Patents by Inventor Hai Sun
Hai Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9275657Abstract: A process for manufacturing a PMR writer main pole with non-conformal side gaps is provided. The process may include depositing a stitch layer comprising a magnetic material and a second stitch layer material over a substrate, forming an air-bearing surface (ABS) region in a first damascene material, and forming a yoke region in a second damascene material. The first damascene material may include Aluminum Oxide (Al2O3). The second damascene material may include Silicon Dioxide (SiO2). Side gap regions may include SiO2.Type: GrantFiled: October 4, 2013Date of Patent: March 1, 2016Assignee: Western Digital (Fremont), LLCInventors: Jinqiu Zhang, Feng Liu, Xiaoyu Yang, Ming Jiang, Xiaotian Zhou, Zeyu Ma, Hai Sun
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Patent number: 9202493Abstract: A mode converter for use in a Heat-assisted magnetic recording (HAMR) read head to couple or bend light (e.g., from an external laser diode) into a tapered waveguide, and subsequently, to a near field transducer is provided. The mode converter may have an ultra-sharp tip, e.g., less than 200 nm to achieve a desired optical output. Manufacturing such a mode converter involves a two-pattern transform process, where overlay control (using a first edge, such as a right edge, as a reference layer relative to which positioning of a second edge, such as a left edge, is measured) allows for aligning of the right and left edges of a tip portion of the mode converter to ultimately create the ultra-sharp tip.Type: GrantFiled: May 27, 2014Date of Patent: December 1, 2015Assignee: WESTERN DIGITAL (FREMONT), LLCInventors: Dujiang Wan, Ge Yi, Lijie Zhao, Zhong Shi, Hai Sun
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Patent number: 9202480Abstract: Various embodiments of the subject disclosure provide a double patterning process that uses two patterning steps to produce a write structure having a nose shape with sharp corners. In one embodiment, a method for forming a write structure on a multi-layer structure comprising a substrate and an insulator layer on the substrate is provided. The method comprises forming a hard mask layer over the insulator layer, performing a first patterning process to form a pole and yoke opening in the hard mask layer, performing a second patterning process to remove rounded corners of the pole and yoke opening in the hard mask layer, removing a portion of the insulator layer corresponding to the pole and yoke opening in the hard mask layer to form a trench in the insulator layer, and filling the trench with a magnetic material.Type: GrantFiled: October 14, 2009Date of Patent: December 1, 2015Assignee: Western Digital (Fremont), LLC.Inventors: Xiaohai Xiang, Yun-Fei Li, Jinqiu Zhang, Hongping Yuan, Xianzhong Zeng, Hai Sun
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Patent number: 9190079Abstract: A magnetic transducer has air-bearing surface (ABS) and includes a main pole and at least one coil. The coil(s) energize the main pole. The main pole includes a yoke and a pole tip having an ABS-facing surface. The pole tip includes a sidewall having a radius of curvature and a chisel angle. The chisel angle is measured between a yoke direction perpendicular to the ABS and a tangent the sidewall. The chisel angle for the pole tip continuously increases in the yoke direction to a maximum a first distance from the ABS-facing surface in the yoke direction. The radius of curvature for the pole tip has a minimum radius of curvature a second distance from the ABS-facing surface in the yoke direction. The first distance is greater than the second distance.Type: GrantFiled: September 22, 2014Date of Patent: November 17, 2015Assignee: Western Digital (Fremont), LLCInventors: Feng Liu, Tao Pan, Hai Sun, Zhigang Bai, Yang Xiang, Yugang Wang, Ling Wang
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Patent number: 9183854Abstract: A method for making an interferometric taper waveguide (I-TWG) with high critical dimension uniformity and small line edge roughness for a heat assisted magnetic recording (HAMR) head, wherein the method includes creating an I-TWG film stack with two hard mask layers on top of an I-TWG core layer sandwiched between two cladding layers, defining a photoresist pattern over the I-TWG film stack using deep ultraviolet lithography, transferring the pattern to the first hard mask layer using reactive ion etching (RIE), forming a temporary I-TWG pattern on the second hard mask layer using RIE, transferring the temporary pattern to the I-TWG core using RIE, refilling the cladding layer, and planarizing using chemical mechanical planarization (CMP).Type: GrantFiled: June 13, 2014Date of Patent: November 10, 2015Assignee: Western Digital (Fremont), LLCInventors: Dujiang Wan, Ge Yi, Lijie Zhao, Hai Sun, Yunfei Li
