Patents by Inventor Borgert Kruizinga
Borgert Kruizinga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11009800Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.Type: GrantFiled: January 26, 2017Date of Patent: May 18, 2021Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Güneş Nakiboğlu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van De Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
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Publication number: 20200379360Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.Type: ApplicationFiled: January 26, 2017Publication date: December 3, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Han-Kwang Nienhuys, Gunes Nakiboglu, Rita Marguerite Albin Lambertine Petit, Hermen Folken Pen, Remco Yuri Van de Moesdijk, Frank Johannes Jacobus Van Boxtel, Borgert Kruizinga
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Patent number: 10580545Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.Type: GrantFiled: September 24, 2014Date of Patent: March 3, 2020Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Petrus Rutgerus Bartraij, Ramon Pascal Van Gorkom, Lucas Johannes Peter Ament, Pieter Willem Herman De Jager, Gosse Charles De Vries, Rilpho Ludovicus Donker, Wouter Joep Engelen, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Erik Roelof Loopstra, Han-Kwang Nienhuys, Andrey Alexandrovich Nikipelov, Michael Jozef Mathijs Renkens, Franciscus Johannes Joseph Janssen, Borgert Kruizinga
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Patent number: 10508951Abstract: A monolithic spectrometer (10) for spectrally resolving light (L), comprises a body (2) of solid material having optical surfaces (3,4,5,6a-6c,8) configured to guide the light (L) along an optical path (E1,E2,E3,E4) inside the body (2). The optical surfaces of the body (2) comprise a segmented focusing surface (6a,6b) comprising first and second continuously functional optical shapes (Ca,Cb) to focus received parts of respective beams (La,Lb) onto respective focal position (fa,fb) in an imaging plane (P) outside the body (2). The second continuously functional optical shape (Cb) is separated from the first continuously functional optical shape (Ca) by an optical discontinuity (Dab) there between.Type: GrantFiled: January 6, 2017Date of Patent: December 17, 2019Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: Borgert Kruizinga, Hedser van Brug, Frerik van Beijnum
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Publication number: 20190017869Abstract: A monolithic spectrometer (10) for spectrally resolving light (L), comprises a body (2) of solid material having optical surfaces (3,4,5,6a-6c,8) configured to guide the light (L) along an optical path (E1,E2,E3,E4) inside the body (2). The optical surfaces of the body (2) comprise a segmented focusing surface (6a,6b) comprising first and second continuously functional optical shapes (Ca,Cb) to focus received parts of respective beams (La,Lb) onto respective focal position (fa,fb) in an imaging plane (P) outside the body (2). The second continuously functional optical shape (Cb) is separated from the first continuously functional optical shape (Ca) by an optical discontinuity (Dab) there between.Type: ApplicationFiled: January 6, 2017Publication date: January 17, 2019Applicant: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNOInventors: Borgert KRUIZINGA, Hedser van BRUG, Frerik van BEIJNUM
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Publication number: 20180081278Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.Type: ApplicationFiled: October 20, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO
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Publication number: 20180031982Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.Type: ApplicationFiled: February 16, 2016Publication date: February 1, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Han-Kwang NIENHUYS, Erik Willem BOGAART, Rilpho Ludovicus Donker, Borgert KRUIZINGA, Erik Roelof LOOPSTRA, Hako BOTMA, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Johannes Jacobus Matheus BASELMANS
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Patent number: 9823572Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: GrantFiled: June 17, 2014Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Gosse Charles De Vries, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Rilpho Ludovicus Donker, Han-Kwang Nienhuys, Borgert Kruizinga, Wouter Joep Engelen, Otger Jan Luiten, Johannes Antonius Gerardus Akkermans, Leonardus Adrianus Gerardus Grimminck, Vladimir Litvinenko
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Publication number: 20160225477Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.Type: ApplicationFiled: September 24, 2014Publication date: August 4, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich BANINE, Peturs Rutgerus BARTRAIJ, Ramon Pascal VAN GORKOM, Lucas Johannes Peter AMENT, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Rilpho Ludovicus DONKER, Wouter Joep ENGELEN, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Erik Roelof LOOPSTRA, Han-Kwang NIENHUYS, Andrey Alexandrovich NIKIPELOV, Michael Jozef Mathijs RENKENS, Franciscus Johannes Joseph JANSSEN, Borgert KRUIZINGA
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Patent number: 9383490Abstract: A light beam is applied to a front surface of an optical depolarizer. The depolarizer rotates the polarization of light received on different surface positions by different amounts, so that the average incoming polarization is scrambled. The depolarizer has a first and second body that transmit first and second polarization components of the beam with mutually different speeds of light. Each body has two wedge shaped parts of variable thickness, corresponding wedge shaped parts in the two bodies providing light paths of substantially position independent lengths, but with variable rotation of polarization. The wedge shape parts of the front body form a concave input surface for the incoming beam. This prevents cross-over of light between the different wedge shaped parts.Type: GrantFiled: December 10, 2012Date of Patent: July 5, 2016Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: Borgert Kruizinga, Huibert Visser, Michiel David Nijkerk
