Abstract: A finFET structure, and method of forming such structure, in which a germanium enriched nanowire is located in the channel region of the FET, while simultaneously having silicon-germanium fin in the source/drain region of the finFET.

Abstract: A material stack comprising alternating layers of a silicon etch stop material and a germanium nanowire template material is formed on a surface of a bulk substrate. The material stack and a portion of the bulk substrate are then patterned by etching to provide an intermediate fin structure including a base semiconductor portion and alternating portions of the silicon etch stop material and the germanium nanowire template material. After recessing each germanium nanowire template material and optionally the base semiconductor portion, and etching each silicon etch stop material to define a new fin structure, a spacer is formed on sidewall surfaces of the remaining portions of the new fin structure. The alternating layers of germanium nanowire template material are then suspended above a notched surface portion of the bulk substrate and thereafter a functional gate structure is formed.

Abstract: A semiconductor structure includes a substrate, and a replacement metal gate (RMG) structure is attached to the substrate. The RMG structure includes a lower portion and an upper tapered portion. A source junction is disposed on the substrate and attached to a first low-k spacer portion. A drain junction is disposed on the substrate and attached to a second low-k spacer portion. A first oxide layer is disposed on the source junction, and attached to the first low-k spacer portion. A second oxide layer is disposed on the drain junction, and attached to the second low-k spacer portion. A cap layer is disposed on a top surface layer of the RMG structure and attached to the first oxide layer and the second oxide layer.

Abstract: Micro light-emitting diode (LED) displays and assembly apparatuses are described. In an example, a method of manufacturing a micro-light emitting diode (LED) display panel includes positioning a carrier plate above a display backplane substrate, the carrier plate having a plurality of light-emitting diode (LED) pixel elements thereon, and the display backplane substrate having a plurality of metal bumps thereon. The method also includes moving the carrier plate toward the display backplane substrate to couple at least a portion of the plurality of LED pixel elements to corresponding ones of the plurality of metal bumps, applying pressure to the carrier plate to transfer and bond the portion of the plurality of LED pixel elements to the corresponding ones of the plurality of metal bumps, and, subsequently, separating the carrier plate from the display backplane substrate.

Abstract: Micro light-emitting diode (LED) displays and assembly apparatuses are described. In an example, a pixel element for a micro-light emitting diode (LED) display panel includes a first color nanowire LED, a second color nanowire LED, the second color different than the first color, and a pair of third color nanowire LEDs, the third color different than the first and second colors. A continuous insulating material layer ius laterally surrounding the first color nanowire LED, the second color nanowire LED, and the pair of third color nanowire LEDs.

Abstract: Micro light-emitting diode (LED) displays and assembly apparatuses are described. In an example, method of manufacturing a micro-light emitting diode (LED) display panel includes positioning a display backplane substrate in a tank or container, the display backplane substrate having microgrooves therein. The method also includes adding a fluid to the tank or container, the fluid including a suspension of light-emitting diode (LED) pixel elements therein. The method also includes moving the fluid over the display backplane substrate. The method also includes assembling LED pixel elements from the fluid into corresponding ones of the microgrooves.

Abstract: A shallow trench isolation layer is formed on a structure comprising semiconductor fins. Portions of the fins are recessed to a level below the shallow trench isolation layer. Epitaxial stressor regions are then formed on the recessed fin areas. A bottom portion of the epitaxial stressor regions are contained by the shallow trench isolation layer, which delays formation of the diamond shape as the epitaxial region is grown. Once the epitaxial stressor regions exceed the level of the shallow trench isolation layer, the diamond shape starts to form. The result of delaying the start of the diamond growth pattern is that the epitaxial regions are narrower for a given fin height. This allows for taller fins, which provide more current handling capacity, while the narrower epitaxial stressor regions enable a smaller fin pitch, allowing for increased circuit density.

Abstract: A method for forming a Fin field-effect transistor (FinFET) semiconductor structure includes performing an angled ion implantation process at a predetermined angle on a first sidewall of a fin to cause damage to the first sidewall of the fin. The damage caused to the first sidewall of the fin is removed.

Abstract: Embodiments of the present disclosure may relate to a memory controller that may include a memory interface and a logic circuitry component coupled with the memory interface. In some embodiments, the logic circuitry component is to program one or more NAND cells of a multi-level NAND memory array via the memory interface with a first set of data in a first pass, determine a first temperature of the multi-level NAND memory array in association with the first pass, determine a second temperature of the multi-level NAND memory array, determine a temperature difference between the second temperature and the first temperature, and perform one or more operations based at least in part on a result of the determination of the temperature difference. Other embodiments may be described and/or claimed.

Abstract: Diffractive optical elements for wide field-of-view virtual reality devices and methods of manufacturing the same are disclosed. An example apparatus includes a substrate and a thin film stack including alternating layers of a first material and a second material. The thin film stack defines an annular protrusion. The annular protrusion has a stair-like profile. Top surfaces of separate ones of steps in the stair-like profile correspond to top surfaces of separate ones of the layers of the second material.

