Abstract: An electrochromic device which includes a display electrode including a conductive layer disposed on a transparent substrate, a counter electrode disposed to face the display electrode, the counter electrode including a white reflective layer, an electrolyte interposed between the display electrode and the counter electrode, a first electrochromic material layer disposed on the display electrode and a second electrochromic material layer disposed on the counter electrode.

Abstract: Example embodiments provide an electrochromic device using polyphthalate as an electrochromic material and a process for preparing the same. The electrochromic device in accordance with example embodiments enables the production of a solid nanoscale electrochromic device having a bistability using polyphthalate as an electrochromic material, and easy formation of a red electrochromic layer which was not reported in a conventional art. Accordingly, the electrochromic device of example embodiments can be usefully employed for fabrication of RGB color electrochromic displays.

Abstract: A method of manufacturing a carbon nanotube field emission device whereby a catalyst layer is formed on a base structure, a solution containing a carbon nanotube powder is coated on the catalyst layer, and an electroless deposition solution is coated on the carbon nanotube coating layer. The method can provide a carbon nanotube field emission device having an improved field emission efficiency and increased lifetime.

Abstract: Disclosed herein is a method for forming a metal pattern with a low resistivity. The method comprises the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal can be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern can be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.

Abstract: Disclosed herein is a method for forming a highly conductive metal pattern which comprises forming a metal pattern on a substrate by the use of a photocatalyst and a selective electroless or electroplating process, and transferring the metal pattern to a flexible plastic substrate. According to the method, a highly conductive metal pattern can be effectively formed on a flexible plastic substrate within a short time, compared to conventional formation methods. Further disclosed is an EMI filter comprising a metal pattern formed by the method. The EMI filter not only exhibits high performances, but also is advantageous in terms of low manufacturing costs and simple manufacturing process. Accordingly, the EMI filter can be applied to a variety of flat panel display devices, including PDPs and organic ELs.

Abstract: A method for forming a metal pattern with a low resistivity. The method may include the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal may be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern may be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.

Abstract: Disclosed are an electrochromic device and a method for fabricating the same. The electrochromic device comprises a transparent electrode, on which an electrochromic layer is formed, a counter electrode on which a reflective layer is formed, and an electrolyte layer interposed between the transparent electrode and the counter electrode. Since the electrolyte layer is formed in only an active region of unit pixels, neither crosstalk nor image diffusion occurs and only the selected region of unit pixels is operated. Thus, the electrochromic device can realize passive matrix displays capable of representing a desired color. Furthermore, the electrochromic device can be utilized in a variety of applications including flexible displays and electrical papers.

Abstract: An electrochromic device which includes a display electrode including a conductive layer disposed on a transparent substrate, a counter electrode disposed to face the display electrode, the counter electrode including a white reflective layer, an electrolyte interposed between the display electrode and the counter electrode, a first electrochromic material layer disposed on the display electrode and a second electrochromic material layer disposed on the counter electrode.

Abstract: A system for preparing nanoparticles using non-thermal pulsed plasma is provided. The system comprises a reaction chamber having two divided regions, i.e. a first region where nanoparticles are to be formed and a second region where the nanoparticles are to be received, to prevent the formation of a thin film of nanoparticles in the second region. The use of the system enables the preparation of nanoparticles with improved uniformity and high collection efficiency. In addition, collection and deposition of nanoparticles can be simultaneously performed in the second region. Therefore, the system can find applications in various fields, including devices, secondary cells and sensors. Further provided is a method for preparing nanoparticles using the system.

Abstract: Disclosed herein is an electrochromic device having the functionality of a secondary battery. The electrochromic device includes a plurality of secondary battery/display segments in which a double metal oxide layer comprising mesoporous metal oxide particles and macroporous metal oxide particles is disposed on a transparent electrode, and a cathode active material for a lithium secondary battery is disposed on a counter electrode to enable oxidation and reduction of lithium. Methods of manufacturing the electrochromic device are disclosed as well.

Abstract: Disclosed herein is an electrochromic display device comprising a pair of transparent substrates facing each other, an anode electrode and a cathode electrode respectively formed on the transparent substrates, an electrolytic layer disposed between the anode electrode and the cathode electrode, an electrochromophore layer of a nano structure formed on at least one of the anode electrode and the cathode electrode, and a redox promoter layer coated with a conductive compound, on the other electrode.

