Patents by Inventor Chung Chih Feng

Chung Chih Feng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180147690
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a second surface. The polishing layer is disposed on the first surface of the base layer and has a plurality of second fibers, a polymeric elastomer and a plurality of pores. The second fibers are arranged irregularly and cross each other to form the pores, and the polymeric elastomer is attached to the second fibers and does not fill the pores.
    Type: Application
    Filed: January 25, 2018
    Publication date: May 31, 2018
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, CHIH-YI LIN, TAI-YUN FU, YUNG-CHANG HUNG, JHIH-GONG LIN
  • Publication number: 20180111247
    Abstract: The present invention relates to a polishing pad comprising a buffer sheet containing a pressure distribution sheet. The invention also relates to a polishing apparatus and a method for manufacturing a polishing pad.
    Type: Application
    Filed: December 20, 2017
    Publication date: April 26, 2018
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, YUNG-CHANG HUNG, WEI-TE LIU
  • Patent number: 9889630
    Abstract: The sheet of a polishing equipment of the present invention includes a buffer layer, an adsorption layer, and an adhesion layer. The adhesion layer is disposed between the buffer layer and the adsorption layer. The adhesion layer has a plurality of adhesion points to bind the buffer layer and the adsorption layer together. The adhesion points are discontinuous and have gaps in between. Consequently, when the sheet is pressed, air can be vented out through the gaps between the adhesion points, so that the adsorption force is increased.
    Type: Grant
    Filed: August 5, 2009
    Date of Patent: February 13, 2018
    Assignee: BESTAC ADVANCED MATERIAL CO., LTD.
    Inventors: Chung-Chih Feng, I-Peng Yao, Lyang-Gung Wang, Wen-Chieh Wu
  • Publication number: 20180036861
    Abstract: The present invention relates to a polishing pad with improved slurry retention capacity, which includes a polishing layer. The polishing layer includes an elastomer main body and a plurality of titanium dioxide nanowires. Each of the titanium dioxide nanowires is independent and is distributed evenly and randomly in the elastomer main body. The present invention further provides a polishing apparatus and a method for manufacturing the polishing pad.
    Type: Application
    Filed: August 1, 2017
    Publication date: February 8, 2018
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, YUNG-CHANG HUNG, PIN-HSIEN SUNG, CHIN-WEI CHEN, WEN-CHIEH WU
  • Patent number: 9884400
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.
    Type: Grant
    Filed: October 1, 2015
    Date of Patent: February 6, 2018
    Assignee: SAN FANG CHEMICAL INDUSTRY CO., LTD
    Inventors: Chung-Chih Feng, I-Peng Yao, Wen-Chieh Wu, Hsin-Ru Song
  • Patent number: 9862071
    Abstract: The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of forming a polishing layer from a polyurethane solution has a solid content more than about 90 wt % and drying the polyurethane solution at a temperature from about 130° C. to about 170° C. The invention also provides a polishing pad manufactured by the method mentioned above. The defect of scraping the surface of the substrate to be polished due to polishing particles remaining is avoided when applying the polishing pad according to the invention, and the flatness of the substrate to be polished is raised and the defective rate is eliminated also.
    Type: Grant
    Filed: September 21, 2010
    Date of Patent: January 9, 2018
    Assignee: SAN FANG CHEMICAL INDUSTRY CO., LTD.
    Inventors: Chung-Chih Feng, I-Peng Yao, Yung-Chang Hung, Lyang-Gung Wang
  • Publication number: 20170297165
    Abstract: The present invention relates to a polishing pad comprising a polishing surface. The polishing surface comprises a first polishing area and a second polishing area. The first polishing area comprises a plurality of first foaming holes, and the second polishing area comprises a plurality of second foaming holes, and an average pore diameter of the first foaming holes is less than an average pore diameter of the second foaming holes. The polishing pad according to the present invention uses the polishing areas with the different pore diameters of the holes to avoid unevenly removing the edge and central part of a substrate when polishing, so that a thickness of the substrate becomes uniform.
    Type: Application
    Filed: June 28, 2017
    Publication date: October 19, 2017
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, YUNG-CHANG HUNG, KUN-CHENG TSAI
  • Publication number: 20170282488
    Abstract: The present invention relates to a laminated composite material and a method for making the same. The laminated composite material includes a base layer and a protection layer. The base layer includes a first surface, a second surface and a plurality of through holes. The second surface is opposite to the first surface. The through holes extend from the first surface of the base layer to the second surface to penetrate through the base layer. The protection layer is disposed on the first surface of the base layer, and has a plurality of penetration holes. Sizes and locations of the penetration holes correspond to those of the through holes.
