Patents by Inventor Aurelian Dodoc
Aurelian Dodoc has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140078483Abstract: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.Type: ApplicationFiled: November 13, 2013Publication date: March 20, 2014Inventors: Aurelian Dodoc, Wilhelm Ulrich, Alexander Epple
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Publication number: 20140043693Abstract: An optical system for imaging an object on an image acquisition unit. The optical system, from the object, comprises a first lens unit, a second lens unit, a third lens unit and a fourth lens unit in the direction of the image acquisition unit. The first lens unit comprises at least one lens group with negative refractive power. The second lens unit comprises at least one lens group with positive refractive power and the third lens unit comprises at least one lens group with negative refractive power. The second lens unit and the third lens unit overall comprise at least three lens groups. From the first lens unit in the direction of an image acquisition unit, the first lens group, the second lens group and then the third lens group are arranged. The three lens groups have a movable design for adjusting the focal length of the optical system.Type: ApplicationFiled: August 12, 2013Publication date: February 13, 2014Applicant: Carl Zeiss AGInventor: Aurelian Dodoc
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Patent number: 8436985Abstract: The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.Type: GrantFiled: May 24, 2012Date of Patent: May 7, 2013Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Daniel Kraehmer, Aurelian Dodoc, Toralf Gruner
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Patent number: 8416490Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: June 16, 2010Date of Patent: April 9, 2013Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20130038929Abstract: A mirror (1a; 1a?; 1b; 1b?; 1c; 1c?) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P??) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H??) and a low refractive index layer (L??), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.Type: ApplicationFiled: June 15, 2012Publication date: February 14, 2013Applicant: CARL ZEISS SMT GMBHInventors: Stephan MUELLENDER, Joern WEBER, Wilfried CLAUSS, Hans-Jochen PAUL, Gerhard BRAUN, Sascha MIGURA, Aurelian DODOC, Christoph ZACZEK, Gisela VON BLANCKENHAGEN, Roland LOERCHER
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Patent number: 8363315Abstract: A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit.Type: GrantFiled: April 7, 2005Date of Patent: January 29, 2013Assignee: Carl Zeiss SMT GmbHInventors: Alexander Epple, Wilhelm Ulrich, Aurelian Dodoc, Hans-Juergen Mann, David Shafer
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Publication number: 20130022345Abstract: An anamorphic objective is provided for imaging an object onto an image acquisition unit. The anamorphic objective has at least one first plane of symmetry and at least one second plane of symmetry. The first plane of symmetry and the second plane of symmetry are oriented perpendicular to one another. The first plane of symmetry and the second plane of symmetry intersect and have a straight line of intersection (intersection line). A first objective section followed by a second objective section are arranged. A diaphragm is arranged between the first objective section and the second objective section. A first anamorphic optical element is arranged in the first objective section. A second anamorphic optical element is arranged in the second objective section. The anamorphic objective fulfills specified conditions and is suitable for generating a stigmatic imaging of the object on the image acquisition unit.Type: ApplicationFiled: June 14, 2012Publication date: January 24, 2013Inventors: Aurelian DODOC, Christian Bannert, Vladan Blahnik, Holger Sehr
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Patent number: 8355201Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: April 6, 2011Date of Patent: January 15, 2013Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf M. Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Patent number: 8339701Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: GrantFiled: June 17, 2010Date of Patent: December 25, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20120274919Abstract: A reflection mirror assembly for use in a catadioptric imaging optical system includes two curved reflection mirrors, each including a reflection surface expressed by equation (a), where y represents height in a direction perpendicular to the optical axis, z represents distance (sag amount) along the optical axis from a tangent plane at a vertex of the reflection surface to a position on the reflection surface at height y, r represents a vertex curvature radius, and R represents a conical coefficient; z=(y2/r)/[1+{1?(1+?)·y2/r2}1/2]??(a), wherein ?1<k<0.Type: ApplicationFiled: June 25, 2012Publication date: November 1, 2012Applicant: CARL ZEISS SMT GMBHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20120274918Abstract: A catadioptric projection objective for imaging a pattern onto an image plane includes: a first objective part for imaging the pattern into a first intermediate image; a second objective part for imaging the first intermediate image into a second intermediate image; and a third objective part for imaging the second intermediate image onto the image plane. A first concave mirror having a continuous mirror surface and a second concave mirror having a continuous mirror surface are upstream of the second intermediate image. A pupil surface is formed between the object plane and the first intermediate image, between the first and the second intermediate image, and between the second intermediate image and the image plane. A plate having essentially parallel plate surfaces is positioned in the first objective part near the pupil surface. At least one plate surface is aspherized to correct for aberrations.Type: ApplicationFiled: June 13, 2012Publication date: November 1, 2012Applicant: CARL ZEISS SMT GMBHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Patent number: 8289619Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: GrantFiled: June 6, 2011Date of Patent: October 16, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf M. Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20120250147Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: ApplicationFiled: May 14, 2012Publication date: October 4, 2012Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20120236272Abstract: The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.Type: ApplicationFiled: May 24, 2012Publication date: September 20, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Mann, Daniel Kraehmer, Aurelian Dodoc, Toralf Gruner
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Publication number: 20120224160Abstract: An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength ?0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.Type: ApplicationFiled: December 7, 2011Publication date: September 6, 2012Applicant: CARL ZEISS SMT GMBHInventors: Aurelian Dodoc, Christoph Zaczek, Sascha Migura, Gerhard Braun, Hans-Juergen Mann, Hans-Jochen Paul
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Publication number: 20120212810Abstract: EUV-mirror having a substrate (S) and a layer arrangement that includes plural layer subsystems (P?, P??) each consisting of a periodic sequence of at least two periods (P2, P3) of individual layers. The periods (P2, P3) include two individual layers composed of different materials for a high refractive index layer (H?, H??) and a low refractive index layer (L?, L??) and have within each layer subsystem (P?, P??) a constant thickness (d2, d3) that deviates from that of the periods of an adjacent layer subsystem.Type: ApplicationFiled: January 10, 2012Publication date: August 23, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Jochen Paul, Gerhard Braun, Sascha Migura, Aurelian Dodoc, Christoph Zaczek
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Patent number: 8212991Abstract: An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.Type: GrantFiled: December 1, 2009Date of Patent: July 3, 2012Assignee: Carl Zeiss SMT GmbHInventors: Aurelian Dodoc, Albrecht Ehrmann, Sascha Bleidistel
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Publication number: 20120162625Abstract: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.Type: ApplicationFiled: January 30, 2012Publication date: June 28, 2012Applicant: CARL ZEISS SMT GMBHInventors: Aurelian DODOC, Wilhelm ULRICH, Alexander EPPLE
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Patent number: 8208127Abstract: The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.Type: GrantFiled: July 15, 2008Date of Patent: June 26, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Daniel Kraehmer, Aurelian Dodoc, Toralf Gruner
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Patent number: 8208198Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: January 16, 2007Date of Patent: June 26, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer