Patents by Inventor Chantal Louis

Chantal Louis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170022322
    Abstract: A copolymer essentially consisting of: from 50 to 99 mole % of at least one recurring unit (R1), based on the total mole amount of the recurring units (R1) and (R2), wherein the recurring unit (R1) is derived from incorporation of 4,4?-terphenyl-p-diol and a dihaloaryl sulfone compound and from 1 to 50 mole % of at least one recurring unit (R2), based on the total mole amount of the recurring units (R1) and (R2), wherein the recurring unit (R2) is derived from incorporation of 4,4?-terphenyl-p-diol and a dihaloaryl ketone compound.
    Type: Application
    Filed: January 21, 2015
    Publication date: January 26, 2017
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Chantal LOUIS, Mohammad Jamal EL-HIBRI, David B. THOMAS
  • Publication number: 20160289179
    Abstract: A process for the preparation of dihalodiphenylsulfones such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, at least one fluorinated anhydride and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.
    Type: Application
    Filed: June 16, 2016
    Publication date: October 6, 2016
    Applicant: SOLVAY SPECIALITY POLYMERS USA, LLC
    Inventor: Chantal LOUIS
  • Patent number: 9394248
    Abstract: A process for the preparation of dihalodiphenylsulfones_such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, at least one fluorinated anhydride and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: July 19, 2016
    Assignee: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventor: Chantal Louis
  • Patent number: 9388128
    Abstract: A process for the preparation of dihalodiphenylsulfones such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, sulfur trioxide and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: July 12, 2016
    Assignee: SOLVAY SPECIALITY POLYMERS USA, LLC
    Inventor: Chantal Louis
  • Publication number: 20160168332
    Abstract: A chemical processing article comprising at least one part made of a poly(arylether sulfone) polymeric material comprising at least one poly(arylether sulfone) polymer, wherein said (t-PAES) polymer comprising more than 50% moles of recurring units (Rt) of formula (St): -E-Ar1—SO2—[Ar2-(T-Ar3)n-SO2]m—Ar4 wherein n and m, equal to or different from each other, are independently zero or an integer of 1 to 5, each of Ar1, Ar2, Ar3 and Ar4 equal to or different from each other and at each occurrence, is an aromatic moiety, T is a bond or a divalent group and E is of formula (Et) wherein each of R?, equal to or different from each other, is selected from the group consisting of halogen, alkyl, alkenyl, alkynyl, aryl, ether, thioether, carboxylic acid, ester, amide, imide, alkali or alkaline earth metal sulfonate, alkyl sulfonate, alkali or alkaline earth metal phosphonate, alkyl phosphonate, amine and quaternary ammonium; j? is zero or is an integer from 1 to 4.
    Type: Application
    Filed: July 16, 2014
    Publication date: June 16, 2016
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: David B. THOMAS, Chantal LOUIS, Mohammad Jamal EL-HIBRI
  • Publication number: 20160159986
    Abstract: An oil and gas recovery article comprising at least one part made of a poly(arylether sulfone) polymeric material comprising at least one poly(arylether sulfone) polymer, wherein said (t-PAES) polymer comprising more than 50% moles of recurring units (Rt) of formula (St): -E-Ar1—SO2—[Ar2-(T-Ar3)n—SO2]m—Ar4 wherein n and m, equal to or different from each other, are independently zero or an integer of 1 to 5, each of Ar1, Ar2, Ar3 and Ar4 equal to or different from each other and at each occurrence, is an aromatic moiety, T is a bond or a divalent group and E is of formula (Et), wherein each of R?, equal to or different from each other, is selected from the group consisting of halogen, alkyl, alkenyl, alkynyl, aryl, ether, thioether, carboxylic acid, ester, amide, imide, alkali or alkaline earth metal sulfonate, alkyl sulfonate, alkali or alkaline earth metal phosphonate, alkyl phosphonate, amine and quaternary ammonium; j? is zero or is an integer from 1 to 4.
    Type: Application
    Filed: July 16, 2014
    Publication date: June 9, 2016
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: David B. THOMAS, Chantal LOUIS, Mohammad Jamal EL-HIBRI
  • Publication number: 20160145385
    Abstract: A method for the preparation of a poly(ether ether ketone) (PEEK) includes: preparing the PEEK by aromatic nucleophilic substitution in the presence of: a) particulate sodium carbonate (Na2CO3), wherein said particulate sodium carbonate has a particle size distribution as follows: D90?45 ?m and D90?250 ?m and D99.5?710 ?m, wherein said particle size distribution is measured by mechanical sieving in accordance with ASTM E 359-00 (reapproved 2005), wherein said measurement is based on the mechanical separation of various fractions on a series of superimposed sieves which are superimposed by descending order of opening mesh of 1000 ?m, 500 ?m, 250 ?m, 180 ?m, 125 ?m, 90 ?m, 63 ?m, and 45 ?m; and b) potassium carbonate (K2CO3) in an amount ranging from 0.001 to about 0.05 mol K/mol Na.