    Type: Application
    Filed: February 17, 2017
    Publication date: October 5, 2017
    Inventors: CHUNG-CHIH FENG, PAI-HSIANG WU, CHIEN-CHIA HUANG, CHIEH LEE
  • Publication number: 20170282509
    Abstract: The present invention relates to a laminated composite material and a method for making the same. The laminated composite material includes a 3D fabric, an adhesion layer, and a resin surface layer. The 3D fabric has a plurality of arranged fibers to form an air permeable structure. The adhesion layer is disposed on a surface of the 3D fabric. The resin surface layer is disposed on the adhesion layer, where the resin surface layer includes at least one layer formed by curing a polyurethane (PU) solution.
    Type: Application
    Filed: January 3, 2017
    Publication date: October 5, 2017
    Inventors: CHUNG-CHIH FENG, KUO-LI LO, SHENG-HUNG LIAO, KO-FENG WANG
  • Publication number: 20170266937
    Abstract: A thin and high strength composite laminate includes a fabric, an elastic layer and a water-based polyurethane layer. The fabric is weaved by high-tenacity filament or high-tenacity monofilament. The high-tenacity filament or high-tenacity monofilament is made of polyethylene terephthalate (PET). The fabric has a first surface and a second surface opposite to the first surface. The elastic layer is laminated on the first surface of the fabric. The water-based polyurethane layer is laminated on the second surface of the fabric. In this way, a thin, anti-fouling, abrasion resistance and high physical strength composite laminate can be manufactured.
    Type: Application
    Filed: October 13, 2016
    Publication date: September 21, 2017
    Inventors: CHUNG-CHIH FENG, CHIH-YI LIN, PAI-HSIANG WU, KAO-LUNG YANG, CHIEN-CHIA HUANG, CHIEH LEE, CHI-CHIN CHIANG
  • Publication number: 20170239783
    Abstract: The present invention relates to a mounting sheet comprising a mounting layer. The mounting layer comprises a mounting surface for mounting the substrate. The mounting surface comprises a first mounting area and a second mounting area, and wherein a mounting force of the first mounting area is stronger than a mounting force of the second mounting area. The sheet according to the invention has the different mounting areas, so that the substrate is easily unloaded when polishing is completed. Furthermore, the broken of the substrate due to removal and the duration and the difficulty of removal are reduced.
    Type: Application
    Filed: April 14, 2017
    Publication date: August 24, 2017
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, LYANG-GUNG WANG, HSIN-RU SONG, WEN-CHIEH WU
  • Publication number: 20170203407
    Abstract: A back pad capable of color rendering end-of-life includes an absorption layer, a dye capsule layer and a carrier layer. The absorption layer has a surface. The dye capsule layer is disposed on the surface of the absorption layer. The carrier layer is laminated onto the dye capsule layer. The dye capsule layer of the present disclosure can be dissolved to release dyes after water penetrates in the back pad, and the end-of-life of the back pad can be easily determined through a color-rendering effect of the dyes.
    Type: Application
    Filed: May 9, 2016
    Publication date: July 20, 2017
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, LYANG-GUNG WANG, HSIN-RU SONG
  • Patent number: 9682457
    Abstract: The present invention relates to a composite polishing pad and a method for making the same. The composite polishing pad includes a cushion layer and a polishing layer. The cushion layer includes a first polymeric elastomer with a hardness of 10 to 70 shore D, and is attached to the polishing layer directly. The polishing layer includes a second polymeric elastomer with a hardness of 30 to 90 shore D, and has a polishing surface for polishing a workpiece. Whereby, the polishing layer will not peel off from the cushion layer easily, so that the polishing quality is raised.
    Type: Grant
    Filed: September 29, 2014
    Date of Patent: June 20, 2017
    Assignee: SAN FANG CHEMICAL INDUSTRY CO., LTD.
    Inventors: Chung-Chih Feng, I-Peng Yao, Wen-Chieh Wu, Yung-Chang Hung
  • Patent number: 9669518
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad has a grinding layer. The grinding layer includes a plurality of fibers and a main body. The fineness of the fibers is 0.001 den to 6 den. The main body is a foam and encloses the fibers. The main body has a plurality of first pores and a plurality of second pores, wherein the first pores are communicated with each other, and the second pores are independent from each other. The size of the first pores is at least 5 times greater than the size of the second pores. The hardness of the grinding layer is 30 to 90 shore D, and the compression ratio thereof is 1% to 10%.
