Patents by Inventor Chia Lun Chen

Chia Lun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7102637
    Abstract: A method of seamless processing for merging 3D color images is disclosed. By transferring the images to a different color space, it separates the brightness from the color information. The seams are smoothed according to the brightness, and the result is transferred back to the RGB color space. It keeps the colors of the images and does not destroy the original textures.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: September 5, 2006
    Assignee: Industrial Technology Research Institute
    Inventor: Chia-Lun Chen
  • Patent number: 7018928
    Abstract: A method for reducing the loss of silicon in a plasma assisted photoresist etching process including providing a silicon substrate including a polysilicon gate structure; masking a portion of the silicon substrate with photoresist to carry out an ion implantation process for forming source and drain regions; carrying out an ion implantation process; and, removing the photoresist according to at least one plasma assisted process wherein the at least one plasma assisted process comprises fluorine containing, oxygen, and hydrogen containing plasma source gases.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: March 28, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Li Te Hsu, Chia Lun Chen, Chiang Jen Peng, Pin Chia Su
  • Publication number: 20050054209
    Abstract: A method for reducing the loss of silicon in a plasma assisted photoresist etching process including providing a silicon substrate including a polysilicon gate structure; masking a portion of the silicon substrate with photoresist to carry out an ion implantation process for forming source and drain regions; carrying out an ion implantation process; and, removing the photoresist according to at least one plasma assisted process wherein the at least one plasma assisted process comprises fluorine containing, oxygen, and hydrogen containing plasma source gases.
    Type: Application
    Filed: September 4, 2003
    Publication date: March 10, 2005
    Inventors: Li Te Hsu, Chia Lun Chen, Chiang Jen Peng, Pin Chia Su
  • Publication number: 20040194806
    Abstract: A substrate drying system having an IPA concentration interlock detector for detecting the concentration of substrate-drying IPA vapor in a processing or cleaning tank of a Marongoni-type substrate drying system, for example, as substrates are dried in the cleaning tank after washing typically using deionized water. In the event that inadequate concentrations of the IPA vapor are delivered to the cleaning tank, the IPA concentration interlock detector transmits an alarm signal to the tool controller to alert facility personnel to the inadequate IPA concentrations in the cleaning tank and prevent the formation of water marks on the substrates.
    Type: Application
    Filed: April 2, 2003
    Publication date: October 7, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shin-Shing Yang, Liang-Yi Chou, Jenn-Wei Ju, Juan-Chin Cheng, Fu-Shiang Chen, Chun-Ying Chen, Li-Te Hsu, Chia-Lun Chen
  • Publication number: 20040125106
    Abstract: A method of seamless processing for merging 3D color images is disclosed. By transferring the images to a different color space, it separates the brightness from the color information. The seams are smoothed according to the brightness, and the result is transferred back to the RGB color space. It keeps the colors of the images and does not destroy the original textures.
    Type: Application
    Filed: April 28, 2003
    Publication date: July 1, 2004
    Inventor: Chia-Lun Chen