Patents by Inventor Amruthavalli P. Alur

Amruthavalli P. Alur has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11955426
    Abstract: A microelectronics package comprising a substrate, the substrate comprising a dielectric and at least first and second conductor level within the dielectric, where the first and second conductor levels are separated by at least one dielectric layer. The microelectronics package comprises an inductor structure that comprises a magnetic core. The magnetic core is at least partially embedded within the dielectric. The inductor structure comprises a first trace in the first conductor level, a second trace in the second conductor level, and a via interconnect connecting the first and second traces. The first trace and the second trace extend at least partially within the magnetic core.
    Type: Grant
    Filed: June 13, 2022
    Date of Patent: April 9, 2024
    Assignee: Intel Corporation
    Inventors: Huong Do, Kaladhar Radhakrishnan, Krishna Bharath, Yikang Deng, Amruthavalli P. Alur
  • Patent number: 11935805
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: April 12, 2023
    Date of Patent: March 19, 2024
    Assignee: Intel Corporation
    Inventors: Rahul Jain, Kyu Oh Lee, Siddharth K. Alur, Wei-Lun K. Jen, Vipul V. Mehta, Ashish Dhall, Sri Chaitra J. Chavali, Rahul N. Manepalli, Amruthavalli P. Alur, Sai Vadlamani
  • Publication number: 20230245940
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Application
    Filed: April 12, 2023
    Publication date: August 3, 2023
    Applicant: Intel Corporation
    Inventors: Rahul JAIN, Kyu Oh LEE, Siddharth K. ALUR, Wei-Lun K. JEN, Vipul V. MEHTA, Ashish DHALL, Sri Chaitra J. CHAVALI, Rahul N. MANEPALLI, Amruthavalli P. ALUR, Sai VADLAMANI
  • Patent number: 11705377
    Abstract: An apparatus is provided which comprises: a plurality of dielectric layers forming a substrate, a plurality of first conductive contacts on a first surface of the substrate, a cavity in the first surface of the substrate defining a second surface parallel to the first surface, a plurality of second conductive contacts on the second surface of the substrate, one or more integrated circuit die(s) coupled with the second conductive contacts, and mold material at least partially covering the one or more integrated circuit die(s) and the first conductive contacts. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: April 13, 2022
    Date of Patent: July 18, 2023
    Assignee: Intel Corporation
    Inventors: Mitul Modi, Robert L. Sankman, Debendra Mallik, Ravindranath V. Mahajan, Amruthavalli P. Alur, Yikang Deng, Eric J. Li
  • Patent number: 11664290
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: May 30, 2023
    Assignee: Intel Corporation
    Inventors: Rahul Jain, Kyu Oh Lee, Siddharth K. Alur, Wei-Lun K. Jen, Vipul V. Mehta, Ashish Dhall, Sri Chaitra J. Chavali, Rahul N. Manepalli, Amruthavalli P. Alur, Sai Vadlamani
  • Patent number: 11581271
    Abstract: Embodiments include semiconductor packages. A semiconductor package includes a plurality of build-up layers and a plurality of conductive layers in the build-up layers. The conductive layers include a first conductive layer and a second conductive layer. The first conductive layer is over the second conductive layer and build-up layers, where a first via couples the first and second conductive layers. The semiconductor package also includes a thin film capacitor (TFC) in the build-up layers, where a second via couples the TFC to the first conductive layer, and the second via has a thickness less than a thickness of the first via. The first conductive layer may be first level interconnects. The build-up layers may be dielectrics. The TFC may include a first electrode, a second electrode, and a dielectric. The first electrode may be over the second electrode, and the dielectric may be between the first and second electrodes.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: February 14, 2023
    Assignee: Intel Corporation
    Inventors: Rahul Jain, Kyu-Oh Lee, Islam A. Salama, Amruthavalli P. Alur, Wei-Lun K. Jen, Yongki Min, Sheng C. Li
  • Patent number: 11552019
    Abstract: Embodiments include semiconductor packages. A semiconductor package includes a first patch and a second patch on an interposer. The semiconductor package also includes a first substrate in the first patch, and a second substrate in the second patch. The semiconductor package further includes an encapsulation layer over and around the first and second patches, a plurality of build-up layers on the first patch, the second patch, and the encapsulation layer, and a plurality of dies and a bridge on the build-up layers. The bridge may be communicatively coupled with the first substrate of the first patch and the second substrate of the second patch. The bridge may be an embedded multi-die interconnect bridge (EMIB). The first and second substrates may be EMIBs and/or high-density packaging (HDP) substrates. The bridge may be positioned between two dies, and over an edge of the first patch and an edge of the second patch.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: January 10, 2023
    Assignee: Intel Corporation
    Inventors: Haifa Hariri, Amruthavalli P. Alur, Wei-Lun K. Jen, Islam A. Salama
  • Publication number: 20220310512
    Abstract: A microelectronics package comprising a substrate, the substrate comprising a dielectric and at least first and second conductor level within the dielectric, where the first and second conductor levels are separated by at least one dielectric layer. The microelectronics package comprises an inductor structure that comprises a magnetic core. The magnetic core is at least partially embedded within the dielectric. The inductor structure comprises a first trace in the first conductor level, a second trace in the second conductor level, and a via interconnect connecting the first and second traces. The first trace and the second trace extend at least partially within the magnetic core.
