Patents by Inventor Faruk Gungor

Faruk Gungor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130263944
    Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
    Type: Application
    Filed: March 14, 2013
    Publication date: October 10, 2013
    Inventors: Faruk Gungor, Dien-Yeh Wu, Joseph Yudovsky, Mei Chang
  • Publication number: 20130098477
    Abstract: Provided are gas distribution apparatus with a delivery channel having an inlet end, an outlet end and a plurality of apertures spaced along the length. The inlet end is connectable to an inlet gas source and the outlet end is connectible with a vacuum source. Also provided are gas distribution apparatus with spiral delivery channels, intertwined spiral delivery channels, splitting delivery channels, merging delivery channels and shaped delivery channels in which an inlet end and outlet end are configured for rapid exchange of gas within the delivery channels.
    Type: Application
    Filed: October 17, 2012
    Publication date: April 25, 2013
    Inventors: Joseph Yudovsky, Mei Chang, Faruk Gungor, Paul F. Ma, David Chu, Chien-Teh Kao, Hyman Lam, Dien-Yeh Wu
  • Publication number: 20120135609
    Abstract: Provided are gas distribution plates (showerheads) for use in an apparatus configured to form a film during, for example, an atomic layer deposition (ALD) process. The gas distribution plate comprises a body defining a thickness and a peripheral edge and has a front surface for facing the substrate. The front surface has a central region with a plurality of openings configured to distribute process gases over the substrate and a focus ring with a sloped region. The focus ring is concentric to the central region such that the thickness at the focus ring is greater than the thickness at the central region.
    Type: Application
    Filed: November 30, 2010
    Publication date: May 31, 2012
    Applicant: Applied Materials, Inc.
    Inventors: Joseph Yudovsky, Tatsuya Sato, Kenric Choi, Anh N. Nguyen, Faruk Gungor
  • Publication number: 20100305884
    Abstract: Methods of determining an amount of precursor in an ampoule have been provided herein. In some embodiments, a method for determining an amount of solid precursor in an ampoule may include determining a first pressure in an ampoule having a first volume partially filled with a solid precursor; flowing an amount of a first gas into the ampoule to establish a second pressure in the ampoule; determining a remaining portion of the first volume based on a relationship between the first pressure, the second pressure, and the amount of the first gas flowed into the ampoule; and determining the amount of solid precursor in the ampoule based on the first volume and the remaining portion of the first volume.
    Type: Application
    Filed: May 17, 2010
    Publication date: December 2, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Joseph Yudovsky, Jeffrey Tobin, Patricia M. Liu, Faruk Gungor, Tai T. Ngo, Travis Tesch, Kenric Choi