    Type: Application
    Filed: September 22, 2015
    Publication date: May 26, 2016
    Applicant: Solvay Advanced Polymers, L.L.C.
    Inventor: Chantal Louis
  • Publication number: 20160145386
    Abstract: The present invention describes a process for preparing a poly(aryl ether ketone) by reacting a nucleophile with 4,4?-difluorobenzophenone (4,4?-DFBP) that is improved through the use of 4,4?-DFBP that meets one or more particular purity conditions. Also described are improved poly(aryl ether ketone) produced using the invention 4,4?-DFBP. Amounts of 2,4?-difluorobenzophenone (2,4?-DFBP), 4-monofluorobenzophenone (4-FBP), chlorine, and monochloromonofluorobenzophenone in 4,4?-DFBP are discussed.
    Type: Application
    Filed: September 22, 2015
    Publication date: May 26, 2016
    Applicant: Solvay Advanced Polymers, L.L.C.
    Inventor: Chantal Louis
  • Publication number: 20160090450
    Abstract: A poly(arylether sulfone) polymer [(t-PAES) polymer, herein after], wherein more than 70% moles of the recurring units are recurring units (Rt) of formula (St): -E-Ar1—S02-[Ar2-(T-Ar3)n—SO2]m-Ar4— (formula St) wherein: n and m, equal to or different from each other, are independently zero or an integer of 1 to 5, each of Ar1, Ar2, Ar3 and Ar4 equal to or different from each other and at each occurrence, is an aromatic moiety, T is a bond or a divalent group optionally comprising one or more than one heteroatom; —E is of formula (Et), wherein each of R?, equal to or different from each other, is selected from the group consisting of halogen, alkyl, alkenyl, alkynyl, aryl, ether, thioether, carboxylic acid, ester, amide, imide, alkali or alkaline earth metal sulfonate, alkyl sulfonate, alkali or alkaline earth metal phosphonate, alkyl phosphonate, amine and quaternary ammonium; j? is zero or is an integer from 1 to 4, and said (t-PAES) polymer having a number average molecular weight (Mn) ranging from 41 000 to
    Type: Application
    Filed: April 30, 2014
    Publication date: March 31, 2016
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Chantal LOUIS, Mohammad Jamal EL-HIBRI, David B. THOMAS, Hemantkumar PATEL
  • Publication number: 20160083523
    Abstract: A poly(arylether sulfone) polymeric material comprising polymer molecules wherein more than 50% moles of the recurring units of said polymer molecules are recurring units (Rt), equal to or different from each other, complying with formula (St): -E-Ar1—S02-[Ar2-(T-Ar3)n-S02]m-Ar4— (formula St) wherein: n and m, equal to or different from each other, are independently zero or an integer of 1 to 5, each of Ar1, Ar2, Ar3 and Ar4 equal to or different from each other and at each occurrence, is an aromatic moiety, T is a bond or a divalent group optionally comprising one or more than one heteroatom—E is of formula (Et): wherein each of R?, equal to or different from each other, is selected from the group consisting of halogen, alkyl, alkenyl, alkynyl, aryl, ether, thioether, carboxylic acid, ester, amide, imide, alkali or alkaline earth metal sulfonate, alkyl sulfonate, alkali or alkaline earth metal phosphonate, alkyl phosphonate, amine and quaternary ammonium; j? is zero or is an integer from 1 to 4; and wherein
    Type: Application
    Filed: April 30, 2014
    Publication date: March 24, 2016
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Chantal LOUIS, Mohammad Jamal EL-HIBRI, David B. THOMAS, Hemantkumar PATEL
  • Publication number: 20160075876
    Abstract: A composition [composition (C), herein after] comprising from 30 to 95% by weight of at least one poly(arylether sulfone) polymer, wherein said polymer comprising more than 50% moles of recurring units (Rt) of formula (St): -E-Ar1—SO2—[Ar2-(T-Ar3)n—SO2]m—Ar4-(formula S) wherein n and m, equal to or different from each other, are independently zero or an integer of 1 to 5, each of Ar1, Ar2, Ar3 and Ar4 equal to or different from each other and at each occurrence, is an aromatic moiety, T is a bond or a divalent group optionally comprising one or more than one heteroatom;and E is of formula (Et): herein each of R?, equal to or different from each other, is selected from the group consisting of halogen, alkyl, alkenyl, alkynyl, aryl, ether, thioether, carboxylic acid, ester, amide, imide, alkali or alkaline earth metal sulfonate, alkyl sulfonate, alkali or alkaline earth metal phosphonate, alkyl phosphonate, amine and quaternary ammonium; j? is zero or is an integer from 1 to 4, from to 50% wt.
