Abstract: Disclosed is the application of spatial filter(s) in rotating compensator ellipsometer systems prior to or after a sample system. The purpose is, for instance, to eliminate a radially outer annulus of a generally arbitrary Profile beam that presents with low intensity level irregular content, so that electromagnetic beam intensity is caused to quickly decay to zero as a function of radius.

Abstract: A Spectroscopic Rotating Compensator Material System Investigation System including a Dual Waveplate Pseudo-Achromatic Compensator System, and a Photo-Array for simultaneously detecting a Multiplicity of Wavelengths, is disclosed. The Spectroscopic Rotating Compensator Material System Investigation System is calibrated by a Mathematical Regression based technique involving, where desirable, Parameterization of Calibration Parameters. Calibration is possible utilizing various dimensional Data Set(s) obtained with the Spectroscopic Rotating Compensator Material System Investigation System in a “Material System present” or in a Straight-through” configuration, said data sets being variously normalized to D.C., A.C. or combination D.C. and A.C. components thereof.

Abstract: Disclosed is the application of spatial filter(s) in ellipsometer and the like systems prior to a sample system. The purpose is to eliminate a radially outer annulus of a generally arbitrary intensity profile, so that electromagnetic beam intensity is caused to quickly decay to zero, rather than, for instance, demonstrate an irregular profile as a function of radius.

Abstract: Disclosed are systems for, and methods of controlling radial energy density profiles in, and/or cross-section dimensioning of electromagnetic beams in polarimeters, ellipsometers, reflectometers and spectrophotometers.

Abstract: Disclosed is a source of polychromatic electromagnetic radiation which, utilizing a beam combiner system, combines beams of polychromatic electromagnetic radiation from a plurality of sources to provide a relatively broad and flattened intensity characteristic vs. wavelength output spectrum, and its application in material system investigation systems, such as ellipsometers, spectrophotometers and polarimeters which comprise a polychromatic source of electromagnetic radiation.

Abstract: Disclosed is a triangular shaped retarder system, for entering retardation between orthogonal components of an electromagnetic beam of radiation. The triangular shaped element, as viewed in side elevation, has first and second sides which project to the left and right and downward from an upper point. A third side is oriented essentially horizontally and is continuous with, and present below, the first and second sides. During use in a spectroscopic ellipsometer/polarimeter system, an entered beam of electromagnetic radiation exits in a propagation direction which is essentially undeviated and undisplaced from the direction of its incidence, even when the retarder system is caused to rotate about the locus of the beam of electromagnetic radiation.

Abstract: Disclosed are retarder systems, for entering retardation between orthogonal components of an electromagnetic beam of radiation, having first and second Berek-type retarders which each present with first and second essentially parallel sides. The first and second Berek-type retarders are oriented, as viewed in side elevation, with first and second sides of one Berek-type retarder being oriented other than parallel to first and second sides of the other Berek-type retarder. During use in a spectroscopic ellipsometer/polarimeter system, a beam of electromagnetic radiation exits in a propagation direction which is essentially undeviated and undisplaced from the direction of an incident beam of electromagnetic radiation, even when the retarder system is caused to rotate about the locus of the beam of electromagnetic radiation. A system with similarly oriented third and fourth Berek-type retarders, sequentially placed after the first and second Berek-type retarders, is also disclosed.

Abstract: A retarder system, for entering retardation between orthogonal components of an electromagnetic beam of radiation, having first and second triangular shaped elements arranged so that the first triangular shaped element, as viewed in side elevation, presents with first and second sides which project to the left and right and downward from an upper point, with a third side which is oriented essentially horizontally and is continuous with, and present below the first and second sides; and so that the second triangular shaped element, as viewed in side elevation, presents with first and second sides which project to the left and right and upward from a lower point, with a third side which is oriented essentially horizontally and is continuous with, and present above the first and second sides.

Abstract: Disclosed is a compensator/retarder system which allows adjustment to eliminate introduction of significant deviation and/or displacement into the propagation direction of a beam of electromagnetic radiation caused to interact therewith, even when the present invention retarder system is caused to continuously rotate in a rotating compensator ellipsometer system. Also disclosed is a method of calibration of an ellipsometer/polarimeter system which includes a present invention compensator/retarder system.

Abstract: A retarder system and method of its use in ellipsometers and polarimeters are disclosed. The retarder system is a parallelogram shaped element which, as viewed in side elevation, has top and bottom sides which are parallel to one another. The retarder system also has right and left sides which are parallel to one another, with both the right and left sides being oriented at an angle to the top and bottom sides. The retarder system is made of a material with an index of refraction greater than that of a surrounding ambient.

Abstract: Disclosed is a method for evaluating parameters in parameterized equations for independently calculating retardence entered to orthogonal components in a beam of electromagnetic radiation which is caused to pass through spatially separated input and output windows, by each of said input and output windows. The present invention finds application in ellipsometric investigation of sample systems present in vacuum chambers, wherein a beam of electromagnetic radiation is caused to pass through an input window, interact with a sample system, and exit through an output window, and where it is necessary to separate out the effects of said input and output windows to arrive at sample system characterizing results.

