Patents by Inventor Atsushi Hiraishi

Atsushi Hiraishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6046609
    Abstract: A sense amplifier, which is intended to reduce the output response time after it has received a small voltage difference until it delivers amplified output signals, consists of a latch circuit made up of a pair of CMOS inverters, a pair of NMOS transistors connected in parallel to the latch circuit, and a current source connected in series to the latch circuit and NMOS transistor pair. The NMOS transistors amplify a small voltage difference of input signals, and the inverters of the latch circuit further amplify the resulting voltage difference to produce the output signals. Based on is a small voltage difference of input signals being amplified in two stages and the amplifying circuit being a 2-stage serial connection of the current source and the NMOS transistor or CMOS inverter, the delay time of output response can be reduced.
    Type: Grant
    Filed: November 10, 1998
    Date of Patent: April 4, 2000
    Assignees: Hitachi, Ltd., Hitachi ULSI Engineering Corp.
    Inventors: Hiroshi Toyoshima, Masashige Harada, Tomohiro Nagano, Yoji Nishio, Atsushi Hiraishi, Kunihiro Komiyaji, Hideharu Yahata, Kenichi Fukui, Hirofumi Zushi, Takahiro Sonoda, Haruko Kawachino, Sadayuki Morita
  • Patent number: 5963483
    Abstract: A synchronous memory unit which includes a plurality of input buffers for receiving address data, a plurality of input latches for holding and outputting address data from in the input buffers according to a clock signal, a plurality of decoders for decoding the address data from the input latches, and a memory cell array having a plurality of memory cells which store and output data signals via bit lines according to the address data decoded by the decoders. Also provided are a sense amplifier for amplifying the output data signals on the bit lines, a selector for selecting one of the amplified output data signals according to the address data decoded by the decoders, and a selector output latch for holding and outputting the amplified output data signal from the selector according to the clock signal. An output latch holds and outputs the amplified output data signal from the selector output latch according to the clock signal.
    Type: Grant
    Filed: August 14, 1998
    Date of Patent: October 5, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Hideharu Yahata, Kenichi Fukui, Yoji Nishio, Atsushi Hiraishi, Sadayuki Morita
  • Patent number: 5854562
    Abstract: A sense amplifier, which is intended to reduce the output response time after it has received a small voltage difference until it delivers amplified output signals, consists of a latch circuit made up of a pair of CMOS inverters, a pair of NMOS transistors connected in parallel to the latch circuit, and a current source connected in series to the latch circuit and NMOS transistor pair. The NMOS transistors amplify a small voltage difference of input signals, and the inverters of the latch circuit further amplify the resulting voltage difference to produce the output signals. Based on is a small voltage difference of input signals being amplified in two stages and the amplifying circuit being of 2-stage serial connection of the current source and the NMOS transistor or CMOS inverter, the delay time of output response can be reduced.
    Type: Grant
    Filed: April 15, 1997
    Date of Patent: December 29, 1998
    Assignees: Hitachi, Ltd, Hitachi ULSI Engineering Corp.
