Patents by Inventor Akio Koike
Akio Koike has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110314868Abstract: The present invention relates to a method for producing a glass body containing: hydrolyzing a silicon compound and a compound containing a metal serving as a dopant, in a flame projected from a burner to form glass fine particles; and depositing and growing the formed glass fine particles on a base material, in which a raw material mixed gas containing a gas of the silicon compound, a gas of the compound containing a metal serving as a dopant, and either one of a combustible gas and a combustion supporting gas is fed into a central nozzle (A) positioning in the center of the burner; the other gas of the combustible gas and the combustion supporting gas is fed into a nozzle (B) different from the central nozzle (A) of the burner; a combustible gas or a combustion supporting gas is arbitrarily fed into a nozzle different from the nozzles (A) and (B); and a flow rate of the raw material mixed gas is 50% or more and not more than 90% of the largest flow rate among flow rate(s) of the combustible gas(ses) and theType: ApplicationFiled: June 27, 2011Publication date: December 29, 2011Applicant: Asahi Glass Company, LimitedInventors: Junko MIYASAKA, Akio KOIKE, Tomonori OGAWA, Masahiro KAWAGISHI
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Publication number: 20110301015Abstract: The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.Type: ApplicationFiled: August 16, 2011Publication date: December 8, 2011Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Takahiro MITSUMORI, Yasutomi Iwahashi, Akio Koike
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Publication number: 20110256344Abstract: It is an object of the present invention to provide a glass substrate having plural through-holes which is not likely to peel from a silicon wafer, even though laminated on and jointed to a the silicon wafer and then subjected to heat treatment. The above object is accomplished by a glass substrate having an average thermal expansion coefficient of from 10×10?7 to 50×10?7/K within a range of from 50° C. to 300° C., having plural through-holes with a taper angle of from 0.1 to 20° and having a thickness of from 0.01 to 5 mm.Type: ApplicationFiled: June 29, 2011Publication date: October 20, 2011Inventors: Motoshi ONO, Akio KOIKE
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Patent number: 8039409Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.Type: GrantFiled: October 14, 2010Date of Patent: October 18, 2011Assignee: Asahi Glass Company, LimitedInventors: Kenta Saitou, Akio Koike, Mitsuhiro Kawata
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Patent number: 8034731Abstract: The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.Type: GrantFiled: August 24, 2010Date of Patent: October 11, 2011Assignee: Asahi Glass Company, LimitedInventors: Akio Koike, Yasutomi Iwahashi, Shinya Kikugawa
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Publication number: 20110239707Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of a pressure of Pb1 and a temperature of 400° C. or lower, and followed by maintaining in the reaction vessel under condition of a pressure Pb2 lower than the pressure Pb1 and a temperature of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.Type: ApplicationFiled: April 1, 2011Publication date: October 6, 2011Applicant: Asahi Glass Company, LimitedInventors: Chikaya Tamitsuji, Kunio Watanabe, Akio Koike
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Publication number: 20110239706Abstract: The present invention relates to a method for production of a synthetic quartz glass having a fluorine concentration of 1,000 ppm by mass or higher, comprising the following processes steps (a) to (c): (a) depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass-forming material onto a substrate, to thereby form a porous glass body; (b) maintaining the porous glass body in a reaction vessel under an elemental fluorine (F2)-containing atmosphere of 400° C. or lower, to thereby obtain a fluorine-containing porous glass body; and (c) heating the fluorine-containing porous glass body in a vitrification furnace to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body, wherein, in step (b), elemental fluorine (F2) is continuously or intermittently supplied to the reaction vessel and the gas in the reaction vessel is continuously or intermittently discharged from the reaction vessel.Type: ApplicationFiled: April 1, 2011Publication date: October 6, 2011Applicant: Asahi Glass Company, LimitedInventors: Chikaya Tamitsuji, Kunio Watanabe, Akio Koike
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Patent number: 8012653Abstract: A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided. A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.Type: GrantFiled: June 24, 2009Date of Patent: September 6, 2011Assignee: Asahi Glass Company, LimitedInventors: Akio Koike, Ken Ebihara
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Patent number: 7998892Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ?T, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.Type: GrantFiled: August 27, 2010Date of Patent: August 16, 2011Assignee: Asahi Glass Company, LimitedInventors: Akio Koike, Yasutomi Iwahashi, Shinya Kikugawa
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Patent number: 7989378Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.Type: GrantFiled: June 28, 2010Date of Patent: August 2, 2011Assignee: Asahi Glass Company, LimitedInventors: Akio Koike, Yasutomi Iwahashi, Shinya Kikugawa
