Patents by Inventor Gregg Higashi

Gregg Higashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8119210
    Abstract: In one embodiment, a method for depositing a capping layer on a dielectric layer in a process chamber is provided which includes depositing the dielectric layer on a substrate surface, depositing a silicon-containing layer by an ALD process, comprising alternately pulsing a silicon precursor and an oxidizing gas into the process chamber, and exposing the silicon-containing layer to a nitridation process. In another embodiment, a method for depositing a silicon-containing capping layer on a dielectric layer in a process chamber by an ALD process is provided which includes flowing a silicon precursor into the process chamber, purging the process chamber with a purge gas, flowing an oxidizing gas comprising water formed by flowing a H2 gas and an oxygen-containing gas through a water vapor generator, and purging the process chamber with the purge gas.
    Type: Grant
    Filed: May 21, 2004
    Date of Patent: February 21, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Pravin K. Narwankar, Gregg Higashi
  • Publication number: 20110308463
    Abstract: A chemical vapor deposition reactor and system has a housing, a substrate transport apparatus and a plurality of fixed processing zones. The processing zones include one or more chemical vapor deposition zones, each having an independent reactant gas supply. Each chemical vapor deposition zone may have a respective showerhead. The substrate transport apparatus moves the substrate along a path from the entrance of the housing to the exit of the housing, passing sequentially through each of the processing zones. A respective isolation zone between neighboring processing zones functions to prevent mixing of gases between the processing zones. The isolation zone has a gas dual flow path directing gas flows in opposing directions. The isolation zone may include a gas inflow isolator coupled via a gas dual flow path to respective exhaust ports of respective process zones. The isolation zone may include a respective isolation curtain having a split gas flow.
    Type: Application
    Filed: August 30, 2011
    Publication date: December 22, 2011
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi
  • Patent number: 8008174
    Abstract: Embodiments of the invention generally relate to a method for forming a multi-layered material during a continuous chemical vapor deposition (CVD) process. In one embodiment, a method for forming a multi-layered material during a continuous CVD process is provided which includes continuously advancing a plurality of wafers through a deposition system having at least four deposition zones. Multiple layers of materials are deposited on each wafer, such that one layer is deposited at each deposition zone. The methods provide advancing each wafer through each deposition zone while depositing a first layer from the first deposition zone, a second layer from the second deposition zone, a third layer from the third deposition zone, and a fourth layer from the fourth deposition zone. Embodiments described herein may be utilized to form an assortment of materials on wafers or substrates, especially for forming Group III/V materials on GaAs wafers.
    Type: Grant
    Filed: October 12, 2009
    Date of Patent: August 30, 2011
    Assignee: Alta Devices, Inc.
    Inventors: Gang He, Gregg Higashi
  • Publication number: 20110083601
    Abstract: Embodiments of the invention generally relate processes for epitaxial growing Group III/V materials at high growth rates, such as about 30 ?m/hr or greater, for example, about 40 ?m/hr, about 50 ?m/hr, about 55 ?m/hr, about 60 ?m/hr, or greater. The deposited Group III/V materials or films may be utilized in solar, semiconductor, or other electronic device applications. In some embodiments, the Group III/V materials may be formed or grown on a sacrificial layer disposed on or over the support substrate during a vapor deposition process. Subsequently, the Group III/V materials may be removed from the support substrate during an epitaxial lift off (ELO) process. The Group III/V materials are thin films of epitaxially grown layers which contain gallium arsenide, gallium aluminum arsenide, gallium indium arsenide, gallium indium arsenide nitride, gallium aluminum indium phosphide, phosphides thereof, nitrides thereof, derivatives thereof, alloys thereof, or combinations thereof.
    Type: Application
    Filed: October 13, 2010
    Publication date: April 14, 2011
    Applicant: Alta Devices, Inc.
    Inventors: Lori D. WASHINGTON, David P. BOUR, Gregg HIGASHI, Gang HE
  • Publication number: 20110056546
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. In one embodiment of a photovoltaic (PV) device, the PV device generally includes an n-doped layer and a p+-doped layer adjacent to the n-doped layer to form a p-n layer such that electric energy is created when electromagnetic radiation is absorbed by the p-n layer. The n-doped layer and the p+-doped layer may compose an absorber layer having a thickness less than 500 nm. Such a thin absorber layer may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
    Type: Application
    Filed: November 5, 2010
    Publication date: March 10, 2011
    Applicant: ALTA DEVICES, INC.
    Inventors: Isik C. KIZILYALLI, Melissa J. ARCHER, Harry ATWATER, Thomas J. GMITTER, Gang HE, Andreas G. HEGEDUS, Gregg HIGASHI
  • Publication number: 20110056553
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) unit, according to embodiments of the invention, may have a very thin absorber layer produced by epitaxial lift-off (ELO), all electrical contacts positioned on the back side of the PV device to avoid shadowing, and/or front side and back side light trapping employing a diffuser and a reflector to increase absorption of the photons impinging on the front side of the PV unit. Several PV units may be combined into PV banks, and an array of PV banks may be connected to form a PV module with thin strips of metal or conductive polymer applied at low temperature. Such innovations may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
    Type: Application
    Filed: November 5, 2010
    Publication date: March 10, 2011
    Applicant: Alta Devices, Inc.
    Inventors: Isik C. KIZILYALLI, Melissa ARCHER, Harry ATWATER, Thomas J. GMITTER, Gang HE, Andreas HEGEDUS, Gregg HIGASHI
  • Publication number: 20110048519
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) device may incorporate front side and/or back side light trapping techniques in an effort to absorb as many of the photons incident on the front side of the PV device as possible in the absorber layer. The light trapping techniques may include a front side antireflective coating, multiple window layers, roughening or texturing on the front and/or the back sides, a back side diffuser for scattering the light, and/or a back side reflector for redirecting the light into the interior of the PV device. With such light trapping techniques, more light may be absorbed by the absorber layer for a given amount of incident light, thereby increasing the efficiency of the PV device.
    Type: Application
    Filed: November 5, 2010
    Publication date: March 3, 2011
    Applicant: ALTA DEVICES, INC.
    Inventors: Isik C. KIZILYALLI, Melissa ARCHER, Harry ATWATER, Thomas J. GMITTER, Gang HE, Andreas HEGEDUS, Gregg HIGASHI
  • Publication number: 20110048532
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) unit, according to embodiments of the invention, may have a very thin absorber layer produced by epitaxial lift-off (ELO), all electrical contacts positioned on the back side of the PV device to avoid shadowing, and/or front side and back side light trapping employing a diffuser and a reflector to increase absorption of the photons impinging on the front side of the PV unit. Several PV units may be combined into PV banks, and an array of PV banks may be connected to form a PV module with thin strips of metal or conductive polymer applied at low temperature. Such innovations may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
    Type: Application
    Filed: November 5, 2010
    Publication date: March 3, 2011
    Applicant: ALTA DEVICES, INC.
    Inventors: Isik C. KIZILYALLI, Melissa ARCHER, Harry ATWATER, Thomas J. GMITTER, Gang HE, Andreas HEGEDUS, Gregg HIGASHI
  • Publication number: 20110041904
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. In one embodiment of a photovoltaic (PV) device, the PV device generally includes an n-doped layer and a p+-doped layer adjacent to the n-doped layer to form a p-n layer such that electric energy is created when electromagnetic radiation is absorbed by the p-n layer. The n-doped layer and the p+-doped layer may compose an absorber layer having a thickness less than 500 nm. Such a thin absorber layer may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
    Type: Application
    Filed: November 5, 2010
    Publication date: February 24, 2011
    Applicant: ALTA DEVICES, INC.
    Inventors: Isik C. KIZILYALLI, Melissa ARCHER, Harry ATWATER, Thomas J. GMITTER, Gang HE, Andreas HEGEDUS, Gregg HIGASHI
  • Publication number: 20100229793
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a showerhead assembly is provided which includes a body having a centralized channel extending through upper and lower portions of the body and extending parallel to a central axis of the body. The showerhead assembly contains an optional diffusion plate having a first plurality of holes and disposed within the centralized channel, an upper tube plate having a second plurality of holes and disposed within the centralized channel below the diffusion plate, a lower tube plate having a third plurality of holes and disposed within the centralized channel below the upper tube plate, and a plurality of tubes extending from the upper tube plate to the lower tube plate. Each tube is coupled to and in fluid communication with individual holes of the upper and lower tube plates.