Abstract: Provided is a method of fabricating a wire grid polarizer. The method includes: forming a photocatalytic layer on a first substrate; forming a patterned resin layer having a plurality of parallel grooves; forming a wire grid by filling the grooves with a metal; and transferring the wire grid and the resin layer to a second substrate.

Abstract: Disclosed herein is an improved method for forming a metal pattern with low contact resistance. The metal pattern may be applied to various flat panel display devices with high resolution. Further disclosed is a flat panel display using a metal pattern formed by the method.

Abstract: A novel black matrix, a method for preparing the same, and a flat display device and an electromagnetic interference filter to which the black matrix is applied. The black matrix is prepared by exposing a photoactive compound to form a latent pattern of nuclei for crystal growth and treating the latent pattern of nuclei for crystal growth with a metal salt solution to give a metal particle-deposited pattern; forming an electroless Ni-plated layer on the metal particle-deposited pattern; and forming an electroless Cu-plated layer on the electroless Ni-plated layer. Exhibiting improved black tone, which is achieved only by a selective multilayer plating process, without using expensive vacuum sputtering apparatus or a photolithographic process, the black matrix can be applied to various flat display devices. In addition, due to improved electric conductivity, the black matrix can be used in an electromagnetic interference filter, without employing an additional front surface blackening process.

Abstract: A method of fabricating a thin film transistor (TFT) substrate includes forming a gate line and a data line on an insulating substrate. The data line crosses the gate line and is insulated from the gate line. The formation of the gate line, the data line, or both the gate line and the data line includes forming a low-resistive conductive pattern on a base pattern using an electroless plating method.

Abstract: A black matrix, a method for preparing the black matrix, a flat panel display and an electromagnetic interference filter using the black matrix. The black matrix may comprise a substrate, a titanium oxide layer, a Ni plating layer, and a Ni/Pd alloy layer. The method may comprise the steps of forming a titanium oxide layer, forming a metal particle-deposited pattern on the titanium oxide layer, forming a Ni electroless plating layer on the metal particle-deposited pattern, and forming a Ni/Pd alloy layer on the Ni electroless plating layer. Since the black matrix may have a high blackening density via simple selective multilayer plating without using a high-price vacuum sputtering apparatus and undergoing photolithography, unlike conventional chromium-based black matrices, it may be employed in various flat panel displays. In addition, since the black matrix may exhibit superior electrical conductivity, it may be used in electromagnetic interference filters without additional front-surface blackening.

Abstract: A flexible electrochromic device including a flexible transparent electrode including a predetermined pattern, an insulating layer formed on a portion of the transparent electrode other than the predetermined pattern, a semiconductor layer formed on the predetermined pattern, an electrochromic monolayer formed on the semiconductor layer, a flexible counter electrode disposed to face the transparent electrode and an electrolyte provided in a space between the transparent electrode and the counter electrode.

Abstract: Disclosed herein is a transparent electrode featuring the interposition of a nano-metal layer between a grid electrode on a transparent substrate and an electroconductive polymer layer, and a preparation method thereof. The transparent electrode can be produced in a continuous process at high productivity and low cost and can be applied to various display devices.

Abstract: A counter electrode for a photovoltaic cell and a photovoltaic cell including the same include a transparent substrate and a catalyst layer formed on the transparent substrate using a supported catalyst The counter electrode of the present invention has an economical preparation cost and process, and also has an enlarged contact area with an electrolyte layer of the cell, leading to improved catalytic activity. Thus, in the case where the counter electrode is applied to the photovoltaic cell, excellent photoconversion efficiency is exhibited. In an exemplary embodiment, the photovoltaic cell is a dye-sensitized photovoltaic cell including such a counter electrode.

Abstract: A method for manufacturing a high-transmittance optical filter for image display devices, which may include the steps of coating a photocatalytic compound on a transparent substrate to form a photocatalytic film, selectively exposing the photocatalytic film to light and growing a metal crystal thereon by plating to form a metal pattern, and selectively etching and removing the photocatalytic compound remaining on the transparent substrate using a buffered oxide etchant (BOE). According to the method, a high-transmittance, high-resolution and low-resistivity optical filter can be manufactured in a simple manner at low costs.