Patents by Inventor Akshey Seghal

Akshey Seghal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition and method for removing photoresist and/or resist residue using supercritical fluids
    Publication number: 20040011386
    Abstract: A method of removing photoresist and/or resist residue from a substrate includes exposing the substrate to a supercritical fluid in combination with a co-solvent mixture comprising an organic solvent and an oxidizer. In one embodiment, the supercritical fluid is supercritical carbon dioxide and the co-solvent mixture includes 1,2-Butylene Carbonate, Dimethyl Sulfoxide and hydrogen peroxide. If desired, supercritical carbon dioxide in combination with a second co-solvent mixture may be subsequently applied to the substrate to rinse and dry the substrate. In one embodiment, the second co-solvent mixture includes isopropyl alcohol.
    Type: Application
    Filed: July 17, 2002
    Publication date: January 22, 2004
    Applicant: SCP Global Technologies Inc.
    Inventor: Akshey Seghal