    Type: Grant
    Filed: August 26, 2014
    Date of Patent: June 6, 2017
    Assignee: San Fang Chemical Industry Co., Ltd.
    Inventors: Chung-Chih Feng, I-Peng Yao, Wen-Chieh Wu, Yung-Chang Hung
  • Patent number: 9616611
    Abstract: The present invention relates to a ball shaped product and a method for making the same. The method includes the following steps of: (a) placing a ball shaped interior material on a supporting seat, wherein a part of an outer surface of the ball shaped interior material is exposed outside the supporting seat; (b) placing the ball shaped interior material and the supporting seat in a chamber; (c) covering a wrapping material on the chamber; (d) vacuum pumping the chamber, so that the wrapping material is attached to the exposed part of the outer surface of the ball shaped interior material; (e) releasing the vacuum of the chamber; and (f) rotating the ball shaped interior material, and repeating the step (a) to step (e) at least one time.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: April 11, 2017
    Assignee: San Fang Chemical Industry Co., Ltd.
    Inventors: Chung-Chih Feng, I-Peng Yao, Ko-Feng Wang, Kai-Feng Kang, Chun-Yi Kuo
  • Publication number: 20170001409
    Abstract: The present invention relates to a composite material having a three-dimensional texture and a method for making the same. The composite material includes a base material and a surface layer. The surface layer is disposed on a surface of the base material, and has a substantially uniform thickness. The surface layer includes at least one first portion and at least one second portion. The first portion is attached to the surface of the base material. The second portion is spaced apart from the surface of the base material to form at least one hole.
    Type: Application
    Filed: November 25, 2015
    Publication date: January 5, 2017
    Inventors: CHUNG-CHIH FENG, PAI-HSIANG WU, CHIEN-CHIA HUANG, TSUNG-YU TSAI
  • Publication number: 20160273159
    Abstract: A thermoplastic artificial leather includes a thermoplastic composite laminate and a textile base. The thermoplastic composite laminate includes a foamed thermoplastic elastic layer, an unfoamed thermoplastic elastic layer and a thermoplastic adhesive layer. The foamed thermoplastic elastic layer has a first surface, a second surface and a plurality of foamed structures. The second surface is opposite to the first surface. The unfoamed thermoplastic elastic layer is disposed on the first surface of the foamed thermoplastic elastic layer. The thermoplastic adhesive layer is disposed on the second surface of the foamed thermoplastic elastic layer. The textile base is laminated on the thermoplastic adhesive layer of the thermoplastic composite laminate.
    Type: Application
    Filed: August 18, 2015
    Publication date: September 22, 2016
    Inventors: CHUNG-CHIH FENG, CHIH-YI LIN, KAO-LUNG YANG, CHI-CHIN CHIANG
  • Publication number: 20160199961
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.
    Type: Application
    Filed: October 1, 2015
    Publication date: July 14, 2016
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, WEN-CHIEH WU, HSIN-RU SONG
  • Publication number: 20160177472
    Abstract: The present invention provides a composite fiber having a high surface area and flexibility and a method for manufacturing the same, and a substrate containing the composite fiber and a method for manufacturing the same. The composite fiber contains a first component and a second component, and has a maximum diameter and a circumference. The first component has a central portion and a plurality of extension portions. A maximum length of the central portion is less than three quarters of the maximum diameter. The first component is in an amount of 50 wt % to 95 wt %, based on the total weight of the composite fiber. The second component has a plurality of outer portions disposed between two extension portions, and the second component is in an amount of 5 wt % to 50 wt %, based on the total weight of the composite fiber.
    Type: Application
    Filed: March 2, 2016
    Publication date: June 23, 2016
    Inventors: CHUNG-CHIH FENG, CHIH-YI LIN, KAO-LUNG YANG
  • Publication number: 20160136778
    Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a base layer and a polishing layer. The base layer has a first surface and a second surface. The polishing layer is disposed on the first surface of the base layer and has a plurality of second fibers, a polymeric elastomer and a plurality of pores. The second fibers are arranged irregularly and cross each other to form the pores, and the polymeric elastomer is attached to the second fibers and does not fill the pores.
    Type: Application
    Filed: June 12, 2015
    Publication date: May 19, 2016
    Inventors: CHUNG-CHIH FENG, I-PENG YAO, CHIH-YI LIN, TAI-YUN FU, YUNG-CHANG HUNG, JHIH-GONG LIN