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Patent number: 9173588Abstract: A method for identifying a stimulation target is provided, which uses microelectrode recording and electrical impedance tomography techniques together in a composite probe. The composite probe includes at least a microelectrode recording sensor and a plurality of microelectrodes, so that after the composite probe is guided and implanted to a depth suitable for the stimulation target based on microelectrode recording signals, tissue structures surrounding the composite probe are delineated by using the plurality of microelectrodes, and the boundary of the stimulation target and the precise location of the composite probe within the stimulation target are determined. Accordingly, the present invention provides a quick and accurate direction for surgeons, eliminating the problem of not knowing the exact location of the implanted probe within the stimulation target as in the case during deep brain stimulation surgeries.Type: GrantFiled: September 27, 2012Date of Patent: November 3, 2015Assignee: National Chiao Tung UniversityInventors: Charles Tak Ming Choi, Shu-Hai Sun, Yi-Hsuan Lee
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Publication number: 20150243304Abstract: A method for making an interferometric taper waveguide (I-TWG) with high critical dimension uniformity and small line edge roughness for a heat assisted magnetic recording (HAMR) head, wherein the method includes creating an I-TWG film stack with two hard mask layers on top of an I-TWG core layer sandwiched between two cladding layers, defining a photoresist pattern over the I-TWG film stack using deep ultraviolet lithography, transferring the pattern to the first hard mask layer using reactive ion etching (RIE), forming a temporary I-TWG pattern on the second hard mask layer using RIE, transferring the temporary pattern to the I-TWG core using RIE, refilling the cladding layer, and planarizing using chemical mechanical planarization (CMP).Type: ApplicationFiled: June 13, 2014Publication date: August 27, 2015Inventors: DUJIANG WAN, GE YI, LIJIE ZHAO, HAI SUN, YUNFEI LI
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Patent number: 9104107Abstract: DUV lithography process that eliminates post exposure baking of a photoresist. Thick photoresist may be processed to obtain enhanced sidewall profiles for microelectronic devices.Type: GrantFiled: May 29, 2013Date of Patent: August 11, 2015Assignee: Western Digital (Fremont), LLCInventors: Xianzhong Zeng, Hai Sun
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Patent number: 9034564Abstract: Disclosed are methods for making read sensors using developable bottom anti-reflective coating and amorphous carbon (a-C) layers as junction milling masks. The methods described herein provide an excellent chemical mechanical polishing or planarization (CMP) stop, and improve control in reader critical physical parameters, shield to shield spacing (SSS) and free layer track width (FLTW).Type: GrantFiled: November 12, 2013Date of Patent: May 19, 2015Assignee: Western Digital (Fremont), LLCInventors: Wei Gao, Miao Wang, Hai Sun, Ming Mao, Tong Zhao
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Patent number: 9007719Abstract: System and methods are provided for the manufacture of a magnetic write head including a pole and yoke region, and a nose shape transition region connecting the yoke to the pole having very small minimum radius of curvature, providing for a sharp transition. A double mask technique is used providing for the adjustment of an offset and illumination conditions between the first and second mask, which provides the capability of tuning the shape of the transition region, and achieving features that would otherwise not be achievable due to distortions caused by optical proximity effect.Type: GrantFiled: March 31, 2014Date of Patent: April 14, 2015Assignee: Western Digital (Fremont), LLCInventors: Hongping Yuan, Bing K. Yen, Ling Wang, Xianzhong Zeng, Dujiang Wan, Hai Sun
