Patents by Inventor Chang Ho Noh

Chang Ho Noh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060180193
    Abstract: A photoacceptive layer having a core-shell structure and a solar cell using the same are provided. More specifically, a photoacceptive layer including a metal oxide of a core-shell structure which can improve photoconversion efficiency by improving a electron migration path, and a solar cell using the same are provided.
    Type: Application
    Filed: January 24, 2006
    Publication date: August 17, 2006
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sang-cheol Park, Jung-gyu Nam, Ki-yong Song, Chang-ho Noh
  • Patent number: 7067237
    Abstract: Disclosed herein are a method for forming a pattern of a one-dimensional nanostructure, and a pattern of a one-dimensional nanostructure formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth, (ii) growing metal crystals by plating the latent pattern to form a metal pattern, and (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.
    Type: Grant
    Filed: June 28, 2004
    Date of Patent: June 27, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin Young Kim, Chang Ho Noh, Euk Che Hwang
  • Patent number: 6395450
    Abstract: A positive working photoresist composition includes at least one thermally cross-linkable photoacid generator, a binder polymer, and a solvent in which the binder polymer and photoacid generator are dissolved. The photoacid generator is represented by the general formula (I): wherein X is methanesulfonate, trifluoromethanesulfonate, 4-toluenesulfonate, 10-camphorsulfonate, cyclohexane sulfamate, perfluoro-1-butanesulfonate, perfluorooctanesulfonate, F, Cl, Br, SbF6, BF4, PF4, or AsF6, R1 is hydrogen or methyl, and R2 is alkyl of C1-10 or vinyloxyethyl. The binder polymer represented by the general formula (II): wherein R1 and R2 are different from each other and are selected from the group consisting of acid labile groups, hydrogen, methoxy, ethoxy, n-butoxy and t-butoxy, R3 is hydrogen or alkyl of C1-10, R4 is hydrogen or methyl, 0<o≦1, 0≦p≦0.7, 0≦q≦0.7, and 0≦r≦0.3, wherein p, q and r are not 0 simultaneously.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: May 28, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-Geun Park, Chang-Ho Noh, Bong-Seok Moon, Sang-Kyun Lee, Seong-Yun Moon
  • Publication number: 20020015906
    Abstract: A polymer for a photoresist composition is given by the formula (I): 1
    Type: Application
    Filed: March 19, 2001
    Publication date: February 7, 2002
    Inventors: Sang Kyun Lee, Bong Seok Moon, Chang Ho Noh