Abstract: Provided is a novel technique for treating cancer using structurally-reinforced S-TuD. Provided are: a composition for the prevention or treatment of tumors, said composition comprising an miRNA inhibitory complex including RNA of analog thereof; and a method for preventing or treating tumors using said composition. The miRNA inhibitory complex preferably includes at least one double-stranded structure and an miRNA-binding sequence. Two strands of the miRNA binding sequence preferably bind individually to two strands on at least one end of the double-stranded structure. According to some of the aspects of the present invention, there is provided a delivery system for delivering such an miRNA inhibitory complex.

Abstract: Disclosed a substrate liquid processing apparatus including: a liquid processing section configured to process a substrate with a processing liquid; a processing liquid supply section configured to supply the processing liquid; a diluent supply section configured to supply a diluent for diluting the processing liquid; a controller configured to control the diluent supply section; a concentration detection unit configured to detect a concentration of the processing liquid; and an atmospheric pressure detection unit configured to detect an atmospheric pressure.

Abstract: A substrate processing apparatus includes a processing tub configured to store therein a processing liquid in which a substrate is immersed to be processed, the processing liquid including a first component and a second component having a boiling point higher than that of the first component; an adjusting liquid supply configured to supply an adjusting liquid configured to adjust a concentration of the second component into the processing tub, the adjusting liquid including the first component; and a controller configured to control the adjusting liquid supply. When changing the concentration, the controller calculates a liquid surface height in the processing tub corresponding to the concentration after being changed based on a concentration difference between the concentration after being changed and the concentration before being changed, and the controller controls a supply of the adjusting liquid into the processing tub based on the calculated liquid surface height.

Abstract: A substrate processing apparatus includes a processing tank, a reservoir, a remover, a mixer, and a return path. Etching is performed on a substrate in the processing tank by immersing the substrate in a processing liquid containing a chemical liquid and silicon. The reservoir recovers and stores the processing liquid discharged from the processing tank. The remover recovers a portion of the processing liquid discharged from the processing tank, and removes silicon from the recovered processing liquid. The mixer mixes the processing liquid stored in the reservoir with the processing liquid from which silicon has been removed by the remover. The processing liquid mixed by the mixer is returned to the processing tank through a return path.

Abstract: A lens driving device includes a base, a lens holder capable of holding a lens body, a movable support, a leaf spring that is disposed on the movable support and supports the lens holder such that the lens holder is movable along an optical axis of the lens body, a suspension wire that rises from the base along the optical axis and supports the movable support such that the movable support is movable in a direction intersecting the optical axis, and a drive mechanism that moves the movable support in the direction intersecting the optical axis. The leaf spring includes a spring body fixed to the movable support, a wire fixing part to which the suspension wire is fixed, and a first beam and a second beam that are disposed between the spring body and the wire fixing part and torsionally deformable.

Abstract: Disclosed a substrate liquid processing apparatus including: a liquid processing section configured to process a substrate with a processing liquid; a processing liquid supply section configured to supply the processing liquid; a diluent supply section configured to supply a diluent for diluting the processing liquid; a controller configured to control the diluent supply section; a concentration detection unit configured to detect a concentration of the processing liquid; and an atmospheric pressure detection unit configured to detect an atmospheric pressure.

Abstract: An anti-reflective structural body is constituted of an integrally molded article and includes an anti-reflective structure formed on a base surface that constitutes an outer surface of the molded article, and the anti-reflective structure includes a plurality of recesses, each being formed to be recessed from the base surface independently of mutually adjacent recesses and having an inclined surface, which is inclined with respect to the base surface and forms at least one punctiform or linear apex portion at a bottom portion.

Abstract: Provided are a sulfuric acid adding facility and an operation method therefor which enable an increase in the maximum capacity and the operation rate of a sulfuric acid supply pump provided in the sulfuric acid adding facility. In a sulfuric acid adding facility, sulfuric acid is added to an autoclave used in a leaching step of a high pressure acid leaching method for a nickel oxide ore. The sulfuric acid adding facility is provided with the same number (n+1) (n is an integer, at least 1) of each of the following: a plurality of sulfuric acid adding pipes for adding sulfuric acid into the autoclave; and a plurality of sulfuric acid supply pumps for supplying sulfuric acid to the sulfuric acid adding pipes. Each of the first through n+1th sulfuric acid supply pumps includes at least three diaphragms and discharge ports of the same number as that of the diaphragms.

Abstract: According to an embodiment, a quantum key distribution device includes first and second operation units. The first operation unit is configured to perform a first operation as a key distillation operation. The first operation unit includes a hardware circuit for performing a part of the first operation. The key distillation operation includes a sifting operation for a photon bit string generated through quantum key distribution with another quantum key distribution device via a quantum communication channel. The second operation unit is configured to perform a second operation as a key distillation operation other than the first operation. The second operation unit includes a circuit for a part of the second operation. The first operation unit stores intermediate data generated by the first operation. The second operation unit generates, by the second operation, a cryptographic key being the same as for the another quantum key distribution device from the intermediate data.

Abstract: A learning means 71 learns, on the basis of learning data including a table including a meaning of a column, and a meaning of the table, a model indicating regularity between a distribution of attribute values according to the meaning of the column in the table and the meaning of the table. An estimating means 72 estimates, on the basis of a distribution of attribute values according to a meaning of a column in an input table and the model, a meaning of the table.

