Abstract: A method of managing information concerning the supply chain of a perishable commodity utilizing a data repository capturing multiple data sources. The method further includes the collating of the data into a chain of custody information representation for use by data contributors.

Abstract: A method of managing information concerning the supply chain of a perishable commodity utilizing a data repository capturing multiple data sources. The method further includes the collating of the data into a chain of custody information representation for use by data contributors.

Abstract: A method of managing information concerning the supply chain of a perishable commodity utilizing a data repository capturing multiple data sources. The method further includes the collating of the data into a chain of custody information representation for use by data contributors.

Abstract: One or more embodiments identify server management actions for resolving problems associated with one or more nodes in information technology infrastructure. In one embodiment, a node-ticket record for an information processing node associated with at least one problem ticket is generated. A set of node-ticket clusters is queried based on the node-ticket record. Each of the set of node-ticket clusters maps a set of server management actions to set of historical node-ticket records associated with the node-ticket cluster. The set of server management actions was previously performed to resolve at least one operational problem associated with at least one information processing node. At least one set of server management actions associated with at least one of the set of node-ticket clusters corresponding to the node-ticket record within a given threshold is identified based on the querying.

Abstract: One or more embodiments identify server management actions for resolving problems associated with one or more nodes in information technology infrastructure. In one embodiment, a node-ticket record for an information processing node associated with at least one problem ticket is generated. A set of node-ticket clusters is queried based on the node-ticket record. Each of the set of node-ticket clusters maps a set of server management actions to set of historical node-ticket records associated with the node-ticket cluster. The set of server management actions was previously performed to resolve at least one operational problem associated with at least one information processing node. At least one set of server management actions associated with at least one of the set of node-ticket clusters corresponding to the node-ticket record within a given threshold is identified based on the querying.

Abstract: One or more embodiments identify server management actions for resolving problems associated with one or more nodes in information technology infrastructure. In one embodiment, a node-ticket record for an information processing node associated with at least one problem ticket is generated. A set of node-ticket clusters is queried based on the node-ticket record. Each of the set of node-ticket clusters maps a set of server management actions to set of historical node-ticket records associated with the node-ticket cluster. The set of server management actions was previously performed to resolve at least one operational problem associated with at least one information processing node. At least one set of server management actions associated with at least one of the set of node-ticket clusters corresponding to the node-ticket record within a given threshold is identified based on the querying.

Abstract: A method for predicting effects of climate change on supply chain performance includes receiving a global climate change model, a supply chain model, and at least one element model. A regional climate model modeling local weather is generated using the global climate model. A first supply chain performance is simulated using the supply chain model, the element model and the regional climate model. One or more extreme weather events are forecasted using the regional climate model. A second supply chain performance is simulated using the supply chain model and the forecasted extreme weather events. A score is determined for the supply chain performance.

Abstract: The techniques provided herein include obtaining a model of an enterprise operation that specifies initiation and one or more evolution milestones of one or more business entities, formulating one or more performance metrics for the enterprise operation, wherein the one or more performance metrics are calculated from the one or more business entities, the one or more evolution milestones, and one or more relevant external events, and using the one or more business entities and one or more performance metrics to automatically create an executable performance monitoring model for the enterprise operation, wherein the executable performance monitoring model processes data in the one or more business entities, the one or more evolution milestones, and the one or more relevant external events to compute the one or more performance metrics for the enterprise operation.

Abstract: One or more embodiments identify server management actions for resolving problems associated with one or more nodes in information technology infrastructure. In one embodiment, a node-ticket record for an information processing node associated with at least one problem ticket is generated. A set of node-ticket clusters is queried based on the node-ticket record. Each of the set of node-ticket clusters maps a set of server management actions to set of historical node-ticket records associated with the node-ticket cluster. The set of server management actions was previously performed to resolve at least one operational problem associated with at least one information processing node. At least one set of server management actions associated with at least one of the set of node-ticket clusters corresponding to the node-ticket record within a given threshold is identified based on the querying.

Abstract: The techniques provided herein include obtaining a model of an enterprise operation that specifies initiation and one or more evolution milestones of one or more business entities, formulating one or more performance metrics for the enterprise operation, wherein the one or more performance metrics are calculated from the one or more business entities, the one or more evolution milestones, and one or more relevant external events, and using the one or more business entities and one or more performance metrics to automatically create an executable performance monitoring model for the enterprise operation, wherein the executable performance monitoring model processes data in the one or more business entities, the one or more evolution milestones, and the one or more relevant external events to compute the one or more performance metrics for the enterprise operation.

Abstract: A semiconductor processing chamber is cleaned by introducing a cleaning gas into a processing chamber, striking a plasma in a remote plasma source that is in communication with the processing chamber, measuring the impedance of the plasma, vaporizing a ruthenium containing deposit on a surface of the processing chamber to form a ruthenium containing gas mixture, and flowing the gas mixture through an analyzer and into an exhaust collection assembly. The measurement of the impedance of the plasma in combination with the ruthenium concentration provides an accurate indication of chamber cleanliness.

Abstract: The present invention provides a method and system for providing contact management to participants engaged in a communication session. The invention permits chat session participants to a communication session to determine common contacts that exists between the chat session participants. Dependent on the accessibility of the particular chat session participants' contact list, other chat session participants to the communication session can view the information located in the contact list. Moreover, a particular chat session participant to the communication session can give either a particular chat session participant or all the chat session participants to the communication session permission to modify their contact list. Permission to access or modify contact lists for chat session participants can be defined prior to establishment of the communication session and/or changed during the communication session.