    Inventors: Hiroshi Toyoshima, Masashige Harada, Tomohiro Nagano, Yoji Nishio, Atsushi Hiraishi, Kunihiro Komiyaji, Hideharu Yahata, Kenichi Fukui, Hirofumi Zushi, Takahiro Sonoda, Haruko Kawachino, Sadayuki Morita
  • Patent number: 5834851
    Abstract: Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: November 10, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki, Shigeru Takahashi, Atsushi Hiraishi, Yutaka Kobayashi, Seigou Yukutake
  • Patent number: 5787043
    Abstract: A semiconductor device is provided which comprises a memory mat formed by dividing a memory into a plurality of blocks and a circuit arrangement disposed at every memory mat block for generating access suppression signals at least for defective memory cells within that block. Using this arrangement, the access speed to a redundant memory cell array for relieving the defects is increased so that a semiconductor memory device capable of a high speed operation is obtained.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: July 28, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Akioka, Yuji Yokoyama, Atsushi Hiraishi, Masahiro Iwamura, Yutaka Kobayashi, Tatsumi Yamauchi, Shigeru Takahashi, Koichi Motohashi
  • Patent number: 5767554
    Abstract: Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: June 16, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki, Shigeru Takahashi, Atsushi Hiraishi, Yutaka Kobayashi, Seigou Yukutake
  • Patent number: 5731219
    Abstract: Herein disclosed is a semiconductor integrated circuit device comprising an SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs, and a method of forming this device. The gate electrodes of the drive MISFETs and of the transfer MISFETs of the memory cell, and the word lines, are individually formed of different conductive layers. The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The source line is formed of a conductive layer identical to that of the word line. An oxidation resisting film is formed on the gate electrodes of the drive MISFETs so as to reduce stress caused by oxidization of edge portions of these gate electrodes, and to reduce a resulting leakage current.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: March 24, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki, Shigeru Takahashi, Atsushi Hiraishi, Yutaka Kobayashi, Seigou Yukutake
  • Patent number: 5726488
    Abstract: A semiconductor device has a well region formed in the surface of a substrate, and has functional portions such as MOSFET and bipolar transistor formed in the well region. The carrier concentration profile of the well region assumes the shape of a valley in the direction of depth thereof, and a minimum point thereof has a concentration of smaller than 5.times.10.sup.15 cm.sup.-3 and is located at a position within 1.6 .mu.m from the surface of the substrate. Preferably, the minimum point should have a concentration of greater than 5.times.10.sup.14 cm.sup.-3 but smaller than 5.times.10.sup.15 cm.sup.-3, and more preferably a concentration of greater than 1.times.10.sup.15 cm.sup.-3 but smaller than 5.times.10.sup.15 cm.sup.-3.
    Type: Grant
    Filed: May 16, 1994
    Date of Patent: March 10, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Atsuo Watanabe, Yoshiaki Yazawa, Atsushi Hiraishi, Masataka Minami, Takahiro Nagano, Takahide Ikeda, Naohiro Momma
  • Patent number: 5700704
    Abstract: A method is provided for manufacturing a semiconductor integrated circuit device which includes a capacitor element having a first electrode, a second electrode, and a dielectric film formed between said first electrode and said second electrode. In particular, the method includes the step of forming at least one of the first electrode and second electrode with a polycrystalline silicon film which is deposited over a semiconductor substrate by a CVD method and which is doped with an impurity during said deposition to decrease the resistance of the polycrystalline silicon film. The capacitor element formed by this method is particularly useful for memory cells of static random access memory devices.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: December 23, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki, Shigeru Takahashi, Atsushi Hiraishi, Yutaka Kobayashi, Seigou Yukutake
  • Patent number: 5680066
    Abstract: A semiconductor device which includes at least one of (1) an input buffer circuit formed of an input level converter and a non-inverting buffer circuit and an inverting buffer circuit each including BiCMOS circuitry which effects high-speed operation; (2) a decoder circuit formed of plural logic gates each of which is composed of the combination of MOS and bipolar circuitry; (3) a sense amplifier circuit including a multiemitter transistor; (4) a signal or address transition detector circuit which includes input circuits each receiving, for example, an address signal of a voltage amplitude and outputting a current amplitude signal in response to a change in level of the address signal, and a detector circuit connected thereto which has a cascode amplifier arranged such that it receives current amplitude signals at an input thereof and in which the cascode amplifier input is maintained at a substantially constant voltage, in which the detection circuit detects a transition of one or more of the current amplitu
    Type: Grant
    Filed: January 13, 1994
    Date of Patent: October 21, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Akioka, Masahiro Iwamura, Atsushi Hiraishi, Yuji Yokoyama, Nozomu Matsuzaki, Tatsumi Yamauchi, Yutaka Kobayashi, Nobuyuki Gotou, Akira Ide, Masahiro Yamamura, Hideaki Uchida
  • Patent number: 5675548
    Abstract: An arrangement which is particularly effective for decoders in semiconductor memory circuits which use, for example, common NMOS to receive one input for a plurality of logic decoder gates is provided includes a plurality of logic gates each having a first input terminal for respectively receiving first input signals and each being coupled to a common node. In one embodiment, first and second switching elements are also coupled to the common node. The first and second switching elements are both coupled to a second input terminal for receiving a second input signal which is common to the plurality of logic gates, and both operate complementary to one another in response to the second input signal. An improved read/write arrangement is also provided for such semiconductor memory circuit which includes circuitry to prevent connection of a common read line to the data lines during the writing operation. This enhances the writing speed by removing the load of the common read line during writing.