    Type: Application
    Filed: April 30, 2014
    Publication date: March 17, 2016
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Mohammad Jamal EL-HIBRI, Chantal LOUIS, David B. THOMAS, Hemantkumar PATEL
  • Patent number: 9212111
    Abstract: A process for the manufacture of a haloaryl compound which comprises contacting a mixture of dihalodiarylsulfone isomers [mixture (M)] with sulfuric acid to provide a mixture of haloarylsulfonic acid isomers [mixture (M1)] and reacting mixture (M1) in the presence of water. The process is independent on the manufacturing process of mixture (M) and is advantageous in that the obtained haloaryl compound can be recycled to the first step of a dihalodiarylsulfone manufacturing process.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: December 15, 2015
    Assignee: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Walter Reichle, Olivier Vidberg, Nicholas Almeter, Chantal Louis
  • Publication number: 20150344418
    Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.
    Type: Application
    Filed: August 10, 2015
    Publication date: December 3, 2015
    Applicant: Solvay Advanced Polymers, LLC
    Inventors: Chantal Louis, William Gandy, Edward Ryan, Geoffrey Scott Underwood, Kong Yi
  • Patent number: 9175136
    Abstract: Sodium carbonate (Na2CO3) having a certain particle size distribution and its use in preparing poly(aryl ether ketone)s, especially PEEK. Poly(aryl ether ketone)s made using the described sodium carbonate. A method for providing a sodium carbonate having a certain particle size distribution, which is especially well suited for the preparation of poly(aryl ether ketone)s.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: November 3, 2015
    Assignee: Solvay Advanced Polymers, L.L.C.
    Inventor: Chantal Louis
  • Patent number: 9133111
    Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: September 15, 2015
    Assignee: Solvay Advanced Polymers, L.L.C.
    Inventors: Chantal Louis, William Gandy, Edward Ryan, Geoffrey Scott Underwood, Kong Yi
  • Publication number: 20150129487
    Abstract: A poly(arylethersulfone) polymer comprising recurring units derived from at least one aromatic dihalocompound comprising at least one —S(?O)2— group and at least one diol (D) comprising at least one cycloaliphatic moiety (M).
    Type: Application
    Filed: May 15, 2013
    Publication date: May 14, 2015
    Inventors: Atul Bhatnagar, Hong Chen, Chantal Louis, Narmandakh Taylor, Joel Pollino
  • Patent number: 8969504
    Abstract: Poly(aryletherketone)s comprising fluoride end groups having improved melt stability, lower gel content and lower color are provided.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: March 3, 2015
    Assignee: Solvay Specialty Polymers USA, L.L.C.
    Inventors: Chantal Louis, Satchit Srinivasan, William Gandy
  • Publication number: 20140323765
    Abstract: A process for the manufacture of a haloaryl compound which comprises contacting a mixture of dihalodiarylsulfone isomers [mixture (M)] with sulfuric acid to provide a mixture of haloarylsulfonic acid isomers [mixture (M1)] and reacting mixture (M1) in the presence of water. The process is independent on the manufacturing process of mixture (M) and is advantageous in that the obtained haloaryl compound can be recycled to the first step of a dihalodiarylsulfone manufacturing process.
    Type: Application
    Filed: December 11, 2012
    Publication date: October 30, 2014
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC.
    Inventors: Walter Reichle, Olivier Vidberg, Nicholas Almeter, Chantal Louis
  • Publication number: 20140228597
    Abstract: A process for the preparation of dihalodiphenylsulfones_such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, sulfur trioxide and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.
    Type: Application
    Filed: April 12, 2012
    Publication date: August 14, 2014
    Applicant: SOLVAY SPECIALITY POLYMERS USA, LLC
    Inventor: Chantal Louis
  • Publication number: 20140221595
    Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.
    Type: Application
    Filed: April 7, 2014
    Publication date: August 7, 2014
    Applicant: SOLVAY ADVANCED POLYMERS, LLC
    Inventors: Chantal Louis, William Gandy, Edward Ryan, Geoffrey Scott Underwood, Kong Yi