Patents by Inventor Gerd Pfeiffer

Gerd Pfeiffer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130244348
    Abstract: Methods are provided for fine tuning substrate resistivity. The method includes measuring a resistivity of a substrate after an annealing process, and fine tuning a subsequent annealing process to achieve a target resistivity of the substrate. The fine tuning is based on the measured resistivity.
    Type: Application
    Filed: March 15, 2012
    Publication date: September 19, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jeffrey P. GAMBINO, Derrick LIU, Dale W. MARTIN, Gerd PFEIFFER
  • Patent number: 8536035
    Abstract: Silicon-on-insulator (SOI) structures and related methods of forming such structures. In one case, a method includes providing a silicon-on-insulator (SOI) handle substrate having: a substantially uniform resistivity profile along a depth of the handle substrate; and an interstitial oxygen (Oi) concentration of less than approximately 10 parts per million atoms (ppma). The method further includes counter-doping a surface region of the handle, causing the surface region to have a resistivity greater than approximately 3 kOhm-cm, and joining the surface region of the handle substrate with a donor wafer.
    Type: Grant
    Filed: February 1, 2012
    Date of Patent: September 17, 2013
    Assignee: International Business Machines Corporation
    Inventors: Alan B. Botula, Mark D. Jaffe, Alvin J. Joseph, Kenneth F. McAvey, Gerd Pfeiffer, Richard A. Phelps
  • Patent number: 8535970
    Abstract: The invention relates to a manufacturing process of a photovoltaic solar cell (100) comprising: providing high doped areas (20) on the rear side (18) of the photovoltaic solar cell (100), providing localized metal contacts (30) localized on said high doped areas (20), providing a passivation layer (50) covering a surface (52) between said contacts (30), wherein the contacts (30) remain substantially free of the passivation layer (50), and depositing a metal layer (32) for a back surface field.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: September 17, 2013
    Assignee: International Business Machines Corporation
    Inventors: Ranier Krauser, Lawrence A. Clevenger, Kevin Prettyman, Brian Christopher Sapp, Kevin S. Petrarca, Harold John Hovel, Gerd Pfeiffer, Zhengwen Li, Carl John Radens
  • Publication number: 20130196493
    Abstract: Silicon-on-insulator (SOI) structures and related methods of forming such structures. In one case, a method includes providing a silicon-on-insulator (SOI) handle substrate having: a substantially uniform resistivity profile along a depth of the handle substrate; and an interstitial oxygen (Oi) concentration of less than approximately 10 parts per million atoms (ppma). The method further includes counter-doping a surface region of the handle, causing the surface region to have a resistivity greater than approximately 3 kOhm-cm, and joining the surface region of the handle substrate with a donor wafer.
    Type: Application
    Filed: February 1, 2012
    Publication date: August 1, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Alan B. Botula, Mark D. Jaffe, Alvin J. Joseph, Kenneth F. McAvey, Gerd Pfeiffer, Richard A. Phelps
  • Patent number: 8486751
    Abstract: A method of manufacturing a photovoltaic cell using a semiconductor wafer having a front side and a rear side, wherein the photovoltaic cell produces electricity when the front side of the semiconductor wafer is illuminated.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: July 16, 2013
    Assignee: International Business Machines Corporation
    Inventors: Lawrence A. Clevenger, Harold J. Hovel, Rainer Klaus Krause, Kevin S. Petrarca, Gerd Pfeiffer, Kevin M. Prettyman, Brian C. Sapp
  • Patent number: 8372725
    Abstract: Structures and methods are provided for forming pre-fabricated deep trench capacitors for SOI substrates. The method includes forming a trench in a substrate and forming a dielectric material in the trench. The method further includes depositing a conductive material over the dielectric material in the trench and forming an insulator layer over the conductive material and the substrate.
    Type: Grant
    Filed: February 23, 2010
    Date of Patent: February 12, 2013
    Assignee: International Business Machines Corporation
    Inventors: Robert Hannon, Subramanian S. Iyer, Gerd Pfeiffer, Ravi M. Todi, Kevin R. Winstel
  • Publication number: 20130009277
    Abstract: A structure and method for forming isolation and a buried plate for a trench capacitor is disclosed. Embodiments of the structure comprise an epitaxial layer serving as the buried plate, and a bounded deep trench isolation area serving to isolate one or more deep trench structures. Embodiments of the method comprise angular implanting of the deep trench isolation area to form a P region at the base of the deep trench isolation area that serves as an anti-punch through implant.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: International Business Machines Corporation
    Inventors: Abhishek Dube, Subramanian S. Iyer, Babar Ali Khan, Oh-jung Kwon, Junedong Lee, Paul C. Parries, Chengwen Pei, Gerd Pfeiffer, Ravi M. Todi, Geng Wang
  • Patent number: 8298908
    Abstract: A structure and method for forming isolation and a buried plate for a trench capacitor is disclosed. Embodiments of the structure comprise an epitaxial layer serving as the buried plate, and a bounded deep trench isolation area serving to isolate one or more deep trench structures. Embodiments of the method comprise angular implanting of the deep trench isolation area to form a P region at the base of the deep trench isolation area that serves as an anti-punch through implant.
    Type: Grant
    Filed: February 11, 2010
    Date of Patent: October 30, 2012
    Assignee: International Business Machines Corporation
    Inventors: Abhishek Dube, Subramanian S. Iyer, Babar Ali Khan, Oh-jung Kwon, Junedong Lee, Paul C. Parries, Chengwen Pei, Gerd Pfeiffer, Ravi M. Todi, Geng Wang
  • Publication number: 20120160295
    Abstract: A method for characterizing the electronic properties of a solar cell to be used in a photovoltaic module comprises the steps of performing a room temperature IV curve measurement of the solar cell and classifying the solar cell based on this IV curve measurement. In order to take stress-related effects into account, the solar cells are reclassified depending on the result of an additional measurement conducted on the solar cells under stress. This stress-related measurement may be gained from light induced thermography (LIT) yielding information on diode shunt areas within the solar cell.
    Type: Application
    Filed: June 24, 2011
    Publication date: June 28, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Lawrence A. Clevenger, Harold J. Hovel, Rainer Klaus Krause, Kevin S. Petrarca, Gerd Pfeiffer, Kevin Prettyman, Brian C. Sapp
  • Patent number: 8197912
    Abstract: A method for manufacturing thin film panels comprises providing a laser patterning system, depositing a base layer on a glass substrate, separating the base layer by scribing a plurality of separation lines corresponding with a predefined scribe pattern, depositing a functional layer on the base layer, determining a first base layer separation edge, moving the translation stage by a first distance, activating the laser array and moving the translation stage by a second distance, deactivating the laser array, determining subsequent separation edges of the base layer and scribing lines therein, depositing a top layer on the functional layer, determining a first functional layer separation edge, operating the stepper motor to move the translation stage by a third distance, activating the laser array and moving the translation stage by a fourth distance, deactivating the laser array, and determining subsequent separation edges of the functional layer and scribing lines therein.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: June 12, 2012
    Assignee: International Business Machines Corporation
    Inventors: Rainer Krause, Gerd Pfeiffer
  • Publication number: 20110318865
    Abstract: The invention relates to a manufacturing process of a photovoltaic solar cell (100) comprising: providing high doped areas (20) on the rear side (18) of the photovoltaic solar cell (100), providing localized metal contacts (30) localized on said high doped areas (20), providing a passivation layer (50) covering a surface (52) between said contacts (30), wherein the contacts (30) remain substantially free of the passivation layer (50), and depositing a metal layer (32) for a back surface field.
    Type: Application
    Filed: June 6, 2011
    Publication date: December 29, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ranier Krauser, Lawrence A. Clevenger, Kevin Prettyman, Brian Christopher Sapp, Kevin S. Petrarca, Harold John Hovel, Gerd Pfeiffer, Zhengwen Li, Carl John Radens
  • Publication number: 20110316343
    Abstract: A photovoltaic module (10) comprises a plurality of solar cells (20) interconnected in serial arrays (15). At least some of the solar cells (20) are equipped with control units (30) comprising at least one thermal sensor (42) and one power sensor (43). The control unit (30) comprises means (35) for removing a specific solar cell (20?) from the photovoltaic module (10) network if said solar cell (20?) is found to have reached a predefined level of degradation. In a preferred embodiment, control unit (30) is an ASIC chip (40) in thermal contact with said solar cell (20) and electrically connected to said solar cell (20).
    Type: Application
    Filed: June 6, 2011
    Publication date: December 29, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ranier Krauser, Lawrence A. Clevenger, Kevin Prettyman, Brian Christopher Sapp, Kevin S. Petrarca, Harold John Hovel, Gerd Pfeiffer, Zhengwen Li, Carl John Radens
  • Publication number: 20110317324
    Abstract: A photovoltaic module (10) with a plurality of solar cells (20) interconnected in serial and/or parallel arrangement within the module (10) is equipped with an overheat protection system (30) for suppressing damages of the photovoltaic module (10) due to defects of the solar cells (20). The overheat protection system (30) comprises a heat sensor (32) which is thermally coupled to a solar cell (20). The heat sensor (32) is physically integrated into an electrical switch (34, 36, 38) which is electrically connected to said solar cell (20).
    Type: Application
    Filed: June 23, 2011
    Publication date: December 29, 2011
    Applicant: International Business Machines Corporation
    Inventors: Lawrence A. Clevenger, Harold J. Hovel, Rainer Krause, Zhengwen Li, Kevin S. Petrarca, Gerd Pfeiffer, Kevin Prettyman, Carl J. Radens, Brian C. Sapp
  • Publication number: 20110204524
    Abstract: Structures and methods are provided for forming pre-fabricated deep trench capacitors for SOI substrates. The method includes forming a trench in a substrate and forming a dielectric material in the trench. The method further includes depositing a conductive material over the dielectric material in the trench and forming an insulator layer over the conductive material and the substrate.
