Patents by Inventor Andrew E. Horch
Andrew E. Horch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8853761Abstract: A nonvolatile memory (“NVM”) bitcell with one or more active regions capacitively coupled to the floating gate but that are separated from both the source and the drain. The inclusion of capacitors separated from the source and drain allows for improved control over the voltage of the floating gate. This in turn allows CHEI (or IHEI) to be performed with much higher efficiency than in existing bitcells, thereby the need for a charge pump to provide current to the bitcell, ultimately decreasing the total size of the bitcell. The bitcells may be constructed in pairs, further reducing the space requirements of the each bitcell, thereby mitigating the space requirements of the separate capacitor/s. The bitcell may also be operated by CHEI (or IHEI) and separately by BTBT depending upon the voltages applied at the source, drain, and capacitor/s.Type: GrantFiled: January 30, 2012Date of Patent: October 7, 2014Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Patent number: 8829588Abstract: Embodiments relate to a nonvolatile memory (“NVM”) bitcell with a replacement metal control gate and an additional floating gate. The bitcell may be created using a standard complementary metal-oxide-semiconductor manufacturing processes (“CMOS processes”) without any additional process steps, thereby reducing the cost and time associated with fabricating a semiconductor device incorporating the NVM bitcell.Type: GrantFiled: July 26, 2011Date of Patent: September 9, 2014Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Publication number: 20140145253Abstract: A nonvolatile memory (“NVM”) bitcell with one or more active regions capacitively coupled to the floating gate but that are separated from both the source and the drain. The inclusion of capacitors separated from the source and drain allows for improved control over the voltage of the floating gate. This in turn allows CHEI (or IHEI) to be performed with much higher efficiency than in existing bitcells, thereby the need for a charge pump to provide current to the bitcell, ultimately decreasing the total size of the bitcell. The bitcells may be constructed in pairs, further reducing the space requirements of the each bitcell, thereby mitigating the space requirements of the separate capacitor/s. The bitcell may also be operated by CHEI (or IHEI) and separately by BTBT depending upon the voltages applied at the source, drain, and capacitor/s.Type: ApplicationFiled: January 29, 2014Publication date: May 29, 2014Applicant: Synopsys, Inc.Inventor: Andrew E. Horch
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Patent number: 8674422Abstract: A nonvolatile memory (“NVM”) bitcell with one or more active regions capacitively coupled to the floating gate but that are separated from both the source and the drain. The inclusion of capacitors separated from the source and drain allows for improved control over the voltage of the floating gate. This in turn allows CHEI (or IHEI) to be performed with much higher efficiency than in existing bitcells, thereby the need for a charge pump to provide current to the bitcell, ultimately decreasing the total size of the bitcell. The bitcells may be constructed in pairs, further reducing the space requirements of the each bitcell, thereby mitigating the space requirements of the separate capacitor/s. The bitcell may also be operated by CHEI (or IHEI) and separately by BTBT depending upon the voltages applied at the source, drain, and capacitor/s.Type: GrantFiled: January 30, 2012Date of Patent: March 18, 2014Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Publication number: 20140056076Abstract: An asymmetric non-volatile memory bitcell is described. The bitcell comprises source and drain regions comprising carriers of the same conductivity type. A floating gate rests on top of the well, and extends over a channel region, and at least a portion of the source and drain regions. The drain region comprises additional carriers of a second conductivity type, allowing band to band tunneling. The source region comprises additional carriers of a first conductivity type, thereby increasing source-gate capacitance. Thus, the bitcell incorporates a select device, thereby decreasing the overall size of the bitcell. The bitcell may be created without any additional CMOS process steps, or through the addition of a single extra mask step.Type: ApplicationFiled: November 1, 2013Publication date: February 27, 2014Applicant: Synopsys, Inc.Inventor: Andrew E. Horch
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Patent number: 8630117Abstract: Non-volatile memory (NVM) devices are disclosed. In one aspect, a NVM device may include a substrate, and a field-effect transistor (FET). The FET may include a first doped region in the substrate and a second doped region in the substrate. The first and the second doped regions may define a channel region of the substrate between them. An insulating layer may overlie the channel region. A floating gate may overlie the insulating layer. Charge of an amount that encodes a value may be stored on the floating gate. The floating gate and the first and the second doped regions may be shaped such that the floating gate defines with the first doped region a first border of a first length, and the floating gate defines with the second doped region a second border of a second length that is less than 90% of the first length.Type: GrantFiled: January 8, 2013Date of Patent: January 14, 2014Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Patent number: 8598642Abstract: An asymmetric non-volatile memory bitcell