Patents by Inventor David Nalewajek

David Nalewajek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7786335
    Abstract: A process for the production of C2-C4 hydrofluorocarbon, such as 1,1,1,3,3-pentafluoropropane, by contacting a non-fluorinated hydrochlorocarbon with a fluorinating agent, such as hydrogen fluoride, in a liquid catalyst system preferably comprising fluorinated superacid catalyst prepared from SbF5, NbF5, TaF5 or TaF5/SnF4 and HF.
    Type: Grant
    Filed: November 3, 2008
    Date of Patent: August 31, 2010
    Assignee: Honeywell International Inc.
    Inventors: David E. Bradley, David Nalewajek, Robert L. Bell
  • Publication number: 20100139274
    Abstract: Aspects of the present invention are directed to working fluids and their use in processes wherein the working fluids comprise compounds having the structure of formula (I): wherein R1, R2, R3, and R4 are each independently selected from the group consisting of: H, F, Cl, Br, and C1-C6 alkyl, at least C6 aryl, at least C3 cycloalkyl, and C6-C15 alkylaryl optionally substituted with at least one F, Cl, or Br, wherein formula (I) contains at least one F and at least one Cl or Br, provided that if any R is Br, then the compound does not have hydrogen. The working fluids are useful in Rankine cycle systems for efficiently converting waste heat generated from industrial processes, such as electric power generation from fuel cells, into mechanical energy or further to electric power. The working fluids of the invention are also useful in equipment employing other thermal energy conversion processes and cycles.
    Type: Application
    Filed: December 3, 2009
    Publication date: June 10, 2010
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: Gary Zyhowski, Ryan Hulse, Haridasan K. Nair, David Nalewajek, Rajiv R. Singh
  • Publication number: 20100081570
    Abstract: Chloropentafluoropropene is employed as a herbicide for the effective control of undesirable spermatophyte growth.
    Type: Application
    Filed: September 24, 2009
    Publication date: April 1, 2010
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: ANDREW J. POSS, MICHAEL VAN DER PUY, RAJIV R. SINGH, GEORGE J. SAMUELS, DAVID NALEWAJEK, CHERYL L. CANTLON
  • Publication number: 20090269478
    Abstract: A method and composition for transforming a latent physiological biometric into a visible physiological biometric are provided, the method comprising: providing a latent biometric disposed on a surface of an article, wherein said biometric comprises at least one eccrine-derived compound; contacting said latent biometric with a developing solution, wherein said developing solution comprises at least one imaging reagent selected from ninhydrin and 1,8-diazafluoren-9-one and a carrier solvent comprising at least one C3-C4 hydrofluorocarbon; and reacting said imaging reagent with said eccrine-derived compound to produce a visible physiological biometric.
    Type: Application
    Filed: April 11, 2009
    Publication date: October 29, 2009
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: David Nalewajek, Cheryl L. Cantlon, Andrew J. Poss, Rajiv Ratna Singh, Ian Shankland
  • Patent number: 7605117
    Abstract: Provided are azeotrope-like compositions comprising tetrafluoropropene and pentafluoropropene and uses thereof, including use in refrigerant compositions, blowing agent compositions, foamable compositions, foams, sterilant compositions, sprayable compositions, and systems and methods using same.
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: October 20, 2009
    Assignee: Honeywell International Inc.
    Inventors: David P. Wilson, Hang T. Pham, Rajiv R. Singh, Raymond H. Thomas, David Nalewajek
  • Publication number: 20090149681
    Abstract: A process for the production of C2-C4 hydrofluorocarbon, such as 1,1,1,3,3-pentafluoropropane, by contacting a non-fluorinated hydrochlorocarbon with a fluorinating agent, such as hydrogen fluoride, in a liquid catalyst system preferably comprising fluorinated superacid catalyst prepared from SbF5, NbF5, TaF5 or TaF5/SnF4 and HF.
    Type: Application
    Filed: November 3, 2008
    Publication date: June 11, 2009
    Applicant: HONEYWELL INTERNATIONAL INC.
    Inventors: David E. Bradley, David Nalewajek, Robert L. Bell
  • Publication number: 20090099274
    Abstract: The invention provides polyurethane and polyisocyanurate foams and methods for the preparation thereof More particularly, the invention relates to open-celled, polyurethane and polyisocyanurate foams and methods for their preparation. The foams are characterized by a fine uniform cell structure and little or no foam collapse. The foams are produced with a polyol premix composition which comprises a combination of a hydrohaloolefin blowing agent, a polyol, a silicone surfactant, and a sterically hindered amine catalyst.