    Type: Application
    Filed: June 13, 2022
    Publication date: September 29, 2022
    Applicant: INTEL CORPORATION
    Inventors: Huong Do, Kaladhar Radhakrishnan, Krishna Bharath, Yikang Deng, Amruthavalli P. Alur
  • Patent number: 11404364
    Abstract: A microelectronics package comprises a substrate that comprises a dielectric and at least two conductor layers within the dielectric, and an inductor structure having a magnetic core at least partially within the dielectric and extending at least between a first conductor layer and a second conductor layer. The inductor structure comprises at least one conductor that extends horizontally at least partially within the magnetic core. The conductor extends in the z-direction within the magnetic core between the first conductor layer and the second conductor layer. One or more vias extend within the dielectric adjacent to the magnetic core between the first conductor layer and the second conductor layer. The conductor of the inductor has a length extending through the magnetic core that is greater than a width of the conductor.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: August 2, 2022
    Assignee: Intel Corporation
    Inventors: Huong Do, Kaladhar Radhakrishnan, Krishna Bharath, Yikang Deng, Amruthavalli P. Alur
  • Publication number: 20220238402
    Abstract: An apparatus is provided which comprises: a plurality of dielectric layers forming a substrate, a plurality of first conductive contacts on a first surface of the substrate, a cavity in the first surface of the substrate defining a second surface parallel to the first surface, a plurality of second conductive contacts on the second surface of the substrate, one or more integrated circuit die(s) coupled with the second conductive contacts, and mold material at least partially covering the one or more integrated circuit die(s) and the first conductive contacts. Other embodiments are also disclosed and claimed.
    Type: Application
    Filed: April 13, 2022
    Publication date: July 28, 2022
    Applicant: Intel Corporation
    Inventors: Mitul MODI, Robert L. SANKMAN, Debendra MALLIK, Ravindranath V. MAHAJAN, Amruthavalli P. ALUR, Yikang DENG, Eric J. LI
  • Patent number: 11393751
    Abstract: A microelectronics package comprising a substrate, the substrate comprising a dielectric and at least first and second conductor level within the dielectric, where the first and second conductor levels are separated by at least one dielectric layer. The microelectronics package comprises an inductor structure that comprises a magnetic core. The magnetic core is at least partially embedded within the dielectric. The inductor structure comprises a first trace in the first conductor level, a second trace in the second conductor level, and a via interconnect connecting the first and second traces. The first trace and the second trace extend at least partially within the magnetic core.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: July 19, 2022
    Assignee: Intel Corporation
    Inventors: Huong Do, Kaladhar Radhakrishnan, Krishna Bharath, Yikang Deng, Amruthavalli P. Alur
  • Publication number: 20220183157
    Abstract: An apparatus is provided which comprises: a cavity made in a substrate of a printed circuit board (PCB); a plurality of solder balls embedded in the cavity; and a horizontal trace within the substrate, wherein the horizontal trace is partially directly under the plurality of solder balls and is coupled to the plurality of solder balls and another trace or via in the substrate such that a substrate region under the plurality of solder balls is independent of a stop layer under the cavity.