is described. The bitcell comprises source and drain regions comprising carriers of the same conductivity type. A floating gate rests on top of the well, and extends over a channel region, and at least a portion of the source and drain regions. The drain region comprises additional carriers of a second conductivity type, allowing band to band tunneling. The source region comprises additional carriers of a first conductivity type, thereby increasing source-gate capacitance. Thus, the bitcell incorporates a select device, thereby decreasing the overall size of the bitcell. The bitcell may be created without any additional CMOS process steps, or through the addition of a single extra mask step.Type: GrantFiled: February 14, 2011Date of Patent: December 3, 2013Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Patent number: 8501562Abstract: An example of a method of fabricating a gate oxide of a floating gate transistor includes forming a plurality of shallow trench isolation (STI) regions in a silicon wafer. The method also includes selectively filling the STI regions with oxide. Further, the method includes forming sacrificial oxide regions on the silicon wafer. Furthermore, the method includes forming implant regions in the silicon wafer. In addition, the method includes selectively removing the sacrificial oxide regions. The method further includes forming the gate oxide.Type: GrantFiled: March 5, 2010Date of Patent: August 6, 2013Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Publication number: 20130193498Abstract: A nonvolatile memory (“NVM”) bitcell with one or more active regions capacitively coupled to the floating gate but that are separated from both the source and the drain. The inclusion of capacitors separated from the source and drain allows for improved control over the voltage of the floating gate. This in turn allows CHEI (or IHEI) to be performed with much higher efficiency than in existing bitcells, thereby the need for a charge pump to provide current to the bitcell, ultimately decreasing the total size of the bitcell. The bitcells may be constructed in pairs, further reducing the space requirements of the each bitcell, thereby mitigating the space requirements of the separate capacitor/s. The bitcell may also be operated by CHEI (or IHEI) and separately by BTBT depending upon the voltages applied at the source, drain, and capacitor/s.Type: ApplicationFiled: January 30, 2012Publication date: August 1, 2013Applicant: SYNOPSYS, INC.Inventor: Andrew E. Horch
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Publication number: 20130193501Abstract: A nonvolatile memory (“NVM”) bitcell with one or more active regions capacitively coupled to the floating gate but that are separated from both the source and the drain. The inclusion of capacitors separated from the source and drain allows for improved control over the voltage of the floating gate. This in turn allows CHEI (or IHEI) to be performed with much higher efficiency than in existing bitcells, thereby the need for a charge pump to provide current to the bitcell, ultimately decreasing the total size of the bitcell. The bitcells may be constructed in pairs, further reducing the space requirements of the each bitcell, thereby mitigating the space requirements of the separate capacitor/s. The bitcell may also be operated by CHEI (or IHEI) and separately by BTBT depending upon the voltages applied at the source, drain, and capacitor/s.Type: ApplicationFiled: January 30, 2012Publication date: August 1, 2013Applicant: SYNOPSYS, INC.Inventor: Andrew E. Horch
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Patent number: 8373167Abstract: Non-volatile memory (NVM) devices are disclosed. In one aspect, a NVM device may include a substrate, and a field-effect transistor (FET). The FET may include a first doped region in the substrate and a second doped region in the substrate. The first and the second doped regions may define a channel region of the substrate between them. An insulating layer may overlie the channel region. A floating gate may overlie the insulating layer. Charge of an amount that encodes a value may be stored on the floating gate. The floating gate and the first and the second doped regions may be shaped such that the floating gate defines with the first doped region a first border of a first length, and the floating gate defines with the second doped region a second border of a second length that is less than 90% of the first length.Type: GrantFiled: December 31, 2007Date of Patent: February 12, 2013Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Publication number: 20130026553Abstract: Embodiments relate to a nonvolatile memory (“NVM”) bitcell with a replacement metal control gate and an additional floating gate. The bitcell may be created using a standard complementary metal-oxide-semiconductor manufacturing processes (“CMOS processes”) without any additional process steps, thereby reducing the cost and time associated with fabricating a semiconductor device incorporating the NVM bitcell.Type: ApplicationFiled: July 26, 2011Publication date: January 31, 2013Applicant: SYNOPSYS, INC.Inventor: Andrew E. Horch
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Publication number: 20120205734Abstract: An asymmetric non-volatile memory bitcell is described. The bitcell comprises source and drain regions comprising carriers of the same conductivity type. A floating gate rests on top of the well, and extends over a channel region, and at least a portion of the source and drain regions. The drain region comprises additional carriers of a second conductivity type, allowing band to band tunneling. The source region comprises additional carriers of a first conductivity type, thereby increasing source-gate capacitance. Thus, the bitcell incorporates a select device, thereby decreasing the overall size of the bitcell. The bitcell may be created without any additional CMOS process steps, or through the addition of a single extra mask step.Type: ApplicationFiled: February 14, 2011Publication date: August 16, 2012Applicant: SYNOPSYS, INC.Inventor: Andrew E. Horch