    Type: Application
    Filed: February 23, 2010
    Publication date: August 25, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert HANNON, Subramanian S. IYER, Gerd PFEIFFER, Ravi M. TODI, Kevin R. WINSTEL
  • Publication number: 20110193193
    Abstract: A structure and method for forming isolation and a buried plate for a trench capacitor is disclosed. Embodiments of the structure comprise an epitaxial layer serving as the buried plate, and a bounded deep trench isolation area serving to isolate one or more deep trench structures. Embodiments of the method comprise angular implanting of the deep trench isolation area to form a P region at the base of the deep trench isolation area that serves as an anti-punch through implant.
    Type: Application
    Filed: February 11, 2010
    Publication date: August 11, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Abhishek Dube, Subramanian S. Iyer, Babar Ali Khan, Oh-jung Kwon, Junedong Lee, Paul C. Parries, Chengwen Pei, Gerd Pfeiffer, Ravi M. Todi, Geng Wang
  • Publication number: 20110180896
    Abstract: A method of forming a bonded wafer structure includes providing a first semiconductor wafer substrate having a first silicon oxide layer at the top surface of the first semiconductor wafer substrate; providing a second semiconductor wafer substrate; forming a second silicon oxide layer on the second semiconductor wafer substrate; forming a silicon nitride layer on the second silicon oxide layer; and bringing the first silicon oxide layer of the first semiconductor wafer substrate into physical contact with the silicon nitride layer of the second semiconductor wafer substrate to form a bonded interface between the first silicon oxide layer and the silicon nitride layer. Alternatively, a third silicon oxide layer may be formed on the silicon nitride layer before bonding. A bonded interface is then formed between the first and third silicon oxide layers. A bonded wafer structure formed by such a method is also provided.
    Type: Application
    Filed: January 25, 2010
    Publication date: July 28, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Gerd Pfeiffer, Haizhou Yin, Edmund J. Sprogis, Subramanian Iyer, Zhibin Ren, Dae-Gyu Park, Oleg Gluschenkov
  • Publication number: 20110120519
    Abstract: A method of manufacturing a photovoltaic cell using a semiconductor wafer having a front side and a rear side, wherein the photovoltaic cell produces electricity when the front side of the semiconductor wafer is illuminated.
    Type: Application
    Filed: November 23, 2010
    Publication date: May 26, 2011
    Applicant: International Business Machines Corporation
    Inventors: Lawrence A. Clevenger, Harlod J. Hovel, Rainer Klaus Krause, Kevin S. Petrarca, Gerd Pfeiffer, Kevin M. Prettyman, Brian C. Sapp
  • Publication number: 20110100451
    Abstract: A silicon solar cell is manufactured by providing a carrier plate, and by applying a first contact pattern to the carrier plate. The first contact pattern includes a set of first laminar contacts. The silicon solar cell is further manufactured by applying a multitude of silicon slices to the first contact pattern, and by applying a second contact pattern to the multitude of silicon slices. Each first laminar contact of the set of first laminar contacts is in spatial laminar contact with maximally two silicon slices. The second contact pattern includes a set of second laminar contacts. Each second laminar contact of the set of second laminar contacts is in spatial laminar contact with maximally two silicon slices.
    Type: Application
    Filed: January 13, 2009
    Publication date: May 5, 2011
    Inventors: Rainer Klaus Krause, Gerd Pfeiffer, Hans-Juergen Eickelmann, Thorsten Muehge
  • Publication number: 20110100412
    Abstract: A photovoltaic module and a method of manufacturing such a module in which metal is deposited in a pattern on the front side of a semiconductor wafer which acts as an electrode. Photovoltaic cells manufactured using a semiconductor wafer typically have a P type semiconductor region and an N type semiconductor region. The metal on the front side of each of the photovoltaic cells forms an electrical connection to the doped layer of the semiconductor wafer on its front side.
    Type: Application
    Filed: June 29, 2010
    Publication date: May 5, 2011
    Applicant: International Business Machines Corporation
    Inventors: Lawrence A. Clevenger, Rainer Krause, Karl-Heinz Lehnert, Gerd Pfeiffer, Kevin Prettyman
  • Publication number: 20110100420
    Abstract: An apparatus, system, and method are disclosed for a photovoltaic module, the photovoltaic module comprising a plurality of photovoltaic cells, a controllable infrared protection layer, and a protection switching means. The controllable infrared protection layer is for reducing the infrared radiation absorbed by the photovoltaic module, where the controllable infrared protection layer has a first state and a second state. When the infrared protection layer is in the first state the transmission of infrared radiation to the photovoltaic cells is higher than when the infrared protection layer is in the second state. The protection switching means is for switching the controllable infrared protection layer between the first state and the second state.
    Type: Application
    Filed: September 21, 2010
    Publication date: May 5, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Lawrence A. Clevenger, Timothy J. Dalton, Maxime Darnon, Rainer Krause, Gerd Pfeiffer, Kevin Prettyman, Carl J. Radens, Brian C. Sapp