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Publication number: 20110179827Abstract: The present invention relates to a process for production of a synthetic quartz glass having a fluorine concentration of 1,000 mass ppm or more, the process comprising: (a) a step of depositing and growing quartz glass fine particles obtained by flame hydrolysis of a glass forming raw material onto a substrate, to thereby form a porous glass body; (b) a step of keeping the porous glass body in a reaction vessel that is filled with elemental fluorine (F2) or a mixed gas comprising elemental fluorine (F2) diluted with an inert gas and contains a solid metal fluoride, to thereby obtain a fluorine-containing porous glass body; and (c) a step of heating the fluorine-containing porous glass body to a transparent vitrification temperature, to thereby obtain a fluorine-containing transparent glass body.Type: ApplicationFiled: April 6, 2011Publication date: July 28, 2011Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Chikaya TAMITSUJI, Kunio Watanabe, Akio Koike
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Publication number: 20110028299Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.Type: ApplicationFiled: October 14, 2010Publication date: February 3, 2011Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Kenta SAITOU, Akio Koike, Mitsuhiro Kawata
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Publication number: 20100323871Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion in the range of the time of irradiation with EUV light is substantially zero when used as an optical member of an exposure tool for EUVL and which has extremely high surface smoothness. The present invention relates to a TiO2-containing silica glass having a TiO2 content of from 7.5 to 12% by mass, a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 40 to 110° C., and a standard deviation (?) of a stress level of striae of 0.03 MPa or lower within an area of 30 mm×30 mm in at least one plane.Type: ApplicationFiled: August 26, 2010Publication date: December 23, 2010Applicant: Asahi Glass Company, LimitedInventors: Akio Koike, Kenta Saito, Long Shao, Yasutomi Iwahashi, Shinya Kikugawa
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Publication number: 20100323873Abstract: The present invention provides a TiO2—SiO2 glass whose coefficient of linear thermal expansion upon irradiation with high EUV energy light is substantially zero, which is suitable as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a halogen content of 100 ppm or more; a fictive temperature of 1,100° C. or lower; an average coefficient of linear thermal expansion in the range of from 20 to 100° C. of 30 ppb/° C. or lower; a temperature width ?T, in which a coefficient of linear thermal expansion is 0±5 ppb/° C., of 5° C. or greater; and a temperature, at which a coefficient of linear thermal expansion is 0 ppb/° C., falling within the range of from 30 to 150° C.Type: ApplicationFiled: August 27, 2010Publication date: December 23, 2010Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Akio Koike, Yasutomi Iwahashi, Shinya Kikugawa
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Publication number: 20100323872Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.Type: ApplicationFiled: August 26, 2010Publication date: December 23, 2010Applicant: Asahi Glass Company, LimitedInventors: Akio KOIKE, Yasutomi IWAHASHI, Shinya KIKUGAWA, Yuko TACHIBANA
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Publication number: 20100317505Abstract: The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.Type: ApplicationFiled: August 24, 2010Publication date: December 16, 2010Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Akio KOIKE, Yasutomi Iwahashi, Shinya Kikugawa
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Publication number: 20100261597Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.Type: ApplicationFiled: June 28, 2010Publication date: October 14, 2010Applicant: ASAHI GLASS COMPANY LIMITEDInventors: Akio KOIKE, Yasutomi Iwahashi, Shinya Kikugawa
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Patent number: 7780616Abstract: In order to provide a walking assistance device capable of favorably providing an assisting force for maintaining the upright posture while reducing the sense of pressure when worn by the user, a hip support member (1) of the walking assisting device, which comprises an assisting force generator (hip joint actuator 10) disposed at least on a side of a hip joint to provide an assisting force to a movement of a lower limb, is provided with: a back support (4) equipped with pads (18, 19, 20) for respectively abutting an intermediate portion between right and left erector spinae muscles, lateral outer sides of the spinae muscles and right and left iliac crests; and a belt (5) connected to the back support for tightening a lower part of the rectus abdominis muscle. In this way, a supporting force can be provided to the lumbar vertebrae to steadily keep the upright posture while reducing a resistance to a bending movement of the waist caused by the support member.Type: GrantFiled: March 15, 2004Date of Patent: August 24, 2010Assignee: Honda Motor Co., Ltd.Inventors: Hisashi Katoh, Takashi Hirata, Akio Koike, Taiji Koyama, Takako Fujii, Yoshirou Koyama
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Publication number: 20100179047Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ?Ti3+/Ti3+, on an optical use surface, is 0.2 or less.Type: ApplicationFiled: March 5, 2010Publication date: July 15, 2010Applicant: ASAHI GLASS CO., LTD.Inventors: Akio KOIKE, Chikaya Tamitsuji, Kunio Watanabe, Tomonori Ogawa
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Publication number: 20100028787Abstract: A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided. A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.Type: ApplicationFiled: June 24, 2009Publication date: February 4, 2010Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Akio KOIKE, Ken EBIHARA