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Patent number: 8194468Abstract: A Non-Volatile Memory (NVM) cell and programming method in which the cell can denote at least two logic levels (e.g., 0 and 1) and includes a read-transistor with a floating gate and a Band-To-Band-Tunneling device (BTBT device) sharing the floating gate with the read transistor. The BTBT device is configured as an injection device for injecting a first charge onto the floating gate when the BTBT device is biased so that it is in accumulation, to set at least one of the logic levels.Type: GrantFiled: June 10, 2011Date of Patent: June 5, 2012Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Publication number: 20120086068Abstract: A method for forming a semiconductor device and a corresponding device are provided. The method includes forming a floating gate device in a process with dual strain layers, and an etch stop layer. An oxide is formed between the floating gate device and a nitride layer above the floating gate.Type: ApplicationFiled: October 6, 2010Publication date: April 12, 2012Applicant: SYNOPSYS INC.Inventor: Andrew E. Horch
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Patent number: 8122307Abstract: One Time Programmable (OTP) memory structures and methods for pretesting the support circuitry are provided. A group of dedicated test cells associated with one or more groups of regular OTP cells are used to test the support circuitry for the regular OTP cells. The dedicated cells are programmed and read. The read values are compared to the programmed values or expected values. As a result of the comparison, failing memories may be designated “Not Usable”, while regular OTP cells of passing memories can be programmed for their purpose resulting in elimination of wasted memories during test.Type: GrantFiled: June 27, 2007Date of Patent: February 21, 2012Assignee: Synopsys, Inc.Inventors: Chad A. Lindhorst, Todd E. Humes, Andrew E. Horch, Ernest Allen, III
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Publication number: 20110255348Abstract: A Non-Volatile Memory (NVM) cell and programming method in which the cell can denote at least two logic levels (e.g., 0 and 1) and includes a read-transistor with a floating gate and a Band-To-Band-Tunneling device (BTBT device) sharing the floating gate with the read transistor. The BTBT device is configured as an injection device for injecting a first charge onto the floating gate when the BTBT device is biased so that it is in accumulation, to set at least one of the logic levels.Type: ApplicationFiled: June 10, 2011Publication date: October 20, 2011Applicant: SYNOPSYS, INC.Inventor: Andrew E. Horch
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Patent number: 7983093Abstract: A Non-Volatile Memory (NVM) cell and programming method in which the cell can denote at least two logic levels (e.g., 0 and 1) and includes a read-transistor with a floating gate and a Band-To-Band-Tunneling device (BTBT device) sharing the floating gate with the read-transistor. The BTBT device is configured as an injection device for injecting a first charge onto the floating gate when the BTBT device is biased so that it is in accumulation, to set at least one of the logic levels.Type: GrantFiled: March 24, 2009Date of Patent: July 19, 2011Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Patent number: 7939861Abstract: Non-volatile memory (NVM) devices are disclosed. In one aspect, a NVM device may include a substrate, and a field-effect transistor (FET). The FET may include a first doped region in the substrate and a second doped region in the substrate. The first and the second doped regions may define a channel region of the substrate between them. An insulating layer may overlie the channel region. A floating gate may overlie the insulating layer. Charge of an amount that encodes a value may be stored on the floating gate. The floating gate and the first and the second doped regions may be shaped such that the floating gate defines with the first doped region a first border of a first length, and the floating gate defines with the second doped region a second border of a second length that is less than 90% of the first length.Type: GrantFiled: February 2, 2007Date of Patent: May 10, 2011Assignee: Synopsys, Inc.Inventor: Andrew E. Horch
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Patent number: 7897440Abstract: A semiconductor device may comprise a plurality of memory cells. A memory cell may comprise a thyristor, at least a portion of which is formed in a pillar of semiconductor material. The pillar may comprise sidewalls defining a cylindrical circumference of a first diameter. In a particular embodiment, the pillars associated with the plurality of memory cells may define rows and columns of an array. In a further embodiment, a pillar may be spaced by a first distance of magnitude up to the first diameter relative to a neighboring pillar within its row. In an additional further embodiment, the pillar may be spaced by a second distance of a magnitude up to twice the first diameter, relative to a neighboring pillar within its column.Type: GrantFiled: November 24, 2008Date of Patent: March 1, 2011Assignee: T-RAM Semiconductor, Inc.Inventor: Andrew E. Horch