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Publication number: 20160147161Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: ApplicationFiled: June 17, 2014Publication date: May 26, 2016Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO
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Patent number: 9304300Abstract: An anamorphotic telescope has mutually different magnification along directions of minimum and maximum magnification in an image plane. A spectroscope with an elongated input slit directed along one of the directions of maximum and minimum magnification may be located in the image plane. The anamorphotic telescope has a first and second reflector lens with mutually different first and second radii of curvature in directions (y, x) that optically correspond to directions of minimum and maximum magnification. At least one of the first and second reflector lens has a variable radius of curvature in one direction (x), which varies as a function of position in the other direction (y), the variable radius of curvature decreasing in a direction of the angle from the view direction to the light directed by the first reflector lens to the second reflector lens.Type: GrantFiled: August 12, 2011Date of Patent: April 5, 2016Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNOInventors: Huibert Visser, Borgert Kruizinga, Michiel David Nijkerk
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Publication number: 20140320852Abstract: A light beam is applied to a front surface of an optical depolarizer. The depolarizer rotates the polarization of light received on different surface positions by different amounts, so that the average incoming polarization is scrambled. The depolarizer has a first and second body that transmit first and second polarization components of the beam with mutually different speeds of light. Each body has two wedge shaped parts of variable thickness, corresponding wedge shaped parts in the two bodies providing light paths of substantially position independent lengths, but with variable rotation of polarization. The wedge shape parts of the front body form a concave input surface for the incoming beam. This prevents cross-over of light between the different wedge shaped parts.Type: ApplicationFiled: December 10, 2012Publication date: October 30, 2014Inventors: Borgert Kruizinga, Huibert Visser, Michiel David Nijkerk
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Patent number: 8873024Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.Type: GrantFiled: March 8, 2010Date of Patent: October 28, 2014Assignee: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNOInventors: Jacobus Hubertus Theodoor Jamar, Herman Hendrikus Maalderink, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra
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Patent number: 8836916Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.Type: GrantFiled: March 8, 2010Date of Patent: September 16, 2014Assignees: Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO, DSM IP Assets B.V.Inventors: Jacobus Hubertus Theodoor Jamar, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra, Mark Herman Else Vaes
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Patent number: 8717535Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.Type: GrantFiled: December 22, 2008Date of Patent: May 6, 2014Assignee: ASML Netherlands B.V.Inventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen
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Patent number: 8629418Abstract: A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.Type: GrantFiled: November 2, 2006Date of Patent: January 14, 2014Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Haico Victor Kok, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Werner Weissbrodt, Manfred Helmut Gustav Wilhelm Johannes Schrenk, Torsten Harzendorf
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Patent number: 8559108Abstract: A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.Type: GrantFiled: December 19, 2008Date of Patent: October 15, 2013Assignee: ASML Netherlands B.V.Inventors: Borgert Kruizinga, Martijn Gerard Dominique Wehrens, Michiel David Nijkerk, Kornelis Frits Feenstra
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Patent number: 8237912Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.Type: GrantFiled: March 8, 2011Date of Patent: August 7, 2012Assignee: ASML Netherlands B.V.Inventors: Herman Boom, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
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Publication number: 20120063131Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising a planar support supporting a two-dimensional array of individually controllable wide-angle light-emitting diodes (LEDs); and a multilens projector array arranged relative to the array, and adapted to project a focused image of the LEDs onto a work area. The multilens projector array is arranged to project light from the LED array having a light emitting edge area image spot size which is smaller than or equal to a light emitting central area image spot size.Type: ApplicationFiled: March 8, 2010Publication date: March 15, 2012Inventors: Jacobus Hubertus Theodoor Jamar, Herman Hendrikus Maalderink, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra