Patents by Inventor Fumiaki Shinozaki

Fumiaki Shinozaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4544627
    Abstract: A negative-working image forming process which comprises uniformly exposing a photosensitive material comprising a support having thereon a sensitive layer comprising (i) an o-quinonediazide compound and (ii) a second compound, to actinic radiation which is able to convert the o-quinonediazide compound to the corresponding indenecarboxylic acid compound, and subsequent to said uniformly exposing imagewise exposing said exposed photosensitive material to a laser beam to thereby render the indenecarboxylic acid compound of the imagewise exposed areas convert to the corresponding indene compound and developing with an alkaline developing solution to dissolve out the unexposed area to the laser beam, wherein said second compound reduces the rate of dissolution of the laser exposed areas in the developing solution by converting the indenecarboxylic acid to the corresponding indene compound, whereby said image results.
    Type: Grant
    Filed: November 3, 1983
    Date of Patent: October 1, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yonosuke Takahashi, Hiromichi Tachikawa, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4543318
    Abstract: A photopolymerizable composition is described, comprising (1) a non-gaseous ethylenically unsaturated compound which has at least two ethylenically unsaturated terminal groups and is capable of forming a polymer, (2) a thermoplastic polymeric binder, (3) a photopolymerization initiator which is activated by actinic radiation, and (4) at least one of certain heterocyclic compounds. The composition is useful as a photoresist for producing printed circuit boards, printing plates, etc., by etching or plating, and the photoresist has superior adhesion with respect to the base.
    Type: Grant
    Filed: July 2, 1984
    Date of Patent: September 24, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Minoru Maeda, Masayuki Iwasaki, Fumiaki Shinozaki
  • Patent number: 4504573
    Abstract: A high sensitivity photopolymerizable composition is disclosed. The composition includes a polymerizable compound having an ethylenically unsaturated bond and a photopolymerizable initiator represented by the general formula (I). ##STR1## The substituents within general formula (I) are defined within the specification. The composition has improved sensitivity and the initiator provides an increased polymerization rate. The composition may further include Michler's ketone and a N-methyl-2-benzoyl-.beta.-naphthothiazolin.
    Type: Grant
    Filed: March 22, 1984
    Date of Patent: March 12, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shun-ichi Ishikawa, Teruo Nagano, Koji Tamoto, Fumiaki Shinozaki
  • Patent number: 4485139
    Abstract: A heat-sensitive recording paper is disclosed. The paper is comprised of a support base having a heat-sensitive color forming layer coated thereon. The color forming layer contains color forming components comprising an almost colorless electron donating dye and an organic acid capable of forming color when contacted with the dye. The color forming layer is coated with a coating layer containing polyvinyl alcohol and boric acid. Due to the existence of the coating layer the recording paper has substantial resistance to decrease the recording density and occur the fog by various chemicals and oils.
    Type: Grant
    Filed: April 22, 1983
    Date of Patent: November 27, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shojiro Watanabe, Tomizo Namiki, Fumiaki Shinozaki
  • Patent number: 4482625
    Abstract: A process for preparing a color proofing sheet is disclosed. The process comprises imagewise exposing a light-sensitive image-forming material comprising a transparent support having provided thereon a dye- or pigment-containing light-sensitive photoresist composition layer or both a dye- or pigment-containing colorant layer and a light-sensitive photoresist composition layer through a color separation mask, developing the material to form a color separation image, transferring the color separation image onto a photopolymerizable image-receiving layer, transferring in registration at least one more color separation image onto the same image-receiving layer to obtain a multicolored color proofing sheet on a single support, and totally exposing the image-receiving layer after the image transfer in an amount sufficient to induce photopolymerization thereof.
    Type: Grant
    Filed: November 28, 1983
    Date of Patent: November 13, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tomizo Namiki, Tomohisa Tago, Mikio Totsuka, Fumiaki Shinozaki
  • Patent number: 4463083
    Abstract: A thermal recording element comprising a support having formed thereon a recording layer, a first protective layer comprising an organic high molecular weight material having a softening point below about 70.degree. C. formed on the recording layer, and a second protective layer comprising an organic high molecular weight material having high mechanical strength.
