Abstract: A touch device includes a cover plate, a carrying structure, a first sensor layer, a dielectric layer and a second sensor layer. The carrying structure is disposed on the cover plate and includes a film layer and a buffer layer stacked on each other. The film is located between the cover plate and the buffer layer. The first sensor layer is at least disposed on the carrying structure. The first sensor layer and the cover plate are respectively located at two opposite sides of the carrying structure. The dielectric layer is disposed on the first sensor layer. The dielectric layer and the carrying structure are respectively located at two opposite sides of the first sensor layer. The second sensor layer is at least disposed on the dielectric layer. The second sensor layer and the first sensor layer are respectively located at two opposite sides of the dielectric layer.

Abstract: A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm.

Abstract: The disclosure provides a touch device, including a protection cover, a pressure-sensing layer and a flat touch-sensing electrode layer. The protection cover is used as an outer protection shield, and an upper surface of the protection cover is provided to users for pressing action. The pressure-sensing layer is disposed under the protection cover to detect touch strength. The flat touch-sensing electrode layer is disposed between the pressure-sensing layer and the protection cover to detect the position of the user's touch.

Abstract: A touch device includes a cover plate, a carrying structure, a first sensor layer, a dielectric layer and a second sensor layer. The carrying structure is disposed on the cover plate and includes a film layer and a buffer layer stacked on each other. The film is located between the cover plate and the buffer layer. The first sensor layer is at least disposed on the carrying structure. The first sensor layer and the cover plate are respectively located at two opposite sides of the carrying structure. The dielectric layer is disposed on the first sensor layer. The dielectric layer and the carrying structure are respectively located at two opposite sides of the first sensor layer. The second sensor layer is at least disposed on the dielectric layer. The second sensor layer and the first sensor layer are respectively located at two opposite sides of the dielectric layer.

Abstract: A touch device includes a cover plate, a carrying structure, a first sensor layer, a dielectric layer and a second sensor layer. The carrying structure is disposed on the cover plate and includes a film layer and a buffer layer stacked on each other. The film is located between the cover plate and the buffer layer. The first sensor layer is at least disposed on the carrying structure. The first sensor layer and the cover plate are respectively located at two opposite sides of the carrying structure. The dielectric layer is disposed on the first sensor layer. The dielectric layer and the carrying structure are respectively located at two opposite sides of the first sensor layer. The second sensor layer is at least disposed on the dielectric layer. The second sensor layer and the first sensor layer are respectively located at two opposite sides of the dielectric layer.

Abstract: The present invention discloses a capacitive touch panel, comprises a substantially transparent substrate and a transparent sensing pattern. The transparent sensing pattern, which detects touch signals, is formed on the substantially transparent substrate. The transparent sensing pattern comprises a plurality of conductor cells and at least one metal conductor disposed on the substantially transparent substrate. The at least one metal conductor connects two adjacent conductor cells. At least one low-reflection layer is formed on the at least one metal conductor. The low-reflection layer can reduce the reflected light therefore reducing the visibility of the metal conductors.

Abstract: The present invention discloses a touch panel and a method of manufacturing a touch panel, to reduce the visibility of the transparent etching line of the transparent electrodes on the touch panel. The touch panel comprises a plurality of transparent electrode disposed distantly on the transparent conductive layer and the passivation layer of a transparent substrate, where the passivation layer covering the transparent conductive layer, to make the refractive index of the passivation layer and the transparent electrodes match with each other. Oxide with high refractive index added in the passivation material is filled in the etched area of the transparent conductive layer, so that the optical refractive index of the etched area and ITO area on transparent conductive layer become closer, and the difference in refractive index curve between ITO area and etched area is reduced, therefore, the effect of making the transparent electrode pattern is achieved.

Abstract: A touch panel is disclosed. The touch panel includes a cover plate having a viewing region and a border region surrounding the viewing region. At least one bonding region is defined in the border region. A shielding layer is disposed on the cover plate corresponding to the border region. An adhesive pattern layer is disposed on the shielding layer and at least in the bonding region. A sensing electrode layer is disposed on the cover plate and extends from the viewing region to the shielding layer corresponding to the border region. A signal trace layer including a plurality of traces is disposed on the shielding layer corresponding to the border region. Each trace has one end electrically connected to the sensing electrode layer and another end assembled onto the adhesive pattern layer corresponding to the bonding region. A method for forming a touch panel is also disclosed.

Abstract: The present disclosure relates to a touch device, and more particularly to a pattern of a capacitive touch device and a manufacturing method thereof. The pattern of the capacitive touch device comprises of a substrate, two adjacent first axial electrodes, a first axial conductive wire, and a pair of metal jumpers. The first axial conductive wire is disposed between the two adjacent first axial electrodes for connecting the two adjacent first axial electrodes. The pair of metallic metal jumpers is disposed on the connecting points of the two first axial electrodes and the first axial conductive wire. Accordingly, resistance caused by the connecting points of the two adjacent first axial electrodes and the first axial conductive wire can be reduced such that response speed of the pattern of the capacitive touch control device is increased.

