Abstract: An optoelectronic semiconductor chip may include a first region doped with a first dopant, a second region doped with a second dopant, an active region between the first and second regions, a first contact layer having an electrically conductive material and covering the first region. An insulating layer may cover the first contact layer and include first openings, and the insulating layer may include a second contact layer having an electrically conductive material and covering the insulating layer and the first openings. The first openings may completely penetrate the insulating layer, and the second contact layer may include second openings and/or a third contact layer comprising an electrically conductive material is arranged in the first openings in each case between the second contact layer and the insulating layer.

Abstract: A radiation-emitting semiconductor chip may include a semiconductor layer sequence having a first semiconductor layer of a first doping type and a second semiconductor layer of a second doping type. The chip may also include a first dielectric layer and a second dielectric layer arranged on the semiconductor layer sequence. A first recess may be arranged in the semiconductor layer sequence in a border region of the radiation-emitting semiconductor chip completely penetrating the first semiconductor layer. The first dielectric layer may cover the semiconductor layer sequence in the border region completely. The border region may be free of the second dielectric layer in an edge region. In addition, a method is disclosed for producing a radiation-emitting semiconductor chip.

Abstract: A solution for locating a recipient is disclosed. A network initiated Unstructured Supplementary Service Data, USSD, request addressed to a terminal device is received (300). Based on the Unstructured Supplementary Service Data request, a query is transmitted (306) regarding the location of the terminal device to a Home Location Register or to a Home Subscriber Server. As a response to the query, address of the Visitor Location Register serving the terminal device is received (308). The Unstructured Supplementary Service Data request is transmitted (310) to the Visitor Location Register to be forwarded to the terminal device.

Abstract: In an embodiment a radiation-emitting semiconductor chip includes a semiconductor body having an active region configured to generate radiation, a first contact layer having a first contact area and a first contact finger structure connected to the first contact area, a second contact layer having a second contact area and a second contact finger structure connected to the second contact area, a current distribution layer electrically conductively connected to the first contact layer, a connection layer electrically conductively connected to the first contact layer via the current distribution layer and an insulation layer, wherein the insulation layer is arranged in places between the connection layer and the current distribution layer, wherein the insulation layer has at a plurality of openings, in which the connection layer and the current distribution layer adjoin one another, and wherein edge regions of the insulation layer includes more openings than a central region of the insulation layer.

Abstract: An ETFE film that has a haze value of 2% or less, and preferably 1% or less, which advantageously may have a thickness greater than 150 pm, and preferably In the range of 200 pm to 300 pm, A film of ETFE, as received from the manufacturer, is stretched under special processing conditions to produce a processed (or final) film having an area stretch factor (Ax) greater than about 1.6. Ax —Initial film thickness/film thickness after stretching. However, it is important that the initial film thickness has a starting thickness of at least 400 pm, and preferably at least 500 pm. Processing conditions Include, in some embodiments, pre-beating and heating during stretching, and post-stretching annealing If the film is stretched in a 2.5×1 or a 4×1 ratio, at a processing temperature in THV range of 130° C. to 150° C., the haze of the resulting film can be reliably brought down to less than 2%. We have also found that this low haze value is not dependent on whether the larger stretch {e.g.

Abstract: In an embodiment a radiation-emitting semiconductor chip includes a semiconductor body having an active region configured to generate radiation, a first contact layer having a first contact area for external electrical contacting the radiation-emitting semiconductor chip and a first contact finger structure connected to the first contact area, a second contact layer having a second contact area for external electrical contacting the radiation-emitting semiconductor chip and a second contact finger structure connected to the second contact area, wherein the first contact finger structure and the second contact finger structure overlap in places in plan view of the radiation-emitting semiconductor chip, a current distribution layer electrically conductively connected to the first contact layer, a connection layer electrically conductively connected to the first contact layer via the current distribution layer and an insulation layer containing a dielectric material, wherein the insulation layer is arranged in p

Abstract: An optoelectronic semiconductor device may include a carrier comprising a patterned surface and a semiconductor layer sequence arranged on the carrier. The semiconductor layer sequence may include a first semiconductor layer having a first surface, a second semiconductor layer having a first surface, and a first main surface and a second main surface opposite the first main surface. The first surfaces of the first and second semiconductor layers may be at least partly arranged at the first main surface. The second main surface may face the patterned surface of the carrier, and at least one side face may connect the first and second main surfaces. The device may further include a directionally reflective layer and a planarization layer. The planarization layer may be arranged between the patterned surface and the directionally reflective layer. Moreover, a method for producing an optoelectronic semiconductor device is also disclosed.

Abstract: An optoelectronic semiconductor device may include a semiconductor layer sequence, a directionally reflective layer being arranged on the first main surface of the semiconductor layer sequence, a first contact structure comprising a first current spreading structure arranged on a first surface of a first semiconductor layer of the semiconductor layer sequence, a second contact structure comprising a second current spreading structure arranged on a first surface of a second semiconductor layer of the layer stack, wherein the first current spreading structure and the second current spreading structure each consist of at least one transparent conductive oxide. Moreover, a method for producing an optoelectronic semiconductor device is described.

Abstract: An optoelectronic semiconductor chip may include a first region doped with a first dopant, a second region doped with a second dopant, an active region between the first and second regions, a first contact layer having an electrically conductive material and covering the first region. An insulating layer may cover the first contact layer and include first openings, and the insulating layer may include a second contact layer having an electrically conductive material and covering the insulating layer and the first openings. The first openings may completely penetrate the insulating layer, and the second contact layer may include second openings and/or a third contact layer comprising an electrically conductive material is arranged in the first openings in each case between the second contact layer and the insulating layer.

