Abstract: An etching composition includes phosphoric acid, a silane compound comprising at least one silicon (Si) atom, and an ammonium salt represented by Formula 1 below: wherein: L1 to L3 are independently substituted or unsubstituted hydrocarbylene, R1 to R4 are independently hydrogen, a substituted or unsubstituted hydrocarbyl group, and Xn? is an n-valent anion, where n is an integer of 1 to 3.

Abstract: The present invention relates to a double slit coating die, and an electrode active material coating apparatus comprising same, the double slit coating die comprising first to fourth blocks which are positioned sequentially adjacent to each other, and having a structure in which the positions of the first and second blocks can move in a direction tilted at an angle ? with respect to the interface between the second and third blocks. The present invention has the effects of preventing slip surfaces between blocks constituting the die from spreading apart, and reducing offset in a coating process.

Abstract: Disclosed is a slot die coater for coating an electrode active material slurry on an electrode current collector, which includes a lower die having a lower outlet, and an upper die disposed above the lower die and having an upper outlet, wherein an upper surface of the lower die and a lower surface of the upper die are at least partially in contact with each other and capable of sliding relative to one another such that the upper die and the lower die are capable of sliding relative to each other along a horizontal direction.

Abstract: An etching composition contains phosphoric acid, phosphoric anhydride, a compound represented by the following Formula 1, and a silane compound comprising at least one silicon (Si) atom, excluding the compound represented by Formula 1: wherein, in Formula 1, A is an n-valent radical, where n is an integer of 1 to 6, L is a direct bond or hydrocarbylene, Y is selected from NR1, O, PR2 and S, where R1 to R2 are independently hydrogen, halogen, a substituted unsubstituted hydrocarbyl group, or non-hydrocarbyl group, X and Z are independently selected from N, O, P and S, and Ra to Rc are independently an unshared electron pair, hydrogen, or a substituted or unsubstituted hydrocarbyl group.

Abstract: An etching composition contains phosphoric acid, phosphoric anhydride, a compound represented by the following Formula 1, and a silane compound comprising at least one silicon (Si) atom, excluding the compound represented by Formula 1: wherein, in Formula 1, A is an n-valent radical, where n is an integer of 1 to 6, L is a direct bond or hydrocarbylene, Y is selected from NR1, O, PR2 and S, where R1 to R2 are independently hydrogen, halogen, a substituted or unsubstituted hydrocarbyl group, or non-hydrocarbyl group, X and Z are independently selected from N, O, P and S, and Ra to Rc are independently an unshared electron pair, hydrogen, or a substituted or unsubstituted hydrocarbyl group.

Abstract: Side molded combination type line lights according to the present invention are configured to include: a fixed frame having a basic C-shaped cross sectional structure formed with a closing portion, opposite side walls, and an opening portion, wherein a protruding locking portion for guiding fixation of pieces is formed on each inner side of the opposite side walls, and a side mold coupling end is formed at each of the end portions of the opposite side walls; a diffusion plate coupled with the opening portion of the fixed frame; and a side mold formed in an L-shaped or T-shaped cross section, wherein an engaging portion to be coupled with the side mold coupling end is formed on one of the two types of side molds and coupled with each of the end portions of the opposite side walls of the fixed frame.

Abstract: The present invention relates to an electrode slurry coating apparatus comprising a lower die applying electrode slurry on a collector, an intermediate die, an upper die, a first discharge part primarily applying the electrode slurry on the collector to form a first coating layer; an intermediate pressing part pressing the first coating layer to adjust a thickness of the first coating layer; a second discharge part secondarily applying the electrode slurry on a surface of the first coating layer to form a second coating layer; and an upper pressing part pressing the first coating layer and the second coating layer, which are stacked, at the same time to adjust a thickness of each of the first coating layer and the second coating layer, wherein the first discharge part has a width less than that of the second discharge part.

Abstract: Disclosed is a method for manufacturing an electrode for a lithium secondary battery, including the steps of: (S1) dry mixing a conductive material and an electrode active material; (S2) dry mixing the resultant product of step (S1) with a binder to obtain electrode mixture powder; and (S3) applying the electrode mixture powder to at least one surface of a current collector. According to an embodiment of the present disclosure, electrode mixture powder is prepared without using a solvent and is applied to a current collector to provide an electrode. Thus, there is no need for a separate drying step. Therefore, the binder and conductive material coated on the surface of electrode active material cause no surface migration phenomenon. As a result, it is possible to prevent degradation of the adhesion of the electrode, and thus to prevent degradation of the performance of the lithium secondary battery.

Abstract: An etching composition is provided. The etching composition includes phosphoric acid, phosphoric anhydride, a silane compound represented by Formula 1 below and water: wherein R1 to R6 are independently hydrogen, halogen, a substituted or unsubstituted C1-C20 hydrocarbyl group, a C1-C20 alkoxy group, a carboxy group, a carbonyl group, a nitro group, a tri(C1-C20-alkyl)silyl group, a phosphoryl group, or a cyano group. L is a direct bond or C1 to C3 hydrocarbylene, and A is an n-valent radical, while n is an integer of 1 to 4.