    Type: Grant
    Filed: February 29, 1996
    Date of Patent: October 7, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Yuji Yokoyama, Takashi Akioka, Masahiro Iwamura, Atsushi Hiraishi, Yutaka Kobayashi, Tatsumi Yamauchi, Shigeru Takahashi, Nobuyuki Gotou, Akira Ide
  • Patent number: 5656836
    Abstract: Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.The two transfer MISFETs of the memory cell have their individual gate electrodes connected-with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: August 12, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki, Shigeru Takahashi, Atsushi Hiraishi, Yutaka Kobayashi, Seigou Yukutake
  • Patent number: 5652457
    Abstract: Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.The two transfer MISFETs of the memory cell have their individual gate electrodes connected with two respective word lines spaced from each other and extended in an identical direction. The region defined by the two word lines is arranged therein with the two drive MISFETs and the source lines.
    Type: Grant
    Filed: November 30, 1994
    Date of Patent: July 29, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki, Shigeru Takahashi, Atsushi Hiraishi, Yutaka Kobayashi, Seigou Yukutake
  • Patent number: 5619151
    Abstract: A semiconductor memory device which includes at least one of (1) an input buffer circuit which generates internal address signals in response to an incoming address; (2) a decoder circuit formed of plural logic gates each of which is composed of the combination of MOS and bipolar circuitry; (3) a sense amplifier circuit including a multiemitter transistor; (4) a signal or address transition detector circuit which includes input circuits each receiving, for example, an address signal of a voltage amplitude and outputting a current amplitude signal in response to a change in level of the address signal, and a detector circuit connected thereto which has a cascode amplifier arranged such that it receives current amplitude signals at an input thereof and in which the cascode amplifier input is maintained at a substantially constant voltage, in which the detection circuit detects a transition of one or more of the current amplitude signals and, in response thereto, generates an ATD signal of a voltage amplitude; a
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: April 8, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Akioka, Masahiro Iwamura, Atsushi Hiraishi, Yuji Yokoyama, Nozomu Matsuzaki, Tatsumi Yamauchi, Yutaka Kobayashi, Nobuyuki Gotou, Akira ide, Masahiro Yamamura, Hideaki Uchida
  • Patent number: 5572480
    Abstract: Herein disclosed is a semiconductor integrated circuit device comprising a SRAM having its memory cell composed of transfer MISFETs to be controlled through word lines and drive MISFETs. The gate electrodes of the drive MISFETs and the gate electrodes of the transfer MISFETs of the memory cell, and the word lines are individually formed of different conductive layers. The drive MISFETs and the transfer MISFETs are individually arranged to cross each other in the gate length direction. The word lines are extended in the gate length direction of the gate electrodes of the drive MISFETs and caused to cross the gate electrodes of the drive MISFETs partially.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: November 5, 1996
    Assignee: Hitachi Ltd.
    Inventors: Shuji Ikeda, Satoshi Meguro, Soichiro Hashiba, Isamu Kuramoto, Atsuyoshi Koike, Katsuro Sasaki, Koichiro Ishibashi, Toshiaki Yamanaka, Naotaka Hashimoto, Nobuyuki Moriwaki, Shigeru Takahashi, Atsushi Hiraishi, Yutaka Kobayashi, Seigou Yukutake
  • Patent number: 5544125
    Abstract: An arrangement which is particularly effective for decoders in semiconductor memory circuits which use, for example, common NMOS to receive one input for a plurality of logic decoder gates is provided includes a plurality of logic gates each having a first input terminal for respectively receiving first input signals, and each being coupled to a common node. In one embodiment, first and second switching elements are also coupled to the common node. The first and second switching elements are both coupled to a second input terminal for receiving a second input signal which is common to the plurality of logic gates, and both operate complementary to one another in response to the second input signal. An improved read/write arrangement is also provided for such semiconductor memory circuits which includes circuitry to prevent connection of a common read line to the data lines during the writing operation. This enhances the writing speed by removing the load of the common read line during writing.