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Patent number: 9001467Abstract: A method and system provide a magnetic transducer having an air-bearing surface (ABS) location, a pole and a gap. The pole has a bottom and a top wider than the bottom. The gap is on the top of the pole and at least as wide as the top of the pole such that an overhang is formed between a top edge of the gap and a bottom edge of the bottom of the pole. The method includes providing a plurality of bottom antireflective coatings (BARCs). The plurality of BARCs form a BARC layer that fills the overhang. A shield photoresist mask is provided on at least a portion of the BARC layer. The shield, which includes at least one side shield, is provided.Type: GrantFiled: June 9, 2014Date of Patent: April 7, 2015Assignee: Western Digital (Fremont), LLCInventors: Xianzhong Zeng, Mingjun Yu, Hai Sun, Donghong Li
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Patent number: 8993217Abstract: Innovative techniques are disclosed for fabricating microelectronic devices using an alternating phase shift mask. Some embodiments of the invention encompass a double exposure technique that utilize high resolution line patterning such that two opaque lines intersect at an angle. After development, substantially circular images may be formed. In certain embodiments, high resolution disk imaging as small as 60 nm is possible.Type: GrantFiled: May 30, 2013Date of Patent: March 31, 2015Assignee: Western Digital (Fremont), LLCInventors: Ling Wang, Dujiang Wan, Miao Wang, Hai Sun
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Patent number: 8793866Abstract: A method provides a PMR transducer. In one aspect, the method includes forming a trench in an intermediate layer using reactive ion etch(es). The trench top is wider than its bottom. In this aspect, the method also includes providing a seed layer using atomic layer deposition and providing a PMR pole on the seed layer. Portion(s) of the seed layer and PMR pole reside in the trench. In another aspect, the method includes providing a mask including a trench having a top wider than its bottom. In this aspect, the method includes providing mask material in the trench, providing an intermediate layer on the mask material and removing the mask material to provide another trench in the intermediate layer. In this aspect, the method also includes providing a PMR pole in the additional trench.Type: GrantFiled: December 19, 2007Date of Patent: August 5, 2014Assignee: Western Digital (Fremont), LLCInventors: Jinqiu Zhang, Liubo Hong, Yong Shen, Yizhong Wang, Hai Sun, Li He
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Publication number: 20140175657Abstract: Apparatus including a die including a device side with contact points; and a build-up carrier disposed on the device side of the die; and a film disposed on the back side of the die, the film including a markable material including a mark contrast of at least 20 percent. Method including forming a body of a build-up carrier adjacent a device side of a die; and forming a film on a back side of the die, the film including a markable material including a mark contrast of at least 20 percent. Apparatus including a package including a microprocessor disposed in a carrier; a film on the back side of the microprocessor, the film including a markable material including a mark contrast of at least 20 percent; and a printed circuit board coupled to at least a portion of the plurality of conductive posts of the carrier.Type: ApplicationFiled: December 21, 2012Publication date: June 26, 2014Inventors: Mihir A. Oka, Rahul N. Manepalli, Dingying Xu, Yosuke Kanaoka, Sergei L. Voronov, Dong Hai Sun
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Patent number: 8703397Abstract: A method for fabricating a side shield for a magnetic transducer is described. The magnetic transducer has a nonmagnetic layer and a pole on the nonmagnetic layer. The pole has sidewalls and an air-bearing surface location (ABS location) corresponding to an air-bearing surface (ABS). A developable bottom antireflective coating (D-BARC) layer covering the pole and at least a portion of the nonmagnetic layer is provided. The D-BARC layer is photosensitive. A photosensitive mask layer is provided on the D-BARC layer. A first portion of the mask layer and a first portion of the D-BARC layer are removed to form a bi-layer mask. The bi-layer mask has an aperture in the mask layer and the D-BARC layer. At least one side shield layer is deposited. At least a portion of the at least one side shield layer resides in the aperture. The bi-layer mask is also removed.Type: GrantFiled: March 29, 2012Date of Patent: April 22, 2014Assignee: Western Digital (Fremont), LLCInventors: Xianzhong Zeng, Hai Sun
