Patents by Inventor Harold Robert Zable
Harold Robert Zable has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11886166Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.Type: GrantFiled: February 14, 2023Date of Patent: January 30, 2024Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20230386784Abstract: Methods and systems for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area, based on an original set of exposure information. A pre-proximity effect correction (PEC) maximum dose for the local pattern density is determined, based on a pre-determined target post-PEC maximum dose. The pre-PEC maximum dose may be calculated near an edge of the desired shape. Methods also include modifying the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information.Type: ApplicationFiled: August 3, 2023Publication date: November 30, 2023Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Patent number: 11756765Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area of the desired shape based on an original set of exposure information. A backscatter for a sub area is calculated, based on the original set of exposure information. Dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A pre-PEC maximum dose is determined for the local pattern density, based on a pre-determined target post-PEC maximum dose. The original set of exposure information is modified with the pre-PEC maximum dose and the increased dosage of the at least one pixel in the sub area to create a modified set of exposure information.Type: GrantFiled: June 17, 2021Date of Patent: September 12, 2023Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20230205177Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.Type: ApplicationFiled: February 14, 2023Publication date: June 29, 2023Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20230124768Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area, based on an original set of exposure information. A pre-proximity effect correction (PEC) maximum dose for the local pattern density is determined, based on a pre-determined target post-PEC maximum dose. The pre-PEC maximum dose is calculated near an edge of the desired shape. Methods also include modifying the original set of exposure information with the pre-PEC maximum dose to create a modified set of exposure information.Type: ApplicationFiled: December 19, 2022Publication date: April 20, 2023Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Patent number: 11604451Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information. A dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A modified set of exposure information is output, including the increased dosage of the at least one pixel in the sub area.Type: GrantFiled: March 24, 2021Date of Patent: March 14, 2023Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Patent number: 11592802Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.Type: GrantFiled: December 28, 2020Date of Patent: February 28, 2023Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman
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Publication number: 20210313143Abstract: Methods for exposing a desired shape in an area on a surface using a charged particle beam system include determining a local pattern density for the area of the desired shape based on an original set of exposure information. A backscatter for a sub area is calculated, based on the original set of exposure information. Dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A pre-PEC maximum dose is determined for the local pattern density, based on a pre-determined target post-PEC maximum dose. The original set of exposure information is modified with the pre-PEC maximum dose and the increased dosage of the at least one pixel in the sub area to create a modified set of exposure information.Type: ApplicationFiled: June 17, 2021Publication date: October 7, 2021Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Patent number: 11126085Abstract: Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.Type: GrantFiled: July 10, 2020Date of Patent: September 21, 2021Assignee: D2S, Inc.Inventor: Harold Robert Zable
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Patent number: 11062878Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes determining a local pattern density for the area of the pattern based on an original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PLC maximum dose.Type: GrantFiled: July 21, 2020Date of Patent: July 13, 2021Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman
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Publication number: 20210208569Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information. A dosage for at least one pixel in a plurality of pixels in the sub area is increased, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area. A modified set of exposure information is output, including the increased dosage of the at least one pixel in the sub area.Type: ApplicationFiled: March 24, 2021Publication date: July 8, 2021Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman
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Publication number: 20210116884Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.Type: ApplicationFiled: December 28, 2020Publication date: April 22, 2021Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman
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Patent number: 10884395Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.Type: GrantFiled: December 22, 2018Date of Patent: January 5, 2021Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman
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Publication number: 20200373122Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes determining a local pattern density for the area of the pattern based on an original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PLC maximum dose.Type: ApplicationFiled: July 21, 2020Publication date: November 26, 2020Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman
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Publication number: 20200341380Abstract: Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.Type: ApplicationFiled: July 10, 2020Publication date: October 29, 2020Applicant: D2S, Inc.Inventor: Harold Robert Zable
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Patent number: 10748744Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam system is disclosed and includes inputting an original set of exposure information for the area and inputting a target post-proximity effect correction (PEC) maximum dose. A local pattern density is calculated for the area of the pattern based on the original set of exposure information. A pre-PEC maximum dose is determined for the area. The original set of exposure information is modified with the pre-PEC maximum dose.Type: GrantFiled: May 24, 2019Date of Patent: August 18, 2020Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman
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Patent number: 10725383Abstract: Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.Type: GrantFiled: September 17, 2019Date of Patent: July 28, 2020Assignee: D25, Inc.Inventor: Harold Robert Zable
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Publication number: 20200201286Abstract: A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.Type: ApplicationFiled: December 22, 2018Publication date: June 25, 2020Applicant: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman
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Publication number: 20200012195Abstract: Methods include inputting an array of pixels, where each pixel in the array of pixels has a pixel dose. The array of pixels represents dosage on a surface to be exposed with a plurality of patterns, each pattern of the plurality of patterns having an edge. A target bias is input. An edge of a pattern in the plurality of patterns is identified. For each pixel which is in a neighborhood of the identified edge, a calculated pixel dose is calculated such that the identified edge is relocated by the target bias. The array of pixels with the calculated pixel doses is output. Systems for performing the methods are also disclosed.Type: ApplicationFiled: September 17, 2019Publication date: January 9, 2020Applicant: D2S, Inc.Inventor: Harold Robert Zable
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Patent number: 10460071Abstract: In some embodiments, data is received defining a plurality of shot groups that will be delivered by a charged particle beam writer during an overall time period, where a first shot group will be delivered onto a first designated area at a first time period. A temperature of the first designated area at a different time period is determined. In some embodiments, the different time period is when secondary effects of exposure from a second shot group are received at the first designated area. In some embodiments, transient temperatures of a target designated area are determined at time periods when exposure from a shot group is received. An effective temperature of the target area is determined, using the transient temperatures and applying a compensation factor based on an amount of exposure received during that time period. A shot in the target shot group is modified based on the effective temperature.Type: GrantFiled: October 20, 2016Date of Patent: October 29, 2019Assignee: D2S, Inc.Inventors: Akira Fujimura, Harold Robert Zable, Ryan Pearman, William Guthrie