Abstract: Disclosed is an electromagnetic beam directing system and method which enables changing the direction of propagation of a beam of electromagnetic radiation without significantly changing the phase angle between orthogonal components therein. Two pairs of mirrors are oriented to form two orthogonally related planes such that phase shift entered to an electromagnetic beam by interaction with the first pair of mirrors is canceled by interaction with the second pair.

Abstract: A retarder system suitable for use in ellipsometers and polarimeters is configured from a first triangular shaped element with reflective outer surfaces, and a second triangular shaped element with reflective inner surfaces. In addition, a non-Brewster angle polarizer system suitable for use in ellipsometers and polarimeters is configured from two plates which are oriented other than parallel with respect to one another. A beam of electromagnetic radiation entered to the retarder system or polarizer system exits with a changed state of polarization, but with essentially no deviation or displacement in the direction of propagation, even when, in the case of the retarder system, it is caused to rotate about the locus of the beam of electromagnetic radiation.

Abstract: Disclosed are laterally compact ellipsometer, polarimeter, reflectometer and the like material system investigating systems, and methods for their use. Input and output optical elements effect changes in orientation, (propagation direction), of a beam of electromagnetic radiation caused to pass therethrough by an essentially total internal reflection therein. In addition, a propagation direction diverted beam of electromagnetic radiation can be simultaneously, optionally, caused to have a phase retardation entered between orthogonal polarization components thereof by at least one of the input and output optical elements. The present invention enables relatively simple investigation of a sample system with a polarized beam of electromagnetic radiation which impinges thereupon at a less than Brewster Angle, small "spot" size effecting angle-of-incidence, with respect to a normal to a surface of an investigated material system.

Abstract: Disclosed is a system and method for controlling polarization state determining parameters of a polarized beam of light in an ellipsometer or polarimeter and the like system, (eg. a modulation element ellipsometer system), so that they are in ranges wherein the sensitivity, (of a sample system characterizing PSI and DELTA value monitoring detector used to measure changes in said polarization state resulting from interaction with a "composite sample system," comprised of a sample system per se. and a beam polarization state determining variable retarder, to noise and measurement errors etc. therein), is reduced. The present invention allows determining sample system per se. characterizing PSI and DELTA values, from Composite Sample System characterizing PSI and DELTA values, by compensating for the presence of present invention components, (VR1) and/or VR2), added to an ellipsometer or polarimeter and the like system.

Abstract: Disclosed are optical elements for use in ellipsometer/polarimeter systems which do not introduce significant deviation and/or displacement into the propagation direction of a beam of electromagnetic radiation caused to interact therewith, even when said optical elements are caused to continuously rotate. Specifically disclosed is a Polarizer system with a high extinction ratio which can be used at infrared wavelengths, as well as a number of retarder systems with retardation vs. wavelength dispersion characteristics which are within a range of acceptability. In addition, certain disclosed optical elements demonstrate limited immunity to beam alignment changes.

Abstract: The use of ellipsometry and polarimetry in analysis of partially polarized beams of electromagnetic radiation, such as result from simultaneous ellipsometric investigation of a plurality of identifiably separate laterally disposed regions on a patterned sample system, is disclosed. Practice of the present invention methodology enables evaluation of characterizing representative parameters of partially polarized beams of electromagnetic radiation, and laterally and vertically oriented physical dimensions and/or optical property(s) of at least two identifiably separate laterally disposed regions of a partially depolarizing sample system.

Abstract: Disclosed is dual-polarizer based system, and method for continuously monitoring the "total film retardance" of a birefringent film, where "total film retardance" is defined as the product of the difference in the indicies of refraction in the two directions of refringence in said film, multiplied with film thickness. The preferred embodiment involves the application of Fourier analysis to signals which pass through the system and a birefringent film therein, to provide a spectrum, changes in which are indicative of changes in monitored "total film retardance". The present invention allows real time monitoring of birefringent films during manufacture thereof, and, hence, via a control system, control of film manufacturing process parameters to the end that produced films present with a relatively more consistent thickness than is the case where the present invention is not utilized.

Abstract: Disclosed is an electromagnetic beam directing system and method which enables changing the direction of propagation of a spectroscopic beam of electromagnetic radiation while maintaining significant sensitivity of both (PSI) and (DELTA) ellipsometric parameters to changes in surfaces of monitored sample systems, while minimizing sensitivity to changes in electromagnetic beam directing means orientation.

Abstract: A Spectroscopic Rotating Compensator Material System Investigation System including a Photo Array for simultaneously detecting a Multiplicity of Wavelengths is disclosed. The Spectroscopic Rotating Compensator Material System Investigation System is calibrated by a Mathematical Regression based technique involving, where desirable, Parameterization of Calibration Parameters. Calibration is possible utilizing a single two dimensional Data Set obtained with the Spectroscopic Rotating Compensator Material System Investigation System in a "Material System present" or in a Straight-through" configuration.