Abstract: An imaging optical system may be capable of forming substantially in one or more second planes one or more complete and/or partial images of one or more objects arranged substantially in one or more first planes and may comprise one or more entrance pupils, at least one of which is located substantially on an opposite side of at least one of the first plane or planes from the imaging optical system exclusive of the at least one entrance pupil so located. Such imaging optical system may be constructed so as to be substantially telecentric on at least a same side thereof as at least one of the second plane or planes.

Abstract: An illumination optical system, exposure apparatus, and microdevice manufacturing method where the illumination optical system has provided in one or more optical paths of actinic light IL emitted from one or more actinic light sources two or more filter members having transmittance distributions substantially definable by one or more functions comprising one or more functions of order three or higher with respect to transmittance as a function of position in one or more directions substantially transverse to one or more optical axes.

Abstract: In a projection exposure apparatus used in lithography process for transferring a predetermined pattern formed on a reflection type mask onto a photosensitive substrate, the reflection mask and the substrate are moved relative to each other by a scanning driver, and the illumination optical system located between a radiation light source and the reflection mask includes a field stop located near a position conjugate with the reflection mask. In another embodiment a scanning driver changes the positional relationship between the reflection mask and the projection optical system, or/and between the substrate and the projection optical system. In another embodiment an image of the field stop is formed on the reflection mask by a relay optical system, preferably a catoptric system, forming the predetermined pattern.

Abstract: A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

Abstract: An exposure apparatus that exposes an image of a pattern of a mask onto a photosensitive substrate with EUV radiation, and includes a radiation source unit and an exposure apparatus body unit. The exposure apparatus body unit includes an optical integrator, a mirror arranged in an optical path between the radiation source unit and the optical integrator, a detector arranged in an optical path of the exposure apparatus body unit, and a controller which is connected to the detector and which controls an inclination of the mirror based on an output from the detector. In addition, the radiation source unit and the exposure apparatus body unit are installed independently.

Abstract: A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

Abstract: An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises a first reflective element group (60) having an array of first optical elements (E) each having an arcuate profile corresponding to the arcuate shape of the illumination field. Each of the first optical elements has an eccentric reflecting surface (RSE) comprising an off-axis section of either a spherical surface (S) or an aspherical surface (ASE). The array of first optical elements is designed so as to form a plurality of arcuate light beams (I) capable of forming a plurality of light source images (I).

Abstract: When designing an optical system having a surface with a film formed thereupon, the optical system is first designed in conformance to predetermined specifications without taking into consideration the presence of the film and its optical wavefront is calculated (S10). Next, the film to be formed is set, the optical system including the film is designed and its optical wavefront is calculated (S20). The results of the calculation performed in step S10 are compared with the results of the calculation performed in step S20 (S30). If the wavefront aberration calculated in S20 is less significant than the wavefront aberration calculated in S10, the results of the calculation performed in S20 are approved as the design solution, and the next stage of design study begins. If, on the other hand, the wavefront aberration calculated in S20 is more significant than the wavefront aberration calculated in S10 (S40), the operation returns to S20 to redesign the optical system including the film.

Abstract: An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises a first reflective element group (60) having an array of first optical elements (E) each having an arcuate profile corresponding to the arcuate shape of the illumination field. Each of the first optical elements has an eccentric reflecting surface (RSE) comprising an off-axis section of either a spherical surface (S) or an aspherical surface (ASE). The array of first optical elements is designed so as to form a plurality of arcuate light beams (108) capable of forming a plurality of light source images (1).

Abstract: An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises a first reflective element group (60) having an array of first optical elements (E) each having an arcuate profile corresponding to the arcuate shape of the illumination field. Each of the first optical elements has an eccentric reflecting surface (RSE) comprising an off-axis section of either a spherical surface (S) or an aspherical surface (ASE). The array of first optical elements is designed so as to form a plurality of arcuate light beams (108) capable of forming a plurality of light source images (I).

Abstract: In a projection exposure apparatus used in lithography process for transferring a predetermined pattern formed on a reflection type mask onto a photosensitive substrate, the reflection mask and the substrate are moved relative to each other by a scanning driver, and the illumination optical system located between a radiation light source and the reflection mask includes a field stop located near a position conjugate with the reflection mask. In another embodiment a scanning driver changes the positional relationship between the reflection mask and the projection optical system, or/and between the substrate and the projection optical system. In another embodiment an image of the field stop is formed on the reflection mask by a relay optical system, preferably a catoptric system, forming the predetermined pattern.

Abstract: A method for performing optical adjustments of an exposure apparatus is based on an exposure apparatus having a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with the illumination light generated from the exposure light source so as to imprint a mask pattern on a substrate base.