Abstract: An apparatus and/or system is described including a memory device or a controller to perform programming and verification operations including application of a shared voltage level to verify two program voltage levels of a multi-level cell device. For example, in embodiments, the control circuitry performs a program operation to program a memory cell and performs a verification operation by applying a single or shared verify voltage level to verify that the memory cell is programmed to a corresponding program voltage level. In embodiments, the program voltage level is one of two consecutive program voltage levels of a plurality of program voltage levels to be verified by application of the shared verify voltage. Other embodiments are disclosed and claimed.

Abstract: An apparatus and/or system is described including a memory device or a controller for a memory device to perform an adjustment of a read operation time for data stored in the memory device. In embodiments, the apparatus may receive a request for data stored in the memory device and a read operation time adjustment module operable by the controller may acquire a first operation temperature of the memory device, obtained at a time of programming of the data stored in the memory device. The apparatus may acquire a second operation temperature of the memory device, obtained after the request for the data stored in the memory device is received. Based at least partially on the first operation temperature and the second operation temperature, the apparatus may adjust the read operation time to read the data. Other embodiments are disclosed and claimed.

Abstract: Embodiments related to emissive devices for displays are discussed. Some embodiments include light emitting diodes including an electron transport layer core having a tube shape with an inner and an outer sidewall, an emission layer on the inner and outer sidewalls, and a hole transport layer on the emission layer, displays and systems including such light emitting diodes, and methods for fabricating them. Other embodiments include emissive laser devices having an emission layer between a hole transport layer and an electron transport layer and first and second metasurface mirrors adjacent to the hole transport layer and the electron transport layer, respectively, displays and systems including such emissive laser devices, and methods for fabricating them.

Abstract: A method of forming a semiconductor device that includes forming a silicon including fin structure and forming a germanium including layer on the silicon including fin structure. Germanium is then diffused from the germanium including layer into the silicon including fin structure to convert the silicon including fin structure to silicon germanium including fin structure.

Abstract: Electrical fuse (eFuse) and resistor structures and methods of manufacture are provided. The method includes forming metal gates having a capping material on a top surface thereof. The method further includes protecting the metal gates and the capping material during an etching process which forms a recess in a dielectric material. The method further includes forming an insulator material and metal material within the recess. The method further includes forming a contact in direct electrical contact with the metal material.

Abstract: A FinFET comprises a hybrid substrate having a top wafer of (100) silicon, a handle wafer of (110) silicon, and a buried oxide layer between the top wafer and the handle wafer; a first set of fins disposed in the top wafer and oriented in a <110> direction of the (100) silicon; and a second set of fins disposed in the handle wafer and oriented in a <112> direction of the (110) silicon. The first set of fins and the second set of fins are aligned.

Abstract: After forming a laterally contacting pair of a semiconductor fin and a conductive strap structure having a base portion vertically contacting a deep trench capacitor embedded in a substrate and a fin portion laterally contacting the semiconductor fin, conducting spikes that are formed on the sidewalls of the deep trench are removed or pushed deeper into the deep trench. Subsequently, a dielectric cap that inhibits epitaxial growth of a semiconductor material thereon is formed over at least a portion of the base portion of the conductive strap structure. The dielectric cap can be formed either over an entirety of the base portion having a stepped structure or on a distal portion of the base portion.

Abstract: A programming of a memory device configurable to reach a plurality of voltage levels is initiated. For each voltage level to be reached, a checkpoint is set up within a sequence of program pulses applied for the programming of the memory device, to determine whether a plurality of memory cells of the memory device have reached the voltage level. The programming of the memory device is aborted, in response to determining at the checkpoint that the plurality of memory cells have not reached the voltage level.

Abstract: A semiconductor structure includes a source drain region of a first material and an extension region of a second material. A semiconductor device fabrication process includes forming a sacrificial dielectric portion upon a semiconductor substrate, forming a sacrificial gate stack upon the sacrificial dielectric portion, forming a gate spacer upon the sacrificial dielectric portion against the sacrificial gate, forming a source drain region of a first doped material upon the semiconductor substrate against the gate spacer, forming a replacement gate trench by removing the sacrificial gate stack, forming an extension trench by removing the sacrificial dielectric portion, and forming an extension region of a second doped material within the extension trench.

Abstract: A plurality of semiconductor fins is formed on a surface of an insulator layer. Gate structures are then formed that are orientated perpendicular and straddle each semiconductor fin. A dielectric spacer is then formed on vertical sidewalls of each gate structure. Next, an etch is performed that removes exposed portions of each semiconductor fin and a portion of the insulator layer not protected by the dielectric spacers and the gate structures. The etch provides semiconductor fin portions that have exposed vertical sidewalls. A doped semiconductor material is then formed from each exposed vertical sidewall of each semiconductor fin portion, followed by an anneal which causes diffusion of dopants from the doped semiconductor material into each semiconductor fin portion and the formation of source/drain regions. The source/drain regions are present along the sidewalls of each semiconductor fin portion and are located beneath the dielectric spacers.