Patents by Inventor Eric S. Moyer

Eric S. Moyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5585450
    Abstract: An oligomerized cyclobutarene containing 80 weight percent or more of oligomers of a degree of polymerization of three or more.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: December 17, 1996
    Assignee: The Dow Chemical Company
    Inventors: Frank L. Oaks, Eric S. Moyer, Edward W. Rutter, Jr., Robert F. Harris
  • Patent number: 5489623
    Abstract: A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers from which they are made are disclosed. The polymers are useful in coatings, photoresists, and the like.
    Type: Grant
    Filed: April 25, 1995
    Date of Patent: February 6, 1996
    Assignee: The Dow Chemical Company
    Inventors: David A. Babb, W. Frank Richey, Katherine S. Clement, Eric S. Moyer, Marius W. Sorenson
  • Patent number: 5464925
    Abstract: The present invention is an oligomer represented by the formula: ##STR1## wherein X is a moiety selected from the group consisting of: ##STR2## where each Y is independently S, O, CH.sub.2, C.dbd.O, CH.sub.3 --C--CH.sub.3, O.dbd.S.dbd.O, or CF.sub.3 --C--CF.sub.3.In another aspect, the present invention is a polymer of the above-described oligomer.
    Type: Grant
    Filed: May 25, 1994
    Date of Patent: November 7, 1995
    Assignee: The Dow Chemical Company
    Inventors: Eric S. Moyer, Denise J. D. Moyer
  • Patent number: 5426164
    Abstract: A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers from which they are made are disclosed. The polymers are useful in coatings, photoresists, and the like.
    Type: Grant
    Filed: December 24, 1992
    Date of Patent: June 20, 1995
    Assignee: The Dow Chemical Company
    Inventors: David A. Babb, W. Frank Richey, Katherine S. Clement, Eric S. Moyer, Marius W. Sorenson