Abstract: The present invention is related to the field of semiconductor processing equipment and methods and provides, in particular, methods and equipment for the sustained, high-volume production of Group III-V compound semiconductor material suitable for fabrication of optic and electronic components, for use as substrates for epitaxial deposition, for wafers and so forth. In preferred embodiments, these methods and equipment are optimized for producing Group III-N (nitrogen) compound semiconductor wafers and specifically for producing GaN wafers. Specifically, the precursor is provided at a mass flow of at least 50 g Group III element/hour for a time of at least 48 hours to facilitate high volume manufacture of the semiconductor material. Advantageously, the mass flow of the gaseous Group III precursor is controlled to deliver the desired amount.

Abstract: The present invention is a container having a diptube inlet, at least one baffle disc positioned between the outlet of the diptube and the outlet of the container to provide a narrow annular space between the baffle disc and the sidewall of the container to prevent liquid droplets from entering the outlet to the container and the inner surface of the container sidewall and an annular, radially inward projecting deflector ledge on the sidewall, proximate the baffle disc. The present invention is also a process of delivering a chemical precursor from a container having the above structure. Liquid and vapor delivery are both contemplated.

Abstract: The present invention is a quartz bubbler container with cross purge capability. This cross purge allows the user to easily purge air and chemical from the valve inlet and outlet by simply flowing inert gas, and avoids the requirement for a more complicated vacuum purging apparatus. The design incorporates two small footprint 3-way valves mounted on the bubbler container inlet and outlet connectors. The 3rd port of each valve is piped together between the valves with a crosspurge line. The valves are corrosion resistant, leak free, maintenance free, non-leaching of impurities, and can accommodate an optional breakseal crusher that will perforate quartz break seals (on the inlet and outlet of ampoule). Liquid out containers of various materials of construction are also contemplated.

Abstract: The present invention is a bubbler having a diptube inlet ending in a bubble size reducing outlet and at least one baffle disc positioned between the outlet of the diptube and the outlet of the bubbler to provide a narrow annular space between the baffle disc and the wall of the bubbler to prevent liquid droplets from entering the outlet to the bubbler. The bubble size reducing outlet is an elongated cylindrical porous metal frit situated in a sump of approximately the same dimensions. A metal frit is placed at the inlet of the outlet of the bubbler. The present invention is also a process of delivering a chemical precursor from a bubbler vessel having the above structure.

Abstract: A vessel for conveying a precursor fluid from the vessel, comprising: an interior volume having an upper volume and a lower volume, wherein the two volumes are in communication and the lower volume contains precursor; a lid comprising a fluid inlet directing carrier gas into the vessel, a “T” fluid outlet, a sidewall having an upper lip wherein the upper lip contacts the lid; a separator interposed between the lid and the sidewall wherein the separator resides adjacent the upper lip and segments the interior volume into the upper volume and a lower volume; and an inlet plenum in communication with the fluid inlet having a plenum chamber opening towards the separator to direct the carrier gas through the separator and towards the precursor. A method for using the apparatus is also disclosed.

Abstract: The present invention is an apparatus and process for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, e) a second manifold for delivering the process chemical from the process container to a process tool; f) a solvent recovery container for containing used solvent and removed process chemical, and, g) a solvent evaporator to differentially remove solvent from process chemical in the solvent recovery container by entrainment in a carrier gas, vacuum removal, heating or combinations thereof. The containers can be baffled on their inert gas inlets. The cabinet can be heated.

Abstract: Vessel and method for the production and delivery of a precursor-containing fluid stream comprising the gaseous phase of a precursor material are disclosed herein. In one aspect, there is provided an vessel comprising: an interior volume wherein the interior volume is segmented into an upper volume and a lower volume wherein the upper volume and the lower volume are in fluid communication; a lid comprising a fluid inlet, a fluid outlet, an optional fill port, and an internal recess wherein at least a portion of the upper volume resides within the internal recess; a sidewall interposed between the lid and a base; and at least one protrusion that extends into the lower volume wherein the precursor is in contact with the at least one protrusion and wherein at least one protrusion extends from at least one selected from the lid, the sidewall, the base, and combinations thereof.

