Abstract: This invention provides a ventilation cover structure which comprises a filter net and a ventilating cover. The filter net comprises network-structured holes. The ventilating cover comprises a first surface and a second surface. The second surface comprises positioning columns. The positioning columns of the ventilating cover and the network-structured holes of the filter net are engaged, so that the filter net is attached to the second surface of the ventilating cover.

Abstract: A cooling apparatus for a light valve of the present invention includes a control box disposed on the back of the light valve to actuate the light valve, followed by a heat pipe and a heat-conducting component pasted upon the inner surface of the control box. The heat-conducting component is connected to a heat-collecting end of the heat pipe and one of its surface contacts with the light valve. The heat of the light valve is conducted to the second part of the control box through the heat-conducting component, and then the heat is conducted to the second part of the control box via the heat pipe pasted upon it. Thus, the heat of the light valve can be removed through the large area of the second part of control box, so as to increase the cooling efficiency and simplify the cooling apparatus.

Abstract: An adjusting apparatus comprises a base, and a supporting frame, a fixed plate, a sliding stand, and a carrier, which are sequential stacked on the base. An optical engine is fixed on the carrier. By rotating the adjusting device, the axis position of optical engine can be adjusted along sliding slots guided by bulges. By using arc surfaces of the sliding stand and the carrier, the adjusting apparatus clips and pushes the blocks of the carrier to adjust the left and right angle of inclination of optical engine. Therefore, the light beam provided by optical engine could project on a screen precisely and reach the optimum projection performance.

Abstract: A metal-insulator-metal (MIM) capacitor structure and method of manufacturing thereof. A plurality of MIM capacitor patterns is formed in two or more insulating layers. The insulating layers may comprise a via layer and a metallization layer of a semiconductor device. A top portion of the top insulating layer is recessed in a region between at least two adjacent MIM capacitor patterns. When the top plate material of the MIM capacitors is deposited, the top plate material fills the recessed area of the top insulating layer between the adjacent MIM capacitor pattern, forming a connecting region that couples together the top plates of the adjacent MIM capacitors. A portion of the MIM capacitor bottom electrode may be formed in a first metallization layer of the semiconductor device.

Abstract: A memory cell comprising a capacitor having a dielectric layer interposing first and second vertically disposed electrodes, an insulating lining located over the capacitor, and a transistor gate extension passing over the capacitor. A spacer isolates an end of one of the capacitor electrodes from the transistor gate extension. In one embodiment, the spacer includes a first non-planar profile configured to engage a second non-planar profile comprising ends of the one of the capacitor electrodes and the insulating lining.

Abstract: A method for fabricating a metal-insulator-metal capacitor in an embedded DRAM process is described. A plurality of contact plugs are provided through an insulating layer to semiconductor device structures in a substrate wherein the contact plugs are formed in a logic area of the substrate and in a memory area of the substrate and providing node contact plugs to node contact regions within the substrate in the memory area. Thereafter, capacitors are fabricated in a twisted trench in a self-aligned copper process.

Abstract: A projection display device includes a casing, lamp installed in the casing, optical engine and lamp cooling apparatus, in which the lamp apparatus includes a fan, recess and lamp cover. The fan is installed at the bottom part of the lamp, and the recess is opened on the casing and located below the fan. The lamp cover is installed outside of the lamp so as to allow a convection space to be formed between the outside of the lamp and the lamp cover. The air with low thermal load at the lower side of the display device is drawn in through the fan to enter the convection space to cool the lamp so as to enhance the cooling effect for the projection display device.

Abstract: A rear projection television includes a casing with a space therein and a plurality of modular units. A plurality of maintenance holes are formed through the casing to communicate with the space. The modular units are positioned in the space to correspond to the maintenance holes. When one component inside the casing needs repairing, only a lid covering the corresponding maintenance hole is dismounted for the user to quickly take the component out, without moving the casing. Thereby, the repair process is simplified with saved repair labor and space.

