Abstract: A method is presented for identifying anomalies based on the dissimilarity and similarity between multivariate samples. A step like procedure applies Dissimilarity- and Similarity computation in a sequenced fashion that considers variable variance, variable correlation and variable distribution pattern of the samples. The spatial interdependency of samples is assessed to deduce the nature of the anomaly. Similarity computation of samples is used to identify weak anomalies that are difficult to detect by conventional exploration methods.

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first re

Abstract: The invention relates to a valve unit for a pressure vessel, the latter consisting of a receptacle and a lid which can be placed on said receptacle in such a way as to make it pressure-tight and said valve unit including: a safety function, pressure-relief function and pressure indicator function; adjustable indicator levels and pressure levels; an indicator pin (4) or indicator piston (10) which is supported against an indicator spring (7), can move in axial direction and bears on its portion becoming visible upon pressurization, due to its emergence from a valve housing (12), indicator rings, for example, for indicating the pressure inside the vessel; and comprising a valve body (5) which is movable in axial direction against the action of an exhaust steam spring (6) and, in the closed position, rests against a seal seat (19), lifting off from this, when a given pressure inside the vessel is exceeded, to uncover a pressure-relief aperture (20), in which case both the indicator spring (7) and the exhaust ste

Abstract: The present invention relates to a method for measuring or verifying the position of a medical implant located in an anatomical body part(s) and/or structure(s) relative to the body part(s) and/or structure(s) or specific points, landmarks or planes of the same, wherein a device is provided which has an at least partially known or previously determined geometry or at least partially known dimensions and is connected to the medical implant; positional or landmark information regarding the anatomical body part(s) and/or structure(s) is acquired; the position of the medical implant is calculated using a navigation system and a reference structure which is or can be connected to the device; and the calculated position of the medical implant is related to or compared with the acquired positional or landmark information regarding the anatomical body part(s) and/or structure(s) in order to measure or verify the position of the medical implant within or relative to the anatomical body part(s) and/or structure(s).

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first re

Abstract: The present invention relates to a centrifuge and a method for cooling a centrifuge. The centrifuge according to the invention includes a cooling device which is improved in that its required installation space is reduced such that the centrifuge can be of a more compact design with the centrifugation capacity remaining unchanged, or the centrifugation capacity can be increased with the installation space remaining unchanged. Further, the number of components can be reduced and thus cost and assembly time can be saved.

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first re

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first re

Abstract: The invention relates to a valve unit for a pressure vessel, the latter consisting of a receptacle and a lid which can be placed on said receptacle in such a way as to make it pressure-tight and said valve unit including: a safety function, pressure-relief function and pressure indicator function; adjustable indicator levels and pressure levels; an indicator pin (4) or indicator piston (10) which is supported against an indicator spring (7), can move in axial direction and bears on its portion becoming visible upon pressurization, due to its emergence from a valve housing (12), indicator rings, for example, for indicating the pressure inside the vessel; and comprising a valve body (5) which is movable in axial direction against the action of an exhaust steam spring (6) and, in the closed position, rests against a seal seat (19), lifting off from this, when a given pressure inside the vessel is exceeded, to uncover a pressure-relief aperture (20), in which case both the indicator spring (7) and the exhaust ste

Abstract: A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the other in the direction of the optical axis, in which each correction piece has a plurality of quadrupole fields (QP) and at least one octupole field (OP.) Each correction piece is constructed such that it is symmetrical with respect to its central plane (S, S?) with each correction piece having an uneven number of at least five quadrupole fields (QP) and at least one octupole field (OP). Each correction piece is further constructed so that it is symmetrical with respect to its central plane. The central quadrupole field is arranged so that it is centered with respect to the central plane of the correction piece and is electromagnetic.

Abstract: A laboratory centrifuge according to the invention provides much better de-mixing rates of centrifuged samples since providing at least one rotation compressor introduces substantially less vibration into the laboratory centrifuge, so that much lower remixing rates are provided.

Abstract: A method for selecting a femoral implant based on models of a femoral neck and/or a femoral head of a patient is provided. A femoral neck model and/or femoral head model is produced from three-dimensional reference point spatial positions of the femoral neck or head, and a base size of a femoral implant model is ascertained based on the femoral head model. A femoral implant model is produced from the base size, and the implant model is positioned at a position in or on the femoral head model. An implant value is ascertained that indicates how many or what proportion of the ascertained reference point spatial positions are outside the implant model. If the implant value exceeds a predetermined value, the implant model is repositioned and the process is repeated. If the implant value does not exceed the value, an appropriate size and position of the implant is determined.

Abstract: A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes.

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first

Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

Abstract: A method for placing a pelvic implant including a cup and a femoral stem includes planning at least one of a location of the cup within a pelvis and a location of the stem within a femur such that a combined anteversion between a predetermined cup component and a predetermined femoral stem component satisfies a predetermined combined anteversion.

Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

Abstract: A method for selecting a femoral implant based on models of a femoral neck and/or a femoral head of a patient, includes: a) detecting reference points on the femoral neck and/or femoral head of the patient; b) registering the femoral neck and/or femoral head based on three-dimensional reference point spatial positions of the detected reference points; c) producing a femoral neck model and/or femoral head model from the three-dimensional reference point spatial positions; d) ascertaining a base size of a femoral implant model based on the femoral head model; e) producing a femoral implant model based on the base size of the femoral implant model; f) positioning the femoral implant model at a position in or on the femoral head model; g) ascertaining an implant value that indicates how many or what proportion of the ascertained reference point spatial positions are outside the femoral implant model; h) determining if the implant value exceeds a predetermined limit value; and i) if the implant value exceeds the l

Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.

Abstract: Disclosed is a lens array having a laterally movable axis for corpuscular rays, particularly for transmission from areas of an object surface onto the focal plane by means of electrons. The inventive array consists of a combined lens comprising a cylinder lens and a quadrupole lens provided with slit diaphragms which can be impinged upon by electric and/or magnetic fields. The optical axis of the quadrupole lens is oriented parallel to the axis of the cylinder lens and defines the optical axis of the projection, the position of which can be altered in relation to the axis of the cylinder lens. The quadrupole lens is in focus in the sector in which the cylinder lens is not in focus and is out of focus in the section in which the cylinder lens is in focus. The inventive combined lens can be operated as an immersion lens for projecting secondary electrons. The immersion field consists of at least two adjacent axially aligned fields.