    Type: Application
    Filed: February 22, 2022
    Publication date: June 9, 2022
    Applicant: INTEL CORPORATION
    Inventors: Kristof Darmawikarta, Robert A. May, Yikang Deng, Ji Yong Park, Maroun D. Moussallem, Amruthavalli P. Alur, Sri Ranga Sai Boyapati, Lilia May
  • Patent number: 11328968
    Abstract: An apparatus is provided which comprises: a plurality of dielectric layers forming a substrate, a plurality of first conductive contacts on a first surface of the substrate, a cavity in the first surface of the substrate defining a second surface parallel to the first surface, a plurality of second conductive contacts on the second surface of the substrate, one or more integrated circuit die(s) coupled with the second conductive contacts, and mold material at least partially covering the one or more integrated circuit die(s) and the first conductive contacts. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: May 10, 2022
    Assignee: Intel Corporation
    Inventors: Mitul Modi, Robert L. Sankman, Debendra Mallik, Ravindranath V. Mahajan, Amruthavalli P. Alur, Yikang Deng, Eric J. Li
  • Patent number: 11272619
    Abstract: An apparatus is provided which comprises: a cavity made in a substrate of a printed circuit board (PCB); a plurality of solder balls embedded in the cavity; and a horizontal trace within the substrate, wherein the horizontal trace is partially directly under the plurality of solder balls and is coupled to the plurality of solder balls and another trace or via in the substrate such that a substrate region under the plurality of solder balls is independent of a stop layer under the cavity.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: March 8, 2022
    Assignee: Intel Corporation
    Inventors: Kristof Darmawikarta, Robert A. May, Yikang Deng, Ji Yong Park, Maroun D. Moussallem, Amruthavalli P. Alur, Sri Ranga Sai Boyapati, Lilia May
  • Publication number: 20210391232
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Application
    Filed: August 27, 2021
    Publication date: December 16, 2021
    Applicant: INTEL CORPORATION
    Inventors: Rahul Jain, Kyu Oh Lee, Siddharth K. Alur, Wei-Lun K. Jen, Vipul V. Mehta, Ashish Dhall, Sri Chaitra J. Chavali, Rahul N. Manepalli, Amruthavalli P. Alur, Sai Vadlamani
  • Patent number: 11158558
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: October 26, 2021
    Assignee: Intel Corporation
    Inventors: Rahul Jain, Kyu Oh Lee, Siddharth K. Alur, Wei-Lun K. Jen, Vipul V. Mehta, Ashish Dhall, Sri Chaitra J. Chavali, Rahul N. Manepalli, Amruthavalli P. Alur, Sai Vadlamani
  • Publication number: 20210307172
    Abstract: An apparatus is provided which comprises: a cavity made in a substrate of a printed circuit board (PCB); a plurality of solder balls embedded in the cavity; and a horizontal trace within the substrate, wherein the horizontal trace is partially directly under the plurality of solder balls and is coupled to the plurality of solder balls and another trace or via in the substrate such that a substrate region under the plurality of solder balls is independent of a stop layer under the cavity.
    Type: Application
    Filed: September 2, 2016
    Publication date: September 30, 2021
    Applicant: INTEL CORPORATION
    Inventors: Kristof Darmawikarta, Robert A. May, Yikang Deng, Ji Yong Park, Maroun D. Moussallem, Amruthavalli P. Alur, Sri Ranga Sai Boyapati, Lilia May
  • Publication number: 20210111088
    Abstract: An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.
    Type: Application
    Filed: December 29, 2016
    Publication date: April 15, 2021
    Applicant: INTEL CORPORATION
    Inventors: Rahul Jain, Kyu Oh Lee, Siddharth K. Alur, Wei-Lun K. Jen, Vipul V. Mehta, Ashish Dhall, Sri Chaitra J. Chavali, Rahul N. Manepalli, Amruthavalli P. Alur, Sai Vadlamani
  • Publication number: 20200294920
    Abstract: Embodiments include semiconductor packages. A semiconductor package includes a first patch and a second patch on an interposer. The semiconductor package also includes a first substrate in the first patch, and a second substrate in the second patch. The semiconductor package further includes an encapsulation layer over and around the first and second patches, a plurality of build-up layers on the first patch, the second patch, and the encapsulation layer, and a plurality of dies and a bridge on the build-up layers. The bridge may be communicatively coupled with the first substrate of the first patch and the second substrate of the second patch. The bridge may be an embedded multi-die interconnect bridge (EMIB). The first and second substrates may be EMIBs and/or high-density packaging (HDP) substrates. The bridge may be positioned between two dies, and over an edge of the first patch and an edge of the second patch.
    Type: Application
    Filed: March 12, 2019
    Publication date: September 17, 2020
    Inventors: Haifa HARIRI, Amruthavalli P. ALUR, Wei-Lun K. JEN, Islam A. SALAMA
  • Publication number: 20200294938
    Abstract: Embodiments include semiconductor packages. A semiconductor package includes a plurality of build-up layers and a plurality of conductive layers in the build-up layers. The conductive layers include a first conductive layer and a second conductive layer. The first conductive layer is over the second conductive layer and build-up layers, where a first via couples the first and second conductive layers. The semiconductor package also includes a thin film capacitor (TFC) in the build-up layers, where a second via couples the TFC to the first conductive layer, and the second via has a thickness less than a thickness of the first via. The first conductive layer may be first level interconnects. The build-up layers may be dielectrics. The TFC may include a first electrode, a second electrode, and a dielectric. The first electrode may be over the second electrode, and the dielectric may be between the first and second electrodes.
    Type: Application
    Filed: March 14, 2019
    Publication date: September 17, 2020
    Inventors: Rahul JAIN, Kyu-Oh LEE, Islam A. SALAMA, Amruthavalli P. ALUR, Wei-Lun K. JEN, Yongki MIN, Sheng C. LI