Abstract: An adjusting apparatus for projection comprises a carrier having a central screw hole and three rounded indentations around central screw hole, an adjusting frame having a plane section and a base section, and a holder. The center of the plane section has a circular concave dug a hole with a smaller aperture. A ball bearing is accommodated in the circular concave. The plane section of the adjusting frame has three screw holes corresponding to the rounded indentations. Three angle-adjusting bolts respectively insert through the screw holes to abut against the rounded indentations. Rotating the angle-adjusting bolts relative to each other varies the length of the angle-adjusting bolts calculated from the plane section of the adjusting frame to the carrier. Thereby, an angle adjustment of a mirror is achieved.

Abstract: A method for forming a silicon dioxide layer over a silicon substrate including providing a substrate having exposed silicon portions; and, forming a silicon dioxide layer over the exposed silicon portions according to an oxide formation process including contacting the exposed silicon portions with an oxidizing solution comprising water and ozone.

Abstract: A casing structure of a rear projection display apparatus includes a substrate, a rear cover and a screen frame. An electronic module and an optical module are mounted on the substrate. A bracket is mounted on a front side of the substrate. The rear cover is fixedly assembled with the substrate via a slot, a flange and a screwing element. The screen frame is mounted on a front side of the rear cover. A panel and a speaker lid cover the bracket of the substrate to accomplish the casing structure. When components inside the casing structure are to be adjusted, only the panel needs to be removed, without changing the positions of the components inside the casing structure. Thereby, adjusting time is saved.

Abstract: An adjusting apparatus for projection comprises a carrier having a central screw hole and three rounded indentations around central screw hole, an adjusting frame having a plane section and a base section, and a holder. The center of the plane section has a circular concave dug a hole with a smaller aperture. A ball bearing is accommodated in the circular concave. The plane section of the adjusting frame has three screw holes corresponding to the rounded indentations. Three angle-adjusting bolts respectively insert through the screw holes to abut against the rounded indentations. Rotating the angle-adjusting bolts relative to each other varies the length of the angle-adjusting bolts calculated from the plane section of the adjusting frame to the carrier. Thereby, an angle adjustment of a mirror is achieved.

Abstract: An adjusting apparatus comprises a base, and a supporting frame, a fixed plate, a sliding stand, and a carrier, which are sequential stacked on the base. An optical engine is fixed on the carrier. By rotating the adjusting device, the axis position of optical engine can be adjusted along sliding slots guided by bulges. By using arc surfaces of the sliding stand and the carrier, the adjusting apparatus clips and pushes the blocks of the carrier to adjust the left and right angle of inclination of optical engine. Therefore, the light beam provided by optical engine could project on a screen precisely and reach the optimum projection performance.

Abstract: A capacitor structure within a microelectronic product employs at least one of: (1) an oxidation barrier layer formed upon a second capacitor plate within the capacitor structure; and (2) a spacer formed adjoining a sidewall of the second capacitor plate, where the spacer is formed with an “L” shape. The foregoing features of the capacitor structure provide a capacitor formed therein with enhanced performance.

Abstract: A capacitor structure within a microelectronic product employs at least one of: (1) an oxidation barrier layer formed upon a second capacitor plate within the capacitor structure; and (2) a spacer formed adjoining a sidewall of the second capacitor plate, where the spacer is formed with an “L” shape. The foregoing features of the capacitor structure provide a capacitor formed therein with enhanced performance.

Abstract: A method for fabricating a metal-insulator-metal capacitor in an embedded DRAM process is described. A plurality of contact plugs are provided through an insulating layer to semiconductor device structures in a substrate wherein the contact plugs are formed in a logic area of the substrate and in a memory area of the substrate and providing node contact plugs to node contact regions within the substrate in the memory area. Thereafter, capacitors are fabricated in a twisted trench in a self-aligned copper process.

Abstract: A method for forming a silicon dioxide layer over a silicon substrate including providing a substrate having exposed silicon portions; and, forming a silicon dioxide layer over the exposed silicon portions according to an oxide formation process including contacting the exposed silicon portions with an oxidizing solution comprising water and ozone.

Abstract: A method of forming a cell memory structure including the step of planarizing an HDP/LDP oxide layer lying over a capacitor area. The method provides for the planarization of the cell storage node, good isolation between the transistor and storage node, reduced step height for the cell-transistor and has the potential for increasing the node capacitance (like DRAM storage node).