    Type: Grant
    Filed: May 11, 1982
    Date of Patent: July 31, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masao Kitajima, Osamu Seshimoto, Tomizo Namiki, Fumiaki Shinozaki, Tomoaki Ikeda, Yuzo Mizobuchi
  • Patent number: 4439515
    Abstract: A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the follow
    Type: Grant
    Filed: April 14, 1983
    Date of Patent: March 27, 1984
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Yasuo Washizawa, Tomoaki Ikeda, Sho Nakao, Syunichi Kondoh
  • Patent number: 4431725
    Abstract: A light-sensitive material having on a support a light-sensitive layer containing an o-quinonediazide compound as a main component and, additionally, a particular compound represented by the following general formula (I): ##STR1## wherein Z represents the nonmetallic atoms forming a 5-membered ring; X represents S, O, ##STR2## or .dbd.N--R.sub.c (where R.sub.a, R.sub.b and R.sub.c are each a hydrogen atom or an organic group other than a carboxylic acid group); and Y is a hydrogen atom or an organic group other than a carboxylic acid group, is disclosed. This material can provide both positive and negative working images having high resolution and good adhesiveness to the support. A process for producing positive working images includes the steps of imagewise exposure and development processing, while a process for producing negative working images includes the steps of imagewise exposure, heating, uniform (overall) exposure and development processing.
    Type: Grant
    Filed: July 19, 1982
    Date of Patent: February 14, 1984
    Inventors: Hiromichi Tachikawa, Yohnosuke Takahashi, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4415650
    Abstract: A recording material having high sensitivity and providing good image quality comprising a support having thereon a recording layer thermally deformable by exposure to high intensity radiation, which recording layer comprises (1) a vacuum deposited layer of at least one organic compound selected from the group consisting of organic carboxylic acids, organic carboxylic acid salts, organic carboxylic acid esters, aromatic sulfonic acids, organic acyclic sulfur compounds, nitrogen-containing heterocyclic compounds, sulfur-containing heterocyclic compounds, organic macromolecular compounds, dyes and pigments, or (2) a vacuum co-deposited layer of a mixture of (a) at least one of the organic compounds described above and (b) at least one inorganic material selected from the group consisting of a metal or a metal compound.
    Type: Grant
    Filed: June 14, 1978
    Date of Patent: November 15, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keishiro Kido, Minoru Wada, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4411983
    Abstract: By treating an imagewise exposed and developed image-forming material comprising a support and a light-sensitive resin composition layer with organic solvents miscible with water or with a mixture of water and organic solvents miscible with water, elimination of non-image areas is completed.
    Type: Grant
    Filed: March 11, 1982
    Date of Patent: October 25, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuo Washizawa, Fumiaki Shinozaki, Tomoaki Ikeda, Sho Nakao
  • Patent number: 4396700
    Abstract: A process for forming an image is disclosed wherein a photosensitive image-forming material comprising a diazonium compound or an azide compound is exposed and developed by a peeling development method wherein a development carrier sheet having thereon a layer of an adhesive composition is adhered to the image-forming material, before or after exposure, and, after exposure, peeled from the image-forming material whereby the exposed areas of the photosensitive layer are adhered to the carrier sheet thereby forming a relief image, and the unexposed areas remaining adhered to the support also forming a relief image.
    Type: Grant
    Filed: December 17, 1981
    Date of Patent: August 2, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masao Kitajima, Hiromichi Tachikawa, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4388399
    Abstract: A light-sensitive image-forming material which comprises a support having provided thereon a first layer comprising at least one alcohol-soluble polyamide resin and, on said first layer, a second layer comprising a light-sensitive photoresist composition, said layer containing said alcohol-soluble polyamide resin containing one or more polymers having one or more of a free carboxy group(s), one or more of a phenolic hydroxy group(s) or a maleic anhydride group in a proportion of about 0.1:9.9 to 6:4 by weight to said polyamide resin.
    Type: Grant
    Filed: February 10, 1982
    Date of Patent: June 14, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomizo Namiki, Tomoaki Ikeda
  • Patent number: 4386153
    Abstract: A light-sensitive composition comprising addition polymerizable ethylenically unsaturated double bond-containing compounds and a photopolymerization initiator comprising (1) at least one compound selected from the group consisting of benzanthrone, substituted benzanthrones (the substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms), 1,2-benzanthraquinone and substituted benzanthraquinones (substituents of which include halogen atoms, alkyl groups having 1 to 5 carbon atoms and alkoxy groups having 1 to 5 carbon atoms) and (2) at least one compound selected from the group consisting of 4,4'-di-substituted amino-benzophenones represented by the following general formula (a), p-substituted amino-benzaldehyde derivatives represented by the following general formula (b), 2-(p-substituted amino-phenyl)-1,3-dioxolanes represented by the following general formula (c), 4,4'-bis(substituted amino)-N-benzylideneanilines represented by the follow
    Type: Grant
    Filed: March 4, 1981
    Date of Patent: May 31, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Yasuo Washizawa, Tomoaki Ikeda, Sho Nakao, Syunichi Kondoh
  • Patent number: 4370404
    Abstract: A novel desensitizing solution is disclosed which is applied to the surface of a lithographic printing plate coated with a photosensitive layer of a photopolymerizable composition, the desensitizing solution contains a hydrophilic colloid, a free radical polymerization inhibitor and water.