    Type: Application
    Filed: September 30, 2008
    Publication date: April 16, 2009
    Inventors: MICHAEL VAN DER PUY, David J. Williams, Haridasan K. Nair, David Nalewajek
  • Patent number: 7307137
    Abstract: The present invention is directed to low dielectric polymers and to methods of producing these low dielectric constant polymers, dielectric materials and layers, and electronic components. In one aspect of the present invention, an isomeric mixture of thermosetting monomers, wherein the monomers have a core structure and a plurality of arms, is provided, and the isomeric mixture of thermosetting monomers is polymerized, wherein polymerization comprises a reaction of an ethynyl group that is located in at least one arm of a monomer.
    Type: Grant
    Filed: October 18, 2001
    Date of Patent: December 11, 2007
    Assignee: Honeywell International Inc.
    Inventors: Kreisler Lau, Feng Quan Liu, Paul Apen, Boris Korolev, Emma Brouk, Ruslan Zherebin, David Nalewajek, Roger Leung
  • Publication number: 20070161827
    Abstract: Disclosed are fluorinated diene alcohols perferably having a fluorine content of at least about 45 weight percent and having a plurality of moieties of the formula CFx and a plurality of moieties of the formula CHx, where each x is independently 1, 2 or 3 and where each CFx moiety is not directly bonded to another CFx moiety.
    Type: Application
    Filed: January 9, 2006
    Publication date: July 12, 2007
    Applicant: Honeywell International Inc.
    Inventors: Jingji Ma, Michael Van Der Puy, David Nalewajek, Haridasan Nair, Lawrence Ford
  • Publication number: 20070118003
    Abstract: A process for the production of C2-C4 hydrofluorocarbon, such as 1,1,1,3,3-pentafluoropropane, by contacting a non-fluorinated hydrochlorocarbon with a fluorinating agent, such as hydrogen fluoride, in a liquid catalyst system preferably comprising fluorinated superacid catalyst prepared from SbF5, NbF5, TaF5 or TaF5/SnF4 and HF.
    Type: Application
    Filed: November 21, 2005
    Publication date: May 24, 2007
    Applicant: Honeywell International Inc.
    Inventors: David Bradley, David Nalewajek, Robert Bell
  • Patent number: 7098176
    Abstract: Provided are azeotrope-like compositions comprising tetrafluoropropene and pentafluoropropene and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants.
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: August 29, 2006
    Assignee: Honeywell International Inc.
    Inventors: Rajiv R. Singh, Hang T. Pham, David P. Wilson, Raymond H. Thomas, David Nalewajek
  • Publication number: 20060122301
    Abstract: Fluorinated divinyl ethers having structures according to Formula I or II: RfCX?CY—O—Z—O—CH?CH2??(I) RfCX?CY—O—M—O—CY?CXRf??(II) wherein Rf is fluorine or a C1-C20 fluorinated alkyl; X and Y are independently hydrogen, a halogen, or a C1-C20 fluorinated alkylene; Z is a C1-C20 alkylene, C3-C10 cycloalkylene, four to ten ring member aromatic and non-aromatic heterocycloalkylene, C6-C15 arylene, or C7-C20 arylalkylene; and M is a C1-C20 alkylene, C3-C18 fluorinated alkylene provided that the chain does not terminate with -CHF- or -CF2-, or a C3-C18 diol having the formula —HO—CH2—(CF2)n—CH2—OH— wherein n is an integer from 1 to 16. Curable compositions, polymers, films, coatings, and optical devices comprising fluorinated divinyl ether compounds are also disclosed as well as processes for producing optical devices from the fluorinated divinyl ether compounds and processes for producing the fluorinated divinyl ethers.
    Type: Application
    Filed: December 8, 2004
    Publication date: June 8, 2006
    Applicant: Honeywell International Inc.
    Inventors: Haridasan Nair, David Nalewajek
  • Patent number: 7049386
    Abstract: In a method of producing a low dielectric constant polymer, a thermosetting monomer is provided, wherein the thermosetting monomer has a cage compound or aryl core structure, and a plurality of arms that are covalently bound to the cage compound or core structure. In a subsequent step, the thermosetting monomer is incorporated into a polymer to form the low dielectric constant polymer, wherein the incorporation into the polymer comprises a chemical reaction of a triple bond that is located in at least one of the arms. Contemplated cage compounds and core structures include adamantane, diamantane, silicon, a phenyl group and a sexiphenylene group, while preferred arms include an arlyene, a branched arylene, and an arylene ether. The thermosetting monomers may advantageously be employed to produce low-k dielectric material in electronic devices, and the dielectric constant of the polymer can be controlled by varying the overall length of the arms.
