Abstract: A new and useful optical element for an optical imaging system is provided, characterized in that the optical element comprises a reflecting surface that is rotationally symmetric and oriented at a grazing angle to a relatively small slit that is illuminated over a relatively large range of angles, such that the optical element collects radiation from the relatively small slit that is illuminated over a large range of angles, and the reflecting surface reflects the collected radiation. The optical element is configured to convert a large range of angles leaving a very small slit, to a much smaller range of angles over a larger area.

Abstract: An autofocus system and method designed to account for instabilities in the system, e.g. due to instabilities of system components (e.g. vibrating mirrors, optics, etc) and/or environmental effects such as refractive index changes of air due to temperature, atmospheric pressure, or humidity gradients, is provided. An autofocus beam is split into a reference beam component (the split off reference channel) and a measurement beam component, by a beam splitting optic located a predetermined distance from (and in predetermined orientation relative to) the substrate, to create a first space between the beam splitting optic and the substrate. A reflector is provided that is spaced from the beam splitting optic by the predetermined distance, to create a second space between the reflector and the beam splitting optic.

Abstract: An exposure apparatus (10) for transferring a mask pattern (12A) from a mask (12) to first and second substrates (14A) (14B) includes an illumination system (18) that generates and simultaneously directs a first beam (32A) at the mask pattern (12A) and a second beam (32B) at the mask pattern (12A). Further, the first beam (32A) is spaced apart from the second beam (32B) at the mask pattern (12A). As provided herein, the first beam (32A) directed at the mask (12) creates a first pattern beam (34A) that is transferred to a first substrate location (33A), and the second beam (32B) directed at the mask (12) creates a second pattern beam (34B) that is transferred to a second substrate location (33B). Moreover, the first substrate location (33A) is spaced apart from the second substrate location (33B). With this design, the first pattern beam (34A) can be transferred to the first substrate (14A) and the second pattern beam (34B) can be simultaneously transferred to the second substrate (14B).

Abstract: A compact optical assembly for a laser radar system is provided, that is configured to move as a unit with a laser radar system as the laser radar system is pointed at a target and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the laser radar. The optical assembly comprises a light source, a lens, a scanning reflector and a fixed reflector that are oriented relative to each other such that: (i) a beam from the light source is reflected by the scanning reflector to the fixed reflector; (ii) reflected light from the fixed reflector is reflected again by the scanning reflector and directed along a line of sight through the lens; and (iii) the scanning reflector is moveable relative to the source, the lens and the fixed reflector, to adjust the focus of the beam along the line of sight.

Abstract: A measurement assembly (12) that directs a light beam (32) at a surface (16, 56) comprises a light source (20) and a fiber optic array (22). The light source (20) emits the light beam (32) that is directed at the surface (16, 56). Subsequently, the light beam (32) is reflected off of the surface (16, 56) to create a reflected beam (58). The fiber optic array (22) has a first array end (33B) that receives the reflected beam (58). Additionally, the fiber optic array (22) includes a primary fiber (234) and at least one auxiliary fiber (238) that is positioned substantially adjacent to the primary fiber (234) at the first array end (33B). A detector assembly (28) is coupled to the fiber optic array (22) to detect any light from the reflected beam (58) in the primary fiber (234) and the at least one auxiliary fiber (238).

Abstract: An autofocus (AF) system and method is provided that maps the topography of a substrate such as a semiconductor wafer, in a manner that corrects for Goos Hanchen (GH) effect. In addition, a new and useful detector is provided that is particularly useful in an AF system and method. The detector preferably has both color and polarization filtering integrally associated with the detector, so that polarization and color filtering is provided at the detector, on a pixel by pixel basis.

Abstract: A compact optical assembly for a laser radar system is provided, that is configured to move as a unit with a laser radar system as the laser radar system is pointed at a target and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the laser radar. The optical assembly comprises a light source, a lens, a scanning reflector and a fixed reflector that are oriented relative to each other such that: (i) a beam from the light source is reflected by the scanning reflector to the fixed reflector; (ii) reflected light from the fixed reflector is reflected again by the scanning reflector and directed along a line of sight through the lens; and (iii) the scanning reflector is moveable relative to the source, the lens and the fixed reflector, to adjust the focus of the beam along the line of sight.

Abstract: A new and useful concept is provided by which control information for an imaging optical system such as a lithographic imaging optical system can be generated. A system and method are disclosed that are designed to detect changes in the lateral position of an image plane or object plane in an imaging optical system, particularly a lithographic imaging optical system.

Abstract: A measurement system (22) for measuring the position of a work piece (28) includes a measurement grating (34) and an encoder head (36). The encoder head (36) directs a measurement beam (252) at the measurement grating (34), the measurement beam (252) having an oval shaped cross-section. The encoder head (36) includes a beam shape adjuster (256) positioned in the path of an input measurement beam (240) having a substantially circular cross-sectional shape that transforms the input measurement beam (240) to provide the measurement beam (252) having the oval shaped cross-section.