Abstract: A transportable container for high purity, high cost, liquid chemicals capable of maximizing dispensing of the liquid chemical content of the container at deviations from an upright position, comprising; a top wall, a side wall and a bottom wall, the bottom wall having an internal surface contacting liquid chemical with a concave upward contour having a lowest most point axially central to the container, an inlet, an outlet comprising a diptube through which the liquid chemical can be dispensed from said container with an outlet end adjacent the top surface and an inlet terminal end adjacent the lowest most point, a level sensor assembly having an output end adjacent the top surface and a terminal end adjacent the lowest most point; the diptube and the level sensor assembly being more proximate to one another at their terminal ends than their ends adjacent the top surface.

Abstract: A container having two ports; first block valve having two diaphragm valves, each valve having a valve seat side and a diaphragm side, each valve seat side faces the other valve seat side, and connected to the first end of a dispense conduit, one diaphragm side connected to a first port, and another diaphragm side connected to vent and or vacuum; a second valve connected to a push gas conduit and a second port.

Abstract: The present invention is an apparatus for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, and; e) a second manifold for delivering the process chemical from the process container to a process tool. A process for using the apparatus is also contemplated.

Abstract: A transportable container for high purity, high cost, liquid chemicals capable of maximizing dispensing of the liquid chemical content of the container at deviations from an upright position, comprising; a top wall, a side wall and a bottom wall, the bottom wall having an internal surface contacting liquid chemical with a concave upward contour having a lowest most point axially central to the container, an inlet, an outlet comprising a diptube through which the liquid chemical can be dispensed from said container with an outlet end adjacent the top surface and an inlet terminal end adjacent the lowest most point, a level sensor assembly having an output end adjacent the top surface and a terminal end adjacent the lowest most point; the diptube and the level sensor assembly being more proximate to one another at their terminal ends than their ends adjacent the top surface.

Abstract: A manifold comprising a container having two ports; a conduit connecting the container to a source/dispense of chemical having a first end and a second end and a connector for the ends; first block valve having two diaphragm valves, each valve having a valve seat side and a diaphragm side, each valve seat side faces the other valve seat side, and connected to the first end of the conduit, one diaphragm side connected to a first port, and another diaphragm side connected to vent; a second block valve having two diaphragm valves, having a valve seat side and a diaphragm side, wherein each valve seat side faces the other valve seat side, and each valve seat side connected to the second end of the conduit, the diaphragm side of one valve connected to purge, and the diaphragm side of another valve connected to push gas or chemical outlet.

Abstract: The present invention is an apparatus for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, and; e) a second manifold for delivering the process chemical from the process container to a process tool. A process for using the apparatus is also contemplated.

Abstract: A manifold for transfer of chemical, comprising; a heated first conduit for connecting a vessel for containing the chemical to a another vessel, a source of pressurized gas and a source of vacuum; a heated first block valve assembly having first and second diaphragm valves, each valve having a diaphragm and a valve seat side and a diaphragm side, wherein the valve seat side of each valve is juxtaposed to the valve seat side of the other valve, and each valve seat side of each valve communicating with the first conduit; a first connector in the first conduit for detaching the conduit from the vessel; a second conduit, for delivering chemical to the vessel, the second conduit connected to the diaphragm side of the first valve; and a third conduit, for communicating pressurized gas and vacuum to the first conduit, connected to the diaphragm side of the second valve.

Abstract: A high purity chemical storage and delivery system and process with secondary containment, comprising; a cabinet for containing a canister of high purity chemical, a manifold in the cabinet for fluid connection between the canister and the cabinet for controllably dispensing high purity chemical; a control unit for controlling the dispensing of high purity chemical from the canister and the cabinet for a downstream use, a closeable opening in the cabinet for allowing loading and unloading of the canister from the cabinet, at least one door for closing the opening, a liquid tight secondary containment door in the opening for closing off a portion of the opening such that the secondary containment door is sized so that the portion is sufficient to define a volume in conjunction with the cabinet to contain the entire high purity chemical liquid contents of the canister.

Abstract: A chemical delivery system for delivering chemicals having at least a high purity includes at least one first reservoir for containing a fluid and at least one second reservoir for containing the fluid. The system also includes a first conduit, a first fluid sensor, and a controller. The first conduit is for transferring the fluid over time from the at least one first reservoir to the at least one second reservoir. The first conduit is metallic and has a first end in communication with the at least one first reservoir and a second end in communication with the at least one second reservoir. The fluid being transferred from the at least one first reservoir to the at least one second reservoir flows through the first conduit from the first end to the second end. The first fluid sensor is adjacent the first conduit, and the first fluid sensor is adapted to detect a presence of the fluid and to detect an absence of the fluid in the first conduit.