Abstract: A manufacturing method for TFT array substrate and TFT array substrate are disclosed. After depositing an electrode material layer and a metal material layer on the gate insulation layer and the active layer in sequence after the active layer above the gate electrode is formed. A photoresist pattern is formed on the metal material layer. The photoresist pattern includes a first and second photoresist blocks with different thicknesses. The metal material layer and the electrode material layer are etched using the photoresist pattern to form a contact electrode and pixel electrodes connected with two ends of the active layer and the source/drain electrodes on the contact electrode. The process is simple and can effectively reduce the contact resistance between the source/drain and the active layer and improve the quality of the product.

Abstract: An array substrate, a method of manufacturing the same and a touch display panel are disclosed. An inorganic insulating layer, a plurality of common electrodes and a passivation layer are sequentially manufactured on a substrate formed with a plurality of thin film transistors and a plurality of touch signal lines. The passivation layer and the inorganic insulating layer are patterned to form a plurality of first via holes exposing drain electrodes of the thin film transistors and the touch signal lines, and to form a plurality of second via holes exposing the common electrodes in such a manner that the touch signal lines and the common electrodes are bridged through the touch electrodes formed on a surface of the passivation layer.

Abstract: A display panel and a display device are provided, which the display panel including a display substrate, a counter substrate, and a backlight. The display substrate includes a first thin film transistor layer, a touch electrode, and a pixel definition layer. The substrate includes a second thin film transistor layer and a photosensitive component. The second thin film transistor layer has a plurality of thin film transistors. The photosensitive component is connected to an underside of the second thin film transistor layer. The photosensitive component receives a reflected light of a user's fingerprint to identify an identification of the user.

Abstract: The present disclosure proposes a multiplex LCD driving circuit. By setting a new circuit structure, adjacent display pixels of the same color are opposite in polarity in the same row of subpixels. In this way, half of the data lines are applied with positive polarity voltage and half of the data line are applied with negative polarity voltage. Capacitance couplings between the data lines and the common electrodes are balanced off each other, which resolves the display picture abnormality caused by the coupling capacitance between the data line and the common electrode in the LTPS-LCD product.

Abstract: A method of manufacturing an array substrate and an array substrate are provided. The method of manufacturing the array substrate includes forming a first metal layer on a substrate, wherein the first metal layer includes a plurality of first metal lines and a plurality of intermittent second metal lines, forming an interlayer dielectric insulating layer on the substrate and the first metal layer, and forming an intermittent data line on the interlayer dielectric insulating layer and the first metal layer, wherein the intermittent data line contacts the two ends of each of the intermittent second metal lines through the via holes.

Abstract: A manufacturing method for a liquid crystal display panel is disclosed and includes a step forming a refractive index gradient layer, a step forming a gate electrode insulation layer, a step forming a first interlayer dielectric layer, and a step forming a second interlayer dielectric layer. The step forming a refractive index gradient layer includes depositing a silicon nitride layer on a glass substrate, depositing the refractive index gradient layer on the silicon nitride layer. The refractive index gradient layer is silicon oxide, and includes a lower refractive index decremental layer and a lower refractive index constant layer. A refractive index of the decremental layer gradually decreases along a direction away from the silicon nitride layer, the lower refractive index constant layer is on the lower refractive index decremental layer. A reflection rate between light in film layers can be lowered to improve light transmittance of the display panel.

Abstract: A manufacturing method for TFT array substrate and TFT array substrate are disclosed. After depositing an electrode material layer and a metal material layer on the gate insulation layer and the active layer in sequence after the active layer above the gate electrode is formed. A photoresist pattern is formed on the metal material layer. The photoresist pattern includes a first and second photoresist blocks with different thicknesses. The metal material layer and the electrode material layer are etched using the photoresist pattern to form a contact electrode and pixel electrodes connected with two ends of the active layer and the source/drain electrodes on the contact electrode. The process is simple and can effectively reduce the contact resistance between the source/drain and the active layer and improve the quality of the product.

Abstract: The present disclosure provides a TFT, an array substrate, their manufacturing methods, and a display device. A source electrode and a drain electrode of the TFT are each of a multi-layered structure including a metal layer and a metal barrier layer. An a-Si active layer of the TFT is covered with an etch stop layer, via-holes penetrating through the etch stop layer are provided at positions corresponding to the source electrode and the drain, and the source electrode and the drain electrode are connected to the a-Si active layer through the via-holes.