Abstract: A multiple wavelength ellipsometer system for use in thin film characterization is disclosed. The light source for the system may include sequentially scanned multiple light emitting diodes or laser diodes. The polarization state detector may comprise no moving parts, and utilizes economical uncoated glass plates as beam splitters. The system compensates for potential measurement errors induced by misalignment of the input beam angle to the polarization state detector via a paired arrangement of the beam splitters. To provide improved accuracy in the analysis of data acquired by the system, methods herein actively compensate for the relatively large bandwidth of a preferable light emitting diode source.

Abstract: A system for monitoring, in real time, relatively large samples as they are caused to pass by an ellipsometer or the like system, and method of its use.

Abstract: A multiple wavelength ellipsometer system for use in thin film characterization is disclosed. The light source for the system may include sequentially scanned multiple light emitting diodes or laser diodes. The polarization state detector may comprise no moving parts, and utilizes economical uncoated glass plates as beam splitters. The system compensates for potential measurement errors induced by misalignment of the input beam angle to the polarization state detector via a paired arrangement of the beam splitters. To provide improved accuracy in the analysis of data acquired by the system, methods herein actively compensate for the relatively large bandwidth of a preferable light emitting diode source.

Abstract: A system and method of use thereof that enables determining and setting sample alignment based on the location of, and geometric attributes of a monitored image formed by reflection of an electromagnetic beam from a sample and into an image monitor, which beam is directed to be incident onto the sample along a locus which is substantially normal to the surface of the sample.

Abstract: An improved system and method for investigation of a wobbling surface of a sample with an electromagnetic beam, involving application of a beam directing dual reflection surface “prism” system, which, while effecting beam locus direction rotation of 90 degrees also preserves beam polarization state. The system allows causing an electromagnetic beam to access an otherwise difficult to access sample in, for instance, a vacuum deposition chamber, and enables achieving very closely spaced incident and spherical mirror reflected points of beam reflection from a sample surface in use.

Abstract: A system, method of configuring, and application a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.

Abstract: Mapping ellipsometer and polarimeter systems which comprise polarization state change compensating beam directing means.

Abstract: A system for and method of mapping process samples which are present in an environmental control chamber at a plurality of “X”-“Y” locations on the surface thereof, wherein the system includes a shield between windows for entering and exiting a beam of electromagnetic radiation, and a process sample.

Abstract: A method of applying spectroscopic ellipsometry to arrive at accurate values of optical and physical properties for thin films on samples having rough or textured surfaces.

Abstract: A system and method for improving data provided by ellipsometer, polarimeter and the like systems involving diminishing the effects of undesirable noise in the intensity of a beam of electromagnetic radiation caused by, for instance, random variations in intensity of a source provided beam of electromagnetic radiation and/or periodic or non-periodic variations in beam intensity resulting from wobble/wander of a moving sample, during investigation of the sample by the beam of electromagnetic radiation.

Abstract: A system and method of use thereof that enables determining and setting sample alignment based on the location of, and geometric attributes of a monitored image formed by reflection of an electromagnetic beam from a sample and into an image monitor, which beam is directed to be incident onto the sample along a locus which is substantially normal to the surface of the sample.

Abstract: A spectroscopic system for adjusting spacing between an adjacent source/detector as a unit, and a sample, and a reflecting means for directing an incident beam which reflects from said sample back onto said sample and then into the detector along a locus which is in a plane of incidence that is offset from that of the incident beam, or directly from the reflecting means into the detector, including means for reducing reflections of a beam of electromagnetic from the back of a sample, including methodology of use.

Abstract: A system and method of use thereof that enables determining and setting sample alignment based on the location of, and geometric attributes of a monitored image formed by reflection of an electromagnetic beam from a sample and into an image monitor, which beam is directed to be incident onto the sample along a locus which is substantially normal to the surface of the sample.

Abstract: Systems which utilize electromagnetic radiation to investigate samples and include at least one spatial filter which has an aperture having an opening therethrough of an arbitrary shape, including methodology for fabracting the aperture on an end of an optical fiber per se.

Abstract: A system, method of configuring, and application a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.

Abstract: A method of configuring a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder system for use in wide spectral range (for example, 190-1700 nm) rotating compensator spectroscopic ellipsometer and/or polarimeter systems.

Abstract: A system and method of substantially achromatically controlling the intensity of a spectroscopic beam with application in spectrophotometers, reflectometers, ellipsometers, polarimeters or the like systems.

Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.

Abstract: A substantially self-contained “on-board” material system investigation system for effecting relative translational and rotational motion between a source and detector of electromagnetic radiation and a sample, which system is functionally mounted on a three dimensional locational system to enable positioning at desired locations on, and distances from, the surface of a sample, including the capability to easily and conveniently effect rotation and/or to change the angle-of-incidence of a beam of electromagnetic radiation onto a sample surface and/or to provide gas flow confined in a mini-chamber near the surface of a sample, at a location at which a beam having UV, VUV, IR and/or NIR wavelengths of electromagnetic radiation is caused to be impinged thereupon.

Abstract: A method of monitoring, in real time, the depth to which a process sample is etched by an etching procedure involving investigating a sample substrate that has a patterned surface which, when electromagnetic radiation in an appropriate wavelength range is caused to reflect from, demonstrates lateral interference effects, such that when a frequency transform is applied to spectroscopic reflection data, three distinguishable peaks occur, at least for some range of pattern depth in the sample surface.