Patents by Inventor Beng S. Ong

Beng S. Ong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090036689
    Abstract: A substituted indolocarbazole comprising at least one optionally substituted thienyl.
    Type: Application
    Filed: October 16, 2008
    Publication date: February 5, 2009
    Applicant: XEROX CORPORATION
    Inventors: Yiliang Wu, Beng S. Ong, Yu Qi, Yuning Li
  • Patent number: 7456424
    Abstract: A thin film transistor composed of a semiconductor layer including an optionally substituted indolocarbazole.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: November 25, 2008
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Beng S. Ong, Yu Qi, Yuning Li
  • Publication number: 20080286907
    Abstract: A method for making a zinc oxide semiconductor layer for a thin film transistor using solution processing at low temperatures is disclosed. The method comprises making a solution comprising a zinc salt and a complexing agent; applying the solution to a substrate; and heating the solution to form a semiconductor layer on the substrate. A thin film transistor using this zinc oxide semiconductor layer has good mobility and on/off ratio.
    Type: Application
    Filed: May 16, 2007
    Publication date: November 20, 2008
    Inventors: Yuning Li, Beng S. Ong
  • Publication number: 20080277724
    Abstract: An electronic device, such as a thin film transistor, is disclosed having a dielectric layer formed from a composition comprising a compound having at least one phenol group and at least one group containing comprising silicon. The resulting dielectric layer has good electrical properties.
    Type: Application
    Filed: May 7, 2007
    Publication date: November 13, 2008
    Inventors: Yu Qi, Yiliang Wu, Yuning Li, Beng S. Ong
  • Patent number: 7449715
    Abstract: An electronic device comprising a polymer of Formula or structure (I) wherein R1 is hydrogen, halogen, a suitable hydrocarbon, or a heteroatom containing group; R2 is hydrogen, a suitable hydrocarbon, a heteroatom containing group, or a halogen; R3 and R4 are independently a suitable hydrocarbon, hydrogen, a heteroatom containing group, or a halogen; Ar is an aromatic component; x, y, a, b, and c represent the number of groups or rings, respectively; Z represents sulfur, oxygen, selenium, or NR wherein R is hydrogen, alkyl, or aryl; and n represents the number of repeating units.
    Type: Grant
    Filed: April 6, 2006
    Date of Patent: November 11, 2008
    Assignee: Xerox Corporation
    Inventors: Yuning Li, Ping Liu, Yiliang Wu, Beng S. Ong
  • Patent number: 7449542
    Abstract: A thienylene-arylene polymer comprised of a repeating segment containing at least one 2,5-thienylene unit selected from (I) and (II), and from about one to about three arylene units selected from (IIIa), (IIIb), and/or (IIIc) wherein R is an alkyl or an alkoxy; R? is halogen, alkyl, or alkoxy, and a and b represent the number of Rs.
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: November 11, 2008
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Ping Liu, Lu Jiang, Beng S. Ong
  • Patent number: 7443027
    Abstract: An apparatus composed of: (a) a substrate; and (b) a deposited composition comprising a liquid and a plurality of metal nanoparticles with a covalently bonded stabilizer.
    Type: Grant
    Filed: November 3, 2005
    Date of Patent: October 28, 2008
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Yuning Li, Beng S. Ong
  • Publication number: 20080246095
    Abstract: An ambipolar transistor, including a p-type semiconductor region and an n-type semiconductor region near the p-type semiconductor region. Also a first terminal and second terminal contact both the p-type semiconductor region and the n-type semiconductor region. Furthermore, the p-type semiconductor region and the n-type semiconductor region substantially do not overlap each other. A method of manufacturing an ambipolar transistor is also disclosed, including forming a p-type semiconductor region, forming an n-type semiconductor region near the p-type semiconductor region, forming a first terminal contacting both the p-type semiconductor region and n-type semiconductor region, forming a second terminal contacting both the p-type semiconductor region and n-type semiconductor region; and wherein the p-type semiconductor region and the n-type semiconductor region substantially do not overlap, and have substantially no interfacial area.
    Type: Application
    Filed: April 6, 2007
    Publication date: October 9, 2008
    Applicant: XEROX CORPORATION
    Inventors: Yiliang WU, Beng S. ONG, Alphonsus Hon-Chung NG
  • Publication number: 20080242112
    Abstract: A process for fabricating an electronic device including: depositing a layer comprising a semiconductor; liquid depositing a dielectric composition comprising a lower-k dielectric material, a higher-k dielectric material, and a liquid, wherein the lower-k dielectric material and the higher-k dielectric material are not phase separated prior to the liquid depositing; and causing phase separation of the lower-k dielectric material and the higher-k dielectric material to form a phase-separated dielectric structure wherein the lower-k dielectric material is in a higher concentration than the higher-k dielectric material in a region of the dielectric structure closest to the layer comprising the semiconductor, wherein the depositing the layer comprising the semiconductor is prior to the liquid depositing the dielectric composition or subsequent to the causing phase separation.
    Type: Application
    Filed: April 2, 2007
    Publication date: October 2, 2008
    Applicant: XEROX CORPORATION
    Inventors: Yiliang Wu, Hadi K. Mahabadi, Beng S. Ong, Paul F. Smith
  • Publication number: 20080237581
    Abstract: An electronic device including in any sequence: (a) a semiconductor layer; and (b) a phase-separated dielectric structure comprising a lower-k dielectric polymer and a higher-k dielectric polymer, wherein the lower-k dielectric polymer is in a higher concentration than the higher-k dielectric polymer in a region of the dielectric structure closest to the semiconductor layer.