Abstract: Sources are disclosed for producing short-wavelength electromagnetic radiation (EMR) such as extreme ultraviolet (“EUV” or “soft X-ray”) radiation useful in microlithography. The sources collect a greater amount of the EMR produced by a plasma than conventional sources and form the collected EMR into an illumination EMR flux having higher intensity than conventionally. The EMR flux desirably has a rotationally symmetrical intensity distribution. The plasma is produced by two electrodes contained in a vacuum chamber. A high-voltage pulsed power supply applies a plasma-creating potential across the electrodes. EMR produced by the plasma is collected, typically by a reflective element configured to form a collimated beam of EMR. The electrodes are configured and oriented such that, as the collimated beam passes by the electrodes, the electrodes exhibit minimal blocking of the EMR flux.

Abstract: An exposure apparatus comprises an X-ray source (2-3, 100, 101), an illumination system (4-7) for guiding said X-ray from an X-ray source to a mask (8), a projection system (9) for projecting a pattern on said mask by guiding said X-ray to an exposed plane (10) through a mask, wherein a projection system comprises a plurality of mirrors (91-94), and at least one reflection mirror (91) is interchangeable with a reflection mirror (97) having a different surface shape.

Abstract: An illumination optical system and projection exposure apparatus (100) using same. The illumination optical system includes a predetermined conjugate plane (A) optically conjugate with respect to a mask (M) to be illuminated. The system also includes a first optical system arranged between alight source (114) and the conjugate plane and having a first optical axis (AZ1), and a second optical system arranged between the conjugate plane and the mask and having a second optical axis (AZ2). The second optical axis is shifted with respect to the first optical axis, at the conjugate plane. An optical integrator (140, 216) is arranged within the first optical system and is capable of forming a plurality of light source images from light from the light source. The integrator is designed so as to illuminate the conjugate plane. The second optical system includes a condenser optical system (144, 160) designed so as to converge light from the conjugate plane and to illuminate the mask.

Abstract: An illumination apparatus is provided capable of obtaining identical line widths at all positions in an image surface. A projection exposure apparatus using this illumination apparatus is also provided as well as a method of manufacturing the projection exposure apparatus and a method of manufacturing a device using this apparatus. The illumination apparatus includes a light source system for supplying a light beam, an optical integrator for forming a plurality of light sources based on a light beam from the light source and a condenser optical system for converging beams from the plurality of light sources for illuminating an illuminated surface. The apparatus also has a filter placed in a location that is in an optically conjugate relationship to the illuminated surface. The filter has at least a first area corresponding to a first portion of the plurality of light sources, and a second area corresponding to a second portion of the plurality of light sources other than the first portion.

Abstract: An illumination optical apparatus has an optical integrator and a condenser optical system. The optical integrator has first and second stages in which a plurality of lens elements each having a rectangular lens surface with long and short sides are arranged while the short sides are set adjacent to each other. The first and second stages are arranged adjacent to each other. A position where the short sides are adjacent to each other in the first stage is different from that in the second stage along a longitudinal direction. Therefore, in the illumination optical apparatus, a resolution difference between a pattern along the vertical direction and that in the horizontal direction caused by a rectangular illuminated area with long and short sides or an arcuated illuminated area can be prevented, so that resolution with a uniform line width can be achieved.

Abstract: An illumination optical apparatus according to the present invention comprises a light source, a collector mirror having an ellipsoidal surface of revolution for reflecting and collecting light from the light source, a collimator lens for converting the light collected by the collector mirror into nearly parallel beams, an optical integrator for producing a plurality of light source images from the beams outgoing from the collimator lens, and a condenser lens for condensing light from the plurality of light source images to illuminate a body to be illuminated in a superimposed manner. Wherein the collimator lens is arranged to satisfy the following condition, R.sub.max <f.sub.col .multidot.sin u.sub.max ; where f.sub.col is a focal length of the condenser lens, u.sub.max a maximum angle of incidence of the light incident into the collimator lens, and R.sub.max a maximum beam radius of the nearly parallel beams collimated by the collimator lens.

Abstract: An illumination apparatus for uniformly illuminating an illuminated object surface. The apparatus comprises light source means for supplying an illumination light beam having parallel rays, an optical integrator for forming a plurality of beams from the illumination light beam from said light source means, a condenser optical system for converging the plurality of beams from said optical integrator to illuminate the illuminated object surface in a superimposed manner, and an optical member having a light quantity attenuator for transmitting said illumination light beam so as to attenuate a light quantity of said illumination light beam by a predetermined amount, said optical member being located at or in the vicinity of a position conjugate with said illuminated object surface.

Abstract: A projection exposure apparatus including a light source system, an optical integrator for forming a plurality of light source images, and a condenser optical system for illuminating a target illumination surface in a rectangular or circular arc pattern in a multiple manner. The optical integrator has, from a light source side, a first lens group which has a plurality of first lens element groups each consisting of a plurality of first lens elements, and a second lens group which has a plurality of second lens element groups each consisting of a plurality of second lens elements. The second lens elements are arranged in a one-to-one correspondence with the first lens elements, and dimensions of the lens section of the first and second lens element satisfy a predetermined relations.