Abstract: Methods and apparatus for supporting electronic promotions and electronic requests for information, e.g., in an integrated manner, on multiple platforms including, e.g., cable network systems, cell phones, etc., are described. Rewards and/or benefits are tracked in a centralized manner and a subscriber is allowed to accumulate rewards and benefits in a single account irrespective of which device or platform was used to initiate an eRFI and/or to act upon a promotion. The methods and apparatus of the present invention allow a cable service provider which supports eRFI on set top boxes to use the same eRFI server to provide responses to eRFI requests received from devices, e.g., cell phones and/or E-mail devices corresponding to a service subscriber, to forward electronic promotion information and to reward users in a forwarding chain for redemptions of coupons included in forwarded promotion information. Forwarded promotion information securely identifies each device/user in the forwarding chain.

Abstract: Systems and methods for using ad hoc networks in cooperation with service provider networks. Multi-network devices communicate with each other as peers in an ad hoc network while each accessing a service provider network. The multi-network devices may each receive the same real-time multimedia stream, be it broadcast or unicast, while sharing stream parity information. The peers may take corrective action to maintain uninterrupted playback of the real-time multimedia stream with no or minimal loss in perceived quality. The peers may further cooperate to facilitate bandwidth and power optimization, fast channel switching, and real-time mobile traffic and network analysis, displays and alerts.

Abstract: A system and method for quarantining IP service devices (ISDs). When an ISD is placed into a quarantined environment, any request from the ISD will be re-directed to a quarantine alert server in a quarantine sub-system. In response to the request, the quarantine alert server may provide the user with information about the quarantine and may redirect, or instruct the user to redirect, the request to a quarantine response server. The quarantine response server may provide additional information that is not in the quarantine video message as to how the user may end the quarantine.

Abstract: Methods for wet cleaning quartz surfaces of components for plasma processing chambers in which semiconductor substrates are processed, such as etch chambers and resist stripping chambers, include contacting the quartz surface with at least one organic solvent, a basic solution and different acid solutions, so as to remove organic and metallic contaminants from the quartz surface. The quartz surface is preferably contacted with one of the acid solutions at least two times.

Abstract: In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.

Abstract: To avoid discontinuities when resuming play of a digital stream that was paused while being viewed live and being simultaneously recorded, the timestamp and digital stream time base discontinuity count associated with the last-viewed frame are used to access the frame in storage that has the same discontinuity count (indicating that it is in the same segment as the last-viewed frame) and a timestamp one greater than the timestamp of the last-viewed frame.

Abstract: To avoid discontinuities when resuming play of a video stream that was paused while being viewed live and being simultaneously recorded, the timestamp and video stream time base discontinuity count associated with the last-viewed frame are used to access the frame in storage that has the same discontinuity count (indicating that it is in the same segment as the last-viewed frame) and a timestamp one greater than the timestamp of the last-viewed frame.

Abstract: Methods and systems for thwarting denial of service attacks originating in a DOCSIS-compliant cable network (DCN) are described. A DCN comprises one or more sub-networks each comprising an access network, one or more cable modem termination systems (CMTSs) and one or more cable modems (CMs). The DCN also accesses an edge server and a local DNS cache server. The DCN interfaces with the Internet and accesses a remote DNS server according to well-known protocols. The CMTS is adapted to compare the source IP address included in IP packet headers to the IP address of the customer premises equipment (CPE) from which the IP packet originates as assigned by the DNS. Data packets that have spoofed addresses are either deleted or quarantined. Packets reaching the edge server are evaluated by an attack detection system. A packet determined to be part of a denial of service attack is inspected and the source IP address and the destination IP address extracted.

Abstract: A system and method for managing e-mail traffic originating from a specific IP address. An outbound e-mail message is routed to an e-mail governor where the IP address of the computer from which outbound e-mail message originated is determined. A record associated with the originating IP address is created in a datatstore. Metrics useful to determine an e-mail message rate and an e-mail byte rate are stored in the e-mail record. An e-mail message rate is determined and compared with an e-mail message rate threshold. If the e-mail message rate threshold is exceeded, the originating IP address is sending spam e-mail (spam) and redial action is taken. An e-mail byte rate is also determined and compared with an e-mail byte rate threshold. If the e-mail byte rate threshold is exceeded, the originating IP address is using excess network resources to send e-mail and redial action is taken.

