Patents by Inventor Borgert Kruizinga
Borgert Kruizinga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120057143Abstract: The invention concerns an illumination system for use in a stereolithography apparatus, comprising: a planar support; a multilens projector array mechanically supported on the planar support over the array on a plano side, and having a work surface arranged to receive a resin applying device for applying a resin layer, the projector array comprising a stack of optical elements, including a plurality of lenslets adapted to project the LEDs onto the work surface, and a two-dimensional array of individually controllable light-emitting diodes (LEDs) arranged between the planar support and the multilens projector. According to an aspect, the planar support and the plano side are supported on contact zones arranged over substantially the entire plano side; the illumination system thus forming a rigid body.Type: ApplicationFiled: March 8, 2010Publication date: March 8, 2012Applicants: DSM IP ASSETS B.V., Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNOInventors: Jacobus Hubertus Theodoor Jamar, Andries Rijfers, Borgert Kruizinga, Jentske D. Kooistra, Mark Herman Else Vaes
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Publication number: 20110194096Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.Type: ApplicationFiled: March 8, 2011Publication date: August 11, 2011Applicant: ASML Netherlands B.V.Inventors: Herman BOOM, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
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Patent number: 7969549Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.Type: GrantFiled: June 30, 2006Date of Patent: June 28, 2011Assignee: ASML Netherlands B.V.Inventors: Herman Boom, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
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Publication number: 20100284064Abstract: A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees.Type: ApplicationFiled: December 19, 2008Publication date: November 11, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Borgert Kruizinga, Martijn Gerard Dominique Wehrens, Michiel David Nijkerk, Kornelis Frits Feenstra
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Publication number: 20090244506Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.Type: ApplicationFiled: December 22, 2008Publication date: October 1, 2009Applicant: ASML Netherlands B.VInventors: Huibert Visser, Martinus Hendricus Hendricus Hoeks, Borgert Kruizinga, Bob Streefkerk, Patricius Aloysius Jacobus Tinnemans, Erwin John Van Zwet, Roeland Nicolaas Maria Vanneer, Marcus Gerhardus Hendrikus Meijerink, Nicolaas Cornelis Johannes Van Der Valk, Har Van Himbergen
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Patent number: 7453078Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.Type: GrantFiled: September 7, 2007Date of Patent: November 18, 2008Assignee: ASML Netherlands B.V.Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
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Publication number: 20080007844Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.Type: ApplicationFiled: September 7, 2007Publication date: January 10, 2008Applicant: ASML Netherlands B.V.Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
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Publication number: 20080002168Abstract: A lens element, for use in a projection system, includes a concave side. The lens element further includes a membrane and a nozzle, the membrane at least covering the concave side of the lens element. The nozzle is arranged for supplying and/or removing a liquid and/or a gas in between the concave side and the membrane.Type: ApplicationFiled: June 30, 2006Publication date: January 3, 2008Applicant: ASML Netherlands B.V.Inventors: Herman Boom, Borgert Kruizinga, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Huibert Visser, Peter Julian Pollard
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Patent number: 7282701Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.Type: GrantFiled: February 28, 2005Date of Patent: October 16, 2007Assignee: ASML Netherlands B.V.Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
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Publication number: 20070108377Abstract: A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.Type: ApplicationFiled: November 2, 2006Publication date: May 17, 2007Applicant: ASML Netherlands B.V.Inventors: Haico Kok, Marcus Van De Kerkhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Antonius Haast, Peter Weissbrodt, Manfred Helmut Gustav Schrenk, Torsten Harzendorf
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Publication number: 20060192093Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.Type: ApplicationFiled: February 28, 2005Publication date: August 31, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
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Patent number: 7023525Abstract: An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.Type: GrantFiled: July 6, 2004Date of Patent: April 4, 2006Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser
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Publication number: 20040239909Abstract: An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.Type: ApplicationFiled: July 6, 2004Publication date: December 2, 2004Applicant: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser
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Patent number: 6778257Abstract: An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.Type: GrantFiled: July 23, 2002Date of Patent: August 17, 2004Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser
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Publication number: 20030030781Abstract: An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.Type: ApplicationFiled: July 23, 2002Publication date: February 13, 2003Applicant: ASML NETHERLANDS B.V.Inventors: Arno Jan Bleeker, Pieter Willem Herman De Jager, Jason Douglas Hintersteiner, Borgert Kruizinga, Matthew Eugene McCarthy, Mark Oskotsky, Lev Ryzhikov, Lev Sakin, Stanislav Smirnov, Bart Snijders, Karel Diederick Van Der Mast, Huibert Visser
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Patent number: 6498351Abstract: In a lithographic projection apparatus, extreme ultraviolet radiation, e.g., of a wavelength of 13 nm, is generated by an undulator 10 in an electron storage ring. The radiation is collected by a first relay mirror 13, and an image of the source waist is formed at an intermediate plane. At the intermediate plane, a first scattering mirror 14 is provided to increase the divergence of the radiation beam in at least one plane. A second relay mirror 15 images the first scattering mirror onto the entrance pupil 18 of the projection system of the lithographic apparatus. A second scattering mirror 16 folds the projection beam onto the mask 17 and further increases the divergence of the radiation beam.Type: GrantFiled: March 9, 2000Date of Patent: December 24, 2002Assignee: ASML Netherlands B.V.Inventors: Borgert Kruizinga, Isabel Escudero Sanz