Abstract: A radiation emitting semiconductor chip may include a semiconductor layer sequence having an active region configured to generate electromagnetic radiation, a first dielectric mirror layer arranged above the semiconductor layer sequence, and a second dielectric mirror layer arranged above the first dielectric mirror layer. The first dielectric mirror layer may have at least one first recess. A first current spreading layer may be arranged in the first recess and above the first dielectric mirror layer. The second dielectric mirror layer may have at least one second recess extending up to the first current spreading layer. The first recess may not overlap with the second recess in lateral direction in plan view. Furthermore, a method for producing a radiation emitting semiconductor chip is disclosed.

Abstract: Various aspects described herein relate to apparatus, methods, and computer programs for retrieving an identifier of a subscription network of a mobile subscriber in a communication system. For example, one such method includes registering with a network repository function network function as a mobile number portability network function providing a service allowing a consumer to retrieve an identifier of a subscription network of a mobile subscriber. This method also includes receiving a request from the consumer to retrieve the identifier of the subscription network of the mobile subscriber. This method further includes sending a response to the consumer comprising information to retrieve the identifier of the subscription network of the mobile subscriber.

Abstract: Water electrolyzer comprising a membrane having first and second opposed major surfaces, a thickness extending between the first and second major surfaces, and first, second, and third regions equally spaced across the thickness, wherein the first region is the closest region to the first major surface, wherein the second region is the closest region to the second major surface, wherein the third region is located between the first and second regions, wherein the first and third regions are each essentially free of both metallic Pt and Pt oxide, and wherein the second region comprises at least one of metallic Pt or Pt oxide; a cathode comprising a first catalyst on the first major surface of the membrane; and an anode comprising a second catalyst on the second major surface of the membrane.

Abstract: A radiation-emitting semiconductor chip includes a semiconductor body; a first contact layer having a first contact surface for external electrical contacting of the semiconductor chip and a first contact web structure connected to the first contact surface, wherein the first contact web structure is a region of the first contact layer that, compared to the first contact surface, has a comparatively small extent at least in a lateral direction; a second contact layer, wherein first and second contact web structures overlap in places in plan view of the semiconductor chip; a current distribution layer; and an insulation layer having a plurality of openings into which the current distribution layer extends.

Abstract: An optoelectronic semiconductor device may include a carrier having a roughened first main surface and optoelectronic semiconductor chips arranged over the roughened first main surface. The combined surface area of the optoelectronic semiconductor chips is smaller than the surface area of the carrier, and a part of the roughened first main surface is arranged between adjacent optoelectronic semiconductor chips.

Abstract: Optoelectronic components may include a semiconductor layer sequence on an auxiliary carrier where the sequence includes at least one n-doped layer, at least one p-doped layer, and an active layer therebetween. A first insulation layer is arranged over a surface of the n-doped layer. A first and second metallization are arranged for contacting the p-doped and n-doped layers, and the metallizations are connected to each other. The first and second metallizations are spatially separated from one another. A second insulation layer electrically insulates the first and second metallizations.

Abstract: An optoelectronic semiconductor chip may include a semiconductor layer sequence provided for generating and/or receiving radiation. The chip may further include a first trench structure and a second trench structure formed in the semiconductor layer sequence. A first contact finger structure may electrically conductively connect the second trench structure to a first semiconductor layer of the semiconductor layer sequence. The first contact finger structure may adjoin a first side surface and/or a second side surface of the second trench structure at least in places. A second contact finger structure may electrically conductively connect to a second semiconductor layer of the semiconductor layer sequence where the second contact finger may be arranged in the first trench structure.

Abstract: An optoelectronic semiconductor chip may include a semiconductor layer sequence having at least one n-doped semiconductor layer, at least one p-doped semiconductor layer, and an active layer arranged between the at least one n-doped semiconductor layer and the at least one p-doped semiconductor layer. A p-terminal contact may be electrically contacted to the p-doped semiconductor layer. An n-terminal contact may be electrically contacted to the n-doped semiconductor layer. The n-terminal contact may be arranged in direct contact with the p-doped semiconductor layer at least in regions.

Abstract: In an embodiment a radiation-emitting semiconductor chip includes a semiconductor body having an active region configured to generate radiation, a first contact layer having a first contact area for external electrical contacting the radiation-emitting semiconductor chip and a first contact finger structure connected to the first contact area, a second contact layer having a second contact area for external electrical contacting the radiation-emitting semiconductor chip and a second contact finger structure connected to the second contact area, wherein the first contact finger structure and the second contact finger structure overlap in places in plan view of the radiation-emitting semiconductor chip, a current distribution layer electrically conductively connected to the first contact layer, a connection layer electrically conductively connected to the first contact layer via the current distribution layer and an insulation layer containing a dielectric material, wherein the insulation layer is arranged in p

Abstract: An optoelectronic semiconductor component may include an optoelectronic semiconductor chip, a connecting material that contains amorphous aluminum oxide, and a sapphire support. The connecting material may be directly adjacent to the sapphire support. The optoelectronic semiconductor chip may be connected to the sapphire support by means of the connecting material containing aluminum oxide.

Abstract: A radiation-emitting semiconductor chip is disclosed. In an embodiment, a radiation-emitting semiconductor chip includes a semiconductor body configured to generate radiation, a first contact layer having a first contact area for external electrical contacting the semiconductor chip and a first contact finger structure connected to the first contact area, a second contact layer having a second contact area for external electrical contacting the semiconductor chip and a second contact finger structure connected to the second contact area, wherein the first contact finger structure and the second contact finger structure overlap in places, a current distribution layer electrically conductively connected to the first contact layer, a connection layer electrically conductively connected to the first contact layer via the current distribution layer and an insulation layer arranged in places between the connection layer and the current distribution layer, wherein the insulation layer has at least one opening.