Abstract: A non-pulsation pump is provided with: a cam mechanism that converts the rotational motion of a shared motor into reciprocal motion having a prescribed phase difference; a plurality of cross heads that make reciprocal motion with a prescribed phase difference through the cam mechanism; and a plurality of reciprocating pumps that are driven with a prescribed phase difference and that include plungers connected to the cross heads, wherein the total discharge flowrate toward a shared discharge pipe is kept constant. This non-pulsation pump includes a preliminary compression step for moving the plungers of the reciprocating pumps to a discharge side by very small amounts before a discharging step but after a suction step, and has a stroke adjustment mechanism for adjusting the effective stroke length of the plunger in the preliminary compression step. Thus, generation of pulsation can be suppressed even when the set pressure changes.

Abstract: A facility state analysis device of an embodiment is provided. The device includes an inputter which accepts input of information specifying a state and location of a facility installed outdoors, a calculator which calculates, by performing statistical processing based at least in part on the information specifying the state and location input to the inputter and information on a predetermined section on a map, an average failure year of the facilities in the section, and a display controller which displays, on a display, the average failure year calculated by the calculator superimposed on the map.

Abstract: According to an embodiment, a communication system includes a plurality of communication apparatuses. Each of the communication apparatuses includes a key generator and a synchronization processor. The key generator generates shared keys shared with another communication apparatus. The synchronization processor synchronizes at least one of order of using the generated shared keys and roles played when the generated shared keys are used, with another communication apparatus based on a rule determined in advance.

Abstract: An electronic device includes a first substrate, a wiring substrate (second substrate) disposed over the first substrate, and an enclosure (case) in which the first substrate and the wiring substrate are accommodated and that has a first side and a second side. A driver component (semiconductor component) is mounted on the wiring substrate. A gate electrode of a first semiconductor component is electrically connected to the driver component via a lead disposed on a side of the first side and a wiring disposed between the driver component and the first side. A gate electrode of a second semiconductor component is electrically connected to the driver component via a lead disposed on a side of the second side and a wiring disposed between the driver component and the second side.

Abstract: A substrate processing apparatus, a substrate processing method and a recording medium capable of shortening an etching processing time are provided. The substrate processing apparatus includes a substrate processing tub, a mixing unit and a supply line. The substrate processing tub is configured to perform an etching processing therein with an etching liquid. The mixing unit is configured to mix a new liquid with a silicon-containing compound or a liquid containing the silicon-containing compound. The supply line is configured to supply a mixed solution mixed by the mixing unit into the substrate processing tub.

Abstract: A substrate processing apparatus, a substrate processing method and a recording medium capable of suppressing precipitation of a silicon oxide while improving selectivity for etching a silicon nitride film are provided. The substrate processing apparatus includes a SiO2 precipitation inhibitor supply unit and a control unit. The SiO2 precipitation inhibitor supply unit is configured to supply a SiO2 precipitation inhibitor to be mixed into a phosphoric acid processing liquid used in performing an etching processing in a substrate processing tub. The control unit is configured to set a SiO2 precipitation inhibitor concentration contained in the phosphoric acid processing liquid based on a temperature of the phosphoric acid processing liquid, and configured to control a supply amount of the SiO2 precipitation inhibitor to achieve the set SiO2 precipitation inhibitor concentration.

Abstract: A substrate processing apparatus and a substrate processing method capable of suppressing precipitation of a silicon oxide while improving selectivity for etching a silicon nitride film are provided. The substrate processing apparatus includes a substrate processing tub, a phosphoric acid processing liquid supply unit, a circulation path, a SiO2 precipitation inhibitor supply unit and a mixing unit. The phosphoric acid processing liquid supply unit is configured to supply a phosphoric acid processing liquid used in performing an etching processing in the substrate processing tub. The circulation path is configured to circulate the phosphoric acid processing liquid supplied into the substrate processing tub. The SiO2 precipitation inhibitor supply unit is configured to supply a SiO2 precipitation inhibitor into the circulation path.

Abstract: A substrate liquid processing apparatus A1 includes a processing liquid storage unit 38 configured to store a processing liquid therein; a processing liquid drain unit 41 configured to drain the processing liquid from the processing liquid storage unit 38; and a control unit 7. The control unit 7 performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit 38 is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit 41 to start draining of the processing liquid.

Abstract: During a normal operation, a refrigeration cycle device is switched to a refrigerant circuit in which heat contained in a high-pressure refrigerant flowing out of an interior radiator is stored in a heat storage member. When frost is formed on an evaporator, the refrigeration cycle device is switched to another refrigerant circuit in which the exterior heat exchanger is heated and defrosted using heat stored in the heat storage member as a heat source. The heat storage member uses a material formed by adding W (tungsten) as an additive to VO2 (vanadium dioxide) which is a transition metal oxide having a property of a phase transition between a metal and an insulator. The heat storage member effectively stores or dissipates heat depending on a temperature zone of the refrigerant, thereby suppressing an increase in energy consumption of a compressor.

Abstract: A substrate liquid processing apparatus includes a liquid processing unit configured to store a processing liquid and a substrate and process the substrate using the processing liquid, the processing liquid including a phosphoric acid aqueous solution; a phosphoric acid aqueous solution supply unit configured to supply the phosphoric acid aqueous solution to the liquid processing unit; a discharge line connected to the liquid processing unit, and configured to discharge the processing liquid; a return line switchably connected to the discharge line, and configured to return the processing liquid to the liquid processing unit; a recycling line switchably connected to the discharge line, and including a recycling unit configured to recycle the processing liquid; and a waste line switchably connected to the discharge line, and configured to discard the processing liquid to the outside.