Abstract: Embodiments of the invention provide a method for forming a material on a substrate during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE-ALD) process. In one embodiment, a method is provided which includes flowing at least one process gas through at least one conduit to form a circular gas flow pattern, exposing a substrate to the circular gas flow pattern, sequentially pulsing at least one chemical precursor into the process gas and igniting a plasma from the process gas to deposit a material on the substrate. In one example, the circular gas flow pattern has circular geometry of a vortex, a helix, a spiral, or a derivative thereof. Materials that may be deposited by the method include ruthenium, tantalum, tantalum nitride, tungsten or tungsten nitride. Other embodiments of the invention provide an apparatus configured to form the material during the PE-ALD process.

Abstract: Embodiments of the invention provide an apparatus configured to form a material during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE-ALD) process. In one embodiment, a lid assembly for conducting a vapor deposition process within a process chamber is provided which includes an insulation cap and a plasma screen. In one example, the insulation cap has a centralized channel configured to flow a first process gas from an upper surface to an expanded channel and an outer channel configured to flow a second process gas from an upper surface to a groove which is encircling the expanded channel. In one example, the plasma screen has an upper surface containing an inner area with a plurality of holes and an outer area with a plurality of slots. The insulation cap may be positioned on top of the plasma screen to form a centralized gas region with the expanded channel and a circular gas region with the groove.

Abstract: Embodiments of the invention provide an apparatus configured to form a material during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE-ALD) process. In one embodiment, a showerhead assembly comprises a showerhead and a plasma baffle that are used to disperse process gases within a plasma-enhanced vapor deposition chamber. The showerhead plate comprises an inner area configured to position the plasma baffle therein and an outer area which has a plurality of holes for emitting a process gas. The plasma baffle comprises a conical nose disposed on an upper surface to receive another process gas, a lower surface to emit the process gas and a plurality of openings configured to flow the process gas from above the upper surface into a process region. The openings are preferably slots that are positioned at predetermined angle for emitting the process gas with a circular flow pattern.

Abstract: Embodiments of the invention provide an apparatus configured to form a material during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE-ALD) process. In one embodiment, a lid assembly is configured to expose a substrate to a sequence of gases and plasmas during a PE-ALD process. The lid assembly comprises components that are capable of being electrically insulated, electrically grounded or RF energized. In one example, the lid assembly comprises a grounded gas manifold assembly positioned above electrically insulated components, such as an insulation cap, a plasma screen insert and an isolation ring. A showerhead, a plasma baffle and a water box are positioned between the insulated components and become RF hot when activated by a plasma generator. Other embodiments of the invention provide deposition processes to form layers of materials within the process chamber.

Abstract: Embodiments of the invention provide an apparatus configured to form a material during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE-ALD) process. In one embodiment, a process chamber is configured to expose a substrate to a sequence of gases and plasmas during a PE-ALD process. The process chamber comprises components that are capable of being electrically insulated, electrically grounded or RF energized. In one example, a chamber body and a gas manifold assembly are grounded and separated by electrically insulated components, such as an insulation cap, a plasma screen insert and an isolation ring. A showerhead, a plasma baffle and a water box are positioned between the insulated components and become RF hot when activated by a plasma generator. Other embodiments of the invention provide deposition processes to form layers of materials within the process chamber.

Abstract: Embodiments of the invention provide a method for depositing ruthenium materials on a substrate by various vapor deposition processes, such as atomic layer deposition (ALD) and plasma-enhanced ALD (PE-ALD). In one aspect, the process has little or no initiation delay and maintains a fast deposition rate while forming a ruthenium material. The ruthenium material may be deposited with good step coverage, strong adhesion, and contains a low carbon concentration for high electrical conductivity. The method for depositing the ruthenium material on a substrate generally includes sequentially exposing the substrate to a pyrrolyl ruthenium precursor and a reagent during the ALD process. The pyrrolyl ruthenium precursor contains ruthenium and at least one pyrrolyl ligand. In some examples, the reagent may contain a plasma of ammonia, nitrogen, or hydrogen during a PE-ALD process. In other examples, a reducing gas may be used during a thermal ALD process.

Abstract: Embodiments of the invention provide a method for depositing ruthenium materials on a substrate by various vapor deposition processes, such as atomic layer deposition (ALD) and plasma-enhanced ALD (PE-ALD). In one aspect, the process has little or no initiation delay and maintains a fast deposition rate while forming a ruthenium material. The ruthenium material may be deposited with good step coverage, strong adhesion, and contains a low carbon concentration for high electrical conductivity. The method for depositing the ruthenium material on a substrate generally includes sequentially exposing the substrate to a pyrrolyl ruthenium precursor and a reagent during the ALD process. The pyrrolyl ruthenium precursor contains ruthenium and at least one pyrrolyl ligand. In some examples, the reagent may contain a plasma of ammonia, nitrogen, or hydrogen during a PE-ALD process. In other examples, a reducing gas may be used during a thermal ALD process.

Abstract: A method, system and computer program product for autonomic security configuration may include controlling a security configuration of at least one resource forming a solution based on a plurality of security requirements. The method may further include applying the plurality of security requirements across a plurality of resources independent of a resource type.