Abstract: A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.

Abstract: A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.

Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.

Abstract: Systems and processes for controlling an imprinting process that dispenses a plurality of droplets onto a substrate. Droplet information representative of droplets is acquired. A set that includes droplet parameters of the droplets based on the droplet information may be estimated. Each of the droplet parameters is representative of particular droplets. Prior to a template being brought into contact with the droplets, either any of the set is outside ranges, or all of the set are inside ranges, may be determined. In a first case when any of the set are outside the ranges, then the imprinting process may be aborted prior to the template being brought into contact with the droplets. In a second case when all of the set are inside the ranges, then the imprinting process may be performed with the template.

Abstract: A superstrate can include a body having a surface; a buffer layer overlying the surface; and a protective layer overlying the buffer layer, wherein the protective layer has a surface roughness that is equal to or less than a surface roughness of the surface of the body. The protective layer can include a material that can be selectively removed with respect to the buffer layer, and the buffer layer can include a material that can be selectively removed with respect to the body of the superstrate. The superstrate can be used for more planarization or other processing sequences before the body needs to be replaced, as any defects that may form extend into the protective layer or buffer layer and not reach the body. The layers can be removed and replaced by corresponding new layers without significantly adversely affecting the body.

Abstract: A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.

Abstract: One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.

Abstract: Systems and processes for controlling an imprinting process that dispenses a plurality of droplets onto a substrate. Droplet information representative of droplets is acquired. A set that includes droplet parameters of the droplets based on the droplet information may be estimated. Each of the droplet parameters is representative of particular droplets. Prior to a template being brought into contact with the droplets, either any of the set is outside ranges, or all of the set are inside ranges, may be determined. In a first case when any of the set are outside the ranges, then the imprinting process may be aborted prior to the template being brought into contact with the droplets. In a second case when all of the set are inside the ranges, then the imprinting process may be performed with the template.

Abstract: A superstrate can include a body having a surface; a buffer layer overlying the surface; and a protective layer overlying the buffer layer, wherein the protective layer has a surface roughness that is equal to or less than a surface roughness of the surface of the body. The protective layer can include a material that can be selectively removed with respect to the buffer layer, and the buffer layer can include a material that can be selectively removed with respect to the body of the superstrate. The superstrate can be used for more planarization or other processing sequences before the body needs to be replaced, as defects may form extend into the protective layer or buffer layer and not reach the body. The layers can be removed and replaced by corresponding new layers without significantly adversely affecting the body.

Abstract: This invention comprises a semiconducting polymer having a permittivity greater than 3.4 at 1000 Hz and a charge mobility in the pure state greater than 10?7 cm2V?1s?1 and more preferably greater than 10?6 cm2V?1s?1. Preferred polymers include repeating units of triarylamines which have specific cyano and/or alkoxy substitution. They are suitable for use in electronic components such as organic thin film transistors.

Abstract: This invention comprises a semiconducting polymer having a permittivity greater than 3.4 at 1000 Hz and a charge mobility in the pure state greater than 10?7 cm2V?1s?1 and more preferably greater than 10?6 cm2V?1s?1. Preferred polymers include repeating units of triarylamines which have specific cyano and/or alkoxy substitution. They are suitable for use in electronic components such as organic thin film transistors.

Abstract: In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern.

Abstract: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.

Abstract: Described herein is a method of controlling call admission for packet switched networks, each network including at least two local area networks (50, 60) and a connecting network (70). The method comprises determining success rates of previous calls from a first local area network to a second local area network and deciding to drop the call attempt based on the success rates of previous calls. In one embodiment, the current packet loss rate for calls from the first local area network to the second local area network is also determined, and the decision to drop the call attempt is based on that current packet loss rate. Additionally, the decision to drop the call attempt may be based on both the current packet loss rate and the success rates of previous calls.

Abstract: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.

Abstract: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.

Abstract: Described herein is a method of controlling call admission for packet switched networks, each network including at least two local area networks (50, 60) and a connecting network (70). The method comprises transmitting a burst 5 of trial data of the same size as the packet to be transmitted from a first node (52, 54) in a first local area network (50) to a second node (62, 64) in a second local area network (60) via the connecting network (70). The connecting network (70) comprises a plurality of routing nodes (72, 74, 76, 78, 80) for muting the burst of trial data of the same size as the packet to be transmitted from a first node (52, 54) in a first local area network (50) to second node (62, 64) in a second local area network (60) via the connecting network (70). The connecting network (70) comprises a plurality of routing nodes (72, 74, 76, 78, 80) for routing the burst of trial data to the second node in the second local area network along a particular path.

Abstract: Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm.

Abstract: Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.