Abstract: A roller shade includes a light shielding sheet which can be rolled up in a roll shape, a roller and an electric motor for openably moving the light shielding sheet, guide belts connected to respective lower surfaces of side end parts of the light shielding sheet in a sheet width direction, and a pair of guide parts each having a guide space which receives a corresponding one of the side end parts of the light shielding sheet in the sheet width direction and a corresponding one of the guide belts, for guiding the side end part and the guide belt. In the roller shade, the light shielding sheet is prevented from being creased when the light shielding sheet moves in the width direction while being rolled or unrolled, due to lack of a tension of the light shielding sheet in the width direction.

Abstract: There is provided an electromagnetic lens which includes an electromagnetic coil wound to be rotationally symmetrical about an optical axis of an electron beam, and a pole piece covering the electromagnetic coil, in which: a gap is integrally formed in either one of an inner wall formed at an inner circumference side of the pole piece and a lower end wall formed in an end portion at an emission side of the electron beam, or a boundary portion between the two walls; the inner wall is formed to be thinnest at a portion close to the gap and to gradually become thicker as a distance from the gap increases; and the electromagnetic lens is formed such that a width in a radial direction thereof is more increased as being closer to the gap along with the change of the thickness of the inner wall.

Abstract: An electron beam EB0 emitted from an electron gun 101 is cut by a first aperture 103a into a rectangular electron beam DB', which is then cut by second and third apertures 140a, 150a into an electron beam EB3 so that the edge cut by the first aperture 103a is removed from the electron beam EB1. This can prevent blur due to the influence of coulomb interaction of the electron beam EB1 between the first and second apertures 103a to 140a and perform highly accurate exposure with the electron beam EB3 having high current density.

Abstract: Up and down directions of an image are to be precisely judged without a special equipment installed in an image pickup device. An object candidate detecting means detects object candidates from an input image and their angles in the input image. A similarity calculation means calculate the degree of similarity between each detected object candidate and each object stored in advance. An input image angle calculating means judges up and down directions of the input image based on the calculated similarity of each object candidate and the angle of the input image. The input image angle calculating means carries out weighting for the angle of each object candidate in the input image based on its similarity and calculates slant angles with respect to the up and down directions of the input image by using the weighted angles.

Abstract: In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained.

Abstract: An electron beam lithography apparatus includes a storage for storing data on a drawing pattern assigned a rank based on an accuracy required for a device pattern, a drawing pattern adjustment unit to generate data on divided drawing patterns based on the rank, a settlement wait time adjustment unit to determine a settlement wait time based on the rank, and a controller to draw the device pattern while irradiating an electron beam based on the data on the divided drawing patterns and the settlement wait time. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits.

Abstract: An electron beam lithography apparatus includes an electron gun emitting an electron beam, a deflector deflecting the electron beam, a focus corrector correcting a focus of the electron beam, a storage unit storing exposure data, and a controller correcting the exposure data based on a constant correction coefficient independent of time passage and a fluctuating correction coefficient changing with time, calculates a deflection efficiency indicating a relation between an input signal to the deflector and an amount of beam deflection, and a correction intensity indicating a relation between an input signal to the focus corrector and a beam focus, and writes the electron beam on a sample according to the deflection efficiency and the correction intensity.

Abstract: Disclosed is a highly safe and effective therapeutic agent for eating disorders, which contains, as an active ingredient, a water-soluble fraction of a hydrolysis product of casein. The hydrolysis product is obtained by means of pepsin.

Abstract: A die casting machine provided with an electric servomotor and a hydraulic cylinder as drive sources for injection is enhanced in operation stability in an injection step. In the injection step, the rotational speed of an injection electric servomotor (3) is pattern-controlled to follow a preset speed command pattern while the forward speed of a piston (5a) caused by driving of an injection hydraulic cylinder (5) is feedback-controlled with an addition signal of the forward speed of the piston (5a) caused by driving of the injection electric servomotor (3) and the forward speed of the piston (5a) caused by driving of the injection hydraulic cylinder (5). Alternatively, the forward speed of the piston (5a) caused by driving of the injection hydraulic cylinder (5) may be pattern-controlled to follow a preset speed command pattern while the rotational speed of the injection electric servomotor (3) is feedback-controlled with the addition signal.

Abstract: In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained.

Abstract: A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.

