Patents by Inventor Diane C. Boyd

Diane C. Boyd has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for varying x-ray hybrid resist space dimensions
    Patent number: 6014422
    Abstract: The present invention provides combining the advantages of hybrid resist with the unique properties of x-ray lithography to form high tolerance devices with x-ray pitch and to provide a means for varying the space width and fine tuning to account for process variations. Accordingly, a space width in the hybrid resist can be selectively printed by varying the mask-wafer gap distance, allowing more versatile structures to be formed and adjustments to be made for process changes such as resist composition and ion implant levels.
    Type: Grant
    Filed: May 21, 1998
    Date of Patent: January 11, 2000
    Assignee: Internaitonal Business Machines Corporation
    Inventors: Diane C. Boyd, Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, William H. Ma, Paul A. Rabidoux