Abstract: Disclosed is a computer-readable medium including a computer program including encoded commands. The computer program is configured to cause one or more processors to perform operations for optimizing a database application when the computer program is executed by the one or more processors of a computer system and the operations include: operation for receiving a query including a bind parameter from an application source; operation for obtaining information related to the bind parameter included in the received query; and operation for rewriting the received query by reflecting the obtained information related to the bind parameter within the received query as hint information.

Abstract: An etching composition providing a high selection ratio enabling selective removal of a nitride film and minimization of an etching rate, a preparation method thereof, an etching composition additive prepared through a reaction of phosphoric anhydride and a silane compound represented by Formula 1 below, a method for preparing the same and an etching composition including the same are provided:

Abstract: An etching composition includes phosphoric acid, a silane compound comprising at least one silicon (Si) atom, and an organic phosphate represented by Formula 1 below: wherein R1 to R3 are independently hydrogen, or a substituted or unsubstituted hydrocarbyl group, and at least one of R1 to R3 is a substituted or unsubstituted hydrocarbyl group.

Abstract: An etching composition includes phosphoric acid, a silane compound comprising at least one silicon (Si) atom, and an ammonium salt represented by Formula 1 below: wherein: L1 to L3 are independently substituted or unsubstituted hydrocarbylene, R1 to R4 are independently hydrogen, a substituted or unsubstituted hydrocarbyl group, and Xn? is an n-valent anion, where n is an integer of 1 to 3.

Abstract: An etching composition contains phosphoric acid, phosphoric anhydride, a compound represented by the following Formula 1, and a silane compound comprising at least one silicon (Si) atom, excluding the compound represented by Formula 1: wherein, in Formula 1, A is an n-valent radical, where n is an integer of 1 to 6, L is a direct bond or hydrocarbylene, Y is selected from NR1, O, PR2 and S, where R1 to R2 are independently hydrogen, halogen, a substituted or unsubstituted hydrocarbyl group, or non-hydrocarbyl group, X and Z are independently selected from N, O, P and S, and Ra to Rc are independently an unshared electron pair, hydrogen, or a substituted or unsubstituted hydrocarbyl group.

Abstract: An etchant composition includes a silane compound represented by the following Chemical Formula 1: wherein R1 to R6 are independently hydrogen, halogen, a substituted or unsubstituted C1-C20 hydrocarbyl group, a phenyl group, a C1-C20 alkoxy group, a carboxy group, a carbonyl group, a nitro group, a tri(C1-C20) alkylsilyl group, a phosphoryl group, or a cyano group, L is a direct bond or C1-C3 hydrocarbylene, A is an n-valent radical, and n is an integer of 1 to 4.

Abstract: An etchant composition includes a silane compound represented by the following Chemical Formula 1: wherein R1 to R6 are independently hydrogen, halogen, a substituted or unsubstituted C1-C20 hydrocarbyl group, a phenyl group, a C1-C20 alkoxy group, a carboxy group, a carbonyl group, a nitro group, a tri (C1-C20)alkylsilyl group, a phosphoryl group, or a cyano group, L is a direct bond or C1-C3 hydrocarbylene, A is an n-valent radical, and n is an integer of 1 to 4.

Abstract: The present disclosure relates to a silicon compound represented by Formula 1 below: wherein R1 to R6 are each independently selected from a hydrogen, a hydrocarbyl group and a non-hydrocarbyl group, L is a direct bond or hydrocarbylene, X is oxygen (O) or sulfur (S), Y and Z are each independently selected from NR7, O, and S, where R7 is a hydrogen, a hydrocarbyl group, or a non-hydrocarbyl group, and Y and Z are not simultaneously NR7, and A is an n-valent radical, where n is an integer of 1 to 6.

Abstract: A method of preparing graphene, including preparing graphite; and putting the graphite in the inside of a vessel and applying vibration at a frequency of 55 Hz to 65 Hz to the vessel.

Abstract: An etchant composition includes phosphoric acid and a silane compound represented by the following Chemical Formula 1: wherein A is an n-valent radical, L is C1-C5 hydrocarbylene, R1 to R3 are independently hydrogen, hydroxy, hydrocarbyl, or alkoxy, in which R1 to R3 exist respectively or are connected to each other by a heteroelement, and n is an integer of 2 to 5.

Abstract: The present invention relates to an apparatus and method for monitoring a dry state of an electrode substrate in which electrode slurry is applied to a collector. The monitoring method comprises emitting light onto a surface of the electrode substrate; receiving the light reflected by the surface of the electrode substrate; and analyzing a luminous intensity or spectrum of the received light to estimate a drying rate of the electrode substrate. The apparatus includes a light emitting part emitting light from a light source onto a surface of the electrode substrate; a light receiving part receiving the light reflected by the surface of the electrode substrate; and a computing device analyzing a luminous intensity or spectrum of the received light and comparing analyzed characteristics of the light with the reference data of the reflected light to the drying rate of the electrode substrate.