Patents by Inventor Chung-Jen Wu

Chung-Jen Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080096997
    Abstract: The present invention provides an amic acid ester oligomer with the structure of formula (1) wherein R, Rx, G, P and m are as defined in the specification. The present invention also provides a precursor composition for a polyimide resin comprising the above-mentioned oligomer of formula (1). The polyimide synthesized from the precursor composition exhibits good operations and physiochemical properties.
    Type: Application
    Filed: April 20, 2007
    Publication date: April 24, 2008
    Inventors: Chung-Jen Wu, Chih-Ming An
  • Publication number: 20050245715
    Abstract: The present invention relates to a process for preparing a precursor solution for polyimide/silica composite material and a process for forming a polyimide/silica composite material film on a substrate, comprising adding a monomer of a silane compound to allow a poly(amic acid) to carry a silica moiety; adding a monomer of formula (R6)xSi(R7)(4-x) to allow the silica moiety to carry a photo-polymerizable unsaturated group; and adding a monomer of formula R8N(R9)2 to allow the poly(amic acid) to carry a photo-polymerizable unsaturated group, where R6, R7, R8, R9, and x are as defined in the specification. The present invention also relates to a precursor solution for polyimide/silica composite material and a polyimide/silica composite material. The composite material of the present invention is useful in microelectronic devices, semiconductor elements, and photoelectric elements.
    Type: Application
    Filed: May 2, 2005
    Publication date: November 3, 2005
    Inventors: Chung-Jen Wu, Min-Chi Wang, Chung-Hung Chang, Meng-Yen Chou, Chin-Chang Chuang, Hsin-Wei Huang, Shu-Wan Lu, Chin-Min An, Chung-Hao Wu, Wen-Chang Chen, Cheng-Tyng Yen, Yu-Wen Wang, Kuo-Huang Hsieh
  • Patent number: 5741837
    Abstract: A syndiotactic polystyrene composition is improved which exhibits improved crystallization rate. The improved syndiotactic polystyrene composition contains (a) a syndiotactic polystyrene; and (b) a nucleating agent which is selected from the group consisting of two types of compounds represented by the following formulas, respectively: ##STR1## In Formulas I and II, the radicals R.sub.1 and R.sub.2, which can be the same of different, are C.sub.1 to C.sub.5 alkyl groups, X is a halogen group, preferably a bromide group, and n is an integer from 1 to 5. In the present invention, the nucleating agent is provided at 0.01 to 5 part, by weight, per 100 parts, also by weight, of the syndiotactic polystyrene resin. An example of Formula I compound is 2-hydroxybenimidiazole, and an example of the Formula II compound is bis(phenylbromide) methane.
    Type: Grant
    Filed: March 27, 1997
    Date of Patent: April 21, 1998
    Assignee: Industrial Technology Research Institute
    Inventors: Chung-Jen Wu, Chien-Ming Chen, Hsien-Ming Chen, Hurng-Rern Lee