Abstract: A method for selectively etching a high k layer with respect to a silicon based material is provided. The high k layer is placed into an etch chamber. An etchant gas is provided into the etch chamber, wherein the etchant gas comprises H2. A plasma is generated from the etchant gas to selectively etch the high k layer with respect to a silicon based material.

Abstract: In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.

Abstract: In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.

Abstract: In one embodiment, a target alignment surface disposed on a target support mechanically engages a darkspace shield alignment surface disposed on a darkspace shield as the target is lodged into a chamber body. The respective alignment surfaces are shaped and positioned so that the darkspace shield is physically moved to a desired aligned position as the alignment surfaces engage each other. In this manner a darkspace shield may be directly aligned to a target within a semiconductor fabrication chamber to provide a suitable darkspace gap between the target and the darkspace shield.

Abstract: In a plasma processing system, a method of tuning of a set of plasma processing steps is disclosed. The method includes striking a first plasma comprising neutrals and ions in a plasma reactor of the plasma processing system. The method also includes etching in a first etching step a set of layers on a substrate; positioning a movable uniformity ring around the substrate, wherein a bottom surface of the uniformity ring is about the same height as a top surface of the substrate; and striking a second plasma consisting essentially of neutrals in the plasma reactor of the plasma processing system. The method further includes etching in a second etching step the set of layers on the substrate; and wherein the etching in the first step and the etching in the second step are substantially uniform.

Abstract: Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.

Abstract: Methods for wet cleaning quartz surfaces of components for plasma processing chambers in which semiconductor substrates are processed, such as etch chambers and resist stripping chambers, include contacting the quartz surface with at least one organic solvent, a basic solution and different acid solutions, so as to remove organic and metallic contaminants from the quartz surface. The quartz surface is preferably contacted with one of the acid solutions at least two times.

Abstract: A method of removing a set of particles from a set of structures including yttrium oxide is disclosed. The method includes exposing the set of structures to a first solution including an oxidizer for a first period. The method also includes removing the set of structures from the first solution, and exposing the set of structures to a second solution including a keytone reagent for a second period. The method further includes removing the set of structures from the second solution, and mechanically rubbing the set of structures with a third solution including a first set of acids for a third period.

Abstract: According to one embodiment of the invention, feeder logic is implemented as a software program stored in a machine readable medium and executed by a processor. The feeder logic is adapted to access indexing data associated with a pre-stored data unit. The pre-stored data unit including content in a scrambled format. The feeder logic is further adapted to generate a trigger data sequence and to insert the trigger data sequence into a data stream processed by a descrambler in response to detection that the content in the scrambled format cannot be descrambled by the descrambler using a currently valid descrambling key. The trigger data sequence is inserted prior to scrambled content of the pre-stored data unit to be processed.

Abstract: A system and method for managing e-mail traffic originating from a specific IP address. An outbound e-mail message is routed to an e-mail governor where the IP address of the computer from which outbound e-mail message originated is determined. A record associated with the originating IP address is created in a datatstore. Metrics useful to determine an e-mail message rate and an e-mail byte rate are stored in the e-mail record. An e-mail message rate is determined and compared with an e-mail message rate threshold. If the e-mail message rate threshold is exceeded, the originating IP address is sending spam e-mail (spam) and redial action is taken. An e-mail byte rate is also determined and compared with an e-mail byte rate threshold.

Abstract: H2O vapor is used as a processing gas for stripping photoresist material from a substrate having a patterned photoresist layer previously used as an ion implantation mask, wherein the patterned photoresist layer is defined by a photoresist crust covering a bulk photoresist portion. Broadly speaking, the H2O vapor is demonstrated to more efficiently strip the photoresist material having a cross-linked photoresist crust without causing the photoresist crust to pop and without causing the bulk photoresist to be undercut. Thus, H2O vapor provides a safe, efficient, and economical processing gas for stripping photoresist material having a photoresist crust resulting from an ion implantation process.