    Type: Application
    Filed: March 16, 2010
    Publication date: September 16, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100212591
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to each other on a lid support, and a second showerhead assembly and an exhaust assembly disposed next to each other on the lid support, wherein the isolator assembly is disposed between the first and second showerhead assemblies and the second showerhead assembly is disposed between the isolator assembly and the exhaust assembly.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 26, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100209626
    Abstract: Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor deposition reactor system includes exposing a lower surface of a substrate susceptor, such as a wafer carrier, to energy emitted from a heating lamp assembly, and heating the substrate susceptor to a predetermined temperature. The heating lamp assembly generally contains a lamp housing disposed on an upper surface of a support base and contains at least one lamp holder, a plurality of lamps extending from the lamp holder, and a reflector disposed on the upper surface of the support base, next to the lamp holder, and below the lamps. The plurality of lamps may have split filament lamps and/or non-split filament lamps for heating inner and outer portions of the substrate susceptor.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100209082
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a heating lamp assembly for a vapor deposition reactor system is provided which includes a lamp housing disposed on an upper surface of a support base and containing a first lamp holder and a second lamp holder and a plurality of lamps extending from the first lamp holder to the second lamp holder. The plurality of lamps may have split filament lamps and/or non-split filament lamps, and in some examples, split and non-split filament may be alternately disposed between the first and second lamp holders. A reflector may be disposed on the upper surface of the support base between the first and second lamp holders. The reflector may contain gold or a gold alloy.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100206235
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100206229
    Abstract: Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor is provided which includes a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembly, a second showerhead assembly, and an exhaust assembly consecutively and linearly disposed next to each other on a lid support. The CVD reactor further contains first and second faceplates disposed on opposite ends of the reactor body, wherein the first showerhead assembly is disposed between the first faceplate and the isolator assembly and the exhaust assembly is disposed between the second showerhead assembly and the second faceplate. The reactor body has a wafer carrier disposed on a wafer carrier track and a lamp assembly disposed below the wafer carrier track and containing a plurality of lamps which may be utilized to heat wafers disposed on the wafer carrier.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100209620
    Abstract: Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for processing a wafer within a vapor deposition reactor is provided which includes heating at least one wafer disposed on a wafer carrier by exposing a lower surface of the wafer carrier to radiation emitted from a lamp assembly and flowing a liquid through a passageway extending throughout the reactor to maintain the reactor lid assembly at a predetermined temperature, such as within a range from about 275° C. to about 325° C. The method further includes traversing the wafer carrier along a wafer carrier track through at least a chamber containing a showerhead assembly and an isolator assembly and another chamber containing a showerhead assembly and an exhaust assembly, and removing gases from the reactor through the exhaust assembly.
    Type: Application
    Filed: March 16, 2010
    Publication date: August 19, 2010
    Applicant: ALTA DEVICES, INC.
    Inventors: Gang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas Hegedus
  • Publication number: 20100132780
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) unit, according to embodiments of the invention, may have a very thin absorber layer produced by epitaxial lift-off (ELO), all electrical contacts positioned on the back side of the PV device to avoid shadowing, and/or front side and back side light trapping employing a diffuser and a reflector to increase absorption of the photons impinging on the front side of the PV unit. Several PV units may be combined into PV banks, and an array of PV banks may be connected to form a PV module with thin strips of metal or conductive polymer applied at low temperature. Such innovations may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
    Type: Application
    Filed: October 23, 2009
    Publication date: June 3, 2010
    Inventors: Isik C. Kizilyalli, Melissa Archer, Harry Atwater, Thomas J. Gmitter, Gang He, Andreas Hegedus, Gregg Higashi
  • Publication number: 20100126570
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. In one embodiment of a photovoltaic (PV) device, the PV device generally includes an n-doped layer and a p+-doped layer adjacent to the n-doped layer to form a p-n layer such that electric energy is created when electromagnetic radiation is absorbed by the p-n layer. The n-doped layer and the p+-doped layer may compose an absorber layer having a thickness less than 500 nm. Such a thin absorber layer may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
    Type: Application
    Filed: October 23, 2009
    Publication date: May 27, 2010
    Inventors: Isik C. Kizilyalli, Melissa Archer, Harry Atwater, Thomas J. Gmitter, Gang He, Andreas Hegedus, Gregg Higashi
  • Publication number: 20100126571
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) device may incorporate front side and/or back side light trapping techniques in an effort to absorb as many of the photons incident on the front side of the PV device as possible in the absorber layer. The light trapping techniques may include a front side antireflective coating, multiple window layers, roughening or texturing on the front and/or the back sides, a back side diffuser for scattering the light, and/or a back side reflector for redirecting the light into the interior of the PV device. With such light trapping techniques, more light may be absorbed by the absorber layer for a given amount of incident light, thereby increasing the efficiency of the PV device.
    Type: Application
    Filed: October 23, 2009
    Publication date: May 27, 2010
    Inventors: Isik C. Kizilyalli, Melissa Archer, Harry Atwater, Thomas J. Gmitter, Gang He, Andreas Hegedus, Gregg Higashi
  • Publication number: 20100126552
    Abstract: Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) unit may have all electrical contacts positioned on the back side of the PV device to avoid shadowing and increase absorption of the photons impinging on the front side of the PV unit. Several PV units may be combined into PV banks, and an array of PV banks may be connected to form a PV module with thin strips of metal or conductive polymer formed at low temperature. Such innovations may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
    Type: Application
    Filed: October 23, 2009
    Publication date: May 27, 2010
    Inventors: Isik C. Kizilyalli, Melissa Archer, Harry Atwater, Thomas J. Gmitter, Gang He, Andreas Hegedus, Gregg Higashi