    Type: Grant
    Filed: June 19, 2002
    Date of Patent: May 23, 2006
    Assignee: Honeywell International Inc.
    Inventors: Kreisler S. Lau, Feng Quan Liu, Boris A. Korolev, Emma Brouk, Ruslan Zherebin, David Nalewajek
  • Publication number: 20060058428
    Abstract: Fluorinated vinyl ether-epoxides which are fluorinated compounds containing both vinyl ether and epoxide functionalities, a process for making them and their uses. The fluorinated vinyl ether-epoxide compounds have the formula wherein X and Y are independently H, a halogen, or a linear or branched C1 to C12 fluoroalkyl group; and Rf is a linear or branched C1 to C12 fluoroalkyl group or a halogen.
    Type: Application
    Filed: September 16, 2004
    Publication date: March 16, 2006
    Inventors: Haridasan Nair, David Nalewajek, Dennis Lavery
  • Publication number: 20060022166
    Abstract: Provided are azeotrope-like compositions comprising tetrafluoropropene and pentafluoropropene and uses thereof, including use in refrigerant compositions, blowing agent compositions, foamable compositions, foams, sterilant compositions, sprayable compositions, and systems and methods using same.
    Type: Application
    Filed: April 18, 2005
    Publication date: February 2, 2006
    Applicant: Honeywell International Inc.
    Inventors: David Wilson, Hang Pham, Rajiv Singh, Raymond Thomas, David Nalewajek
  • Publication number: 20060008731
    Abstract: Monomers and polymers useful for forming photoresists. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomer having a monomeric unit structure which comprises: where Hal=F, Cl or Br and X=H or F; and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm, and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.
    Type: Application
    Filed: July 9, 2004
    Publication date: January 12, 2006
    Inventors: Michael Van Der Puy, Jingji Ma, Dennis Lavery, Lawrence Ford, Haridasan Nair, David Nalewajek, Andrew Poss, Leonard Stachura
  • Publication number: 20060008730
    Abstract: Monomers and polymers useful for forming photoresists are provided. More particularly, photoresists, as well as monomers and polymers for photoresists useful in micro-lithography, specifically monomers bearing acid-labile groups of reduced optical density. The resulting photoresists exhibit improved transparency to 157 nm light. The photoresist compositions are composed of a mixture of at least one water insoluble, acid decomposable polymer which is prepared from at least one monomeric unit which comprises an acid labile group of the formula —OC(CH3)2CF3 and which is substantially transparent to ultraviolet radiation at a wavelength of about 157 nm and at least one photoacid generator capable of generating an acid upon exposure to sufficient activating energy at a wavelength of about 157 nm.
    Type: Application
    Filed: July 9, 2004
    Publication date: January 12, 2006
    Inventors: Michael Puy, Haridasan Nair, Jingji Ma, David Nalewajek, Andrew Poss, Leonard Stachura, Lawrence Ford, Dennis Lavery
  • Patent number: 6972271
    Abstract: Disclosed are methods of producing supported organic catalyst systems which find particular use in polymerization reactions. The methods comprise generally, the steps of (a) providing an organic catalyst solution comprising an organic catalyst dissolved in a solvent; (b) contacting the organic catalyst solution with a solid support material; and (c) removing the solvent from the support material by using one or more supercritical-like solvents.
    Type: Grant
    Filed: October 14, 2004
    Date of Patent: December 6, 2005
    Assignee: Honeywell International Inc.
    Inventors: Raymond H. P. Thomas, Roy Robinson, David Nalewajek, Kane D. Cook
  • Publication number: 20050233932
    Abstract: Provided are azeotrope-like compositions comprising tetrafluoropropene and pentafluoropropene and uses thereof, including use in refrigerant compositions, refrigeration systems, blowing agent compositions, and aerosol propellants.
    Type: Application
    Filed: April 16, 2004
    Publication date: October 20, 2005
    Applicant: Honeywell International, Inc.
    Inventors: Rajiv Singh, Hang Pham, David Wilson, Raymond Thomas, David Nalewajek
  • Publication number: 20050113606
    Abstract: The invention pertains to a process for preparing chlorodifluoroacetyl fluoride (CDAF) by oxidation of chlorotrifluoroethylene (CTFE) in a solvent using a continuously stirred tank reactor. It provides a process for the production of chlorodifluoroacetyl fluoride by comprises reacting a solvent solution of chlorotrifluoroethylene with oxygen in a reactor to form a product which comprises chlorodifluoroacetyl fluoride. The reacting may be conducted in a continuous or batch mode.
    Type: Application
    Filed: November 20, 2003
    Publication date: May 26, 2005
    Inventors: Robert Bell, Timothy Demmin, David Bradley, David Nalewajek