Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Abstract: A weather strip 5 is attached to a peripheral edge of an opening 4a of a vehicle body 1?, and a deck cover 18 includes a resin outer panel 21 and an inner panel 23 joined onto a rear side of the outer panel 21. A spacer 35 is interposed between the outer panel 21 and the inner panel 23 such that a portion of the deck cover 18 provided with the spacer 35 makes contact with the weather strip 5 when the deck cover 18 is closed.

Abstract: It is intended to provide an anti-EphA4 antibody or an EphA4-binding fragment thereof which is capable of binding to EphA4 and inhibiting the binding between EphA4 and its ligand, and a pharmaceutical composition comprising the anti-EphA4 antibody or the EphA4-binding fragment thereof as an active ingredient. A mouse anti-EphA4 antibody having binding affinity for EphA4 was obtained, and the sequences of complementarity-determining regions (CDRs) of the mouse anti-EphA4 antibody were identified. This allowed for preparation of a humanized antibody comprising the CDR sequences of the mouse anti-EphA4 antibody in heavy chain variable region and light chain variable region.

Abstract: Advertisement information relating to an object is provided in real time, while capturing images of the object. m first local features which are respectively feature vectors from one dimension to i dimensions are stored in association with an object, n feature points are extracted from a video picture, n second local features which are respectively feature vectors from one dimension to j dimensions are generated, the smaller number of dimensions is selected, of the number of dimensions i and the number of dimensions j, and an object is recognized to be present in the video picture and advertisement information relating to that object is provided when determination is made that at least a prescribed ratio of the m first local features of the selected number of dimensions corresponds to the n second local features of the selected number of dimensions.

Abstract: A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

Abstract: Provided is an exposure apparatus that exposes a pattern on a sample, the exposure apparatus including a plurality of blanking electrodes that are provided corresponding to a plurality of charged particle beams and each switch whether the corresponding particle beam irradiates the sample according to an input voltage; an irradiation control section that outputs switching signals for switching blanking voltages supplied respectively to the blanking electrodes; and a measuring section that, for each blanking electrode, measures a delay amount that is from when the switching signal changes to when the blanking voltage changes.

Abstract: An exposure apparatus including a plurality of column units to generate a plurality of charged particle beams arrayed in a first direction, a column control unit to separately control irradiation timings of the charged particle beams, a converting unit to convert design data describing an arrangement coordinate of device patterns as a base into exposure data including second data which is divided into belt-like regions having a width of one charged particle beam and extending in a second direction, and first data which specifies the second data based on a position of the first direction, a first storing unit to store the exposure data, and a distributing unit to distribute each of the column units by reconfiguring the exposure data in accordance with an exposure order, and a method of creating exposure data structure and beam control data for such an exposure apparatus are provided.

Abstract: Complex and fine patterns may be formed by an exposure apparatus that decreases movement error of a stage including a beam generating section that generates a charged particle beam, a stage section that has a sample mounted thereon and moves the sample relative to the beam generating section, a detecting section that detects a position of the stage section, a predicting section that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section, and an irradiation control section that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount.

Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Abstract: The invention relates to a charged particle beam exposure apparatus configured to expose cut patterns or via patterns on a substrate having a plurality of line patterns 81a arranged on an upper surface of the substrate at a constant pitch by irradiating the substrate with a plurality of charged particle beams B1 to Bn while moving a one-dimensional array beam A1 in an X direction parallel to the line patterns 81a, the one-dimensional array beam A1 being a beam in which the charged particle beams B1 to Bn are arranged in an Y direction orthogonal to the line patterns 81a.

Abstract: A multicolumn charged particle beam exposure apparatus includes a plurality of column cells which generate charged particle beams, and the column cell includes a yoke which is made of a magnetic material and generates a magnetic field of a predetermined intensity distribution around an optical axis of the column, and a coil which is wound around the yoke. The coil includes a plurality of divided windings, which are driven by different power sources.

