0.35 or less.

Abstract: The present invention relates to a non-alkali glass having a strain point of from 710° C. to lower than 725° C., an average thermal expansion coefficient at from 50 to 300° C. of from 30×10?7 to 43×10?7/° C., a temperature T2 at which glass viscosity reaches 102 dPa·s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1320° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 66 to 70, Al2O3 12 to 14, B2O3 exceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.

Abstract: A glass is a glass sheet containing, as expressed by mass percentage based on oxides, 63 to 75% of SiO2, 3 to 12% of Al2O3, 3 to 10% of MgO, 0.5 to 10% of CaO, 0 to 3% of SrO, 0 to 3% of BaO, 10 to 18% of Na2O, 0 to 8% of K2O, 0 to 3% of ZrO2, and 0.005 to 0.25% of Fe2O3. The glass has a temperature (T2) at which a viscosity thereof reaches 102 dPa·s of 1525° C. or lower. In the glass, R2O/Al2O3 is 2.0 or more and 4.6 or less (in the formula, the R2O is Na2O+K2O).

Abstract: A chemically strengthened glass contains, as expressed by mass percentage based on oxides, 60% to 75% of SiO2, 3% to 9% of Al2O3, 2% to 10% of MgO, 3% to 10% of CaO, 10% to 18% of Na2O, at most 4% of K2O, 0% to 3% of ZrO2, 0% to 0.3% of TiO2, and 0.02% to 0.4% of SO3. It has a temperature T2 at which a viscosity of a glass melt is 100 dPa·sec of 1530° C. or lower. In a chemically strengthened main surface thereof, it has a depth of a compressive stress layer of 8 ?m or more and a surface compressive stress of 500 MPa or more.

Abstract: The present invention relates to a non-alkali glass substrate, having a strain point of 685° C. or higher and 750° C. or lower, an average thermal expansion coefficient at 50 to 350° C. of from 35×10?7 to 43×10?7/° C., a specific gravity of from 2.50 to 2.80, a photoelastic constant of 25 nm/MPa/cm or more and less than 29 nm/MPa/cm, and a temperature (T4) at which viscosity reaches 104 dPa·s of 1,250° C. or higher and lower than 1,350° C., and having a prescribed composition.

Abstract: The present invention relates to a non-alkali glass having a strain point of from 710° C. to lower than 725° C., an average thermal expansion coefficient at from 50 to 300° C. of from 30×10?7 to 43×10?7/° C., a temperature T2 at which glass viscosity reaches 102 dPa·s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPd·s of 1320° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 66 to 70, Al2O3 12 to 14, B2O3 exceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.

Abstract: The present invention relates to a non-alkali glass having a strain point of from 710° C. to lower than 725° C., an average thermal expansion coefficient at from 50 to 300° C. of from 30×10?7 to 43×10?7/° C., a temperature T2 at which glass viscosity reaches 102 dPa·s of 1710° C. or lower, a temperature T4 at which the glass viscosity reaches 104 dPa·s of 1320° C. or lower, and containing, indicated by mol % on the basis of oxides, SiO2 66 to 70, Al2O3 12 to 14, B2O3 exceeding 0 to 1.5, MgO exceeding 9.5 to 13 (or 5 to 9.5), CaO 4 to 9 (or 4 to 11), SrO 0.5 to 4.5, BaO 0 to 0.5 and ZrO 0 to 2.

Abstract: The present invention relates to an alkali-free glass substrate, having a strain point of 680° C. or higher, a Young's modulus of 78 GPa or greater, an UV transmittance at a wavelength of 300 nm of from 40% to 85% in terms of 0.5 mm thickness, an in-plane distribution of the UV transmittance at a wavelength of 300 nm in a G6-sized substrate of 1% or less in terms of 0.5 mm thickness, an average cooling rate around the glass transition point obtained according to a rate cooling method of 400° C./min or lower, and an in-plane distribution of the average cooling rate of 40° C./min or less.