Abstract: The disclosure provides a touch device, including a protection cover, a pressure-sensing layer and a flat touch-sensing electrode layer. The protection cover is used as an outer protection shield, and an upper surface of the protection cover is provided to users for pressing action. The pressure-sensing layer is disposed under the protection cover to detect touch strength. The flat touch-sensing electrode layer is disposed between the pressure-sensing layer and the protection cover to detect the position of the user's touch.

Abstract: A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm.

Abstract: A touch device includes a cover plate, a carrying structure, a first sensor layer, a dielectric layer and a second sensor layer. The carrying structure is disposed on the cover plate and includes a film layer and a buffer layer stacked on each other. The film is located between the cover plate and the buffer layer. The first sensor layer is at least disposed on the carrying structure. The first sensor layer and the cover plate are respectively located at two opposite sides of the carrying structure. The dielectric layer is disposed on the first sensor layer. The dielectric layer and the carrying structure are respectively located at two opposite sides of the first sensor layer. The second sensor layer is at least disposed on the dielectric layer. The second sensor layer and the first sensor layer are respectively located at two opposite sides of the dielectric layer.

Abstract: A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm.

Abstract: The present disclosure provides a touch panel including a plate, a sensing layer, a border, and an optical compensation layer, wherein the plate has an upper surface and a lower surface opposite to the upper surface, wherein the lower surface is planned with a conducting wire region and a sensing region. The border is overlaid on the conducting wire region, and the sensing layer is disposed in the sensing region. An optical compensation layer is disposed on the border, and is located between the plate and the border. The border has a first color, which appears as a second color if a user sees the border through the optical compensation layer, and thus achieves diversification of the border color.

Abstract: A touch panel is formed by firstly forming a film layer on a first plate, and next, sequentially forming a buffer layer on the film layer, forming a sensing layer on the buffer layer, forming a second plate on the sensing layer. After the foregoing formation procedures, the first plate is removed from the film layer. Next, a cover is attached to the film layer. In this way, the film layer is located between the cover and the buffer layer. Finally, the second plate is removed from the sensing layer, so as to form a touch panel with the features of light weight, thin thickness and low costs.

Abstract: A touch panel is formed by firstly forming a film layer on a first plate, and next, sequentially forming a buffer layer on the film layer, forming a sensing layer on the buffer layer, forming a second plate on the sensing layer. After the foregoing formation procedures, the first substrate layer is removed from the film layer. Next, a cover is attached to the film layer. In this way, the film layer is located between the cover and the buffer layer. Finally, the second substrate layer is removed from the sensing layer, so as to form a touch panel with the features of light weight, thin thickness and low costs.

Abstract: A touch panel is formed by firstly forming a film layer on a first plate, and next, sequentially forming a buffer layer on the film layer, forming a sensing layer on the buffer layer, forming a second plate on the sensing layer. After the foregoing formation procedures, the first plate is removed from the film layer. Next, a cover is attached to the film layer. In this way, the film layer is located between the cover and the buffer layer. Finally, the second plate is removed from the sensing layer, so as to form a touch panel with the features of light weight, thin thickness and low costs.

Abstract: The present invention discloses a touch sensing structure for capacitive touch panel comprising a substrate, at least one first conductive line formed on the substrate, an insulating layer formed on the substrate and covering the first conductive line, the insulating layer having at least two adjacent holes therein formed above the two ends of the first conductive line respectively, at least two adjacent first conductive cells, at least two adjacent second conductive cells and at least one second conductive line formed on the insulating layer, the adjacent first conductive cells connected to two ends of the first conductive line correspondingly, the second conductive cells located on two sides of the first conductive line respectively, the second conductive line located on the insulating layer for interconnecting the adjacent second conductive cells, and the insulating layer makes the first conductive line electrically insulated from the second conductive line, thereby forming the touch sensing structure.

Abstract: A touch panel is formed by firstly forming a film layer on a first plate, and next, sequentially forming a buffer layer on the film layer, forming a sensing layer on the buffer layer, forming a second plate on the sensing layer. After the foregoing formation procedures, the first substrate layer is removed from the film layer. Next, a cover is attached to the film layer. In this way, the film layer is located between the cover and the buffer layer. Finally, the second substrate layer is removed from the sensing layer, so as to form a touch panel with the features of light weight, thin thickness and low costs.

Abstract: A touch panel is formed by firstly forming a film layer on a first plate, and next, sequentially forming a buffer layer on the film layer, forming a sensing layer on the buffer layer, forming a second plate on the sensing layer. After the foregoing formation procedures, the first plate is removed from the film layer. Next, a cover is attached to the film layer. In this way, the film layer is located between the cover and the buffer layer. Finally, the second plate is removed from the sensing layer, so as to form a touch panel with the features of light weight, thin thickness and low costs.