    Type: Application
    Filed: April 2, 2007
    Publication date: October 2, 2008
    Applicant: XEROX CORPORATION
    Inventors: Yiliang Wu, Hadi K. Mahabadi, Beng S. Ong, Paul F. Smith
  • Publication number: 20080226896
    Abstract: An apparatus composed of: (a) a substrate; and (b) a deposited composition comprising a liquid and a plurality of metal nanoparticles with a covalently bonded stabilizer.
    Type: Application
    Filed: December 12, 2007
    Publication date: September 18, 2008
    Applicant: XEROX CORPORATION
    Inventors: Yiliang Wu, Yuning Li, Beng S. Ong
  • Patent number: 7425723
    Abstract: An organic thin-film transistor has a p-type semiconducting layer, wherein the semiconducting layer comprises a crystalline conjugated polyarylamine of the chemical structure: wherein R1 through R5 are independently selected from hydrogen, alkyl having from about 1 to about 30 carbon atoms, aryl having from about 6 to about 40 carbon atoms, heteroaryl having from about 3 to about 40 atoms, alkoxy having from about 1 to about 30 carbon atoms, aryloxy having from about 6 to about 40 carbon atoms, and substituted derivatives thereof; wherein A and B are the same or different independently selected from arylenes having from about 6 to about 20 carbon atoms or heteroarylenes having from about 3 to about 20 carbon atoms; and wherein n is the degree of polymerization; and wherein the polyarylamine has a mobility (?0) of 10?4 cm2/V·sec or greater.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: September 16, 2008
    Assignee: Xerox Corporation
    Inventors: Beng S. Ong, Yuning Li, Yiliang Wu, Ping Liu
  • Publication number: 20080207917
    Abstract: A polymer comprising at least one type of repeat unit comprising at least one type of an optionally substituted indolocarbazole moiety and at least one divalent linkage.
    Type: Application
    Filed: April 22, 2008
    Publication date: August 28, 2008
    Applicant: XEROX CORPORATION
    Inventors: Yuning Li, Beng S. Ong, Yiliang Wu, Ping Liu
  • Patent number: 7402681
    Abstract: A compound composed of a plurality of optionally substituted indolocarbazole moieties which are the same or different from each other.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: July 22, 2008
    Assignee: Xerox Corporation
    Inventors: Beng S. Ong, Yu Qi, Yiliang Wu, Yuning Li
  • Patent number: 7396852
    Abstract: A compound including at least one type of an optionally substituted indolocarbazole moiety and at least one divalent linkage.
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: July 8, 2008
    Assignee: Xerox Corporation
    Inventors: Yuning Li, Beng S. Ong, Yiliang Wu, Ping Liu
  • Patent number: 7397086
    Abstract: A thin-film transistor, such as a top-gate thin-film transistor, is provided herein. The thin-film transistor has a performance-enhancing layer, such as a performance-enhancing bottom layer, comprising a polymer other than a polyimide. In specific embodiments, the polymer is selected from the group consisting of polysiloxane, polysilsesquioxane, and mixtures thereof. In other embodiments, it is a self-assembling polymeric monolayer of a silane agent and an organophosphonic acid. The performance-enhancing layer directly contacts the substrate. The layer improves the carrier mobility and current on/off ratio of the thin film transistor.
    Type: Grant
    Filed: December 23, 2005
    Date of Patent: July 8, 2008
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Beng S. Ong, Paul F. Smith
  • Publication number: 20080146776
    Abstract: An electronic device, such as a thin film transistor, containing a semiconductor of Formula/Structure (I) wherein each R? is independently at least one of hydrogen, and a suitable hydrocarbon; Ar is an aryl, inclusive of heteroaryl substituents; and M represents at least one thiophene based conjugated segment.
    Type: Application
    Filed: December 14, 2006
    Publication date: June 19, 2008
    Inventors: Ping Liu, Beng S. Ong, Yiliang Wu, Yuning Li, Hualong Pan
  • Publication number: 20080142788
    Abstract: An electronic device with a semiconductor layer of (I) wherein X is O or NR?; m represents the number of methylenes; M is a conjugated moiety; R and R? are selected from the group consisting of at least one of hydrogen, a suitable hydrocarbon, and a suitable hetero-containing group; a represents the number of 3-substituted thiophene units; b represents the number of conjugated moieties, and n represents the number of polymer repeating units.
    Type: Application
    Filed: December 14, 2006
    Publication date: June 19, 2008
    Inventors: Yuning Li, Beng S. Ong
  • Publication number: 20080135937
    Abstract: A thin film transistor comprising: (a) an insulating layer; (b) a gate electrode; (c) a semiconductor layer; (d) a source electrode; and (e) a drain electrode, wherein the insulating layer, the gate electrode, the semiconductor layer, the source electrode, and the drain electrode are in any sequence as long as the gate electrode and the semiconductor layer both contact the insulating layer, and the source electrode and the drain electrode both contact the semiconductor layer, and wherein at least one of the source electrode, the drain electrode, and the gate electrode comprise coalesced coinage metal containing nanoparticles and a residual amount of one or both of a stabilizer covalently bonded to the coalesced coinage metal containing nanoparticles and a decomposed stabilizer covalently bonded to the coalesced coinage metal containing nanoparticles.
    Type: Application
    Filed: December 12, 2007
    Publication date: June 12, 2008
    Applicant: XEROX CORPORATION
    Inventors: Yiliang Wu, Yuning Li, Beng S. Ong
  • Publication number: 20080121869
    Abstract: A thin-film transistor (TFT) with dual-layer source and drain electrodes is provided. Each source and drain electrode comprises a first layer and a second layer. The first layer has a work function which differs from the energy level of the semiconductor by at least 0.5 eV and the second layer has a work function matching the energy level of the semiconductor. The semiconductor has a short channel length.
    Type: Application
    Filed: November 29, 2006
    Publication date: May 29, 2008
    Inventors: Yiliang Wu, Beng S. Ong