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen.

Abstract: A search object and m-number of first local features respectively constituted by a feature vector of 1 to i dimensions of local areas of m-number of feature points in an image of the search object are stored, feature points are extracted from the image, second local features respectively constituted by a feature vector of 1 dimension to j dimensions are generated with respect to local areas of n-number of feature points, a smaller number of dimensions among the number of dimensions i of the first local features and the number of dimensions j of the second local features is selected, and an existence of the search object in the image in the video is recognized when a prescribed ratio of the m-number of first local features up to the selected number of dimensions corresponds to the n-number of second local features up to the selected number of dimensions.

Abstract: Merchandise management is implemented by recognizing a piece of merchandise in an image on a video in real time. A piece of merchandise and m-number of first local feature which are respectively 1-dimensional to i-dimensional feature vectors are stored after being associated with each other, n-number of feature points are extracted from an image on a video captured by an imaging unit, n-number of second local feature which are respectively 1-dimensional to j-dimensional feature vectors are generated, a smaller number of dimensions of the number of dimensions i and the number of dimensions j is selected, and a recognition that the merchandise exists in the image on the video is made when it is determined that a prescribed proportion or more of the m-number of first local feature of the selected number of dimensions correspond to the n-number of second local feature of the selected number of dimensions.

Abstract: To form a complex and fine pattern by combining optical exposure technology and charged particle beam exposure technology, provided is an exposure apparatus that radiates a charged particle beam at a position corresponding to a line pattern on a sample, including a beam generating section that generates a plurality of the charged particle beams at different irradiation positions in a width direction of the line pattern; a scanning control section that performs scanning with the irradiation positions of the charged particle beams along a longitudinal direction of the line pattern; a selecting section that selects at least one charged particle beam to irradiate the sample from among the plurality of charged particle beams, at a designated irradiation position in the longitudinal direction of the line pattern; and an irradiation control section that controls the at least one selected charged particle beam to irradiate the sample.

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen.

Abstract: An exposure apparatus is configured to include an electronic optical system 108 that generates an electron ray and irradiates a wafer W with the electron ray, a wafer stage WS that holds the wafer W, and an electron detector 44 and a fog preventing mechanism 70 that are placed between the electronic optical system 108 and the wafer stage WS. A substrate 71 constitutes the fog preventing mechanism 70, and opening holes 71a0 that penetrate up to the upper surface of the substrate 71 are formed in a first area of the bottom surface of the substrate 71, and opening holes 71a0 that are closed in the substrate 71 are formed in a second area of the bottom surface.

Abstract: An excellent peptidyl peptidase-IV inhibitor and the like are provided. A peptide consisting of Val-Pro-X wherein X represents an amino acid residue (except for L-proline residue); the aforementioned X is preferably one selected from a basic amino acid residue, an aliphatic neutral amino acid residue, an amide group-carrying neutral amino acid residue, or an aromatic group-carrying neutral amino acid residue; the aforementioned X is preferably one selected from an alanine residue, a glutamine residue, a methionine residue, an asparagine residue, a glycine residue, a valine residue, a tyrosine residue, a serine residue, and a lysine residue; a dipeptidyl peptidase-IV inhibitor, a blood sugar rise suppressing agent, a vascular endothelial disorder suppressing agent, and an angiotensin converting enzyme inhibitor containing the aforementioned peptide as an active ingredient.

Abstract: Provided is an exposure apparatus that exposes a pattern on a sample, the exposure apparatus including a plurality of blanking electrodes that are provided corresponding to a plurality of charged particle beams and each switch whether the corresponding particle beam irradiates the sample according to an input voltage; an irradiation control section that outputs switching signals for switching blanking voltages supplied respectively to the blanking electrodes; and a measuring section that, for each blanking electrode, measures a delay amount that is from when the switching signal changes to when the blanking voltage changes.

Abstract: There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.