Abstract: A method for supplying vapor to a chamber includes providing a first diverter valve that, when open, diverts vapor away from the chamber, and a second diverter valve that, when open, supplies the vapor to the chamber; supplying a carrier gas to the chamber; after supplying the carrier gas, creating plasma in the chamber while a substrate is in the chamber; opening the first diverter valve and closing the second diverter valve; supplying the vapor by vaporizing at least one liquid precursor in a carrier gas; after a first predetermined period sufficient for the vapor to reach steady-state flow, closing the first diverter valve and opening the second diverter valve to supply the vapor to the chamber; and after a second predetermined period following the first predetermined period, opening the first diverter valve and closing the second diverter valve to stop supplying the vapor to the chamber.

Abstract: A vapor delivery system for supplying vapor to a chamber in a plasma-enhanced chemical vapor deposition (PECVD) system includes a vapor supply that supplies vapor by vaporizing at least one liquid precursor in a carrier gas. A first path includes a first filter that filters the vapor flowing from the vapor supply to the chamber. At least one second path is parallel to the first path and includes a second filter that filters vapor flowing from the vapor supply to the chamber. A plurality of valves are configured to switch delivery of the vapor to the chamber between the first path and the second path.

Abstract: A point-of-use valve (POU valve) manifold is provided that allows for multiple precursors to be delivered to a semiconductor processing chamber through a common outlet. The manifold may have a plurality of precursor inlets and a purge gas inlet. The manifold may be configured such that there are zero dead legs in the manifold when the purge gas is routed through the manifold, and may provide mounting location for the POU valves that alternate sides. One or more internal flow path volumes may include elbow features.

Abstract: A vapor delivery system for supplying vapor to a chamber in a plasma-enhanced chemical vapor deposition (PECVD) system includes a vapor supply that supplies vapor by vaporizing at least one liquid precursor in a carrier gas. A first path includes a first filter that filters the vapor flowing from the vapor supply to the chamber. At least one second path is parallel to the first path and includes a second filter that filters vapor flowing from the vapor supply to the chamber. A plurality of valves are configured to switch delivery of the vapor to the chamber between the first path and the second path.

Abstract: A method of preparing a coated optical fiber for coupling to a face of an optical device includes placing the coated fiber so that it extends through a stripping station, a cleaning station and a cleaving station. A stripper at the stripping station is brought into engagement with the fiber and relative motion between the fiber and the stripping station, the cleaning station and the cleaving station is effected lengthwise of the fiber, whereby the coating is stripped from a medial length segment of the fiber as the cleaning device at the cleaning station is activated for cleaning fragments of coating material from the medial length segment of the fiber as the medial length segment passes through the cleaning station and the cleaning device is deactivated and stripping is discontinued.

Abstract: A method of preparing a coated optical fiber for coupling to a face of an optical device includes placing the coated fiber so that it extends through a stripping station, a cleaning station and a cleaving station. A stripper at the stripping station is brought into engagement with the fiber and relative motion between the fiber and the stripping station, the cleaning station and the cleaving station is effected lengthwise of the fiber, whereby the coating is stripped from a medial length segment of the fiber as the cleaning device at the cleaning station is activated for cleaning fragments of coating material from the medial length segment of the fiber as the medial length segment passes through the cleaning station and the cleaning device is deactivated and stripping is discontinued.