Abstract: Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

Abstract: An automotive exterior resin part which is a molded article made of a long glass fiber reinforced polycarbonate resin/styrene-based resin, has been molded by injection molding, has a projected area of 200 cm2 or above and allows coating, plating or deposition, wherein the content of the glass fibers in the molded article is 25 to 50% by weight and the weight-average fiber length thereof is 0.5 to 2.0 mm, the centerline average surface roughnesses (Ra) over all faces to be subjected to coating, plating or deposition is 0.8 m or below and the maximum coefficient of linear expansion at 30 to 80° C. is 5×l0?5 or below.

Abstract: The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Abstract: Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.

Abstract: Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

Abstract: The exposure system comprises a projection optical system that irradiates exposure light emitted from a mask onto a substrate, a first support member that supports the projection optical system, and a support structure that supports the first support member, wherein the support member supports the first support member at a position that is higher than the position at which the first support member supports the projection optical system.

Abstract: Devices are disclosed for placement between first and second masses for attenuating transmission of motions from one of the masses to the other. A general embodiment of such a device includes a fluid isolator and a lateral fluid bearing situated along a support axis. The fluid isolator includes a housing defining an isolator chamber pressurized with a gas at pressure Pisol. The fluid isolator is situated such that motion of the masses relative to each other along the support axis is at the fluid isolator, and lateral motion is at the lateral fluid bearing. The lateral fluid bearing includes first and second bearing surfaces that are transverse to the support axis. At least one such surface defines three channels: pressure channel, atmospheric pressure channel, and vacuum channel. In order from the isolator chamber, the pressure channel (at pressure PXYbearing?Pisol) is first, the atmospheric pressure channel (at pressure Patm) is second, and the vacuum channel (at pressure Pvac) is third.

Abstract: Devices are disclosed for placement between first and second masses for attenuating transmission of motions from one of the masses to the other. A general embodiment of such a device includes a fluid isolator and a lateral fluid bearing situated along a support axis. The fluid isolator includes a housing defining an isolator chamber pressurized with a gas at pressure Pisol. The fluid isolator is situated such that motion of the masses relative to each other along the support axis is at the fluid isolator, and lateral motion is at the lateral fluid bearing. The lateral fluid bearing includes first and second bearing surfaces that are transverse to the support axis. At least one such surface defines three channels: pressure channel, atmospheric pressure channel, and vacuum channel. In order from the isolator chamber, the pressure channel (at pressure PXYbearing≈Pisol) is first, the atmospheric pressure channel (at pressure Patm) is second, and the vacuum channel (at pressure Pvac) is third.

Abstract: A reticle stage moves while holding the reticle. A stage controller detects the acceleration of the reticle stage based on the results of detection of an laser interference system. A main control system controls movement of the reticle stage so that the acceleration detected by the reticle stage becomes within a predetermined range of acceleration of the reticle stage where offset will not occur in the reticle. An image of the pattern formed on the reticle is transferred to a wafer through a projection optical system while synchronously moving the reticle and the wafer.

Abstract: A reticle stage moves while holding the reticle. A stage controller detects the acceleration of the reticle stage based on the results of detection of an laser interference system. A main control system controls movement of the reticle stage so that the acceleration detected by the reticle stage becomes within a predetermined range of acceleration of the reticle stage where offset will not occur in the reticle. An image of the pattern formed on the reticle is transferred to a wafer through a projection optical system while synchronously moving the reticle and the wafer.

Abstract: A vibration isolation apparatus for preventing shaking and vibration of a stage of an exposure apparatus or the like uses a vibration isolation mount formed of a spring buffer system employing a spring member and a fluid buffer system employing a viscous fluid as a vibration isolation base which is disposed between a base member on which an exposure unit is mounted and an installation surface on which the base member is installed so as to support the base member. The coefficient of viscous drag of the viscous fluid is varied to vary a damping coefficient which depends on the coefficient of viscous drag thereby to vary rigidity of the vibration isolation mount, whereby vibration transmitted from an external source and vibration associated with a stage movement are damped.

Abstract: A method is provided for suppressing vibration of a body supported by an anti-vibration mount having a predetermined damping coefficient and a predetermined spring constant. The method includes the steps of applying a predetermined force to the body, detecting motion of the body generated in response to the predetermined force, and deriving a mechanical constant of the body from the damping coefficient and the spring constant of the anti-vibration mount and the detected motion of the body generated in response to the predetermined force. The method further includes the steps of monitoring the vibration of the body, and exerting a controlling force to the body in accordance with the monitored vibration of the body and the derived mechanical constant of the body to suppress the vibration of the body.

Abstract: A connector for mounting and grounding electrical components to an underlyuing electrically conductive support structure by a mounting screw includes an electrically insulating mounting block which defines at least one mounting hole. A bent, electrically conductive bus bar having upper and lower legs is operatively associated with the mounting block such that a terminal end portion of the lower leg extends from the mounting block so as to contact the mounting screw when the connector is mounted to the support structure. Thus, grounding of the bus bar to the support structure occurs through the mounting screw. A reinforcement ring may be provided for the mounting hole which is positionally retained therewithin by various structures. Thus, reliable mounting and grounding of an electrical component may be achieved by the connectors of this invention, while minimizing the risk that excessive tightening of the mounting screw will result in breakage of the mounting block in the vicinity of the mounting hole.

Abstract: An exposure apparatus for forming a pattern of a mask on a photo-sensitive substrate comprises an X-Y stage, a Z-stage supported on the X-Y stage, and a levelling stage that supports the photo-sensitive substrate. The levelling stage is supported on the Z-stage by a plurality of levelling devices that define a levelling reference plane, and that are operated in unison to change the level of the levelling stage relative to the Z-stage and relative to an exposure reference plane that is parallel to the levelling reference plane. The levelling devices are also operated individually to change the inclination of the photo-sensitive substrate relative to the levelling reference plane and relative to the exposure reference plane. A focus detector controls the movement of the Z-stage and the in-unison movement of the levelling devices. An inclination detector controls the individual operation of the levelling devices.