Abstract: A tinted glass composition and glass article including the same, the composition including: about 45 mol % to about 80 mol % SiO2; about 6 mol % to about 22 mol % Al2O3; 0 mol % to about 25 mol % B2O3; about 7 mol % to about 25 mol % of at least one alkaline earth oxide selected from MgO, CaO, SrO, BaO, and combinations thereof, about 0.5 mol % to about 20 mol % CuO; 0 mol % to about 6 mol % SnO2, SnO, or a combination thereof, 0 mol % to about 1.0 mol % C; 0 mol % to about 5 mol % La2O3; and 0 mol % to about 10 mol % PbO, and that is substantially free of alkali metal.

Abstract: A tinted glass composition and glass article including the same, the composition including: about 45 mol % to about 80 mol % SiO2; about 6 mol % to about 22 mol % Al2O3; 0 mol % to about 25 mol % B2O3; about 7 mol % to about 25 mol % of at least one alkaline earth oxide selected from MgO, CaO, SrO, BaO, and combinations thereof, about 0.5 mol % to about 20 mol % CuO; 0 mol % to about 6 mol % SnO2, SnO, or a combination thereof, 0 mol % to about 1.0 mol % C; 0 mol % to about 5 mol % La2O3; and 0 mol % to about 10 mol % PbO, and that is substantially free of alkali metal.

Abstract: An article including a glass having that includes SiO2, Al2O3, and B2O3 and least one of Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, SnO2, ZnO, La2O3, F, and Fe2O3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.

Abstract: According to one embodiment, a glass-ceramic composition may include from about 60 mol. % to about 75 mol. % SiO2; from about 5 mol. % to about 10 mol. % Al2O3; from about 2 mol. % to about 20 mol. % alkali oxide R2O, the alkali oxide R2O including Li2O and Na2O; and from 0 mol. % to about 5 mol. % alkaline earth oxide RO, the alkaline earth oxide RO including MgO. A ratio of Al2O3 (mol. %) to the sum of (R2O (mol. %)+RO (mol. %)) may be less than 1 in the glass-ceramic composition. A major crystalline phase of the glass-ceramic composition may be Li2Si2O5. A liquidus viscosity of the glass-ceramic composition may be greater than 35 kP. The glass-ceramic composition may be used to form the glass clad layer(s) of a laminated glass article.

Abstract: A tinted glass composition and glass article including the same, the composition including: about 45 mol % to about 80 mol % SiO2; about 6 mol % to about 22 mol % Al2O3; 0 mol % to about 25 mol % B2O3; about 7 mol % to about 25 mol % of at least one alkaline earth oxide selected from MgO, CaO, SrO, BaO, and combinations thereof; about 0.5 mol % to about 20 mol % CuO; 0 mol % to about 6 mol % SnO2, SnO, or a combination thereof; 0 mol % to about 1.0 mol % C; 0 mol % to about 5 mol % La2O3; and 0 mol % to about 10 mol % PbO, and that is substantially free of alkali metal.

Abstract: The present disclosure relates to a reconstituted wafer- and/or panel-level package comprising a glass substrate having a plurality of cavities. Each cavity is configured to hold a single IC chip. The reconstituted wafer- and/or panel-level package can be used in a fan-out wafer or panel level packaging process. The glass substrate can include at least two layers having different photosensitivities with one layer being sufficiently photosensitive to be capable of being photomachined to form the cavities.

Abstract: A laminated glass article includes a glass core layer and a glass cladding layer adjacent to the glass core layer. At least one of the glass core layer or the glass cladding layer is a tinted layer. The tinted layer can include a tinting agent that imparts a color to the tinted layer.

Abstract: The present disclosure relates to a reconstituted wafer- and/or panel-level package comprising a glass substrate having a plurality of cavities. Each cavity is configured to hold a single IC chip. The reconstituted wafer- and/or panel-level package can be used in a fan-out wafer or panel level packaging process. The glass substrate can include at least two layers having different photosensitivities with one layer being sufficiently photosensitive to be capable of being photomachined to form the cavities.

Abstract: A glass-ceramic includes SiO2 in a range of 40 mol. % to 80 mol. %; Al2O3 in a range of 5 mol. % to 20 mol. %; MgO in a range of 5 mol. % to 20 mol. %; and at least one of B2O3, ZnO, and TiO2, each in a range of 0 mol. % to 10 mol. %, such that the glass-ceramic further comprises a magnesium aluminosilicate crystalline phase at a concentration in a range of 5 wt. % to 80 wt. % of the glass-ceramic.

Abstract: The present disclosure relates to a reconstituted wafer- and/or panel-level package comprising a glass substrate having a plurality of cavities. Each cavity is configured to hold a single IC chip. The reconstituted wafer- and/or panel-level package can be used in a fan-out wafer or panel level packaging process. The glass substrate can include at least two layers having different photosensitivities with one layer being sufficiently photosensitive to be capable of being photomachined to form the cavities.