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Patent number: 8657614Abstract: A rotating lamp tube socket structure includes a seat body, a cover and a rotating element, and the rotating element is pivotally turned with respect to a cover to an installing position or a conducting position, such that when the rotating element is pivotally turned to the installing position, an elastic element is compressed to retract in a direction towards the cover, and when the rotating element is pivotally turned to the conducting position, an elastic resilience of the elastic element props the rotating element to be protruded towards the outside.Type: GrantFiled: July 8, 2012Date of Patent: February 25, 2014Assignee: Chuan He Co., Ltd.Inventor: Ming-Hai Sun
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Patent number: 8657615Abstract: A lamp tube socket structure includes a base, an elastic element, an abutting element, a cover and a metal clip, and the base has an actuating portion, a support pillar extended transversally from the actuating portion and comprised of two wings, and an elastic element is contained in the support pillar, and the abutting element is passed and installed to the two wings of the support pillar and pushed by the elastic element, and the cover has a covering portion, an embedding hole formed on the covering portion, and the cover is combined with the base, and a metal clip containing portion is formed between the covering portion and the actuating portion.Type: GrantFiled: July 8, 2012Date of Patent: February 25, 2014Inventor: Ming-Hai Sun
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Patent number: 8649123Abstract: A method for providing a perpendicular magnetic recording (PMR) head is disclosed. The method comprises: providing an insulating layer; covering the insulating layer with a hard mask material; forming a pre-defined shape in the hard mask material; forming a pole trench and a yoke area in the insulating layer by a first reactive ion etching (RIE) process in which the yoke area includes a loading prevention pattern; performing a wet etching process to remove the hard mask material from the pole trench and the yoke area; performing a second RIE process to remove the loading prevention pattern of the yoke area, wherein the pole trench and the remainder of the yoke area are not removed and remain having similar side wall angles; and providing a PMR pole in which at least a portion of the PMR pole resides in the pole trench.Type: GrantFiled: November 26, 2008Date of Patent: February 11, 2014Assignee: Western Digital (Fremont), LLCInventors: Jinqiu Zhang, Hai Sun, Hongping Yuan, Tsung Yuan Chen
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Patent number: 8563146Abstract: A method for fabricating a magnetic transducer having an air-bearing surface (ABS). An underlayer having a first and second regions and a bevel connecting these regions is provided. The first region is thicker and closer to the ABS than the second region. An intermediate layer conformal with the underlayer is provided. A hard mask layer having a top surface perpendicular to the ABS is formed on the intermediate layer. Part of the hard mask and intermediate layers are removed to provide a trench. The trench has a bottom surface and sidewalls having a first angle between the bottom surface and the intermediate layer and a second angle corresponding to the hard mask layer. A pole is provided in the trench. The pole has a pole tip, a yoke distal, and a bottom bevel. At least the yoke includes sidewalls having sidewall angles corresponding to the first and second angles.Type: GrantFiled: June 27, 2011Date of Patent: October 22, 2013Assignee: Western Digital (Fremont), LLCInventors: Jinqiu Zhang, Ying Hong, Hai Sun, Hongping Yuan, Guanghong Luo, Xiaoyu Yang, Hongmei Han, Lingyun Miao
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Patent number: 8475189Abstract: A connection unit for fluorescent tubes includes a base connected to each of two ends of a light unit and the base has an extension, two conductive plates are connected to two reception areas of the extension, a cover is removably connected to the base and has a room and a recessed area is defined in the top of the cover, a rotatable member is removably connected to the recessed area and has a face board which has a reception hole communicating with the room, a shank is connected to the periphery of the reception hole and the rotatable member is rotatable about an axis of the recessed area, the base and the conductive plates are pulled out from the recessed area and the room respectively.Type: GrantFiled: May 27, 2011Date of Patent: July 2, 2013Assignee: Chuan He Co., Ltd.Inventor: Ming-Hai Sun