Abstract: A contrasting surface surrounding the pin minor when measuring aberrations of a lithographic projection system. By using a surrounding surface having a different reflectivity characteristic relative to the pin minor, the reflected wave front contains predominately single-pass aberration content because the amount of double-pass content is significantly reduced. As a result, the aberration measurement performed by a measurement system is more accurate.

Abstract: A new and useful optical system is provided, which is particularly useful as an optical relay for an aerial imaging system (AIS). The optical system preferably comprises a two element catadioptric lens where a beam transmitted by makes two reflections before leaving the first solid glass (catadioptric) element, then reflects off the second (mirror) element, makes a fourth reflection off the outside surface of the first element and then passes through a hole in the center of the second element. When the optical system is used as an AIS relay, it substantially captures the NA of the projection lens with which it is associated, and simplifies the structure of the AIS relay. In addition, the AIS relay is configured to minimize the affects of stray light.

Abstract: New and useful optical components are provided, for use in measuring projection lens characteristics of an optical imaging system that images a substrate. The optical components comprise an array of full NA imagers located at the substrate plane, and a relay system for imaging the imagers to a detector that is remote from the substrate.

Abstract: A way of predicting distribution of light in an illumination pupil, comprising: (a) identifying one or more component(s) of an illumination system having an illumination pupil, where the component(s) affect the distribution of light in the illumination pupil; (b) generating a point spread function that depends on the identified component(s) and has a functional relationship with the configurable settings of the illumination system; and (c) predicting the distribution of light in the illumination pupil using the point spread function.

Abstract: A target (16) for a metrology system (10) that monitors the position of an object (12) includes a target housing (18) and a detector assembly (20). The target housing (18) is substantially spherically shaped and includes a first detector region (218F). The target housing (18) includes a housing interior (228). A light beam (22A) impinging on the target housing (18) results in light energy within the housing interior (228). The detector assembly (20) includes a first detector (220A) secured to the first detector region (218F). The first detector (220?) generates a first signal when the light beam (22A) impinges on the target housing (18) that relates to the light energy within the housing interior (228).

Abstract: An optical assembly for a system for inspecting or measuring of an object is provided that is configured to move as a unit with a system, as the system is pointed at a target, and eliminates the need for a large scanning (pointing) mirror that is moveable relative to other parts of the system. The optical assembly comprises catadioptric optics configured to fold the optical path of the pointing beam and measurement beam that are being directed through the outlet of the system, to compress the size of the optical assembly.

Abstract: A new and useful optical element for an optical imaging system is provided, characterized in that the optical element comprises a reflecting surface that is rotationally symmetric and oriented at a grazing angle to a relatively small slit that is illuminated over a relatively large range of angles, such that the optical element collects radiation from the relatively small slit that is illuminated over a large range of angles, and the reflecting surface reflects the collected radiation. The optical element is configured to convert a large range of angles leaving a very small slit, to a much smaller range of angles over a larger area.

Abstract: An encoder system and method are provided, that is designed to improve 2D encoder systems and methods in areas such as accuracy, compactness, stability, resolution, and/or light efficiency. Moreover, the system and method of this invention provides a new concept in a retroreflector that while particularly useful in applicants' system and method, is believed to have more general utility in optical imaging systems and methods.

Abstract: New and useful concepts for an autofocus system and method are provided. A basic concept uses fringe projection in an autofocus system and method. A further aspect provides spatial filtering concepts for the fringe projection concept. In yet another aspect, the fringe projection autofocus system and method is provided with temporal phase shifting using no moving parts. In a still further aspect, the fringe projection autofocus system and method is provided with unambiguous height measurement concepts.

Abstract: A new and useful concept is provided by which control information for an imaging optical system such as a lithographic imaging optical system can be generated. A system and method are disclosed that are designed to detect changes in the lateral position of an image plane or object plane in an imaging optical system, particularly a lithographic imaging optical system.

Abstract: An autofocus system (222C) for measuring the position of a work piece (200) along an axis includes a slit light source assembly (236), a slit detector assembly (238), and a control system (224). The slit light source assembly (236) directs a first slit of light (342A) at a first slit area (344A) of the work piece (200). The slit detector assembly (238) detects light reflected off of the first slit area (344A) and generates a first slit signal relating to the amount of light reflected off of the first slit area (344A) at the slit detector assembly (238). The control system (224) uses the first slit signal from the slit detector assembly (238), and first reflectance information of the first slit area (344A) to determine the position of the work piece (200) along the axis. With this design, the autofocus system (222C) can compensate for the changes in reflectivity of the work piece (200).