Abstract: A glass-ceramic includes SiO2 in a range of 40 mol. % to 80 mol. %; Al2O3 in a range of 5 mol. % to 20 mol. %; MgO in a range of 5 mol. % to 20 mol. %; and at least one of B2O3, ZnO, and TiO2, each in a range of 0 mol. % to 10 mol. %, such that the glass-ceramic further comprises a magnesium aluminosilicate crystalline phase at a concentration in a range of 5 wt. % to 80 wt. % of the glass-ceramic.

Abstract: Methods for manufacturing glass articles having a target effective coefficient of thermal expansion CTETeff averaged over a temperature range comprise selecting a glass core composition having an average core glass coefficient of thermal expansion CTEcore that is greater than the target effective CTETeff and a glass clad composition having an average clad glass coefficient of thermal expansion CTEclad that is less than the target effective CTETeff; and manufacturing a glass laminate comprising a glass core layer formed from the glass core composition and two or more glass cladding layers fused to the glass core layer, each of the two or more glass cladding layers formed from the glass clad composition such that a ratio of a thickness of the glass core layer to a total thickness of the two or more glass cladding layers is selected to produce the glass laminate having an effective coefficient of thermal expansion CTEeff that is within ±0.5 ppm/° C. of the target effective CTETeff.

Abstract: A glass-ceramic that includes: SiO2 from about 35 mol % to about 80 mol %; B2O3 from about 10 mol % to about 50 mol %; P2O5 from about 10 mol % to about 50 mol %; and an optional addition of one or more of CaO, MgO and Bi2O3 from 0 mol % to about 5 mol %, wherein the glass-ceramic further comprises a boron-phosphate crystalline phase.

Abstract: An article including a glass having that includes SiO2, Al2O3, and B2O3 and least one of Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, SnO2, ZnO, La2O3, F, and Fe2O3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.

Abstract: A laminate glass article is provided that includes: a core glass layer comprising a first coefficient of thermal expansion (CTE); and a plurality of clad glass layers, each comprising a first primary surface, a second primary surface in contact with the core glass layer and a second CTE that is lower than the first CTE of the core glass layer. The difference in the first and second CTE is about 10×10?7/#C to about 70×10?7/#C. Further, each of the core glass layer and the clad glass layers comprises a viscosity from 109.0 to 1014.0 Poise from about 550#C to about 700#C.

Abstract: A method for processing a transparent workpiece includes directing a pulsed laser beam into the transparent workpiece such that a portion of the pulsed laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, thereby forming a damage line within the transparent workpiece, and the portion of the pulsed laser beam directed into the transparent workpiece includes a wavelength ?, a spot size wo, and a Rayleigh range ZR that is greater than F D ? ? ? w 0 , 2 ? , where FD is a dimensionless divergence factor comprising a value of 10 or greater. Further, the method for processing the transparent workpiece includes etching the transparent workpiece with an etching vapor to remove at least a portion of the transparent workpiece along the damage line, thereby forming an aperture extending through the at least a portion of the thickness of the transparent workpiece.

Abstract: An article including a glass having that includes SiO2, Al2O3, and B2O3 and least one of Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, SnO2, ZnO, La2O3, F, and Fe2O3, wherein the glass includes a dielectric constant of about 10 or less and/or a loss tangent of about 0.01 or less, both as measured with signals at 10 GHz.

Abstract: A tinted glass composition and glass article including the same, the composition including: about 45 mol % to about 80 mol % SiO2; about 6 mol % to about 22 mol % Al2O3; 0 mol % to about 25 mol % B2O3; about 7 mol % to about 25 mol % of at least one alkaline earth oxide selected from MgO, CaO, SrO, BaO, and combinations thereof; about 0.5 mol % to about 20 mol % CuO; 0 mol % to about 6 mol % SnO2, SnO, or a combination thereof; 0 mol % to about 1.0 mol % C; 0 mol % to about 5 mol % La2O3; and 0 mol % to about 10 mol % PbO, and that is substantially free of alkali metal.

Abstract: A method for processing a transparent workpiece includes directing a pulsed laser beam into the transparent workpiece such that a portion of the pulsed laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, thereby forming a damage line within the transparent workpiece, and the portion of the pulsed laser beam directed into the transparent workpiece includes a wavelength ?, a spot size w0, and a Rayleigh range ZR that is greater than F D ? ? ? w 0 2 ? , where FD is a dimensionless divergence factor comprising a value of 10 or greater. Further, the method for processing the transparent workpiece includes etching the transparent workpiece with an etching vapor to remove at least a portion of the transparent workpiece along the damage line, thereby forming an aperture extending through the at least a portion of the thickness of the transparent workpiece.

Abstract: Methods for machining glass structures may be performed on fusion-drawn glass laminates having a core layer interposed between a first cladding layer and a second cladding layer. The core layer may be formed from a core glass composition having a core photosensitivity, the first cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity, and the second cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity. At least one of the core layer, the first cladding layer, and the second cladding layer is a photomachinable layer. The methods may include exposing a selected region of a photomachinable layer in the fusion-drawn laminate to ultraviolet radiation; heating the glass structure until the selected region crystallizes; and removing the crystallized material selectively from the photomachinable layer.