Abstract: The present invention relates to an alkali-free glass having a strain point of 725° C. or higher, an average thermal expansion coefficient at from 50 to 300° C. of from 30×10?7 to 40×107/° C., a temperature T2 at which a glass viscosity is 102 dPa·s of 1,710° C. or lower, and a temperature T4 at which a glass viscosity is 104 dPa·s of 1,320° C. or lower, the alkali-free glass including, in terms of mol % on the basis of oxides, SiO2: 66 to 70, Al2O3: 12 to 15, B2O3: 0 to 1.5, MgO: more than 9.5 and 13 or less, CaO: 4 to 9, SrO: 0.5 to 4.5, BaO: 0 to 1, and ZrO2: 0 to 2, in which MgO+CaO+SrO+BaO is from 17 to 21, MgO/(MgO+CaO+SrO+BaO) is 0.4 or more, MgO/(MgO+CaO) is 0.4 or more, MgO/(MgO+SrO) is 0.6 or more, and the alkali-free glass does not substantially contain an alkali metal oxide.

Abstract: The present invention relates to an alkali-free glass having a strain point of 725° C. or higher, an average thermal expansion coefficient at from 50 to 300° C. of from 30×10?7 to 40×10?7/° C., a temperature T2 at which a glass viscosity is 102 dPa·s of 1,710° C. or lower, and a temperature T4 at which a glass viscosity is 104 dPa·s of 1,320° C. or lower, the alkali-free glass including, in terms of mol % on the basis of oxides, SiO2: 66 to 70, Al2O3: 12 to 15, B2O3: 0 to 1.5, MgO: more than 9.5 and 13 or less, CaO: 4 to 9, SrO: 0.5 to 4.5, BaO: 0 to 1, and ZrO2: 0 to 2, in which MgO+CaO+SrO+BaO is from 17 to 21, MgO/(MgO+CaO+SrO+BaO) is 0.4 or more, MgO/(MgO+CaO) is 0.4 or more, MgO/(MgO+SrO) is 0.6 or more, and the alkali-free glass does not substantially contain an alkali metal oxide.

Abstract: The present invention relates to a non-alkali glass substrate, having a strain point of 685° C. or higher and 750° C. or lower, an average thermal expansion coefficient at 50 to 350° C. of from 35×10?7 to 43×10?7/° C., a specific gravity of from 2.50 to 2.80, a photoelastic constant of 25 nm/MPa/cm or more and less than 29 nm/MPa/cm, and a temperature (T4) at which viscosity reaches 104 dPa·s of 1,250° C. or higher and lower than 1,350° C., and having a prescribed composition.

Abstract: The present invention relates to an alkali-free glass having a strain point of 735° C. or higher, an average thermal expansion coefficient at from 50 to 350° C. of from 30×10?7 to 40×10?7/° C., a temperature T2 at which a glass viscosity is 102 dPa·s of 1,710° C. or lower, a temperature T4 at which a glass viscosity is 104 dPa·s of 1,340° C. or lower, and a devitrification temperature of 1,330° C. or lower, the alkali-free glass including, in terms of mol % on the basis of oxides: SiO2 66 to 69, Al2O3 12 to 15, B2O3 0 to 1.5, MgO 6 to 9.5, CaO 7 to 9, SrO 0.5 to 3, BaO 0 to 1, and ZrO2 0 to 2, in which MgO+CaO+SrO+BaO is from 16 to 18.2, MgO/(MgO+CaO+SrO+BaO) is 0.35 or more, MgO/(MgO+CaO) is 0.40 or more and less than 0.52, and MgO/(MgO+SrO) is 0.45 or more.

Abstract: To provide tempered glass which is thin and can be produced by common air-quench tempering without requiring a special production facility, and untreated glass for such tempered glass. The tempered glass is obtainable via a heating step and a cooling step. The heating step is a step of applying heat treatment to glass to be treated, of which the glass transition point is from 500 to 600° C. and the maximum value of the thermal expansion coefficient (?max) between the glass transition point and the yield point is at least 430×10?7/° C. The cooling step is a step of applying air-quenching treatment to the glass to be treated.