Abstract: Systems and methods are disclosed to process streaming data units (tuples) for an application using a plurality of processing units, the application have a predetermined processing time requirement, by changing an operator-set applied to the tuple by a processing unit, on a tuple-by-tuple basis; estimating code requirement for potential operators based on processing unit capability; and assigning the potential operators to the processing units.

Abstract: A mask for exposure, which is used in a multi-column electron beam exposure apparatus having multiple column cells, includes a stencil pattern group constituted by multiple stencil patterns for each of the multiple column cells. The stencil pattern groups are arranged at intervals corresponding to arrangement intervals of the multiple column cells, and all of the stencil pattern groups are formed on a single mask substrate. The stencil pattern groups include: a first stencil pattern group formed within a deflectable range of an electron beam of each of the multiple column cells; and a second stencil pattern group having two or more of the first stencil patterns.

Abstract: The invention is to provide an in-line screw type injection molding machine which can have a simplified configuration of an injection mechanism and a metering mechanism.

Abstract: An electron beam lithography apparatus includes a storage for storing data on a drawing pattern assigned a rank based on an accuracy required for a device pattern, a drawing pattern adjustment unit to generate data on divided drawing patterns based on the rank, a settlement wait time adjustment unit to determine a settlement wait time based on the rank, and a controller to draw the device pattern while irradiating an electron beam based on the data on the divided drawing patterns and the settlement wait time. The drawing pattern adjustment unit determines upper limits on the long-side length of a divided drawing pattern or on the area of the divided drawing pattern based on the rank, and divides the drawing pattern based on the upper limits.

Abstract: A multi-column electron beam lithography apparatus includes multiple columns, each including a mask having several aperture patterns; a selective deflector to deflect an electron beam to select an aperture pattern; a bending back deflector to bend the beam passed through the pattern back to the column optical axis; and an electron beam trajectory adjustment unit to adjust deflection efficiencies of the deflectors without the mask installed to allow the beam deflected toward any positions in a deflection region to be bent back and applied to the same position on a sample, and to adjust the deflection efficiency of the selective deflector with the mask installed to allow the beam to be deflected toward any pattern of the mask, while maintaining a relationship between the deflection efficiencies.

Abstract: Systems and methods are disclosed to process streaming data units (tuples) for an application using a plurality of processing units, the application have a predetermined processing time requirement, by changing an operator-set applied to the tuple by a processing unit, on a tuple-by-tuple basis; estimating code requirement for potential operators based on processing unit capability; and assigning the potential operators to the processing units.

Abstract: A die casting machine provided with an electric servomotor and a hydraulic cylinder as drive sources for injection is enhanced in operation stability in an injection step. In the injection step, the rotational speed of an injection electric servomotor (3) is pattern-controlled to follow a preset speed command pattern while the forward speed of a piston (5a) caused by driving of an injection hydraulic cylinder (5) is feedback-controlled with an addition signal of the forward speed of the piston (5a) caused by driving of the injection electric servomotor (3) and the forward speed of the piston (5a) caused by driving of the injection hydraulic cylinder (5). Alternatively, the forward speed of the piston (5a) caused by driving of the injection hydraulic cylinder (5) may be pattern-controlled to follow a preset speed command pattern while the rotational speed of the injection electric servomotor (3) is feedback-controlled with the addition signal.

Abstract: A viewing surveillance system which make it possible to carry out the viewing surveillance independently from the broadcasting form like analog broadcasting or digital broadcasting. The viewing surveillance system also make it possible to carry out the viewing surveillance without any restriction set to viewers or any burden to the broadcast stations. The image feature data generating unit 12 receives a picture signal from the image viewing terminal 50, and generates the image feature data which represents a feature of the image from the picture signal. The image information transmitting unit 13 transmits the image feature data generated by the image feature data generating unit 12 to the viewing surveillance server 2. On the other hand, the image feature data generating units 21a to 21c also generates the image feature data based on the broadcasted programs and stores the image feature data in the program image feature data storing unit 22.

Abstract: An electron beam lithography apparatus includes an electron gun emitting an electron beam, a deflector deflecting the electron beam, a focus corrector correcting a focus of the electron beam, a storage unit storing exposure data, and a controller correcting the exposure data based on a constant correction coefficient independent of time passage and a fluctuating correction coefficient changing with time, calculates a deflection efficiency indicating a relation between an input signal to the deflector and an amount of beam deflection, and a correction intensity indicating a relation between an input signal to the focus corrector and a beam focus, and writes the electron beam on a sample according to the deflection efficiency and the correction intensity.