    Type: Grant
    Filed: November 5, 1981
    Date of Patent: January 25, 1983
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiromichi Tachikawa, Yohonosuke Takahashi, Kazuo Ishii, Tomoaki Ikeda, Fumiaki Shinozaki
  • Patent number: 4356254
    Abstract: An image-forming method is described using a light-sensitive material comprising a support and a light-sensitive layer on the support, said light-sensitive layer containing an o-quinonediazide compound as a first component and a basic carbonium dye as a second component; according to this method images can be obtained both by positive working and negative working techniques. Furthermore, images which are free from yellow light fogging can be obtained by use of a laser beam.
    Type: Grant
    Filed: July 7, 1980
    Date of Patent: October 26, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yohnosuke Takahashi, Hiromichi Tachikawa, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4356255
    Abstract: A photosensitive member comprising a photosensitive layer containing an o-quinonediazide compound as a photosensitive agent and an additive, characterized in that the additive is selected from a group consisting of quinone compounds and aromatic ketone compounds, and a method for forming an image using the same.
    Type: Grant
    Filed: June 30, 1980
    Date of Patent: October 26, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiromichi Tachikawa, Yohnosuke Takahashi, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4334006
    Abstract: A process for forming an image is disclosed wherein a photo-sensitive material composed of a support and a layer of a photo-sensitive composition containing a diazonium compound, an o-quinonediazide compound or an aromatic azide is exposed and developed by heating in intimate contact with a peeling development carrier sheet, and subsequently, peeling the carrier sheet from the photo-sensitive material.
    Type: Grant
    Filed: April 14, 1980
    Date of Patent: June 8, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masao Kitajima, Hiromichi Tachikawa, Fumiaki Shinozaki, Tomoaki Ikeda
  • Patent number: 4328304
    Abstract: A novel desensitizing solution is disclosed which is applied to the surface of a lithographic printing plate coated with a photosensitive layer of a photopolymerizable composition, the desensitizing solution contains a hydrophilic colloid, a free radical polymerization inhibitor and water.
    Type: Grant
    Filed: September 24, 1979
    Date of Patent: May 4, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiromichi Tachikawa, Yohonosuke Takahashi, Kazuo Ishii, Tomoaki Ikeda, Fumiaki Shinozaki
  • Patent number: 4317123
    Abstract: A thermal recording material possessing high sensitivity which comprises a support having thereon in sequence a subbing layer, a recording layer and optionally, a protecting layer in which the subbing layer contains a composition comprising (A) 100 parts by weight of chlorinated polyolefin having a chlorine content of about 30% by weight or more and (B) 1 part to 100 parts by weight of aminoalkylalkoxysilane compound represented by the following general formula (I): ##STR1## wherein R.sup.1 represents an amino group or a H.sub.2 N--R.sup.5 --NH-- group; R.sup.2 and R.sup.5 each represents a polymethylene group having 1 to 2 carbon atoms or a straight or branched chain alkylene (alkanediyl) group having 3 to 5 carbon atoms, and may be the same or different; R.sup.3 represents a straight or branched chain alkyl group having 1 to 5 carbon atoms; m represents 2 or 3; R.sup.4 represents a straight or branched chain alkyl group having 1 to 5 carbon atoms or an R.sup.1 --R.sup.
    Type: Grant
    Filed: October 25, 1979
    Date of Patent: February 23, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tomizo Namiki, Osamu Seshimoto, Fumiaki Shinozaki, Akira Nahara, Tomoaki Ikeda
  • Patent number: 4309713
    Abstract: A thermal recording element comprising a support, a recording layer formed thereon and a chlorinated polyolefin layer formed on said recording layer.
    Type: Grant
    Filed: June 26, 1979
    Date of Patent: January 5, 1982
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Tomizo Namiki, Masao Kitajima, Tomoaki Ikeda, Yuzo Mizobuchi