    Type: Grant
    Filed: February 6, 1995
    Date of Patent: August 6, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Yuji Yokoyama, Takashi Akioka, Masahiro Iwamura, Atsushi Hiraishi, Yutaka Kobayashi, Tatsumi Yamauchi, Shigeru Takahashi, Nobuyuki Gotou, Akira Ide
  • Patent number: 5512497
    Abstract: Disclosed is a bipolar-CMOS LSI manufactured by a simplified process and realizing a higher density of integration as well as a higher operating speed, in which a base lead-out electrode of a bipolar transistor and respective gate electrodes of a p-channel MISFET and an n-channel MISFET of CMOS transistors are made of an identical conductor film, and the conductor film of the gate electrode of the p-channel MISFET is of p-type, while that of the gate electrode of the n-channel MISFET is of n-type.
    Type: Grant
    Filed: July 8, 1994
    Date of Patent: April 30, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Takahide Ikeda, Kouichirou Yamada, Osamu Saito, Masanori Odaka, Nobuo Tamba, Katsumi Ogiue, Atsushi Hiraishi, Atsuo Watanabe, Mitsuru Hirao, Akira Fukami, Masayuki Ohayashi, Tadashi Kuramoto
  • Patent number: 5502820
    Abstract: An improved buffer circuit arrangement is provided which is particularly useful for semiconductor integrated circuit semiconductor memories and microprocessors. The buffer circuit is capable of switching large loads in various types of LSIs, and features a low noise and high speed circuit operation. This is accomplished by a parallel connection of output transistors in an output buffer circuit, and by differentiating the starting time of operation between the output transistors connected in parallel without using a delay circuit. For example, differentiating the starting times can be achieved by either providing the transistors with different characteristics from one another or the driving circuits with different characteristics from one another. Another aspect of the circuit is the provision of a two-level preset arrangement which presets the output node of the circuit to predetermined values before the input signals are applied.
    Type: Grant
    Filed: February 8, 1995
    Date of Patent: March 26, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Atsushi Hiraishi, Takashi Akioka, Yutaka Kobayashi, Yuji Yokoyama, Masahiro Iwamura, Tatsumi Yamauchi, Shigeru Takahashi, Hideaki Uchida, Akira Ide
  • Patent number: 5398318
    Abstract: An improved buffer circuit arrangement is provided which is particularly useful for semiconductor integrated circuit semiconductor memories and microprocessors. The buffer circuit is capable of switching large loads in various types of LSIs, and features a low noise and high speed circuit operation. This is accomplished by a parallel connection of output transistors in an output buffer circuit, and by differentiating the starting time of operation between the output transistors connected in parallel without using a delay circuit. For example, differentiating the starting times can be achieved by either providing the transistors with different characteristics from one another or the driving circuits with different characteristics from one another. Another aspect of the circuit is the provision of a two-level preset arrangement which presets the output node of the circuit to predetermined values before the input signals are applied.
    Type: Grant
    Filed: November 2, 1990
    Date of Patent: March 14, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Atsushi Hiraishi, Takashi Akioka, Yutaka Kobayashi, Yuji Yokoyama, Masahiro Iwamura, Tatsumi Yamauchi, Shigeru Takahashi, Hideaki Uchida, Akira Ide
  • Patent number: 5387827
    Abstract: A semiconductor integrated logic circuit is provided which includes a plurality of logic gates each having a first input terminal for respectively receiving first input signals, wherein each of the logic gates is coupled to a common node. In one embodiment, first and second switching elements are also coupled to the common node. The first and second switching elements are both coupled to a second input terminal for receiving a second input signal which is common to the plurality of logic gates, and both operate complementary to one another in response to the second input signal. This arrangement is particularly effective for decoders in semiconductor memory circuits which use a common NMOS to receive one input for a plurality of logic decoder gates. An improved read/write arrangement is also provided for semiconductor memory circuits which includes circuitry to prevent connection of a common read line to the data lines during the writing operation.
    Type: Grant
    Filed: January 22, 1991
    Date of Patent: February 7, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Yuji Yokoyama, Takashi Akioka, Masahiro Iwamura, Atsushi Hiraishi, Yutaka Kobayashi, Tatsumi Yamauchi, Shigeru Takahashi, Nobuyuki Gotou, Akira Ide